Antennas

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CPC
H01J37/3211

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3211Antennas

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Hybrid plasma source array
- Patent number 12,266,503
- Issue date Apr 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plenum assemblies for cooling transformer coupled plasma windows
- Patent number 12,261,018
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hanry Issavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Resonant antenna for physical vapor deposition applications
- Patent number 12,261,017
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Barton Lane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,261,021
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna member and apparatus for treating substrate
- Patent number 12,255,050
- Issue date Mar 18, 2025
- Semes Co., Ltd.
- Yoon Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,249,485
- Issue date Mar 11, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of control for plasma processing
- Patent number 12,230,475
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning chamber for metal oxide removal
- Patent number 12,211,737
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna structure and plasma generating device using same
- Patent number 12,205,794
- Issue date Jan 21, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 12,205,795
- Issue date Jan 21, 2025
- Ulvac, Inc.
- Taichi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HTCC antenna for generation of microplasma
- Patent number 12,198,897
- Issue date Jan 14, 2025
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact high density plasma source
- Patent number 12,198,896
- Issue date Jan 14, 2025
- Lam Research Corporation
- Roger Patrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor reaction chamber and atomic layer plasma etching appa...
- Patent number 12,191,114
- Issue date Jan 7, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Xingfei Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and method for operating same
- Patent number 12,159,766
- Issue date Dec 3, 2024
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,159,771
- Issue date Dec 3, 2024
- Tokyo Electron Limited
- Yuki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively-coupled plasma processing apparatus
- Patent number 12,154,760
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Hitoshi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna mechanism and plasma processing device
- Patent number 12,136,533
- Issue date Nov 5, 2024
- Nissin Electric Co., Ltd.
- Yasunori Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating method of etching device
- Patent number 12,131,892
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Feng-Ju Tsai
- B08 - CLEANING
Information Patent Grant
Systems and methods for extracting process control information from...
- Patent number 12,131,886
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Demagnetizing coils for linearity improvement of current ratio of p...
- Patent number 12,087,549
- Issue date Sep 10, 2024
- MKS Instruments, Inc.
- Dinh-Vuong Le
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING THE SAME
- Publication number 20250104968
- Publication date Mar 27, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL DEVICE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT
- Publication number 20250095962
- Publication date Mar 20, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jinji XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA DEVICE FOR EXHAUST GAS TREATMENT
- Publication number 20250095961
- Publication date Mar 20, 2025
- LOT CES CO., LTD.
- Jin Ho BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
- Publication number 20250095967
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES
- Publication number 20250087472
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
- Publication number 20250079121
- Publication date Mar 6, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PARTICLE DETECTION
- Publication number 20250060298
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Wei Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20250054730
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS
- Publication number 20250054738
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dan MAROHL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME
- Publication number 20250046571
- Publication date Feb 6, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046579
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Hirotoshi SAKAUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250022682
- Publication date Jan 16, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Shogo OKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014877
- Publication date Jan 9, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Hisao NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20250014867
- Publication date Jan 9, 2025
- PSK INC.
- Sung Jin YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250006462
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Morihito INAGAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250006467
- Publication date Jan 2, 2025
- PSK INC.
- Paul YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20250006461
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240412960
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jawon KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Junction System for Direct-Drive Radiofrequency Power Supply
- Publication number 20240396372
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20240395515
- Publication date Nov 28, 2024
- SPP TECHNOLOGIES CO., LTD.
- Kazuya OTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
- Publication number 20240395501
- Publication date Nov 28, 2024
- Samsung Electronics Co., Ltd.
- Hyojin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
- Publication number 20240387151
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- BENJAMIN ALEXANDROVICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371612
- Publication date Nov 7, 2024
- JUSUNG ENGINEERING CO., LTD.
- Young Rok KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20240371610
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING CHAMBER FOR METAL OXIDE REMOVAL
- Publication number 20240371685
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING...
- Publication number 20240363309
- Publication date Oct 31, 2024
- Kokusai Electric Corporation
- Naofumi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Hybrid plasma source array

Plenum assemblies for cooling transformer coupled plasma windows

Semiconductor processing apparatus and dielectric window cleaning m...

Resonant antenna for physical vapor deposition applications

Apparatus and method for treating substrate

Antenna member and apparatus for treating substrate

Substrate processing apparatus, method of manufacturing semiconduct...

Systems and methods of control for plasma processing

Radio frequency (RF) system with embedded RF signal pickups

Ion beam source, substrate process apparatus including the same, an...

To an inductively coupled plasma source

Cleaning chamber for metal oxide removal

Antenna structure and plasma generating device using same

Plasma processing device

HTCC antenna for generation of microplasma

Compact high density plasma source

Semiconductor reaction chamber and atomic layer plasma etching appa...

Workpiece processing apparatus with thermal processing systems

Plasma treatment apparatus, a method of monitoring a process of man...

Dual-frequency, direct-drive inductively coupled plasma source

Plasma generating apparatus and method for operating same

Plasma processing apparatus

Inductively-coupled plasma processing apparatus

Antenna mechanism and plasma processing device

Operating method of etching device

Systems and methods for extracting process control information from...

Plasma processing system and method using radio frequency and micro...

Apparatus for plasma processing

Tin oxide films in semiconductor device manufacturing

Demagnetizing coils for linearity improvement of current ratio of p...

Patents Applicationslast 30 patents

ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING THE SAME

COIL DEVICE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT

INDUCTIVELY COUPLED PLASMA DEVICE FOR EXHAUST GAS TREATMENT

PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES

SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES

DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE

IN-SITU PARTICLE DETECTION

Systems and Methods for Extracting Process Control Information from...

TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS

PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME

COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

Plasma Processing Apparatus

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

Junction System for Direct-Drive Radiofrequency Power Supply

Substrate Processing Apparatus

Metrology Enclosure Including Spectral Reflectometry System for Pla...

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD

SUBSTRATE PROCESSING APPARATUS

FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

CLEANING CHAMBER FOR METAL OXIDE REMOVAL

SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING...