Alignment marks and their environment

Industry

CPC
G03F9/7073

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7073Alignment marks and their environment

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lithographic overlay correction and lithographic process
- Patent number 11,966,170
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ai-Jen Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,966,171
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imprint apparatus
- Patent number 11,709,421
- Issue date Jul 25, 2023
- Canon Kabushiki Kaisha
- Ken-ichiro Shinoda
- G02 - OPTICS
Information Patent Grant
Method of pattern alignment for field stitching
- Patent number 11,640,118
- Issue date May 2, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,630,397
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment mark evaluation method and alignment mark evaluation system
- Patent number 11,586,118
- Issue date Feb 21, 2023
- GHANGXIN MEMORY TECHNOLOGIES, INC.
- Liyuan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coaxial see-through alignment imaging system
- Patent number 11,526,088
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Anton J. Devilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tunable wavelength see-through layer stack
- Patent number 11,513,445
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Position detection apparatus, position detection method, lithograph...
- Patent number 11,249,401
- Issue date Feb 15, 2022
- Canon Kabushiki Kaisha
- Genki Murayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaping apparatus and article manufacturing method
- Patent number 11,137,680
- Issue date Oct 5, 2021
- Canon Kabushiki Kaisha
- Shintaro Narioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Real-time correction of template deformation in nanoimprint lithogr...
- Patent number 10,996,560
- Issue date May 4, 2021
- Canon Kabushiki Kaisha
- Anshuman Cherala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information determining apparatus and method
- Patent number 10,948,837
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- An Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of controlling a patterning process, device manufacturing m...
- Patent number 10,908,512
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Daan Maurits Slotboom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic cluster, lithographic apparatus, and device manufactur...
- Patent number 10,895,813
- Issue date Jan 19, 2021
- ASML Holding N.V.
- Irit Tzemah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic overlay correction and lithographic process
- Patent number 10,831,110
- Issue date Nov 10, 2020
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ai-Jen Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming apparatus, deciding method, storage medium, informa...
- Patent number 10,831,116
- Issue date Nov 10, 2020
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and method for producing article
- Patent number 10,751,920
- Issue date Aug 25, 2020
- Canon Kabushiki Kaisha
- Hiroshi Sato
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Apparatus and method for aligning integrated circuit layers using m...
- Patent number 10,635,007
- Issue date Apr 28, 2020
- GLOBALFOUNDRIES Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self aligning systems and methods for lithography systems
- Patent number 10,599,055
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark and measurement method thereof
- Patent number 10,566,290
- Issue date Feb 18, 2020
- United Microelectronics Corp.
- Chia-Chen Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transfer method and apparatus and computer program product
- Patent number 10,538,017
- Issue date Jan 21, 2020
- Koninklijke Philips N.V.
- Marcus Antonius Verschuuren
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system wafer stack beam analyzer
- Patent number 10,488,767
- Issue date Nov 26, 2019
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming an aligned mask
- Patent number 10,474,027
- Issue date Nov 12, 2019
- Macronix International Co., Ltd.
- Chin-Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer table chuck having a particle recess
- Patent number 10,310,390
- Issue date Jun 4, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yung-Hsiang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light emitting device and method for manufacturing light emitting d...
- Patent number 10,224,469
- Issue date Mar 5, 2019
- SHARP KABUSHIKI KAISHA
- Toshio Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240152064
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Mincheol KWAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD...
- Publication number 20240094624
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Masaki MITSUYASU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT SYSTEM AND METHOD FOR ALIGNING AN OBJECT HAVING AN ALIGNM...
- Publication number 20240004321
- Publication date Jan 4, 2024
- Nearfield Instruments B.V.
- Hamed SADEGHIAN MARNANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER EDGE EXPOSURE METHOD, WAFER EDGE EXPOSURE DEVICE AND MASK
- Publication number 20220317582
- Publication date Oct 6, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- CHI-NAN CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC OVERLAY CORRECTION AND LITHOGRAPHIC PROCESS
- Publication number 20210041792
- Publication date Feb 11, 2021
- Taiwan Semiconductor Manufacturing company Ltd.
- AI-JEN HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic Cluster, Lithographic Apparatus, and Device Manufactur...
- Publication number 20200326640
- Publication date Oct 15, 2020
- ASML Holding N.V.
- Irit TZEMAH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION DETERMINING APPARATUS AND METHOD
- Publication number 20200159134
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- An GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC OVERLAY CORRECTION AND LITHOGRAPHIC PROCESS
- Publication number 20190369504
- Publication date Dec 5, 2019
- Taiwan Semiconductor Manufacturing company Ltd.
- AI-JEN HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Alignment System Wafer Stack Beam Analyzer
- Publication number 20190204759
- Publication date Jul 4, 2019
- ASML Holding N.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING APPARATUS, DECIDING METHOD, STORAGE MEDIUM, INFORMA...
- Publication number 20190064679
- Publication date Feb 28, 2019
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER TABLE CHUCK HAVING A PARTICLE RECESS
- Publication number 20190049849
- Publication date Feb 14, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Yung-Hsiang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REAL-TIME CORRECTION OF TEMPLATE DEFORMATION IN NANOIMPRINT LITHOGR...
- Publication number 20190033708
- Publication date Jan 31, 2019
- Canon Kabushiki Kaisha
- Anshuman Cherala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF CONTROLLING A PATTERNING PROCESS, DEVICE MANUFACTURING M...
- Publication number 20180373162
- Publication date Dec 27, 2018
- Daan Maurits SLOTBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ON-AXIS ILLUMINATION AND ALIGNMENT FOR CHARGE CONTROL DURING CHARGE...
- Publication number 20180364564
- Publication date Dec 20, 2018
- APPLIED MATERIALS ISRAEL LTD.
- Alex Goldenshtein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180196363
- Publication date Jul 12, 2018
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, OBJECT POSITIONING SYSTEM AND DEVICE MANUFA...
- Publication number 20180149986
- Publication date May 31, 2018
- ASML NETHERLANDS B.V.
- Paul Corné Henri DE WIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-LAYER SEMICONDUCTOR DEVICE STRUCTURE
- Publication number 20180130797
- Publication date May 10, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yasutoshi OKUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK TRANSMISSION DEVICE AND TRANSMISSION METHOD
- Publication number 20180039192
- Publication date Feb 8, 2018
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Xiaoyu JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ALIGNMENT SYSTEM THEREOF
- Publication number 20170329241
- Publication date Nov 16, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE PAD PATTERNS FOR GATE ALIGNMENT MARKS
- Publication number 20140175594
- Publication date Jun 26, 2014
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Ming Hao TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK AND METHOD OF FORMING THE SAME
- Publication number 20140065380
- Publication date Mar 6, 2014
- NANYA TECHNOLOGY CORPORATION
- Chui-Fu Chiu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20130277756
- Publication date Oct 24, 2013
- FUJITSU SEMICONDUCTOR LIMITED
- Makoto Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20130020721
- Publication date Jan 24, 2013
- Elpida Memory, Inc.
- Yutaka NAKAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTORS WITH DUAL LAYER PASSIVATION
- Publication number 20130015462
- Publication date Jan 17, 2013
- FREESCALE SEMICONDUCTOR, INC.
- BRUCE M. GREEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for detecting work alignment mark and exposure apparatus usi...
- Publication number 20110075123
- Publication date Mar 31, 2011
- Ushio Denki Kabushiki Kaisha
- Shinichi Nagamori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Transistor and method with dual layer passivation
- Publication number 20070241419
- Publication date Oct 18, 2007
- Bruce M. Green
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Alignment marks and their environment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithographic overlay correction and lithographic process

Method for producing overlay results with absolute reference for se...

Imprint apparatus

Method of pattern alignment for field stitching

Method for producing overlay results with absolute reference for se...

Alignment mark evaluation method and alignment mark evaluation system

Coaxial see-through alignment imaging system

Tunable wavelength see-through layer stack

Metrology method, patterning device, apparatus and computer program

Position detection apparatus, position detection method, lithograph...

Shaping apparatus and article manufacturing method

Lithographic method

Real-time correction of template deformation in nanoimprint lithogr...

Metrology method, patterning device, apparatus and computer program

Lithographic method

Information determining apparatus and method

Methods of controlling a patterning process, device manufacturing m...

Lithographic cluster, lithographic apparatus, and device manufactur...

Lithographic overlay correction and lithographic process

Pattern forming apparatus, deciding method, storage medium, informa...

Imprint apparatus and method for producing article

Apparatus and method for aligning integrated circuit layers using m...

Self aligning systems and methods for lithography systems

Alignment mark and measurement method thereof

Transfer method and apparatus and computer program product

Lithographic method

Alignment system wafer stack beam analyzer

Method for forming an aligned mask

Wafer table chuck having a particle recess

Light emitting device and method for manufacturing light emitting d...

Patents Applicationslast 30 patents

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD...

ALIGNMENT SYSTEM AND METHOD FOR ALIGNING AN OBJECT HAVING AN ALIGNM...

WAFER EDGE EXPOSURE METHOD, WAFER EDGE EXPOSURE DEVICE AND MASK

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

LITHOGRAPHIC OVERLAY CORRECTION AND LITHOGRAPHIC PROCESS

Lithographic Cluster, Lithographic Apparatus, and Device Manufactur...

INFORMATION DETERMINING APPARATUS AND METHOD

LITHOGRAPHIC METHOD

LITHOGRAPHIC OVERLAY CORRECTION AND LITHOGRAPHIC PROCESS

Alignment System Wafer Stack Beam Analyzer

LITHOGRAPHIC METHOD

PATTERN FORMING APPARATUS, DECIDING METHOD, STORAGE MEDIUM, INFORMA...

WAFER TABLE CHUCK HAVING A PARTICLE RECESS

REAL-TIME CORRECTION OF TEMPLATE DEFORMATION IN NANOIMPRINT LITHOGR...

METHODS OF CONTROLLING A PATTERNING PROCESS, DEVICE MANUFACTURING M...

ON-AXIS ILLUMINATION AND ALIGNMENT FOR CHARGE CONTROL DURING CHARGE...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS, OBJECT POSITIONING SYSTEM AND DEVICE MANUFA...

MULTI-LAYER SEMICONDUCTOR DEVICE STRUCTURE

MASK TRANSMISSION DEVICE AND TRANSMISSION METHOD

ALIGNMENT METHOD AND ALIGNMENT SYSTEM THEREOF

ACTIVE PAD PATTERNS FOR GATE ALIGNMENT MARKS

OVERLAY MARK AND METHOD OF FORMING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

TRANSISTORS WITH DUAL LAYER PASSIVATION

Method for detecting work alignment mark and exposure apparatus usi...

Transistor and method with dual layer passivation