Annular electrodes

Industry

CPC
H01J2237/1215

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1215Annular electrodes

Industries

Patents Grantslast 30 patents

Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Axially progressive lens for transporting charged particles
- Patent number 11,791,149
- Issue date Oct 17, 2023
- Agilent Technologies, Inc.
- Tong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Particle beam system for adjusting the current of individual partic...
- Patent number 11,562,880
- Issue date Jan 24, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens arrangement usable in particle-optical systems
- Patent number 11,527,379
- Issue date Dec 13, 2022
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Objective lens arrangement usable in particle-optical systems
- Patent number 10,622,184
- Issue date Apr 14, 2020
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-electrode electron optics
- Patent number 9,905,322
- Issue date Feb 27, 2018
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-electrode stack arrangement
- Patent number 9,355,751
- Issue date May 31, 2016
- Mapper Lithography IP B.V.
- Willem Henk Urbanus
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-electrode cooling arrangement
- Patent number 9,165,693
- Issue date Oct 20, 2015
- Mapper Lithography IP B.V.
- Willem Henk Urbanus
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electronic optical lens barrel and production method therefor
- Patent number 7,193,221
- Issue date Mar 20, 2007
- Toudai TLO, Ltd.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical apparatus, electron microscopy system and electron...
- Patent number 6,914,249
- Issue date Jul 5, 2005
- Carl Zeiss NTS GmbH
- Oliver Kienzle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optic column and scanning electron microscope
- Patent number 5,399,860
- Issue date Mar 21, 1995
- Kabushiki Kaisha Toshiba
- Motosuke Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and controlling method therefor
- Patent number 5,293,508
- Issue date Mar 8, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Shigeru Shiratake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle generating device and focusing lens therefor
- Patent number 5,095,208
- Issue date Mar 10, 1992
- Hitachi, Ltd.
- Yoichi Ose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced path ion beam implanter
- Patent number 5,091,655
- Issue date Feb 25, 1992
- Eaton Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES
- Publication number 20240038521
- Publication date Feb 1, 2024
- Agilent Technologies, Inc.
- Tong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES
- Publication number 20220336199
- Publication date Oct 20, 2022
- Agilent Technologies, Inc.
- Tong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTIC...
- Publication number 20210210303
- Publication date Jul 8, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRANGEMENT USABLE IN PARTICLE-OPTICAL SYSTEMS
- Publication number 20200243296
- Publication date Jul 30, 2020
- CARL ZEISS MICROSCOPY GMBH
- Rainer KNIPPELMEYER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Particle-Optical Component
- Publication number 20090159810
- Publication date Jun 25, 2009
- Rainer Knippelmeyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic optical lens barrel and production method therefor
- Publication number 20050173649
- Publication date Aug 11, 2005
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle-optical apparatus, electron microscopy system and electron...
- Publication number 20040105160
- Publication date Jun 3, 2004
- LEO Elektronenmikroskopie GmbH
- Oliver Kienzle
- B82 - NANO-TECHNOLOGY

Annular electrodes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vacuum chamber arrangement for charged particle beam generator

Axially progressive lens for transporting charged particles

Vacuum chamber arrangement for charged particle beam generator

Particle beam system for adjusting the current of individual partic...

Objective lens arrangement usable in particle-optical systems

Vacuum chamber arrangement for charged particle beam generator

Objective lens arrangement usable in particle-optical systems

Vacuum chamber arrangement for charged particle beam generator

Multi-electrode electron optics

Multi-electrode stack arrangement

Multi-electrode cooling arrangement

Electronic optical lens barrel and production method therefor

Particle-optical apparatus, electron microscopy system and electron...

Electron optic column and scanning electron microscope

Ion implanter and controlling method therefor

Charged particle generating device and focusing lens therefor

Reduced path ion beam implanter

Patents Applicationslast 30 patents

AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTIC...

OBJECTIVE LENS ARRANGEMENT USABLE IN PARTICLE-OPTICAL SYSTEMS

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

Particle-Optical Component

Electronic optical lens barrel and production method therefor

Particle-optical apparatus, electron microscopy system and electron...