Alternating phase shift masks

Industry

CPC
G03F1/0061

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/0061Alternating phase shift masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System and method for making photomasks
- Patent number 7,984,393
- Issue date Jul 19, 2011
- Texas Instruments Incorporated
- Thomas J. Aton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask, exposure method using the same, and method of generatin...
- Patent number 7,794,899
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and manufacturing method of semiconductor device
- Patent number 7,790,335
- Issue date Sep 7, 2010
- Fujitsu Semiconductor Limited
- Takayoshi Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, pattern formation method using the same and mask data cr...
- Patent number 7,790,337
- Issue date Sep 7, 2010
- Panasonic Corporation
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Notched trim mask for phase shifting mask
- Patent number 7,695,871
- Issue date Apr 13, 2010
- Synopsys, Inc.
- Paulus J. M. van Adrichem
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Continuous sloped phase edge architecture fabrication technique usi...
- Patent number 7,695,872
- Issue date Apr 13, 2010
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask, exposure method using the same, and method of generatin...
- Patent number 7,662,523
- Issue date Feb 16, 2010
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting test mask patterns for characterizing illumination a...
- Patent number 7,648,802
- Issue date Jan 19, 2010
- The Regents of the University of California
- Andrew R. Neureuther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing target-image-based optical prox...
- Patent number 7,585,600
- Issue date Sep 8, 2009
- Synopsys, Inc.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for creating phase edge structures in a phase shift mask
- Patent number 7,563,546
- Issue date Jul 21, 2009
- International Business Machiens Corporation
- Jason M. Benz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,541,118
- Issue date Jun 2, 2009
- Samsung Electronics Co., Ltd.
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor integrated circuit device
- Patent number 7,387,867
- Issue date Jun 17, 2008
- Hitachi, Ltd.
- Norio Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo mask, exposure method using the same, and method of generatin...
- Patent number 7,384,712
- Issue date Jun 10, 2008
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing target-image-based optical prox...
- Patent number 7,382,912
- Issue date Jun 3, 2008
- Synopsys, Inc.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of creating a layout of a set of masks
- Patent number 7,361,435
- Issue date Apr 22, 2008
- Samsung Electronics Co., Ltd.
- Chul-Hong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a phase shift mask
- Patent number 7,338,736
- Issue date Mar 4, 2008
- Samsung Electronics Co., Ltd.
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Continuous sloped phase edge architecture fabrication technique usi...
- Patent number 7,282,306
- Issue date Oct 16, 2007
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,141,337
- Issue date Nov 28, 2006
- United Microelectronics Corp.
- Chin-Lung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for etching photomasks
- Patent number 7,115,523
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Brigitte C. Stoehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect repair method, in particular for repairing quartz defects on...
- Patent number 7,108,798
- Issue date Sep 19, 2006
- Infineon Technologies AG
- Ralf Ludwig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermally-generated mask pattern
- Patent number 7,078,136
- Issue date Jul 18, 2006
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photolithographic mask
- Patent number 7,070,887
- Issue date Jul 4, 2006
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating phase-shift mask inspection method and apparatus
- Patent number 7,072,502
- Issue date Jul 4, 2006
- Applied Materials, Inc.
- Shirley Hemar
- G01 - MEASURING TESTING
Information Patent Grant
Multiple design database layer inspection
- Patent number 7,027,635
- Issue date Apr 11, 2006
- KLA-Tencor Technologies Corporation
- Mark J. Wihl
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for performing target-image-based optical prox...
- Patent number 7,005,218
- Issue date Feb 28, 2006
- Synopsys, Inc.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple alternating phase shift technology for amplifying resolution
- Patent number 7,001,695
- Issue date Feb 21, 2006
- LSI Logic Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for manufacturing a highly-integrated circuit device
- Patent number 6,998,199
- Issue date Feb 14, 2006
- Samsung Electronics Co., Ltd.
- Chul-Hong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor manufacturing resolution enhancement system and metho...
- Patent number 6,994,939
- Issue date Feb 7, 2006
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defect inspection apparatus for phase shift mask
- Patent number 6,879,393
- Issue date Apr 12, 2005
- Dai Nippon Printing Co., Ltd.
- Yasuhiro Koizumi
- G01 - MEASURING TESTING
Information Patent Grant
Tri-tone attenuated phase shift trim mask for double exposure alter...
- Patent number 6,861,182
- Issue date Mar 1, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Hsing Chang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOLITHOGRAPHY METHOD AND APPARATUS
- Publication number 20200057375
- Publication date Feb 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20190302604
- Publication date Oct 3, 2019
- HOYA CORPORATION
- Yasutaka HORIGOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MAKING PHOTOMASKS
- Publication number 20090125870
- Publication date May 14, 2009
- Thomas J. Aton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO MASK, EXPOSURE METHOD USING THE SAME, AND METHOD OF GENERATIN...
- Publication number 20080220377
- Publication date Sep 11, 2008
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO MASK, EXPOSURE METHOD USING THE SAME, AND METHOD OF GENERATIN...
- Publication number 20080222597
- Publication date Sep 11, 2008
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PERFORMING TARGET-IMAGE-BASED OPTICAL PROX...
- Publication number 20080201686
- Publication date Aug 21, 2008
- Synopsys, Inc.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME
- Publication number 20080102383
- Publication date May 1, 2008
- Samsung Electronics Co., Ltd.
- Myung-Ah KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRIM PHOTOMASK PROVIDING ENHANCED DIMENSIONAL TRIMMING AND METHODS...
- Publication number 20080076034
- Publication date Mar 27, 2008
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuous sloped phase edge architecture fabrication technique usi...
- Publication number 20080044768
- Publication date Feb 21, 2008
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, pattern formation method using the same and mask data cr...
- Publication number 20070184361
- Publication date Aug 9, 2007
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Notched trim mask for phase shifting mask
- Publication number 20070082276
- Publication date Apr 12, 2007
- Synopsys, Inc.
- Paulus J. M. van Adrichem
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shifting test mask patterns for characterizing illumination a...
- Publication number 20070053576
- Publication date Mar 8, 2007
- The Regents of the University of California
- Andrew R. Neureuther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for repairing an alternating phase-shift mask
- Publication number 20060147814
- Publication date Jul 6, 2006
- Ted Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for performing target-image-based optical prox...
- Publication number 20060115753
- Publication date Jun 1, 2006
- Synopsys Merger Holding LLC.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask used in manufacturing highly-integrated circuit device, method...
- Publication number 20060099522
- Publication date May 11, 2006
- Samsung Electronics Co., Ltd.
- Chul-Hong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuous sloped phase edge architecture fabrication technique usi...
- Publication number 20050214652
- Publication date Sep 29, 2005
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for etching photomasks
- Publication number 20050181608
- Publication date Aug 18, 2005
- APPLIED MATERIALS, INC.
- Brigitte C. Stoeher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR CREATING PHASE EDGE STRUCTURES
- Publication number 20050164097
- Publication date Jul 28, 2005
- International Business Machines Corporation
- Jason M. Benz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and manufacturing method of semiconductor device
- Publication number 20050164129
- Publication date Jul 28, 2005
- FUJITSU LIMITED
- Takayoshi Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift mask and fabrication thereof
- Publication number 20050112476
- Publication date May 26, 2005
- Robert A. Bellman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor integrated circuit device
- Publication number 20050090120
- Publication date Apr 28, 2005
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo mask, exposure method using the same, and method of generatin...
- Publication number 20050003305
- Publication date Jan 6, 2005
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, exposure apparatus and device manufacturing method
- Publication number 20040248043
- Publication date Dec 9, 2004
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask and method of fabricating the same
- Publication number 20040248018
- Publication date Dec 9, 2004
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple alternating phase shift technology for amplifying resolution
- Publication number 20040224239
- Publication date Nov 11, 2004
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for performing target-image-based optical prox...
- Publication number 20040219436
- Publication date Nov 4, 2004
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Defect correction method for a photomask
- Publication number 20040209172
- Publication date Oct 21, 2004
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A phase shift mask
- Publication number 20040197671
- Publication date Oct 7, 2004
- Chin-Lung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Defect repair method, in particular for repairing quartz defects on...
- Publication number 20040124175
- Publication date Jul 1, 2004
- Infineon Technologies AG
- Ralf Ludwig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermal generation of mask pattern
- Publication number 20040126675
- Publication date Jul 1, 2004
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY

Alternating phase shift masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System and method for making photomasks

Photo mask, exposure method using the same, and method of generatin...

Photomask and manufacturing method of semiconductor device

Photomask, pattern formation method using the same and mask data cr...

Notched trim mask for phase shifting mask

Continuous sloped phase edge architecture fabrication technique usi...

Photo mask, exposure method using the same, and method of generatin...

Phase shifting test mask patterns for characterizing illumination a...

Method and apparatus for performing target-image-based optical prox...

Process for creating phase edge structures in a phase shift mask

Phase shift mask

Manufacturing method of semiconductor integrated circuit device

Photo mask, exposure method using the same, and method of generatin...

Method and apparatus for performing target-image-based optical prox...

Method of creating a layout of a set of masks

Method of fabricating a phase shift mask

Continuous sloped phase edge architecture fabrication technique usi...

Phase shift mask

Method and apparatus for etching photomasks

Defect repair method, in particular for repairing quartz defects on...

Thermally-generated mask pattern

Photolithographic mask

Alternating phase-shift mask inspection method and apparatus

Multiple design database layer inspection

Method and apparatus for performing target-image-based optical prox...

Multiple alternating phase shift technology for amplifying resolution

Mask for manufacturing a highly-integrated circuit device

Semiconductor manufacturing resolution enhancement system and metho...

Defect inspection apparatus for phase shift mask

Tri-tone attenuated phase shift trim mask for double exposure alter...

Patents Applicationslast 30 patents

PHOTOLITHOGRAPHY METHOD AND APPARATUS

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

SYSTEM AND METHOD FOR MAKING PHOTOMASKS

PHOTO MASK, EXPOSURE METHOD USING THE SAME, AND METHOD OF GENERATIN...

PHOTO MASK, EXPOSURE METHOD USING THE SAME, AND METHOD OF GENERATIN...

METHOD AND APPARATUS FOR PERFORMING TARGET-IMAGE-BASED OPTICAL PROX...

PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME

TRIM PHOTOMASK PROVIDING ENHANCED DIMENSIONAL TRIMMING AND METHODS...

Continuous sloped phase edge architecture fabrication technique usi...

Photomask, pattern formation method using the same and mask data cr...

Notched trim mask for phase shifting mask

Phase shifting test mask patterns for characterizing illumination a...

Methods for repairing an alternating phase-shift mask

Method and apparatus for performing target-image-based optical prox...

Mask used in manufacturing highly-integrated circuit device, method...

Continuous sloped phase edge architecture fabrication technique usi...

Method and apparatus for etching photomasks

PROCESS FOR CREATING PHASE EDGE STRUCTURES

Photomask and manufacturing method of semiconductor device

Phase-shift mask and fabrication thereof

Manufacturing method of semiconductor integrated circuit device

Photo mask, exposure method using the same, and method of generatin...

Exposure method, exposure apparatus and device manufacturing method

Phase shift mask and method of fabricating the same

Multiple alternating phase shift technology for amplifying resolution

Method and apparatus for performing target-image-based optical prox...

Defect correction method for a photomask

A phase shift mask

Defect repair method, in particular for repairing quartz defects on...

Thermal generation of mask pattern