Amplitude modulation, includes pulsing

Industry

CPC
H01J37/32146

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32146Amplitude modulation, includes pulsing

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Adaptive pulse shaping with post match sensor
- Patent number 12,362,146
- Issue date Jul 15, 2025
- MKS Inc.
- Jonathan Smyka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and substrate processing apparatus
- Patent number 12,362,142
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Takashi Chiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for OES data collection and endpoint detection
- Patent number 12,362,158
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method, and apparatus for controlling ion energy distributi...
- Patent number 12,354,836
- Issue date Jul 8, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining an optimal ion energy for plasma processing of a dielec...
- Patent number 12,347,662
- Issue date Jul 1, 2025
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Qihao Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directional selective deposition
- Patent number 12,347,674
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma excitation with ion energy control
- Patent number 12,347,647
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,646
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Bongseong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma etching
- Patent number 12,334,353
- Issue date Jun 17, 2025
- SPTS Technologies Limited
- Weikang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration processes utilizing boron-doped silicon materials
- Patent number 12,334,358
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for implementing a micro pulsing scheme using du...
- Patent number 12,334,304
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- A N M Wasekul Azad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state RF pulsing to control mask shape and breaking selectivi...
- Patent number 12,322,571
- Issue date Jun 3, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing assembly and power supply arrangement
- Patent number 12,322,570
- Issue date Jun 3, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching a semiconductor substrate in a pla...
- Patent number 12,315,732
- Issue date May 27, 2025
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,315,698
- Issue date May 27, 2025
- Tokyo Electron Limited
- Cedric Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active switch on time control for bias supply
- Patent number 12,308,210
- Issue date May 20, 2025
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical emission spectroscopy for advanced process characterization
- Patent number 12,306,044
- Issue date May 20, 2025
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for automated frequency tuning of radiofrequency...
- Patent number 12,300,463
- Issue date May 13, 2025
- Lam Research Corporation
- Mathew Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced film formation method
- Patent number 12,300,466
- Issue date May 13, 2025
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 12,283,461
- Issue date Apr 22, 2025
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for multi-level pulsing in RF plasma tools
- Patent number 12,283,463
- Issue date Apr 22, 2025
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,571
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Plasma-enhanced atomic layer deposition with radio-frequency power...
- Patent number 12,270,103
- Issue date Apr 8, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for using binning to increase power during a lo...
- Patent number 12,266,505
- Issue date Apr 1, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,261,021
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,020
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Takahiro Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PULSING CONTROL MATCH NETWORK AND GENERATOR
- Publication number 20250232955
- Publication date Jul 17, 2025
- COMET TECHNOLOGIES USA, INC.
- Stephen E. SAVAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAP-FILLING METHOD FOR A SEMICONDUCTOR DEVICE AND METHOD OF MANUFAC...
- Publication number 20250233017
- Publication date Jul 17, 2025
- WONIK IPS CO., LTD.
- Chang Gyu SONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250232954
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20250232957
- Publication date Jul 17, 2025
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20250226182
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250226181
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS USING MICROWAVES
- Publication number 20250210316
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250210328
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode and Coil Configurations For Processing Chambers and Relat...
- Publication number 20250210304
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY REFEEDING MODULE, SWITCHING CIRCUIT AND EMBODIMENT, PLASMA P...
- Publication number 20250210306
- Publication date Jun 26, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST ATOMIC LAYER ETCH
- Publication number 20250210363
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION WITH RADIO-FREQUENCY POWER...
- Publication number 20250197995
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Jeremy David Fields
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20250201520
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250191880
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250191881
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250183004
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Hwasoo SEOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...
- Publication number 20250183006
- Publication date Jun 5, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250183012
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250174434
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL DEVICE AND METHOD FOR ACTUATING AN IMPEDANCE MATCHING CIRCU...
- Publication number 20250174437
- Publication date May 29, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian A. Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20250174433
- Publication date May 29, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH PHASE-LOCKED WAVEFORMS
- Publication number 20250166966
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING VARIABILITY IN FEATURES OF A SUBST...
- Publication number 20250166967
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUB-MILLISECOND OPTICAL DETECTION OF PULSED PLASMA PROCESSES
- Publication number 20250157801
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Francisco Machuca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250149294
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Juhyun NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149298
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
- Publication number 20250149295
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250149300
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Tangkuei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...
- Publication number 20250140565
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS

Amplitude modulation, includes pulsing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Adaptive pulse shaping with post match sensor

Plasma processing method and substrate processing apparatus

Method for OES data collection and endpoint detection

High aspect ratio etch with infinite selectivity

System, method, and apparatus for controlling ion energy distributi...

Determining an optimal ion energy for plasma processing of a dielec...

Directional selective deposition

Plasma excitation with ion energy control

Plasma processing apparatus

Method and apparatus for plasma etching

Integration processes utilizing boron-doped silicon materials

System and methods for implementing a micro pulsing scheme using du...

Multi-state RF pulsing to control mask shape and breaking selectivi...

Pulsing assembly and power supply arrangement

Method and apparatus for etching a semiconductor substrate in a pla...

Plasma processing method and plasma processing apparatus

Active switch on time control for bias supply

Optical emission spectroscopy for advanced process characterization

Method and system for automated frequency tuning of radiofrequency...

Plasma enhanced film formation method

Method of uniformity control

Systems and methods for achieving peak ion energy enhancement with...

Systems and methods for multi-level pulsing in RF plasma tools

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Plasma-enhanced atomic layer deposition with radio-frequency power...

Systems and methods for using binning to increase power during a lo...

Apparatus and method for treating substrate

Plasma processing apparatus and plasma processing method

Apparatus to control ion energy

Patents Applicationslast 30 patents

PULSING CONTROL MATCH NETWORK AND GENERATOR

GAP-FILLING METHOD FOR A SEMICONDUCTOR DEVICE AND METHOD OF MANUFAC...

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

SUBSTRATE PROCESSING APPARATUS USING MICROWAVES

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

Electrode and Coil Configurations For Processing Chambers and Relat...

ENERGY REFEEDING MODULE, SWITCHING CIRCUIT AND EMBODIMENT, PLASMA P...

FAST ATOMIC LAYER ETCH

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION WITH RADIO-FREQUENCY POWER...

APPARATUS AND METHOD FOR TREATING SUBSTRATE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

CONTROL DEVICE AND METHOD FOR ACTUATING AN IMPEDANCE MATCHING CIRCU...

METHOD OF PROCESSING A SUBSTRATE

PLASMA PROCESSING WITH PHASE-LOCKED WAVEFORMS

SYSTEMS AND METHODS FOR REDUCING VARIABILITY IN FEATURES OF A SUBST...

SUB-MILLISECOND OPTICAL DETECTION OF PULSED PLASMA PROCESSES

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...