anisotropy

Industry

CPC
H01J2237/3345

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3345anisotropy

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
- Patent number 12,176,236
- Issue date Dec 24, 2024
- Kioxia Corporation
- Wu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma non-uniformity detection
- Patent number 12,027,351
- Issue date Jul 2, 2024
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 11,961,721
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and substrate fixing device
- Patent number 11,437,263
- Issue date Sep 6, 2022
- Shinko Electric Industries Co., Ltd.
- Michio Horiuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching apparatus
- Patent number 11,120,975
- Issue date Sep 14, 2021
- Research & Business Foundation Sungkyunkwan University
- Geun Young Yeom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incident in-situ process monitor sensor
- Patent number 10,978,278
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing device
- Patent number 10,546,720
- Issue date Jan 28, 2020
- Canon Anelva Corporation
- Yoshimitsu Kodaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for anisotropic substrate etching
- Patent number 10,193,066
- Issue date Jan 29, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanostructured material and method of making the same
- Patent number 10,126,469
- Issue date Nov 13, 2018
- 3M Innovative Properties Company
- Ta-Hua Yu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam processing method and ion beam processing apparatus
- Patent number 9,984,854
- Issue date May 29, 2018
- Canon Anelva Corporation
- Yoshimitsu Kodaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-high speed anisotropic reactive ion etching
- Patent number 9,966,232
- Issue date May 8, 2018
- The Penn State Research Foundation
- Srinivas Tadigadapa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Etching method and etching apparatus
- Patent number 9,865,471
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Gaku Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced etch and deposition profile control using plasma sheath en...
- Patent number 8,858,816
- Issue date Oct 14, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- B44 - DECORATIVE ARTS
Information Patent Grant
Enhanced etch and deposition profile control using plasma sheath en...
- Patent number 8,603,591
- Issue date Dec 10, 2013
- Varian Semiconductor Ewuipment Associates, Inc.
- Ludovic Godet
- B44 - DECORATIVE ARTS
Information Patent Grant
Method and apparatus for low energy electron enhanced etching of su...
- Patent number 7,431,796
- Issue date Oct 7, 2008
- Georgia Tech Research Corporation
- Kevin P. Martin
- B08 - CLEANING
Information Patent Grant
Etching methods and apparatus and substrate assemblies produced the...
- Patent number 7,125,804
- Issue date Oct 24, 2006
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low energy electron enhanced etching of su...
- Patent number 6,852,195
- Issue date Feb 8, 2005
- Georgia Tech Research Corporation
- Kevin P. Martin
- B08 - CLEANING
Information Patent Grant
Low ceiling temperature process for a plasma reactor with heated so...
- Patent number 6,818,140
- Issue date Nov 16, 2004
- Jian Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsed plasma processing of semiconductor substrates
- Patent number 6,794,301
- Issue date Sep 21, 2004
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having RF power applicator and a dual-purpose window
- Patent number 6,790,311
- Issue date Sep 14, 2004
- Kenneth S Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching methods and apparatus and substrate assemblies produced the...
- Patent number 6,784,111
- Issue date Aug 31, 2004
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Patent number 6,736,931
- Issue date May 18, 2004
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching methods and apparatus and substrate assemblies produced the...
- Patent number 6,635,335
- Issue date Oct 21, 2003
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having an inductive antenna coupling power through a...
- Patent number 6,623,596
- Issue date Sep 23, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- A21 - BAKING EDIBLE DOUGHS
Information Patent Grant
Parallel-plate electrode plasma reactor having an inductive antenna...
- Patent number 6,572,732
- Issue date Jun 3, 2003
- Applied Materials Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal control apparatus for inductively coupled RF plasma reactor...
- Patent number 6,514,376
- Issue date Feb 4, 2003
- Applied Materials Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF Plasma reactor having an overhead solenoidal...
- Patent number 6,454,898
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF plasma reactor having an antenna adjacent a...
- Patent number 6,444,085
- Issue date Sep 3, 2002
- Applied Materials Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,440,866
- Issue date Aug 27, 2002
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for pulsed plasma processing of a semiconducto...
- Patent number 6,395,641
- Issue date May 28, 2002
- Mattson Techonolgy, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...
- Publication number 20240242935
- Publication date Jul 18, 2024
- LAM RESEARCH CORPORATION
- He Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Etching Features in a Layer in a Substrate
- Publication number 20240234158
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Indroneil Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20240222100
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Shan HU
- G01 - MEASURING TESTING
Information Patent Application
In-Situ Adsorbate Formation for Dielectric Etch
- Publication number 20240112888
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Plasma Etch Process
- Publication number 20240112887
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20240096599
- Publication date Mar 21, 2024
- Hitachi High-Tech Corporation
- Koichi Takasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Aspect Ratio Contact (HARC) Etch
- Publication number 20240096640
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
END POINT DETECTION METHOD AND APPARATUS FOR ANISOTROPIC ETCHING US...
- Publication number 20240087860
- Publication date Mar 14, 2024
- SANDISK TECHNOLOGIES LLC
- Shoichi MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR DRY ETCHING
- Publication number 20240071803
- Publication date Feb 29, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Fu-Yi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of Trench Profile Angle in SiC Semiconductors
- Publication number 20240006181
- Publication date Jan 4, 2024
- SPTS TECHNOLOGIES LIMITED
- Huma Ashraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Radiofrequency Signal Generator-Based Contr...
- Publication number 20230253185
- Publication date Aug 10, 2023
- LAM RESEARCH CORPORATION
- Bradford J. Lyndaker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20230230809
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20230068877
- Publication date Mar 2, 2023
- Kokusai Electric Corporation
- Naofumi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20220399222
- Publication date Dec 15, 2022
- KIOXIA Corporation
- Wu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA NON-UNIFORMITY DETECTION
- Publication number 20210217587
- Publication date Jul 15, 2021
- COMET TECHNOLOGIES USA, INC.
- STEPHEN E. SAVAS
- G01 - MEASURING TESTING
Information Patent Application
AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCE...
- Publication number 20210217588
- Publication date Jul 15, 2021
- COMET TECHNOLOGIES USA, INC.
- STEPHEN E. SAVAS
- G01 - MEASURING TESTING
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20210193444
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR
- Publication number 20200043710
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Methods
- Publication number 20190198301
- Publication date Jun 27, 2019
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING APPARATUS
- Publication number 20190035610
- Publication date Jan 31, 2019
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR ANISOTROPIC SUBSTRATE ETCHING
- Publication number 20190006587
- Publication date Jan 3, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING DEVICE
- Publication number 20180240646
- Publication date Aug 23, 2018
- Canon ANELVA Corporation
- YOSHIMITSU KODAIRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ANISOTROPICALLY ETCHING GRAPHENE
- Publication number 20180226261
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Ryota IFUKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-HIGH SPEED ANISOTROPIC REACTIVE ION ETCHING
- Publication number 20160099132
- Publication date Apr 7, 2016
- The Penn State Research Foundation
- Srinivas TADIGADAPA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
ULTRA-HIGH SPEED ANISOTROPIC REACTIVE ION ETCHING
- Publication number 20140166618
- Publication date Jun 19, 2014
- The Penn State Research Foundation
- Srinivas TADIGADAPA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ENHANCED ETCH AND DEPOSITION PROFILE CONTROL USING PLASMA SHEATH EN...
- Publication number 20140034611
- Publication date Feb 6, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- B44 - DECORATIVE ARTS
Information Patent Application
Enhanced Etch and Deposition Profile Control Using Plasma Sheath En...
- Publication number 20100252531
- Publication date Oct 7, 2010
- Ludovic Godet
- B44 - DECORATIVE ARTS
Information Patent Application
ETCHING METHODS AND APPARATUS AND SUBSTRATE ASSEMBLIES PRODUCED THE...
- Publication number 20070077724
- Publication date Apr 5, 2007
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching methods and apparatus and substrate assemblies produced the...
- Publication number 20040262263
- Publication date Dec 30, 2004
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor manufacturing apparatus and method for manufacturing...

Plasma non-uniformity detection

Normal-incidence in-situ process monitor sensor

Electrostatic chuck and substrate fixing device

Ion beam etching apparatus

Normal-incident in-situ process monitor sensor

Ion beam processing device

Apparatus and techniques for anisotropic substrate etching

Nanostructured material and method of making the same

Ion beam processing method and ion beam processing apparatus

Ultra-high speed anisotropic reactive ion etching

Etching method and etching apparatus

Enhanced etch and deposition profile control using plasma sheath en...

Enhanced etch and deposition profile control using plasma sheath en...

Method and apparatus for low energy electron enhanced etching of su...

Etching methods and apparatus and substrate assemblies produced the...

Method and apparatus for low energy electron enhanced etching of su...

Low ceiling temperature process for a plasma reactor with heated so...

Pulsed plasma processing of semiconductor substrates

Plasma reactor having RF power applicator and a dual-purpose window

Etching methods and apparatus and substrate assemblies produced the...

Inductively coupled RF plasma reactor and plasma chamber enclosure...

Etching methods and apparatus and substrate assemblies produced the...

Plasma reactor having an inductive antenna coupling power through a...

Parallel-plate electrode plasma reactor having an inductive antenna...

Thermal control apparatus for inductively coupled RF plasma reactor...

Inductively coupled RF Plasma reactor having an overhead solenoidal...

Inductively coupled RF plasma reactor having an antenna adjacent a...

Plasma reactor with heated source of a polymer-hardening precursor...

Apparatus and method for pulsed plasma processing of a semiconducto...

Patents Applicationslast 30 patents

Apparatus and Methods for Plasma Processing

MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...

Method for Etching Features in a Layer in a Substrate

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

In-Situ Adsorbate Formation for Dielectric Etch

In-Situ Adsorbate Formation for Plasma Etch Process

PLASMA PROCESSING DEVICE

High Aspect Ratio Contact (HARC) Etch

END POINT DETECTION METHOD AND APPARATUS FOR ANISOTROPIC ETCHING US...

METHODS AND SYSTEMS FOR DRY ETCHING

Control of Trench Profile Angle in SiC Semiconductors

Systems and Methods for Radiofrequency Signal Generator-Based Contr...

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

PLASMA NON-UNIFORMITY DETECTION

AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCE...

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR

Plasma Processing Apparatus and Methods

ION BEAM ETCHING APPARATUS

APPARATUS AND TECHNIQUES FOR ANISOTROPIC SUBSTRATE ETCHING

ION BEAM PROCESSING DEVICE

METHOD OF ANISOTROPICALLY ETCHING GRAPHENE

ULTRA-HIGH SPEED ANISOTROPIC REACTIVE ION ETCHING

ULTRA-HIGH SPEED ANISOTROPIC REACTIVE ION ETCHING

ENHANCED ETCH AND DEPOSITION PROFILE CONTROL USING PLASMA SHEATH EN...

Enhanced Etch and Deposition Profile Control Using Plasma Sheath En...

ETCHING METHODS AND APPARATUS AND SUBSTRATE ASSEMBLIES PRODUCED THE...

Etching methods and apparatus and substrate assemblies produced the...