Arrangements enabling beams to pass between regions of different pressure

Industry

CPC
H01J37/301

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/301Arrangements enabling beams to pass between regions of different pressure

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Particle yield via beam-line pressure control
- Patent number 11,562,885
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Thomas Stacy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced electron beam generation
- Patent number 11,517,975
- Issue date Dec 6, 2022
- Arcam AB
- Mattias Fager
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Electron beam 3D printing machine
- Patent number 11,370,055
- Issue date Jun 28, 2022
- Consorzio Di Ricerca Hypatia
- Gildo Di Domenico
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Plasma driven particle propagation apparatus and pumping method
- Patent number 10,593,515
- Issue date Mar 17, 2020
- Aurora Labs Limited
- David Budge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle optical apparatus with a predetermined final vacuum pressure
- Patent number 9,153,414
- Issue date Oct 6, 2015
- FEI Company
- Hendrik Nicolaas Slingerland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interface, a method for observing an object within a non-vacuum env...
- Patent number 9,076,631
- Issue date Jul 7, 2015
- Dov Shachal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure charged particle beam system
- Patent number 8,921,811
- Issue date Dec 30, 2014
- FEI Company
- Milos Toth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system with intermediate chamber
- Patent number 8,916,837
- Issue date Dec 23, 2014
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Interface, a method for observing an object within a non-vacuum env...
- Patent number 8,779,358
- Issue date Jul 15, 2014
- Dov Shachal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system with intermediate chamber
- Patent number 8,586,949
- Issue date Nov 19, 2013
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Gas-cluster-jet generator and gas-cluster ion-beam apparatus utiliz...
- Patent number 8,217,372
- Issue date Jul 10, 2012
- Exogenesis Corporation
- Stanley Harrison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interface, a method for observing an object within a non-vacuum env...
- Patent number 8,164,057
- Issue date Apr 24, 2012
- Dov Shachal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope for inspecting and processing of an object with...
- Patent number 8,058,614
- Issue date Nov 15, 2011
- Carl Zeiss NTS GmbH
- Johannes Bihr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron microscope for inspecting and processing of an object with...
- Patent number 7,645,989
- Issue date Jan 12, 2010
- Carl Zeiss NTS GmbH
- Johannes Bihr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 7,186,976
- Issue date Mar 6, 2007
- Carl Zeiss SMT Limited
- Michael Frank Dean
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection apparatus, detection method and electron beam irradiation...
- Patent number 7,095,699
- Issue date Aug 22, 2006
- Sony Corporation
- Yoshihisa Miura
- G11 - INFORMATION STORAGE
Information Patent Grant
Electron beam irradiation apparatus, electron beam irradiation meth...
- Patent number 7,034,319
- Issue date Apr 25, 2006
- Sony Corporation
- Yuichi Aki
- G11 - INFORMATION STORAGE
Information Patent Grant
Ion and charged particle source for production of thin films
- Patent number 6,878,930
- Issue date Apr 12, 2005
- Ross Clark Willoughby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Environmental scanning electron microscope
- Patent number 6,809,322
- Issue date Oct 26, 2004
- Gerasimos Daniel Danilatos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam system using multiple electron beams
- Patent number 6,797,953
- Issue date Sep 28, 2004
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiation system and electron beam irradiation method
- Patent number 6,649,859
- Issue date Nov 18, 2003
- Sony Corporation
- Yoshihisa Miura
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged-particle beam exposure apparatus and device manufacturing m...
- Patent number 6,603,128
- Issue date Aug 5, 2003
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam column for charged particle beam device
- Patent number 6,576,908
- Issue date Jun 10, 2003
- Applied Materials, Inc.
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atmospheric electron x-ray spectrometer
- Patent number 6,452,177
- Issue date Sep 17, 2002
- California Institute of Technology
- Jason E. Feldman
- G01 - MEASURING TESTING
Information Patent Grant
Particle beam emitting assembly
- Patent number 6,404,115
- Issue date Jun 11, 2002
- The Welding Institute
- Allan Sanderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential pumping via core of annular supersonic jet
- Patent number 6,396,064
- Issue date May 28, 2002
- Gerasimos Daniel Danilatos
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Apparatus for electron beam welding at atmospheric pressure
- Patent number 5,951,886
- Issue date Sep 14, 1999
- PTR Precision Technologies
- Guenther G. Schubert
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for extracting ion current from space of high vacuum into sp...
- Patent number 5,637,880
- Issue date Jun 10, 1997
- Agency of Industrial Science & Technology Ministry of International Trade & I...
- Yuji Horino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for charged particle propagation
- Patent number 5,578,831
- Issue date Nov 26, 1996
- Associated Universities, Inc.
- Ady Hershcovitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low magnification gas limiting aperture assembly for electron micro...
- Patent number 5,485,008
- Issue date Jan 16, 1996
- University of Maryland, College Park
- Myron E. Taylor
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PARTICLE YIELD VIA BEAM-LINE PRESSURE CONTROL
- Publication number 20220037114
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Thomas Stacy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam 3D Printing Machine
- Publication number 20190202000
- Publication date Jul 4, 2019
- Consorzio Di Ricerca Hypatia
- Gildo Di Domenico
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma Driven Particle Propagation Apparatus and Pumping Method
- Publication number 20180190471
- Publication date Jul 5, 2018
- Aurora Labs Limited
- David Budge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENV...
- Publication number 20140361166
- Publication date Dec 11, 2014
- Dov Shachal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20140061497
- Publication date Mar 6, 2014
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20120293780
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENV...
- Publication number 20120241608
- Publication date Sep 27, 2012
- Dov Shachal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle-Beam Induced Processing Using Liquid Reactants
- Publication number 20110293847
- Publication date Dec 1, 2011
- Jeffrey Todd Hastings
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS-CLUSTER-JET GENERATOR AND GAS-CLUSTER ION-BEAM APPARATUS UTILIZ...
- Publication number 20110155897
- Publication date Jun 30, 2011
- Exogenesis Corporation
- Stanley Harrison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE CHARGED PARTICLE BEAM SYSTEM
- Publication number 20110031394
- Publication date Feb 10, 2011
- FEI Company
- William Ralph Knowles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENV...
- Publication number 20100140470
- Publication date Jun 10, 2010
- Dov Shachal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron microscope for inspecting and processing of an object with...
- Publication number 20100119698
- Publication date May 13, 2010
- Johannes Bihr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron microscope for inspecting and processing of an object with...
- Publication number 20080099674
- Publication date May 1, 2008
- CARL ZEISS NTS GMBH
- Johannes Bihr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Particle optical apparatus with a predetermined final vacuum pressure
- Publication number 20070176102
- Publication date Aug 2, 2007
- FEI Company
- Hendrik Nicolaas Slingerland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protecting Aperture for Charged Particle Emitter
- Publication number 20070145303
- Publication date Jun 28, 2007
- Pavel Adamec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Glow discharge drilling apparatus and glow discharge drilling method
- Publication number 20060231590
- Publication date Oct 19, 2006
- Akihiro Hirano
- G01 - MEASURING TESTING
Information Patent Application
Scanning electron microscope
- Publication number 20040173747
- Publication date Sep 9, 2004
- Michael Frank Dean
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detection apparatus, detection method and electron beam irradiation...
- Publication number 20030202449
- Publication date Oct 30, 2003
- Yoshihisa Miura
- G11 - INFORMATION STORAGE
Information Patent Application
Environmental scanning electron microscope
- Publication number 20030168595
- Publication date Sep 11, 2003
- Gerasimos Daniel Danilatos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lens assembly for electron beam column
- Publication number 20020148971
- Publication date Oct 17, 2002
- Michael Sogard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam irradiation system and electron beam irradiation method
- Publication number 20020121504
- Publication date Sep 5, 2002
- Yoshihisa Miura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam system using multiple electron beams
- Publication number 20020117967
- Publication date Aug 29, 2002
- Robert L. Gerlach
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle beam exposure apparatus and device manufacturing m...
- Publication number 20020009901
- Publication date Jan 24, 2002
- Hiroshi Maehara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam irradiation apparatus, electron beam irradiation meth...
- Publication number 20010052577
- Publication date Dec 20, 2001
- Yuichi Aki
- H01 - BASIC ELECTRIC ELEMENTS

Arrangements enabling beams to pass between regions of different pressure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Particle yield via beam-line pressure control

Enhanced electron beam generation

Electron beam 3D printing machine

Plasma driven particle propagation apparatus and pumping method

Particle optical apparatus with a predetermined final vacuum pressure

Interface, a method for observing an object within a non-vacuum env...

High pressure charged particle beam system

Charged particle lithography system with intermediate chamber

Interface, a method for observing an object within a non-vacuum env...

Charged particle lithography system with intermediate chamber

Gas-cluster-jet generator and gas-cluster ion-beam apparatus utiliz...

Interface, a method for observing an object within a non-vacuum env...

Electron microscope for inspecting and processing of an object with...

Electron microscope for inspecting and processing of an object with...

Scanning electron microscope

Detection apparatus, detection method and electron beam irradiation...

Electron beam irradiation apparatus, electron beam irradiation meth...

Ion and charged particle source for production of thin films

Environmental scanning electron microscope

Electron beam system using multiple electron beams

Electron beam irradiation system and electron beam irradiation method

Charged-particle beam exposure apparatus and device manufacturing m...

Beam column for charged particle beam device

Atmospheric electron x-ray spectrometer

Particle beam emitting assembly

Differential pumping via core of annular supersonic jet

Apparatus for electron beam welding at atmospheric pressure

Method for extracting ion current from space of high vacuum into sp...

Method and apparatus for charged particle propagation

Low magnification gas limiting aperture assembly for electron micro...

Patents Applicationslast 30 patents

PARTICLE YIELD VIA BEAM-LINE PRESSURE CONTROL

Electron Beam 3D Printing Machine

Plasma Driven Particle Propagation Apparatus and Pumping Method

INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENV...

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER

INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENV...

Particle-Beam Induced Processing Using Liquid Reactants

GAS-CLUSTER-JET GENERATOR AND GAS-CLUSTER ION-BEAM APPARATUS UTILIZ...

HIGH PRESSURE CHARGED PARTICLE BEAM SYSTEM

INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENV...

Electron microscope for inspecting and processing of an object with...

Electron microscope for inspecting and processing of an object with...

Particle optical apparatus with a predetermined final vacuum pressure

Protecting Aperture for Charged Particle Emitter

Glow discharge drilling apparatus and glow discharge drilling method

Scanning electron microscope

Detection apparatus, detection method and electron beam irradiation...

Environmental scanning electron microscope

Lens assembly for electron beam column

Electron beam irradiation system and electron beam irradiation method

Electron beam system using multiple electron beams

Charged-particle beam exposure apparatus and device manufacturing m...

Electron beam irradiation apparatus, electron beam irradiation meth...