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H01J37/3211
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H
ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/00
Discharge tubes with provision for introducing objects or material to be exposed to the discharge
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H01J37/3211
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Patents Grants
last 30 patents
Information
Patent Grant
Device for detecting plasma of ultra fast with multi channel
Patent number
11,961,720
Issue date
Apr 16, 2024
T.O.S Co., Ltd.
Yong Kyu Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
Patent number
11,955,315
Issue date
Apr 9, 2024
Beijing E-Town Semiconductor Technology Co., Ltd.
Dieter Hezler
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inductive coil structure and inductively coupled plasma generation...
Patent number
11,935,725
Issue date
Mar 19, 2024
EN2CORE TECHNOLOGY INC.
Sae Hoon Uhm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus including predictive control
Patent number
11,907,235
Issue date
Feb 20, 2024
HITACHI HIGH-TECH CORPORATION
Yutaka Okuyama
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method for processing substrate
Patent number
11,894,219
Issue date
Feb 6, 2024
Semes Co., Ltd.
Je Ho Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing system and method using radio frequency (RF) and...
Patent number
11,887,815
Issue date
Jan 30, 2024
Tokyo Electron Limited
Yunho Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems for cooling RF heated chamber components
Patent number
11,887,819
Issue date
Jan 30, 2024
Lam Research Corporation
Jon McChesney
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus
Patent number
11,881,380
Issue date
Jan 23, 2024
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Toshihiro Wada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma control system and plasma control program
Patent number
11,862,431
Issue date
Jan 2, 2024
Nissin Electric Co., Ltd.
Tsubasa Iwakoke
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Adjustable fastening device for plasma gas injectors
Patent number
11,854,769
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Yung-Shun Hsu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Enhanced ignition in inductively coupled plasmas for workpiece proc...
Patent number
11,848,204
Issue date
Dec 19, 2023
Beijing E-Town Semiconductor Technology Co., Ltd.
Stephen E. Savas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
Patent number
11,837,447
Issue date
Dec 5, 2023
Beijing E-Town Semiconductor Technology Co., Ltd.
Dixit Desai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
Patent number
11,837,440
Issue date
Dec 5, 2023
Kokusai Electric Corporation
Takeshi Yasui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus
Patent number
11,832,373
Issue date
Nov 28, 2023
Tokyo Electron Limited
Yohei Yamazawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma generation apparatus, deposition apparatus using the same, a...
Patent number
11,823,865
Issue date
Nov 21, 2023
Tokyo Electron Limited
Hitoshi Kato
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for producing coated substrates
Patent number
11,814,718
Issue date
Nov 14, 2023
Bühler Alzenau GmbH
Jürgen Pistner
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus
Patent number
11,810,758
Issue date
Nov 7, 2023
Tokyo Electron Limited
Satoshi Itou
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
RF generator
Patent number
11,810,759
Issue date
Nov 7, 2023
Hitachi Kokusai Electric Inc.
Yoshiyuki Oshida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma generating apparatus and method for operating same
Patent number
11,791,133
Issue date
Oct 17, 2023
EN2CORE technology, Inc.
Sae Hoon Uhm
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Devices and methods for controlling wafer uniformity in plasma-base...
Patent number
11,769,652
Issue date
Sep 26, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Jr-Sheng Chen
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Temperature control using temperature control element coupled to fa...
Patent number
11,749,509
Issue date
Sep 5, 2023
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
Yorkman Ma
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Lattice coat surface enhancement for chamber components
Patent number
11,739,411
Issue date
Aug 29, 2023
Applied Materials, Inc.
Lit Ping Lam
B22 - CASTING POWDER METALLURGY
Information
Patent Grant
Inductively coupled plasma processing apparatus
Patent number
11,735,396
Issue date
Aug 22, 2023
Samsung Electronics Co., Ltd.
Seung Bo Shim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
Patent number
11,728,136
Issue date
Aug 15, 2023
Lam Research Corporation
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reaction chamber and semiconductor processing apparatus
Patent number
11,715,632
Issue date
Aug 1, 2023
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
Xingcun Li
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming plasma processing apparatus, related apparatus, a...
Patent number
11,715,628
Issue date
Aug 1, 2023
Samsung Electronics Co., Ltd.
Jeongil Mun
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Vacuum pump protection against deposition byproduct buildup
Patent number
11,710,623
Issue date
Jul 25, 2023
Lam Research Corporation
John Stephen Drewery
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma system and filter device
Patent number
11,705,307
Issue date
Jul 18, 2023
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
Peng Chen
B08 - CLEANING
Information
Patent Grant
Multiple frequency electron cyclotron resonance thruster
Patent number
11,699,575
Issue date
Jul 11, 2023
The Regents of the University of Michigan
Benjamin Alexander Jorns
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metal etching with in situ plasma ashing
Patent number
11,699,596
Issue date
Jul 11, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Hsing-Hsiang Wang
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
RESONANT ANTENNA FOR PHYSICAL VAPOR DEPOSITION APPLICATIONS
Publication number
20240136151
Publication date
Apr 25, 2024
TOKYO ELECTRON LIMITED
Barton LANE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
Publication number
20240128052
Publication date
Apr 18, 2024
Applied Materials, Inc.
Costel Biloiu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WIRELESS DATA COMMUNICATION IN PLASMA PROCESS CHAMBER THROUGH VI SE...
Publication number
20240112885
Publication date
Apr 4, 2024
Applied Materials, Inc.
Chuang-Chia Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
Publication number
20240105423
Publication date
Mar 28, 2024
Kokusai Electric Corporation
Takeshi Yasui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND COIL HOLDER FOR HOLDING PLASMA EXCI...
Publication number
20240105422
Publication date
Mar 28, 2024
TOKYO ELECTRON LIMITED
Masato OZAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...
Publication number
20240087847
Publication date
Mar 14, 2024
Applied Materials, Inc.
Zheng John YE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
COMPACT REMOTE PLASMA SOURCE FOR HDP CVD CHAMBERS
Publication number
20240087852
Publication date
Mar 14, 2024
Advanced Refurbishment Technologies LLC d/b/a ARTSemi LLC
Christopher William Lewis
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...
Publication number
20240071754
Publication date
Feb 29, 2024
Beijing E-Town Semiconductor Technology Co., Ltd.
Stephen E. Savas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA RESISTANT YTTRIUM ALUMINUM OXIDE CHAMBER COMPONENTS
Publication number
20240059616
Publication date
Feb 22, 2024
Heraeus Conamic North America LLC
Matthew Joseph DONELON
C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information
Patent Application
ION BEAM SOURCE, SUBSTRATE PROCESS APPARATUS INCLUDING THE SAME, AN...
Publication number
20240062996
Publication date
Feb 22, 2024
Samsung Electronics Co., Ltd.
SeungWan YOO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
INDUCTIVELY COUPLED PLASMA ETCHING APPARATUS, AND INDUCTIVELY COUPL...
Publication number
20240055226
Publication date
Feb 15, 2024
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SEJONG CAMPUS
Kwang Ho KWON
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Workpiece Processing Apparatus with Thermal Processing Systems
Publication number
20240055242
Publication date
Feb 15, 2024
Beijing E-Town Semiconductor Technology Co., Ltd.
Dixit Desai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20240049379
Publication date
Feb 8, 2024
TOKYO ELECTRON LIMITED
Yohei YAMAZAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HTCC ANTENNA FOR GENERATION OF MICROPLASMA
Publication number
20240047178
Publication date
Feb 8, 2024
Inficon, Inc.
Shawn Briglin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF
Publication number
20240038510
Publication date
Feb 1, 2024
Samsung Electronics Co., Ltd.
Changheon LEE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND R...
Publication number
20240030062
Publication date
Jan 25, 2024
LAM RESEARCH CORPORATION
Dennis M. Hausmann
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLA...
Publication number
20240030043
Publication date
Jan 25, 2024
SAMSUNG DISPLAY CO., LTD.
Takayuki FUKASAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR PROCESSING APPARATUS FOR GENERATING PLASMA
Publication number
20240014016
Publication date
Jan 11, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chien-Hsiang Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20240006163
Publication date
Jan 4, 2024
TOKYO ELECTRON LIMITED
Takeshi KOBAYASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME
Publication number
20240006150
Publication date
Jan 4, 2024
EN2CORE technology, Inc
Sae Hoon UHM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ANTENNA MEMBER AND APPARATUS AND METHOD FOR TREATING SUBSTRATE
Publication number
20230411117
Publication date
Dec 21, 2023
SEMES CO., LTD.
Yoon Seok CHOI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Temperature Control Using Temperature Control Element Coupled to Fa...
Publication number
20230411125
Publication date
Dec 21, 2023
Beijing E-Town Semiconductor Technology Co., Ltd.
Yorkman Ma
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
Publication number
20230402256
Publication date
Dec 14, 2023
TOKYO ELECTRON LIMITED
Takashi CHIBA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Apparatus for Plasma Processing
Publication number
20230377845
Publication date
Nov 23, 2023
TOKYO ELECTRON LIMITED
Merritt Funk
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20230377899
Publication date
Nov 23, 2023
TOKYO ELECTRON LIMITED
Takahiro YONEZAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA SOURCES AND PLASMA PROCESSING APPARATUS THEREOF
Publication number
20230369017
Publication date
Nov 16, 2023
Applied Materials, Inc.
Vladimir NAGORNY
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS
Publication number
20230369018
Publication date
Nov 16, 2023
SEMES CO., LTD.
Sangjeong LEE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
Publication number
20230360883
Publication date
Nov 9, 2023
LAM RESEARCH CORPORATION
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR USE IN GENERATING PLASMA
Publication number
20230352270
Publication date
Nov 2, 2023
Dyson Technology Limited
Sven GAUTER
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ANTENNA FOR INDUCTIVELY COUPLED PLASMA EXCITATION, ANTENNA UNIT FOR...
Publication number
20230343553
Publication date
Oct 26, 2023
TOKYO ELECTRON LIMITED
Yohei YAMAZAWA
H01 - BASIC ELECTRIC ELEMENTS