Antireflective coatings

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CPC
G03F1/46

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/46Antireflective coatings

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,313,968
- Issue date May 27, 2025
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,181,791
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection mode photomask
- Patent number 12,176,211
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,072,619
- Issue date Aug 27, 2024
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical lithography system and method of using the same
- Patent number 12,032,295
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,019,366
- Issue date Jun 25, 2024
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical lithography system and method of using the same
- Patent number 11,960,211
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning method and structures resulting therefrom
- Patent number 11,848,239
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-silicon-content wet-removable planarizing layer
- Patent number 11,817,317
- Issue date Nov 14, 2023
- Brewer Science, Inc.
- Ming Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,774,844
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection mode photomask and method of making
- Patent number 11,735,421
- Issue date Aug 22, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of accelerated hazing of mask assembly
- Patent number 11,703,752
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,275,301
- Issue date Mar 15, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection mode photomask
- Patent number 11,270,884
- Issue date Mar 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask for extreme-ultraviolet (extreme-UV) lithography and method fo...
- Patent number 11,092,884
- Issue date Aug 17, 2021
- Imec VZW
- Jae Uk Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflection optical substrates and methods of manufacture
- Patent number 11,009,794
- Issue date May 18, 2021
- ASML Holding N.V.
- Parag Vinayak Kelkar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask assembly and haze acceleration method
- Patent number 10,983,430
- Issue date Apr 20, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflective film, re...
- Patent number 10,921,705
- Issue date Feb 16, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask and method
- Patent number 10,859,902
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask laser etch
- Patent number 10,802,392
- Issue date Oct 13, 2020
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent substrate and process for producing it
- Patent number 10,741,725
- Issue date Aug 11, 2020
- AGC Inc.
- Azusa Takai
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Photomask blank
- Patent number 10,712,654
- Issue date Jul 14, 2020
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor mask blanks with a compatible stop layer
- Patent number 10,678,126
- Issue date Jun 9, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for manufacturing photomask, and mask patte...
- Patent number 10,585,345
- Issue date Mar 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection mode photomask and fabrication method therefore
- Patent number 10,553,428
- Issue date Feb 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask and method
- Patent number 10,481,483
- Issue date Nov 19, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for manufacturing semiconductor device using t...
- Patent number 10,222,691
- Issue date Mar 5, 2019
- Samsung Electronics Co., Ltd.
- Yang-Nam Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent substrate and process for producing it
- Patent number 10,211,237
- Issue date Feb 19, 2019
- AGC Inc.
- Azusa Takai
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Image mask film scheme and method
- Patent number 10,156,783
- Issue date Dec 18, 2018
- Taiwan Semiconductor Manufactuing Company, Ltd.
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for EUV lithography, EUV lithography apparatus and method for...
- Patent number 10,156,782
- Issue date Dec 18, 2018
- Carl Zeiss SMT GmbH
- Peter Huber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20250164891
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Soo Doo Chae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK
- Publication number 20250093764
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Lithography System and Method of Using the Same
- Publication number 20240319609
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20240319578
- Publication date Sep 26, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
- Publication number 20240142869
- Publication date May 2, 2024
- Applied Materials, Inc.
- Yung-chen LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
- Publication number 20240142870
- Publication date May 2, 2024
- Applied Materials, Inc.
- Yung-chen LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM
- Publication number 20240063060
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230367195
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION MODE PHOTOMASK
- Publication number 20230360914
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-REFLECTION WITH INTERCONNECTED STRUCTURES
- Publication number 20230341761
- Publication date Oct 26, 2023
- Edgehog Advanced Technologies Inc.
- Chia-hung Calvin Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Application
FLUID PURGING SYSTEM
- Publication number 20230314964
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- José Nilton FONSECA JUNIOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK STRUCTURE FOR PREPARING SEMICONDUCTOR STRUCTURE
- Publication number 20230185184
- Publication date Jun 15, 2023
- NANYA TECHNOLOGY CORPORATION
- WEI-CHUAN FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...
- Publication number 20230119980
- Publication date Apr 20, 2023
- Merck Patent GmbH
- Daniel HUDSON
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230110529
- Publication date Apr 13, 2023
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME
- Publication number 20230109913
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME
- Publication number 20230011701
- Publication date Jan 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220197127
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION MODE PHOTOMASK AND METHOD OF MAKING
- Publication number 20220165572
- Publication date May 26, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM
- Publication number 20220013412
- Publication date Jan 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ACCELERATED HAZING OF MASK ASSEMBLY
- Publication number 20210216007
- Publication date Jul 15, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wu-Hung KO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-SILICON-CONTENT WET-REMOVABLE PLANARIZING LAYER
- Publication number 20210125829
- Publication date Apr 29, 2021
- Brewer Science, Inc.
- Ming Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspect...
- Publication number 20200379336
- Publication date Dec 3, 2020
- KLA Corporation
- Dmitriy Zusin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION MODE PHOTOMASK
- Publication number 20200161132
- Publication date May 21, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Mask and Method
- Publication number 20200004134
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK ASSEMBLY AND HAZE ACCELERATION METHO
- Publication number 20190258155
- Publication date Aug 22, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wu-Hung KO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSPARENT SUBSTRATE AND PROCESS FOR PRODUCING IT
- Publication number 20190139996
- Publication date May 9, 2019
- AGC Inc.
- Azusa TAKAI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REFLECTION MODE PHOTOMASK AND FABRICATION METHOD THEREFORE
- Publication number 20190067007
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lang CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Mask and Method
- Publication number 20190004416
- Publication date Jan 3, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK
- Publication number 20180335692
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) REFLECTIVE MASK
- Publication number 20180299765
- Publication date Oct 18, 2018
- GLOBALFOUNDRIES INC.
- SherJang Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Antireflective coatings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reflective mask blank, reflective mask, and method for manufacturin...

Extreme ultraviolet mask and method of manufacturing the same

Reflection mode photomask

Reflective mask blank, reflective mask, and method for manufacturin...

Optical lithography system and method of using the same

Reflective mask blank, reflective mask, and method for manufacturin...

Optical lithography system and method of using the same

Patterning method and structures resulting therefrom

High-silicon-content wet-removable planarizing layer

Extreme ultraviolet mask and method of manufacturing the same

Reflection mode photomask and method of making

Method of accelerated hazing of mask assembly

Extreme ultraviolet mask and method of manufacturing the same

Reflection mode photomask

Mask for extreme-ultraviolet (extreme-UV) lithography and method fo...

Anti-reflection optical substrates and methods of manufacture

Mask assembly and haze acceleration method

Mask blank substrate, substrate with multilayer reflective film, re...

Lithography mask and method

Photomask laser etch

Transparent substrate and process for producing it

Photomask blank

Semiconductor mask blanks with a compatible stop layer

Photomask blank, method for manufacturing photomask, and mask patte...

Reflection mode photomask and fabrication method therefore

Lithography mask and method

Photomask and method for manufacturing semiconductor device using t...

Transparent substrate and process for producing it

Image mask film scheme and method

Mask for EUV lithography, EUV lithography apparatus and method for...

Patents Applicationslast 30 patents

LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

EXTREME ULTRAVIOLET MASK

Optical Lithography System and Method of Using the Same

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

REFLECTION MODE PHOTOMASK

ANTI-REFLECTION WITH INTERCONNECTED STRUCTURES

FLUID PURGING SYSTEM

HARDMASK STRUCTURE FOR PREPARING SEMICONDUCTOR STRUCTURE

A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...

BLANK MASK AND PHOTOMASK USING THE SAME

OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME

OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

REFLECTION MODE PHOTOMASK AND METHOD OF MAKING

PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM

METHOD OF ACCELERATED HAZING OF MASK ASSEMBLY

HIGH-SILICON-CONTENT WET-REMOVABLE PLANARIZING LAYER

Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspect...

REFLECTION MODE PHOTOMASK

Lithography Mask and Method

MASK ASSEMBLY AND HAZE ACCELERATION METHO

TRANSPARENT SUBSTRATE AND PROCESS FOR PRODUCING IT

REFLECTION MODE PHOTOMASK AND FABRICATION METHOD THEREFORE

Lithography Mask and Method

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) REFLECTIVE MASK