Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

G03F9/70for microlithography G03F9/7003Alignment type or strategy G03F9/7007Alignment other than original with workpiece G03F9/7011Pre-exposure scan; original with original holder alignment; Prealignment G03F9/7015Reference G03F9/7019Calibration G03F9/7023Aligning or positioning in direction perpendicular to substrate surface G03F9/7026Focusing G03F9/703Gap setting G03F9/7034Leveling G03F9/7038Alignment for proximity or contact printer G03F9/7042Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation G03F9/7046Strategy G03F9/7049Technique G03F9/7053Non-optical G03F9/7057Gas flow G03F9/7061Scanning probe microscopy G03F9/7065Production of alignment light G03F9/7069Alignment mark illumination G03F9/7073Alignment marks and their environment G03F9/7076Mark details G03F9/708Mark formation G03F9/7084Position of mark on substrate: i.e. position in (x, y, z) of mark G03F9/7088Alignment mark detection G03F9/7092Signal processing G03F9/7096Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus