Amplitude modulation, includes pulsing

Industry

CPC
H01J37/32146

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32146Amplitude modulation, includes pulsing

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,261,021
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,020
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Takahiro Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-shape voltage pulse trains for uniformity and etch profile tu...
- Patent number 12,255,051
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma measurement method
- Patent number 12,237,157
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of control for plasma processing
- Patent number 12,230,475
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 12,230,477
- Issue date Feb 18, 2025
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated control of a plasma processing system
- Patent number 12,230,476
- Issue date Feb 18, 2025
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state pulsing for achieving a balance between bow control and...
- Patent number 12,217,972
- Issue date Feb 4, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,205,801
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Toshiaki Saijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...
- Patent number 12,183,544
- Issue date Dec 31, 2024
- Lam Research Corporation
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote source pulsing with advanced pulse control
- Patent number 12,183,583
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage waveform generator for plasma assisted processing apparatuses
- Patent number 12,183,547
- Issue date Dec 31, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Jordi Everts
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,761
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,765
- Issue date Nov 26, 2024
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage waveform generator for plasma assisted processing apparatuses
- Patent number 12,136,534
- Issue date Nov 5, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Jordi Everts
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,136,535
- Issue date Nov 5, 2024
- Tokyo Electron Limited
- Tatsuro Ohshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse and bias synchronization methods and systems
- Patent number 12,131,884
- Issue date Oct 29, 2024
- MKS Instruments, Inc.
- Mariusz Oldziej
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing assisted low-k film deposition with high mechanical stre...
- Patent number 12,125,675
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Ruitong Xiong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,125,676
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Takahiro Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE PROCESSING METHOD US...
- Publication number 20250104969
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- HYUN BAE KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250095963
- Publication date Mar 20, 2025
- Hitachi High-Tech Corporation
- Haixiang HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250095981
- Publication date Mar 20, 2025
- Hitachi High-Tech Corporation
- Jiahui LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTO...
- Publication number 20250095971
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- Ji Mo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO CONTROL ETCH PROFILE BY RF PULSING
- Publication number 20250095964
- Publication date Mar 20, 2025
- LAM RESEARCH CORPORATION
- Daksh AGARWAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...
- Publication number 20250087458
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS
- Publication number 20250087459
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE-ASSISTED PLASMA STRIKE
- Publication number 20250087461
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PLASMA ETCHING A LAYER BASED ON A III-N MATERIAL
- Publication number 20250079122
- Publication date Mar 6, 2025
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Nicolas POSSEME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR AND METHOD OF USING SAME
- Publication number 20250079123
- Publication date Mar 6, 2025
- JEHARA CORPORATION
- Hongseub KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250069851
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250062101
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250046580
- Publication date Feb 6, 2025
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250046620
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Kenta NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION
- Publication number 20250046576
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR LATERAL ETCH WITH BOTTOM PASSIVATION
- Publication number 20250046617
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Adam Pranda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE SWITCH ON TIME CONTROL FOR BIAS SUPPLY
- Publication number 20250022683
- Publication date Jan 16, 2025
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250022684
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014866
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM
- Publication number 20250006464
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250006516
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20250006463
- Publication date Jan 2, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...
- Publication number 20240429026
- Publication date Dec 26, 2024
- CENTROTHERM INTERNATIONAL AG
- Sebastian Hubertus Schulz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240429025
- Publication date Dec 26, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSITION CONTROL IN A BIAS SUPPLY
- Publication number 20240429023
- Publication date Dec 26, 2024
- Advanced Energy Industries, Inc.
- Hien Minh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240429024
- Publication date Dec 26, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240420922
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS

Amplitude modulation, includes pulsing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for treating substrate

Plasma processing apparatus and plasma processing method

Apparatus to control ion energy

Multi-shape voltage pulse trains for uniformity and etch profile tu...

Reducing aspect ratio dependent etch with direct current bias pulsing

Plasma measurement method

Plasma processing assembly using pulsed-voltage and radio-frequency...

Systems and methods of control for plasma processing

Nanosecond pulser ADC system

Integrated control of a plasma processing system

Multi-state pulsing for achieving a balance between bow control and...

Systems and methods for metastable activated radical selective stri...

Solid-state switch based high-speed pulser with plasma IEDF modific...

Plasma processing apparatus and plasma processing method

Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...

Remote source pulsing with advanced pulse control

Voltage waveform generator for plasma assisted processing apparatuses

Methods and systems for advanced ion control for etching processes

Control method and plasma processing apparatus

Apparatus to control a waveform

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma uniformity control in pulsed DC plasma chamber

Plasma processing chambers configured for tunable substrate and edg...

Voltage waveform generator for plasma assisted processing apparatuses

Plasma processing apparatus and plasma processing method

Pulse and bias synchronization methods and systems

RF pulsing assisted low-k film deposition with high mechanical stre...

Plasma processing apparatus and plasma processing method

Apparatus for plasma processing

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE PROCESSING METHOD US...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTO...

METHOD TO CONTROL ETCH PROFILE BY RF PULSING

TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...

TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS

PULSED VOLTAGE-ASSISTED PLASMA STRIKE

METHOD FOR PLASMA ETCHING A LAYER BASED ON A III-N MATERIAL

PLASMA GENERATOR AND METHOD OF USING SAME

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION

METHOD FOR LATERAL ETCH WITH BOTTOM PASSIVATION

ACTIVE SWITCH ON TIME CONTROL FOR BIAS SUPPLY

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

TRANSITION CONTROL IN A BIAS SUPPLY

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES