Antennas

Industry

CPC
H01J37/3211

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3211Antennas

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Antenna structure and plasma generating device using same
- Patent number 12,205,794
- Issue date Jan 21, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 12,205,795
- Issue date Jan 21, 2025
- Ulvac, Inc.
- Taichi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HTCC antenna for generation of microplasma
- Patent number 12,198,897
- Issue date Jan 14, 2025
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact high density plasma source
- Patent number 12,198,896
- Issue date Jan 14, 2025
- Lam Research Corporation
- Roger Patrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor reaction chamber and atomic layer plasma etching appa...
- Patent number 12,191,114
- Issue date Jan 7, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Xingfei Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and method for operating same
- Patent number 12,159,766
- Issue date Dec 3, 2024
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,159,771
- Issue date Dec 3, 2024
- Tokyo Electron Limited
- Yuki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively-coupled plasma processing apparatus
- Patent number 12,154,760
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Hitoshi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna mechanism and plasma processing device
- Patent number 12,136,533
- Issue date Nov 5, 2024
- Nissin Electric Co., Ltd.
- Yasunori Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating method of etching device
- Patent number 12,131,892
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Feng-Ju Tsai
- B08 - CLEANING
Information Patent Grant
Systems and methods for extracting process control information from...
- Patent number 12,131,886
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Demagnetizing coils for linearity improvement of current ratio of p...
- Patent number 12,087,549
- Issue date Sep 10, 2024
- MKS Instruments, Inc.
- Dinh-Vuong Le
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating system having t...
- Patent number 12,087,554
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Sungyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing system including coil with RF powered faraday...
- Patent number 12,087,557
- Issue date Sep 10, 2024
- Lam Research Corporation
- Shen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma enhanced process chamber
- Patent number 12,080,516
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma reactor and wire structure for antenna c...
- Patent number 12,082,331
- Issue date Sep 3, 2024
- LOT CES CO., LTD.
- Jin Ho Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,051,566
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active temperature control for RF window in immersed antenna source
- Patent number 12,014,898
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Adam Calkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic coated quartz lid for processing chamber
- Patent number 12,009,178
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Bernard L. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for highly anisotropic etching of titanium oxide spacer usin...
- Patent number 12,009,211
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of controlling the same, and...
- Patent number 12,001,194
- Issue date Jun 4, 2024
- Semes Co., Ltd.
- Seung Yeon Kim
- G05 - CONTROLLING REGULATING
Information Patent Grant
Variable mode plasma chamber utilizing tunable plasma potential
- Patent number 12,002,652
- Issue date Jun 4, 2024
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and method for forming semiconductor structure
- Patent number 12,002,663
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Rung Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250022682
- Publication date Jan 16, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Shogo OKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014877
- Publication date Jan 9, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Hisao NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20250014867
- Publication date Jan 9, 2025
- PSK INC.
- Sung Jin YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250006462
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Morihito INAGAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250006467
- Publication date Jan 2, 2025
- PSK INC.
- Paul YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20250006461
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240412960
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jawon KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Junction System for Direct-Drive Radiofrequency Power Supply
- Publication number 20240396372
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20240395515
- Publication date Nov 28, 2024
- SPP TECHNOLOGIES CO., LTD.
- Kazuya OTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
- Publication number 20240395501
- Publication date Nov 28, 2024
- Samsung Electronics Co., Ltd.
- Hyojin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
- Publication number 20240387151
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- BENJAMIN ALEXANDROVICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371612
- Publication date Nov 7, 2024
- JUSUNG ENGINEERING CO., LTD.
- Young Rok KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20240371610
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING CHAMBER FOR METAL OXIDE REMOVAL
- Publication number 20240371685
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING...
- Publication number 20240363309
- Publication date Oct 31, 2024
- Kokusai Electric Corporation
- Naofumi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Plasma Processing
- Publication number 20240347317
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS
- Publication number 20240339297
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL STRUCTURE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT
- Publication number 20240339296
- Publication date Oct 10, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jinrong ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240321562
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240304456
- Publication date Sep 12, 2024
- Hitachi High-Tech Corporation
- Koichi TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20240304416
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential
- Publication number 20240297019
- Publication date Sep 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTOR AND PLASMA PROCESSING APPARATUS
- Publication number 20240297018
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240266152
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20240266144
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- JAEWON JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVELY COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS
- Publication number 20240258079
- Publication date Aug 1, 2024
- INNOVATION FOR CREATIVE DEVICES CO., LTD.
- Buil JEON
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Antenna structure and plasma generating device using same

Plasma processing device

HTCC antenna for generation of microplasma

Compact high density plasma source

Semiconductor reaction chamber and atomic layer plasma etching appa...

Workpiece processing apparatus with thermal processing systems

Plasma treatment apparatus, a method of monitoring a process of man...

Dual-frequency, direct-drive inductively coupled plasma source

Plasma generating apparatus and method for operating same

Plasma processing apparatus

Inductively-coupled plasma processing apparatus

Antenna mechanism and plasma processing device

Operating method of etching device

Systems and methods for extracting process control information from...

Plasma processing system and method using radio frequency and micro...

Apparatus for plasma processing

Tin oxide films in semiconductor device manufacturing

Demagnetizing coils for linearity improvement of current ratio of p...

Substrate treating apparatus and substrate treating system having t...

Vacuum pump protection against deposition byproduct buildup

Substrate processing system including coil with RF powered faraday...

High density plasma enhanced process chamber

Inductively coupled plasma reactor and wire structure for antenna c...

Plasma processing apparatus

Active temperature control for RF window in immersed antenna source

Ceramic coated quartz lid for processing chamber

Method for highly anisotropic etching of titanium oxide spacer usin...

Substrate processing apparatus, method of controlling the same, and...

Variable mode plasma chamber utilizing tunable plasma potential

Processing apparatus and method for forming semiconductor structure

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

Plasma Processing Apparatus

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

Junction System for Direct-Drive Radiofrequency Power Supply

Substrate Processing Apparatus

Metrology Enclosure Including Spectral Reflectometry System for Pla...

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD

SUBSTRATE PROCESSING APPARATUS

FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

CLEANING CHAMBER FOR METAL OXIDE REMOVAL

SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING...

Method and System for Plasma Processing

PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS

COIL STRUCTURE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

ANTENNA AND PLASMA PROCESSING APPARATUS

Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential

DISTRIBUTOR AND PLASMA PROCESSING APPARATUS

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

CAPACITIVELY COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS