Arrangements for directing or deflecting the discharge along a desired path

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CPC
H01J37/147

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/147Arrangements for directing or deflecting the discharge along a desired path

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam system, method of operating a charged particl...
- Patent number 12,293,895
- Issue date May 6, 2025
- Carl Zeiss SMT GmbH
- Eugen Foca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system
- Patent number 12,293,896
- Issue date May 6, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam device having a deflection unit
- Patent number 12,288,664
- Issue date Apr 29, 2025
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron beam image acquisition method, multiple electron...
- Patent number 12,288,666
- Issue date Apr 29, 2025
- NuFlare Technology, Inc.
- Koichi Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample display method
- Patent number 12,288,665
- Issue date Apr 29, 2025
- TESCAN BRNO s.r.o
- Jiri Dluhos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating multiple electron beams with a photocathode film
- Patent number 12,283,453
- Issue date Apr 22, 2025
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monochromator device and methods of use thereof
- Patent number 12,283,455
- Issue date Apr 22, 2025
- Cornell University
- Duncan Cameron
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for alignment of secondary beams in multi-beam in...
- Patent number 12,278,081
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Qingpo Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission charged particle microscope with an electron energy lo...
- Patent number 12,255,045
- Issue date Mar 18, 2025
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam particle beam system and method for operating same
- Patent number 12,255,040
- Issue date Mar 18, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microscopy feedback for improved milling accuracy
- Patent number 12,249,482
- Issue date Mar 11, 2025
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for azimuthal deflection of individual particl...
- Patent number 12,249,478
- Issue date Mar 11, 2025
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiation apparatus with overlapping beam columns a...
- Patent number 12,243,710
- Issue date Mar 4, 2025
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of plasma resistant oxyfluoride coating layer
- Patent number 12,237,153
- Issue date Feb 25, 2025
- KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY
- Sung min Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and system and method using electron gun
- Patent number 12,237,140
- Issue date Feb 25, 2025
- Ralf Edinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and inspection device
- Patent number 12,237,145
- Issue date Feb 25, 2025
- HITACHI HIGH-TECH CORPORATION
- Atsuko Shintani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 12,237,144
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for event modulated electron microscopy
- Patent number 12,237,147
- Issue date Feb 25, 2025
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Bryan Walter Reed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled surface with a cryo-nanomanipulator for impr...
- Patent number 12,230,473
- Issue date Feb 18, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-beam charged particle source with alignment means
- Patent number 12,224,152
- Issue date Feb 11, 2025
- Technische Universiteit Delft
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope
- Patent number 12,224,153
- Issue date Feb 11, 2025
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress modulation by implant to back of wafer
- Patent number 12,217,974
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High framerate and high dynamic range electron microscopy
- Patent number 12,211,667
- Issue date Jan 28, 2025
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas jet deflection in pressurized systems
- Patent number 12,209,579
- Issue date Jan 28, 2025
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Charged particle beam device
- Patent number 12,205,790
- Issue date Jan 21, 2025
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...
- Publication number 20250149290
- Publication date May 8, 2025
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CHARACTERIZING A DETECTION PATH OF A CHARGED PARTICLE BEA...
- Publication number 20250140511
- Publication date May 1, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, MULTI-ELECTRON BEA...
- Publication number 20250132119
- Publication date Apr 24, 2025
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A CHARGED PARTICLE BEAM APPARATUS, AND CHARGED...
- Publication number 20250132121
- Publication date Apr 24, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Stanislav Bardy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS JET DEFLECTION IN PRESSURIZED SYSTEMS
- Publication number 20250116264
- Publication date Apr 10, 2025
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...
- Publication number 20250112018
- Publication date Apr 3, 2025
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION
- Publication number 20250112017
- Publication date Apr 3, 2025
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250112023
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT
- Publication number 20250104965
- Publication date Mar 27, 2025
- Axcelis Technologies, Inc.
- Wilhelm Platow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...
- Publication number 20250104966
- Publication date Mar 27, 2025
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY-ELECTRODE, CHARGED PARTICLE BEAM DEVICE AND METHOD FOR IN...
- Publication number 20250104959
- Publication date Mar 27, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Stephan Heinrich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS
- Publication number 20250095951
- Publication date Mar 20, 2025
- Kabushiki Kaisha Toshiba
- Kazuyuki HIGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
- Publication number 20250095958
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOBILE ACCELERATOR-BASED VOLUMETRIC FABRICATION METHOD FOR IN-SITU...
- Publication number 20250083381
- Publication date Mar 13, 2025
- FERMI RESEARCH ALLIANCE, LLC
- Aaron Sauers
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Optics for In-Situ Scanning Electron Microscope Repair
- Publication number 20250087450
- Publication date Mar 13, 2025
- KLA Corporation
- Tomas Plettner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR PERFORMING AN INTERFEROMETRIC MEASUREMENT
- Publication number 20250069849
- Publication date Feb 27, 2025
- Technische Universitat Berlin
- Tolga WAGNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...
- Publication number 20250069958
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Alex Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM
- Publication number 20250062097
- Publication date Feb 20, 2025
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Zhimin WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device, and Beam Deflection Method in Charged...
- Publication number 20250062096
- Publication date Feb 20, 2025
- Hitachi High-Tech Corporation
- Naoto ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DYNAMIC ABERRATION CORRECTION
- Publication number 20250062098
- Publication date Feb 20, 2025
- KLA Corporation
- Xiaoxue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO MORE PRECISELY CALIBRATE THE MECHANICAL TILT AND ROTATION...
- Publication number 20250054726
- Publication date Feb 13, 2025
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN
- Publication number 20250054720
- Publication date Feb 13, 2025
- Ralf Edinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING...
- Publication number 20250054727
- Publication date Feb 13, 2025
- NuFlare Technology, Inc.
- Tsubasa NANAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20250046564
- Publication date Feb 6, 2025
- Korea Research Institute of Standards and Science
- Takashi OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20250046565
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Tomonori NAKANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL DEVICE AND METHOD
- Publication number 20250046570
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS WITH MULTIPLE DETECTORS AND METHODS...
- Publication number 20250037967
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Xuedong LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...
- Publication number 20250037968
- Publication date Jan 30, 2025
- CARL ZEISS MICROSCOPY GMBH
- Lucas Harmsen
- H01 - BASIC ELECTRIC ELEMENTS

Arrangements for directing or deflecting the discharge along a desired path

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam system, method of operating a charged particl...

Particle beam system

Particle beam device having a deflection unit

Multiple electron beam image acquisition method, multiple electron...

Sample display method

Creating multiple electron beams with a photocathode film

Monochromator device and methods of use thereof

System and method for alignment of secondary beams in multi-beam in...

Transmission charged particle microscope with an electron energy lo...

Multi-beam particle beam system and method for operating same

Microscopy feedback for improved milling accuracy

Particle beam system for azimuthal deflection of individual particl...

Electron beam irradiation apparatus with overlapping beam columns a...

Forming method of plasma resistant oxyfluoride coating layer

Electron gun and system and method using electron gun

Charged particle beam device and inspection device

Apparatus of plural charged-particle beams

Apparatus using multiple beams of charged particles

Methods and systems for event modulated electron microscopy

Temperature-controlled surface with a cryo-nanomanipulator for impr...

Multi-beam charged particle source with alignment means

Electron microscope

Localized stress modulation by implant to back of wafer

Multiple charged-particle beam apparatus with low crosstalk

High framerate and high dynamic range electron microscopy

Gas jet deflection in pressurized systems

Method and system for the removal and/or avoidance of contamination...

Charged particle beam device

Charged particle beam writing apparatus, charged particle beam writ...

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Patents Applicationslast 30 patents

MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...

METHOD OF CHARACTERIZING A DETECTION PATH OF A CHARGED PARTICLE BEA...

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, MULTI-ELECTRON BEA...

METHOD OF OPERATING A CHARGED PARTICLE BEAM APPARATUS, AND CHARGED...

GAS JET DEFLECTION IN PRESSURIZED SYSTEMS

ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...

IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT

MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...

PROXIMITY-ELECTRODE, CHARGED PARTICLE BEAM DEVICE AND METHOD FOR IN...

ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

MOBILE ACCELERATOR-BASED VOLUMETRIC FABRICATION METHOD FOR IN-SITU...

Optics for In-Situ Scanning Electron Microscope Repair

DEVICE FOR PERFORMING AN INTERFEROMETRIC MEASUREMENT

DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...

RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM

Charged Particle Beam Device, and Beam Deflection Method in Charged...

SYSTEM AND METHOD FOR DYNAMIC ABERRATION CORRECTION

METHOD TO MORE PRECISELY CALIBRATE THE MECHANICAL TILT AND ROTATION...

ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN

BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING...

CHARGED PARTICLE BEAM APPARATUS

Charged Particle Beam Device

CHARGED PARTICLE OPTICAL DEVICE AND METHOD

CHARGED PARTICLE BEAM APPARATUS WITH MULTIPLE DETECTORS AND METHODS...

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...