Alignment type or strategy

Industry

CPC
G03F9/7003

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7003Alignment type or strategy

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for modeling measurement data over a substrate area and asso...
- Patent number 12,287,583
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement device and measurement method, exposure apparatus and e...
- Patent number 12,164,236
- Issue date Dec 10, 2024
- Nikon Corporation
- Akihiro Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 12,044,981
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,977,339
- Issue date May 7, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic overlay correction and lithographic process
- Patent number 11,966,170
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ai-Jen Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
- Patent number 11,927,879
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,921,436
- Issue date Mar 5, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Accuracy improvements in optical metrology
- Patent number 11,862,522
- Issue date Jan 2, 2024
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determination of customized components for fitting wafer profile
- Patent number 11,788,833
- Issue date Oct 17, 2023
- Nikon Corporation
- Travis D. Bow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,784,098
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling a position of a first object relative to a se...
- Patent number 11,774,865
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Thijs Adriaan Cornelis Van Keulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,728,224
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,710,668
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus
- Patent number 11,534,859
- Issue date Dec 27, 2022
- Semes Co., Ltd.
- Duk Hyun Son
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 11,500,299
- Issue date Nov 15, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,442,371
- Issue date Sep 13, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing light guide elements
- Patent number 11,422,479
- Issue date Aug 23, 2022
- Waymo LLC
- Bernard Fidric
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-orthogonal target and method for using the same in measuring mi...
- Patent number 11,409,205
- Issue date Aug 9, 2022
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor device and system for perfor...
- Patent number 11,392,045
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Yun Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining stress in a substrate, control system for co...
- Patent number 11,300,888
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for making accurate grating patterns using multiple writing...
- Patent number 11,243,480
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- David Markle
- G02 - OPTICS
Information Patent Grant
Masking process and mask set
- Patent number 11,204,546
- Issue date Dec 21, 2021
- Beijing BOE Optoelectronics Technology Co., Ltd
- Zhiheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,170,072
- Issue date Nov 9, 2021
- ASML Netherands B.V.
- Everhardus Cornelis Mos
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,145,557
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Maintaining a set of process fingerprints
- Patent number 11,099,485
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 11,099,487
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,185
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,184
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time correction of template deformation in nanoimprint lithogr...
- Patent number 10,996,560
- Issue date May 4, 2021
- Canon Kabushiki Kaisha
- Anshuman Cherala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ALIGNMENT METHOD BASED ON HOLOGRAPHIC LITHOGRAPHY, SYSTEM AND DEVICE
- Publication number 20250155829
- Publication date May 15, 2025
- HYPER-OPTICS (BEIJING) TECHNOLOGIES LTD.
- Wen XIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS
- Publication number 20250053106
- Publication date Feb 13, 2025
- ASML Netherlands B,V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION
- Publication number 20240354485
- Publication date Oct 24, 2024
- ONTO INNOVATION INC.
- Keith Frank Best
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE
- Publication number 20240353353
- Publication date Oct 24, 2024
- Karim S. KARIM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...
- Publication number 20240134295
- Publication date Apr 25, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYZING METHOD, ANALYSIS APPARATUS, MEASURING METHOD, MEASUREMENT...
- Publication number 20240045348
- Publication date Feb 8, 2024
- Nikon Corporation
- Ayako SUGIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240014078
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHIP ASSEMBLY AND METHOD OF MAKING A CHIP ASSEMBLY
- Publication number 20230400788
- Publication date Dec 14, 2023
- NPL Management Limited
- Alastair SINCLAIR
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20230221655
- Publication date Jul 13, 2023
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING A SAMPLING SCHEME AND ASSOCIATED APPARATUSES
- Publication number 20230176490
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STACK ALIGNMENT TECHNIQUES
- Publication number 20230020745
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Arjen Benjamin STORM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A REGISTRATION ERROR
- Publication number 20220365449
- Publication date Nov 17, 2022
- Carl Zeiss SMT GMBH
- Mario Laengle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...
- Publication number 20220326629
- Publication date Oct 13, 2022
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT DEVICE AND MEASUREMENT METHOD, EXPOSURE APPARATUS AND E...
- Publication number 20220317581
- Publication date Oct 6, 2022
- Nikon Corporation
- Akihiro UEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A POSITION OF A FIRST OBJECT RELATIVE TO A SE...
- Publication number 20220299889
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Thijs Adriaan Cornelis VAN KEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210384086
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-Orthogonal Target and Method for Using the Same in Measuring Mi...
- Publication number 20210364935
- Publication date Nov 25, 2021
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT APPARATUS
- Publication number 20210354236
- Publication date Nov 18, 2021
- SEMES CO., LTD.
- Duk Hyun Son
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS
- Publication number 20210349402
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210335678
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL SEMICONDUCTOR INTEGRATED CIRCUITS AND CONCENTRIC PHOTOL...
- Publication number 20210223697
- Publication date Jul 22, 2021
- SHAHZAD AKBAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Manufacturing Light Guide Elements
- Publication number 20210208506
- Publication date Jul 8, 2021
- WAYMO LLC
- Bernard Fidric
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SYSTEM FOR MAKING ACCURATE GRATING PATTERNS USING MULTIPLE WRITIN...
- Publication number 20210191285
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- David MARKLE
- G02 - OPTICS
Information Patent Application
ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY
- Publication number 20210175132
- Publication date Jun 10, 2021
- KLA-Tencor Corporation
- Barak Bringoltz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SYSTEM FOR PERFOR...
- Publication number 20210088915
- Publication date Mar 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Yun WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC OVERLAY CORRECTION AND LITHOGRAPHIC PROCESS
- Publication number 20210041792
- Publication date Feb 11, 2021
- Taiwan Semiconductor Manufacturing company Ltd.
- AI-JEN HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210035871
- Publication date Feb 4, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND EXPOSURE APPARATUS
- Publication number 20200379361
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yung-Yao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...
- Publication number 20200363738
- Publication date Nov 19, 2020
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS

Alignment type or strategy

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for modeling measurement data over a substrate area and asso...

Measurement device and measurement method, exposure apparatus and e...

Method and apparatus to determine a patterning process parameter us...

Method and apparatus for optimization of lithographic process

Substrate processing system and substrate processing method, and de...

Lithographic overlay correction and lithographic process

Extreme ultraviolet (EUV) photomask and method of manufacturing sem...

Substrate processing system and substrate processing method, and de...

Accuracy improvements in optical metrology

Determination of customized components for fitting wafer profile

Method and apparatus to determine a patterning process parameter

Method of controlling a position of a first object relative to a se...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Substrate treatment apparatus

Exposure method and exposure apparatus

Substrate processing system and substrate processing method, and de...

Method for manufacturing light guide elements

Non-orthogonal target and method for using the same in measuring mi...

Method for manufacturing semiconductor device and system for perfor...

Methods of determining stress in a substrate, control system for co...

System for making accurate grating patterns using multiple writing...

Masking process and mask set

Method and apparatus for inspection and metrology

Method and apparatus to determine a patterning process parameter

Maintaining a set of process fingerprints

Method and apparatus for optimization of lithographic process

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Real-time correction of template deformation in nanoimprint lithogr...

Patents Applicationslast 30 patents

ALIGNMENT METHOD BASED ON HOLOGRAPHIC LITHOGRAPHY, SYSTEM AND DEVICE

ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS

TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION

MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE

Lithographic Method for Imprinting Three-Dimensional Microstructure...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...

ANALYZING METHOD, ANALYSIS APPARATUS, MEASURING METHOD, MEASUREMENT...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

CHIP ASSEMBLY AND METHOD OF MAKING A CHIP ASSEMBLY

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

METHOD FOR OPTIMIZING A SAMPLING SCHEME AND ASSOCIATED APPARATUSES

STACK ALIGNMENT TECHNIQUES

METHOD FOR DETERMINING A REGISTRATION ERROR

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...

MEASUREMENT DEVICE AND MEASUREMENT METHOD, EXPOSURE APPARATUS AND E...

METHOD OF CONTROLLING A POSITION OF A FIRST OBJECT RELATIVE TO A SE...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Non-Orthogonal Target and Method for Using the Same in Measuring Mi...

SUBSTRATE TREATMENT APPARATUS

METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

CYLINDRICAL SEMICONDUCTOR INTEGRATED CIRCUITS AND CONCENTRIC PHOTOL...

Method for Manufacturing Light Guide Elements

A SYSTEM FOR MAKING ACCURATE GRATING PATTERNS USING MULTIPLE WRITIN...

ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SYSTEM FOR PERFOR...

LITHOGRAPHIC OVERLAY CORRECTION AND LITHOGRAPHIC PROCESS

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

EXPOSURE METHOD AND EXPOSURE APPARATUS

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...