Antennas

Industry

CPC
H01J37/3222

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3222Antennas

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus for treating substrate
- Patent number 12,362,147
- Issue date Jul 15, 2025
- Semes Co., Ltd.
- Sang Jeong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,656
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate and method for treating substrate
- Patent number 12,340,983
- Issue date Jun 24, 2025
- Semes Co., Ltd.
- Dong-Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric and irregular shaped plasmas using modular microwave sources
- Patent number 12,340,978
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma showerhead with improved uniformity
- Patent number 12,340,980
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Chaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-invasive diagnostic method and apparatus for plasma processes
- Patent number 12,340,993
- Issue date Jun 24, 2025
- Shinjae You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,338,532
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 12,288,675
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave reactor system enclosing a self-igniting plasma
- Patent number 12,281,013
- Issue date Apr 22, 2025
- LytEn, Inc.
- David Tanner
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,716
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,243,718
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, film-forming apparatus, and film-processing apparatus
- Patent number 12,211,710
- Issue date Jan 28, 2025
- NHK Spring Co., Ltd.
- Toshihiko Hanamachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods of plasma generation with microwaves
- Patent number 12,106,939
- Issue date Oct 1, 2024
- Rimere, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,094,697
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Toshimasa Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Artificial diamond plasma production device
- Patent number 12,084,759
- Issue date Sep 10, 2024
- WAVE POWER TECHNOLOGY INC.
- Ming-Hsiung Tsao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave resonator array for plasma diagnostics
- Patent number 12,062,529
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with multiple metal housings
- Patent number 12,033,835
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of low temperature thin film deposition and in-si...
- Patent number 12,018,374
- Issue date Jun 25, 2024
- DSGI Technologies, Inc.
- Jeffrey Edward Kowalski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for forming graphene structure
- Patent number 12,014,907
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Ryota Ifuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 12,014,900
- Issue date Jun 18, 2024
- Recarbon, Inc.
- Curtis Peter Tom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,002,655
- Issue date Jun 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing apparatus
- Patent number 11,996,270
- Issue date May 28, 2024
- Samsung Electronics Co., Ltd.
- Eunhee Jeang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing apparatus and wafer processing method using the same
- Patent number 11,990,348
- Issue date May 21, 2024
- Samsung Electronics Co., Ltd.
- Chanyeong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and film forming method
- Patent number 11,972,929
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Makoto Wada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20250210840
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
- Publication number 20250207261
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Ryota IFUKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250210312
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Sun Wook JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS
- Publication number 20250163578
- Publication date May 22, 2025
- Applied Materials, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250140534
- Publication date May 1, 2025
- SEMES CO., LTD.
- Young Seo AN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND HEATING APPARATUS
- Publication number 20250118537
- Publication date Apr 10, 2025
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250104975
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Device
- Publication number 20250104974
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High-Frequency Power Supply, Plasma Processing Device, and Matching...
- Publication number 20250095954
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Method for Measuring Resonance Freq...
- Publication number 20250095973
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION APPARATUS
- Publication number 20250095966
- Publication date Mar 20, 2025
- LEYDENJAR TECHNOLOGEIS B.V.
- Pavel KUDLACEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC WAVE SUPPLY MECHANISM AND PLASMA PROCESSING APPARATUS
- Publication number 20250087463
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Mitsutoshi ASHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20250037977
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods Of Plasma Generation With Microwaves
- Publication number 20250022685
- Publication date Jan 16, 2025
- Rimere, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRIC FIELD UNIFORMITY ON DISTRIBUTED ELECTRODE
- Publication number 20240404792
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Jordan Alexander THIMOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONICAL IMPEDANCE TRANSFORMER FOR MICROWAVE PLASMA PROCESSING
- Publication number 20240395506
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Kenneth Brian Doering
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20240371615
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES
- Publication number 20240363317
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus
- Publication number 20240339300
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...
- Publication number 20240339299
- Publication date Oct 10, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20240312767
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME
- Publication number 20240282586
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Chanyeong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240254626
- Publication date Aug 1, 2024
- Tokyo Electron Limited
- Hiroki YAMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Antenna Plane Magnets for Improved Performance
- Publication number 20240258074
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242936
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242937
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...
- Publication number 20240222085
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Koichiro NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FREQUENCY REACTION PROCESSING APPARATUS AND HIGH FREQUENCY REA...
- Publication number 20240212986
- Publication date Jun 27, 2024
- SST INC.
- Toshiyuki TAKAMATSU
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for treating substrate

Plasma processing apparatus

Apparatus for treating substrate and method for treating substrate

Symmetric and irregular shaped plasmas using modular microwave sources

Plasma showerhead with improved uniformity

Non-invasive diagnostic method and apparatus for plasma processes

Plasma processing method and plasma processing apparatus

Cylindrical cavity with impedance shifting by irises in a power-sup...

Microwave reactor system enclosing a self-igniting plasma

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Stage, film-forming apparatus, and film-processing apparatus

Plasma processing apparatus and plasma processing method

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Plasma processing system and method using radio frequency and micro...

Substrate processing apparatus and method

Systems and methods of plasma generation with microwaves

Plasma processing apparatus

Artificial diamond plasma production device

Microwave resonator array for plasma diagnostics

Plasma processing apparatus

Modular microwave source with multiple metal housings

System and method of low temperature thin film deposition and in-si...

Method and device for forming graphene structure

Optical system for monitoring plasma reactions and reactors

Plasma processing apparatus

Wafer processing apparatus

Wafer processing apparatus and wafer processing method using the same

Cylindrical cavity with impedance shifting by irises in a power-sup...

Processing apparatus and film forming method

Patents Applicationslast 30 patents

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING SYSTEM

SUBSTRATE PROCESSING APPARATUS

PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND HEATING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma Processing Device

High-Frequency Power Supply, Plasma Processing Device, and Matching...

Plasma Processing Apparatus and Method for Measuring Resonance Freq...

PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION APPARATUS

ELECTROMAGNETIC WAVE SUPPLY MECHANISM AND PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR PLASMA PROCESSING

Systems And Methods Of Plasma Generation With Microwaves

ELECTRIC FIELD UNIFORMITY ON DISTRIBUTED ELECTRODE

CONICAL IMPEDANCE TRANSFORMER FOR MICROWAVE PLASMA PROCESSING

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS

METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES

Plasma Processing Apparatus

MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...

Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS

WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME

FILM FORMING METHOD AND FILM FORMING APPARATUS

Antenna Plane Magnets for Improved Performance

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...

HIGH FREQUENCY REACTION PROCESSING APPARATUS AND HIGH FREQUENCY REA...