Alignment mark illumination

Industry

CPC
G03F9/7069

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7069Alignment mark illumination

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Offset alignment method and micro-lithographic printing device
- Patent number 12,147,168
- Issue date Nov 19, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement method, measurement apparatus, and mark
- Patent number 12,140,879
- Issue date Nov 12, 2024
- Kioxia Corporation
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection apparatus, lithography apparatus, and article manufacturi...
- Patent number 11,934,098
- Issue date Mar 19, 2024
- Canon Kabushiki Kaisha
- Tomokazu Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of sensing alignment marks
- Patent number 11,841,628
- Issue date Dec 12, 2023
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination apparatus, measurement apparatus, substrate processing...
- Patent number 11,841,623
- Issue date Dec 12, 2023
- Canon Kabushiki Kaisha
- Yuki Isaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment sensor based on wavelength-scanning
- Patent number 11,841,626
- Issue date Dec 12, 2023
- ASML Holding N.V.
- Muhsin Eralp
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase modulators in alignment to decrease mark size
- Patent number 11,803,130
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus
- Patent number 11,709,421
- Issue date Jul 25, 2023
- Canon Kabushiki Kaisha
- Ken-ichiro Shinoda
- G02 - OPTICS
Information Patent Grant
Recipe selection based on inter-recipe consistency
- Patent number 11,703,772
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Measurement apparatus, lithography apparatus, and method of manufac...
- Patent number 11,537,056
- Issue date Dec 27, 2022
- Canon Kabushiki Kaisha
- Takamitsu Komaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adaptive alignment
- Patent number 11,513,446
- Issue date Nov 29, 2022
- ASML Holding N.V.
- Greger Göte Andersson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus, determination method, and method of manufact...
- Patent number 11,275,319
- Issue date Mar 15, 2022
- Canon Kabushiki Kaisha
- Koshiro Arahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molding apparatus for molding composition on substrate with mold, a...
- Patent number 11,194,249
- Issue date Dec 7, 2021
- Canon Kabushiki Kaisha
- Atsushi Kimura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Measurement apparatus, exposure apparatus, and method of manufactur...
- Patent number 11,169,452
- Issue date Nov 9, 2021
- Canon Kabushiki Kaisha
- Hironori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of leveling wafer in exposure process and exposure system th...
- Patent number 10,948,835
- Issue date Mar 16, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Bum-Hwan Jeon
- G01 - MEASURING TESTING
Information Patent Grant
Mark position determination method
- Patent number 10,942,460
- Issue date Mar 9, 2021
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G01 - MEASURING TESTING
Information Patent Grant
Alignment measurement system
- Patent number 10,942,461
- Issue date Mar 9, 2021
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recipe selection based on inter-recipe consistency
- Patent number 10,901,330
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Imprint apparatus and method for producing article
- Patent number 10,751,920
- Issue date Aug 25, 2020
- Canon Kabushiki Kaisha
- Hiroshi Sato
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Exposure apparatus and article manufacturing method
- Patent number 10,754,255
- Issue date Aug 25, 2020
- Canon Kabushiki Kaisha
- Takafumi Miyaharu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus, exposure apparatus, and method of manufactur...
- Patent number 10,656,541
- Issue date May 19, 2020
- Canon Kabushiki Kaisha
- Hironori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position detector, position detection method, imprint apparatus, an...
- Patent number 10,634,995
- Issue date Apr 28, 2020
- Canon Kabushiki Kaisha
- Ken Minoda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Position detector, position detection method, imprint apparatus, an...
- Patent number 10,613,434
- Issue date Apr 7, 2020
- Canon Kabushiki Kaisha
- Ken Minoda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polarization independent metrology system
- Patent number 10,558,131
- Issue date Feb 11, 2020
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method
- Patent number 10,514,620
- Issue date Dec 24, 2019
- ASML Holding N.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay alignment detection apparatus for display device and exposu...
- Patent number 10,466,600
- Issue date Nov 5, 2019
- BOE Technology Group Co., Ltd.
- Lei Zhang
- G02 - OPTICS
Information Patent Grant
Measurement system, lithographic system, and method of measuring a...
- Patent number 10,437,159
- Issue date Oct 8, 2019
- ASML Netherlands B.V.
- Teunis Willem Tukker
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
- Publication number 20240263941
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Rui CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology system for packaging applications
- Publication number 20240241456
- Publication date Jul 18, 2024
- Venkatakaushik VOLETI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...
- Publication number 20240201605
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Ulrich MUELLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20240184222
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Guido DE HAAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTI...
- Publication number 20240069455
- Publication date Feb 29, 2024
- Canon Kabushiki Kaisha
- KOHEI SENSHU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...
- Publication number 20240061349
- Publication date Feb 22, 2024
- Canon Kabushiki Kaisha
- Yuki Isaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE OBJECTIVES METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND M...
- Publication number 20240012338
- Publication date Jan 11, 2024
- ASML Holding N.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OFFSET ALIGNMENT METHOD AND MICRO-LITHOGRAPHIC PRINTING DEVICE
- Publication number 20230341788
- Publication date Oct 26, 2023
- Mycronic AB
- Anders SVENSSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Back Side to Front Side Alignment on a Semiconductor Wafer with Spe...
- Publication number 20230296994
- Publication date Sep 21, 2023
- INFINEON TECHNOLOGIES AG
- Dirk Offenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURI...
- Publication number 20230194980
- Publication date Jun 22, 2023
- Canon Kabushiki Kaisha
- TOMOKAZU TAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SENSING ALIGNMENT MARKS
- Publication number 20230116318
- Publication date Apr 13, 2023
- ASML Holding N.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT METHOD, MEASUREMENT APPARATUS, AND MARK
- Publication number 20230081143
- Publication date Mar 16, 2023
- KIOXIA Corporation
- Takashi SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE
- Publication number 20220397833
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT SENSOR BASED ON WAVELENGTH-SCANNING
- Publication number 20220299892
- Publication date Sep 22, 2022
- ASML Holding N.V.
- Muhsin ERALP
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGN...
- Publication number 20220100109
- Publication date Mar 31, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADAPTIVE ALIGNMENT
- Publication number 20210397103
- Publication date Dec 23, 2021
- ASML Holding N.V.
- Greger Göte Andersson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY
- Publication number 20210103227
- Publication date Apr 8, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFAC...
- Publication number 20200409277
- Publication date Dec 31, 2020
- Canon Kabushiki Kaisha
- Takamitsu Komaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTUR...
- Publication number 20200249589
- Publication date Aug 6, 2020
- Canon Kabushiki Kaisha
- Hironori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Measurement System
- Publication number 20200241433
- Publication date Jul 30, 2020
- ASML Netherlands B,V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF LEVELING WAFER IN EXPOSURE PROCESS AND EXPOSURE SYSTEM TH...
- Publication number 20200201198
- Publication date Jun 25, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- BUM-HWAN JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS, DETERMINATION METHOD, AND METHOD OF MANUFACT...
- Publication number 20200174384
- Publication date Jun 4, 2020
- Canon Kabushiki Kaisha
- Koshiro Arahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20200019066
- Publication date Jan 16, 2020
- Canon Kabushiki Kaisha
- Takafumi Miyaharu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY
- Publication number 20190271921
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
Polarization Independent Metrology System
- Publication number 20190243254
- Publication date Aug 8, 2019
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARK POSITION DETERMINATION METHOD
- Publication number 20190086824
- Publication date Mar 21, 2019
- ASML Netherlands B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180196363
- Publication date Jul 12, 2018
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY ALIGNMENT DETECTION APPARATUS FOR DISPLAY DEVICE AND EXPOSU...
- Publication number 20180095371
- Publication date Apr 5, 2018
- BOE TECHNOLOGY GROUP CO., LTD.
- Lei Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Alignment mark illumination

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Offset alignment method and micro-lithographic printing device

Measurement method, measurement apparatus, and mark

Detection apparatus, lithography apparatus, and article manufacturi...

Apparatus for and method of sensing alignment marks

Illumination apparatus, measurement apparatus, substrate processing...

Alignment sensor based on wavelength-scanning

Phase modulators in alignment to decrease mark size

Imprint apparatus

Recipe selection based on inter-recipe consistency

Measurement apparatus, lithography apparatus, and method of manufac...

Adaptive alignment

Lithography apparatus, determination method, and method of manufact...

Molding apparatus for molding composition on substrate with mold, a...

Measurement apparatus, exposure apparatus, and method of manufactur...

Lithographic method

Lithographic method

Method of leveling wafer in exposure process and exposure system th...

Mark position determination method

Alignment measurement system

Recipe selection based on inter-recipe consistency

Imprint apparatus and method for producing article

Exposure apparatus and article manufacturing method

Measurement apparatus, exposure apparatus, and method of manufactur...

Position detector, position detection method, imprint apparatus, an...

Position detector, position detection method, imprint apparatus, an...

Polarization independent metrology system

Lithographic method

Alignment method

Overlay alignment detection apparatus for display device and exposu...

Measurement system, lithographic system, and method of measuring a...

Patents Applicationslast 30 patents

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

Metrology system for packaging applications

COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...

METROLOGY METHOD AND APPARATUS

DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTI...

ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...

MULTIPLE OBJECTIVES METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND M...

OFFSET ALIGNMENT METHOD AND MICRO-LITHOGRAPHIC PRINTING DEVICE

Back Side to Front Side Alignment on a Semiconductor Wafer with Spe...

DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURI...

APPARATUS FOR AND METHOD OF SENSING ALIGNMENT MARKS

MEASUREMENT METHOD, MEASUREMENT APPARATUS, AND MARK

PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE

ALIGNMENT SENSOR BASED ON WAVELENGTH-SCANNING

APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGN...

ADAPTIVE ALIGNMENT

RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFAC...

MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTUR...

Alignment Measurement System

METHOD OF LEVELING WAFER IN EXPOSURE PROCESS AND EXPOSURE SYSTEM TH...

LITHOGRAPHY APPARATUS, DETERMINATION METHOD, AND METHOD OF MANUFACT...

LITHOGRAPHIC METHOD

EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD

RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY

Polarization Independent Metrology System

LITHOGRAPHIC METHOD

MARK POSITION DETERMINATION METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

OVERLAY ALIGNMENT DETECTION APPARATUS FOR DISPLAY DEVICE AND EXPOSU...