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Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
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Industry
CPC
G03F1/00
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
Current Industry
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
Sub Industries
G03F1/0007
using an elastic substrate or involving an optical distortion
G03F1/0015
by drawing, writing
G03F1/0023
the masking pattern being obtained by the application of an ink
G03F1/003
the masking pattern being obtained by thermal means
G03F1/0038
using chemical means
G03F1/0046
Phase shift masks
G03F1/0053
Hybrid phase shift masks
G03F1/0061
Alternating phase shift masks
G03F1/0069
Auxiliary patterns or specific arrangements of the phase-shifting elements to avoid phase-conflicts
G03F1/0076
Masks with semi-transparent phase shifters
G03F1/0084
Masks where at least part of the patterns comprise no opaque or semi-opaque pattern elements
G03F1/0092
Auxiliary processes relating to originals
G03F1/02
by photographic processes for production of originals simulating relief
G03F1/04
by montage processes
G03F1/06
from printing surfaces
G03F1/08
Originals having inorganic imaging layers
G03F1/10
by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns
G03F1/103
the masking pattern being obtained by modification of the polymeric pattern by energetic means
G03F1/106
the masking means
G03F1/12
by exposing silver-halide-containing photosensitive materials or diazo-type materials
G03F1/14
Originals characterised by structural details
G03F1/142
Pellicles, pellicle rings or continuous protective layers
G03F1/144
Auxiliary patterns; Corrected patterns
G03F1/146
Originals for X-Ray exposures, X-Ray masks
G03F1/148
X-Ray absorbers
G03F1/16
Originals having apertures
G03F1/20
Masks or mask blanks for imaging by charged particle beam [CPB] radiation
G03F1/22
Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength
G03F1/24
Reflection masks Preparation thereof
G03F1/26
Phase shift masks [PSM] PSM blanks Preparation thereof
G03F1/28
with three or more diverse phases on the same PSM Preparation thereof
G03F1/29
Rim PSM or outrigger PSM Preparation thereof
G03F1/30
Alternating PSM
G03F1/32
Attenuating PSM [att-PSM]
G03F1/34
Phase-edge PSM
G03F1/36
Masks having proximity correction features Preparation thereof
G03F1/38
Masks having auxiliary features
G03F1/40
Electrostatic discharge [ESD] related features
G03F1/42
Alignment or registration features
G03F1/44
Testing or measuring features
G03F1/46
Antireflective coatings
G03F1/48
Protective coatings
G03F1/50
Mask blanks not covered by G03F1/20 - G03F1/34 Preparation thereof
G03F1/52
Reflectors
G03F1/54
Absorbers
G03F1/56
Organic absorbers
G03F1/58
having two or more different absorber layers
G03F1/60
Substrates
G03F1/62
Pellicles, e.g. pellicle assemblies
G03F1/64
characterised by the frames
G03F1/66
Containers specially adapted for masks, mask blanks or pellicles Preparation thereof
G03F1/68
Preparation processes not covered by groups G03F1/20 - G03F1/50
G03F1/70
Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging
G03F1/72
Repair or correction of mask defects
G03F1/74
by charged particle beam [CPB]
G03F1/76
Patterning of masks by imaging
G03F1/78
by charged particle beam [CPB]
G03F1/80
Etching
G03F1/82
Auxiliary processes
G03F1/84
Inspecting
G03F1/86
by charged particle beam [CPB]
G03F1/88
prepared by photographic processes for production of originals simulating relief
G03F1/90
prepared by montage processes
G03F1/92
prepared from printing surfaces
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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H01 - BASIC ELECTRIC ELEMENTS
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H01 - BASIC ELECTRIC ELEMENTS
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
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B82 - NANO-TECHNOLOGY
Information
Patent Application
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Publication date
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
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Katsuyoshi KODERA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
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Publication number
20240431057
Publication date
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Bryan P. Kiple
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR