Antennas

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CPC
H01J37/3211

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3211Antennas

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,368,030
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and substrate processing apparatus
- Patent number 12,362,142
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Takashi Chiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating device
- Patent number 12,354,838
- Issue date Jul 8, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,354,837
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Takahiro Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced ignition in inductively coupled plasmas for workpiece proc...
- Patent number 12,347,677
- Issue date Jul 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,646
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Bongseong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,340,975
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Takehisa Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma ultraviolet enhanced deposition
- Patent number 12,334,317
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antennas, circuits for generating plasma, plasma processing apparat...
- Patent number 12,327,709
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Dong-Hyub Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 12,322,579
- Issue date Jun 3, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for use in generating plasma
- Patent number 12,315,697
- Issue date May 27, 2025
- Dyson Technology Limited
- Sean Michael Carley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Large-area high-density plasma processing chamber for flat panel di...
- Patent number 12,312,689
- Issue date May 27, 2025
- Applied Materials, Inc.
- Suhail Anwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,315,698
- Issue date May 27, 2025
- Tokyo Electron Limited
- Cedric Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 12,308,209
- Issue date May 20, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma antenna and apparatus for generating plasma having the same
- Patent number 12,278,088
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Il Gyo Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control system and methods
- Patent number 12,278,089
- Issue date Apr 15, 2025
- Applied Materials, Inc.
- Michael Andrew Stearns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device
- Patent number 12,278,092
- Issue date Apr 15, 2025
- Nissin Electric Co., Ltd.
- Toshihiko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma sources and plasma processing apparatus thereof
- Patent number 12,272,521
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid plasma source array
- Patent number 12,266,503
- Issue date Apr 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plenum assemblies for cooling transformer coupled plasma windows
- Patent number 12,261,018
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hanry Issavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Resonant antenna for physical vapor deposition applications
- Patent number 12,261,017
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Barton Lane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,261,021
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna member and apparatus for treating substrate
- Patent number 12,255,050
- Issue date Mar 18, 2025
- Semes Co., Ltd.
- Yoon Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,249,485
- Issue date Mar 11, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of control for plasma processing
- Patent number 12,230,475
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250232956
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM
- Publication number 20250232953
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Ryan T. DOWNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BALANCED RESONATOR SOURCE FOR PLASMA PROCESSING
- Publication number 20250232952
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20250226178
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMB...
- Publication number 20250226186
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...
- Publication number 20250218726
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Sanghyeon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLENUMS FOR COOLING DIELECTRIC WINDOWS
- Publication number 20250218724
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Hanry ISSAVI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250218744
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218733
- Publication date Jul 3, 2025
- TES CO., LTD.
- Woo-Young CHUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF BLOCKER FOR UNIFORMITY CONTROL
- Publication number 20250218742
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode and Coil Configurations For Processing Chambers and Relat...
- Publication number 20250210304
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIALLY TUNABLE INDUCTIVELY COUPLED PLASMA ANTENNA
- Publication number 20250210305
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE LINER FOR PLASMA SOURCE
- Publication number 20250201530
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Ryan T. DOWNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION MODULE, OPERATION METHOD THEREOF, AND SUBSTRATE P...
- Publication number 20250201516
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Je Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hybrid Plasma Source Array
- Publication number 20250201517
- Publication date Jun 19, 2025
- Beijing E-Town Semiconductor Technology Co., LTD
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20250201520
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...
- Publication number 20250201594
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...
- Publication number 20250201518
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD
- Publication number 20250191883
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryuta HIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20250183020
- Publication date Jun 5, 2025
- SAMSUNG DISPLAY CO., LTD.
- Gi Woon SUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method for Splitting Current from Direct-Drive Radiof...
- Publication number 20250174431
- Publication date May 29, 2025
- LAM RESEARCH CORPORATION
- Matthew Lowell Talley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE COUPLED COIL, RADIO FREQUENCY PROVISION APPARATUS, RADIO...
- Publication number 20250174432
- Publication date May 29, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source with Radial Coil Network
- Publication number 20250157791
- Publication date May 15, 2025
- Yuhui ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149298
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149308
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
- Publication number 20250149295
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149307
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...
- Publication number 20250149293
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Jaewon Jeong
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Deposition method and deposition apparatus

Plasma processing method and substrate processing apparatus

Plasma generating device

Plasma processing method and plasma processing apparatus

Enhanced ignition in inductively coupled plasmas for workpiece proc...

Plasma processing apparatus

Plasma processing apparatus

Remote plasma ultraviolet enhanced deposition

Antennas, circuits for generating plasma, plasma processing apparat...

Metal contamination reduction in substrate processing systems with...

Method and apparatus for use in generating plasma

Large-area high-density plasma processing chamber for flat panel di...

Plasma processing method and plasma processing apparatus

Workpiece processing apparatus with plasma and thermal processing s...

Plasma antenna and apparatus for generating plasma having the same

Plasma uniformity control system and methods

Plasma treatment device

Plasma sources and plasma processing apparatus thereof

Hybrid plasma source array

Plenum assemblies for cooling transformer coupled plasma windows

Semiconductor processing apparatus and dielectric window cleaning m...

Resonant antenna for physical vapor deposition applications

Apparatus and method for treating substrate

Antenna member and apparatus for treating substrate

Substrate processing apparatus, method of manufacturing semiconduct...

Systems and methods of control for plasma processing

Radio frequency (RF) system with embedded RF signal pickups

Ion beam source, substrate process apparatus including the same, an...

To an inductively coupled plasma source

Patents Applicationslast 30 patents

PLASMA PROCESSING DEVICE

PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM

BALANCED RESONATOR SOURCE FOR PLASMA PROCESSING

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMB...

Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...

PLENUMS FOR COOLING DIELECTRIC WINDOWS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

RF BLOCKER FOR UNIFORMITY CONTROL

Electrode and Coil Configurations For Processing Chambers and Relat...

SPATIALLY TUNABLE INDUCTIVELY COUPLED PLASMA ANTENNA

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

PROTECTIVE LINER FOR PLASMA SOURCE

PLASMA GENERATION MODULE, OPERATION METHOD THEREOF, AND SUBSTRATE P...

Hybrid Plasma Source Array

APPARATUS AND METHOD FOR TREATING SUBSTRATE

MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...

PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...

PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD

SPUTTERING APPARATUS

Apparatus and Method for Splitting Current from Direct-Drive Radiof...

INDUCTIVE COUPLED COIL, RADIO FREQUENCY PROVISION APPARATUS, RADIO...

Inductively Coupled Plasma Source with Radial Coil Network

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...