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CPC
H01J37/3222

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3222Antennas

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods of plasma generation with microwaves
- Patent number 12,106,939
- Issue date Oct 1, 2024
- Rimere, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,094,697
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Toshimasa Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Artificial diamond plasma production device
- Patent number 12,084,759
- Issue date Sep 10, 2024
- WAVE POWER TECHNOLOGY INC.
- Ming-Hsiung Tsao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave resonator array for plasma diagnostics
- Patent number 12,062,529
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with multiple metal housings
- Patent number 12,033,835
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of low temperature thin film deposition and in-si...
- Patent number 12,018,374
- Issue date Jun 25, 2024
- DSGI Technologies, Inc.
- Jeffrey Edward Kowalski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for forming graphene structure
- Patent number 12,014,907
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Ryota Ifuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 12,014,900
- Issue date Jun 18, 2024
- Recarbon, Inc.
- Curtis Peter Tom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,002,655
- Issue date Jun 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing apparatus
- Patent number 11,996,270
- Issue date May 28, 2024
- Samsung Electronics Co., Ltd.
- Eunhee Jeang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing apparatus and wafer processing method using the same
- Patent number 11,990,348
- Issue date May 21, 2024
- Samsung Electronics Co., Ltd.
- Chanyeong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and film forming method
- Patent number 11,972,929
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Makoto Wada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,967,485
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave coupling/combining device and associated microwave generator
- Patent number 11,961,713
- Issue date Apr 16, 2024
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQU...
- Louis Latrasse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,948,776
- Issue date Apr 2, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source, microwave plasma processing apparatus and...
- Patent number 11,942,308
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Yasuaki Taniike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled chemical processing reactor
- Patent number 11,923,176
- Issue date Mar 5, 2024
- LytEn, Inc.
- Michael W. Stowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring device and method of obtaining thickness of sheath
- Patent number 11,898,840
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency (RF) and...
- Patent number 11,887,815
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,887,825
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Mikio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis...
- Patent number 11,867,643
- Issue date Jan 9, 2024
- Korea Research Institute of Standards and Science
- Hyo Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,862,434
- Issue date Jan 2, 2024
- PSK INC.
- Young Jae Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,854,775
- Issue date Dec 26, 2023
- Board of Trustees of Michigan State University
- Timothy A. Grotjohn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Distributed ground single antenna ion source
- Patent number 11,810,763
- Issue date Nov 7, 2023
- Schlumberger Technology Corporation
- Benjamin Levitt
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRIC FIELD UNIFORMITY ON DISTRIBUTED ELECTRODE
- Publication number 20240404792
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Jordan Alexander THIMOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONICAL IMPEDANCE TRANSFORMER FOR MICROWAVE PLASMA PROCESSING
- Publication number 20240395506
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Kenneth Brian Doering
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20240371615
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES
- Publication number 20240363317
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus
- Publication number 20240339300
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...
- Publication number 20240339299
- Publication date Oct 10, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20240312767
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME
- Publication number 20240282586
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Chanyeong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240254626
- Publication date Aug 1, 2024
- Tokyo Electron Limited
- Hiroki YAMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Antenna Plane Magnets for Improved Performance
- Publication number 20240258074
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242936
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242937
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...
- Publication number 20240222085
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Koichiro NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FREQUENCY REACTION PROCESSING APPARATUS AND HIGH FREQUENCY REA...
- Publication number 20240212986
- Publication date Jun 27, 2024
- SST INC.
- Toshiyuki TAKAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20240203692
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, INFORMATION PROCESSING APPARATUS, PLAS...
- Publication number 20240194451
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ASSEMBLY METHOD OF RESONATOR ARRAY...
- Publication number 20240186114
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240170260
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240030008
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014010
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Tetsuo KAWANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE MATERIALS SYSTEMS
- Publication number 20240010818
- Publication date Jan 11, 2024
- Lyten, Inc.
- Michael W. Stowell
- C01 - INORGANIC CHEMISTRY
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386804
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Toshimasa KOBAYASHI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386791
- Publication date Nov 30, 2023
- Tokyo Electron Limited
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230369021
- Publication date Nov 16, 2023
- SEMES CO., LTD.
- Yoon Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230352273
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230352274
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNER, AND IMPEDANCE MATCHING METHOD
- Publication number 20230335876
- Publication date Oct 19, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...
- Publication number 20230326716
- Publication date Oct 12, 2023
- Tokyo Electron Limited
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Plasma processing system and method using radio frequency and micro...

Substrate processing apparatus and method

Systems and methods of plasma generation with microwaves

Plasma processing apparatus

Artificial diamond plasma production device

Microwave resonator array for plasma diagnostics

Plasma processing apparatus

Modular microwave source with multiple metal housings

System and method of low temperature thin film deposition and in-si...

Method and device for forming graphene structure

Optical system for monitoring plasma reactions and reactors

Plasma processing apparatus

Wafer processing apparatus

Wafer processing apparatus and wafer processing method using the same

Cylindrical cavity with impedance shifting by irises in a power-sup...

Processing apparatus and film forming method

Plasma processing apparatus and plasma processing method

Microwave coupling/combining device and associated microwave generator

Plasma processing apparatus

Microwave plasma source, microwave plasma processing apparatus and...

Temperature-controlled chemical processing reactor

Measuring device and method of obtaining thickness of sheath

Plasma processing system and method using radio frequency (RF) and...

Control method and plasma processing apparatus

Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis...

Substrate processing apparatus

Methods and apparatus for microwave plasma assisted chemical vapor...

Distributed ground single antenna ion source

Patents Applicationslast 30 patents

ELECTRIC FIELD UNIFORMITY ON DISTRIBUTED ELECTRODE

CONICAL IMPEDANCE TRANSFORMER FOR MICROWAVE PLASMA PROCESSING

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS

METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES

Plasma Processing Apparatus

MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...

Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS

WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME

FILM FORMING METHOD AND FILM FORMING APPARATUS

Antenna Plane Magnets for Improved Performance

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...

HIGH FREQUENCY REACTION PROCESSING APPARATUS AND HIGH FREQUENCY REA...

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

PLASMA PROCESSING APPARATUS, INFORMATION PROCESSING APPARATUS, PLAS...

PLASMA PROCESSING APPARATUS AND ASSEMBLY METHOD OF RESONATOR ARRAY...

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

COMPOSITE MATERIALS SYSTEMS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

TUNER, AND IMPEDANCE MATCHING METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...