Arrangements for directing or deflecting the discharge along a desired path

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H01J37/147

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/147Arrangements for directing or deflecting the discharge along a desired path

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for scanning a sample using multi-beam inspection...
- Patent number 12,165,837
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stroboscopic illumination synchronized electron detection and imaging
- Patent number 12,165,835
- Issue date Dec 10, 2024
- FEI Company
- Bart Jozef Janssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and electron beam application apparatus
- Patent number 12,165,828
- Issue date Dec 10, 2024
- HITACHI HIGH-TECH CORPORATION
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam gun control systems and methods
- Patent number 12,145,006
- Issue date Nov 19, 2024
- Varian Medical Systems, Inc.
- Mark Everett Trail
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus
- Patent number 12,142,453
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus with multiple detectors and methods...
- Patent number 12,142,455
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual speed acquisition for drift corrected, fast, low dose, adaptiv...
- Patent number 12,136,532
- Issue date Nov 5, 2024
- FEI Company
- Pavel Potocek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for generating particle wave carrying electric...
- Patent number 12,125,666
- Issue date Oct 22, 2024
- Yanbing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual source injector with switchable analyzing magnet
- Patent number 12,112,918
- Issue date Oct 8, 2024
- Axcelis Technologies, Inc.
- Wilhelm Platow
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arbitrary electron dose waveforms for electron microscopy
- Patent number 12,080,514
- Issue date Sep 3, 2024
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Shewmon Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam deflection device, aberration corrector, monochromator, and ch...
- Patent number 12,062,519
- Issue date Aug 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multiple particle beam system while altering...
- Patent number 12,057,290
- Issue date Aug 6, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and inspection method
- Patent number 12,057,288
- Issue date Aug 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas jet deflection in pressurized systems
- Patent number 12,049,883
- Issue date Jul 30, 2024
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and ion beam irradiati...
- Patent number 12,040,155
- Issue date Jul 16, 2024
- Kioxia Corporation
- Junichi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-die metrology methods and systems for process control
- Patent number 12,040,187
- Issue date Jul 16, 2024
- ASML Netherlands B.V.
- Lingling Pu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern data processing for programmable direct-write apparatus
- Patent number 12,040,157
- Issue date Jul 16, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam adjustment method and three-dimensional powder bed fusion addi...
- Patent number 12,020,894
- Issue date Jun 25, 2024
- Jeol Ltd.
- Shio En
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Charged particle beam writing apparatus
- Patent number 12,009,175
- Issue date Jun 11, 2024
- NuFlare Technology, Inc.
- Hirofumi Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus, defect repair method, lithographic exposur...
- Patent number 11,996,267
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Ruben Cornelis Maas
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240420915
- Publication date Dec 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Mihiro TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...
- Publication number 20240412889
- Publication date Dec 12, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404787
- Publication date Dec 5, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIVE-DIMENSIONAL ELECTRON MICROSCOPE AND ANALYSIS METHOD THEREFOR
- Publication number 20240395499
- Publication date Nov 28, 2024
- RINKEN
- Takahiro SHIMOJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
- Publication number 20240395495
- Publication date Nov 28, 2024
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF
- Publication number 20240382166
- Publication date Nov 21, 2024
- Rodney HERRING
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTIPLE ELECTRON BEAM OPTICS
- Publication number 20240387140
- Publication date Nov 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Alon Litman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...
- Publication number 20240371596
- Publication date Nov 7, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...
- Publication number 20240371600
- Publication date Nov 7, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heated Plasma Flood Gun Sweeper
- Publication number 20240371602
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM APPARATUS
- Publication number 20240355575
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- German AKSENOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR EVENT MODULATED ELECTRON MICROSCOPY
- Publication number 20240355581
- Publication date Oct 24, 2024
- Integrated Dynamic Electron Solutions, Inc.
- Bryan Walter REED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339287
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS
- Publication number 20240339289
- Publication date Oct 10, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Adar Sonn-Segev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD
- Publication number 20240339294
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Marijke SCOTUZZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240321545
- Publication date Sep 26, 2024
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL DEVICE
- Publication number 20240321547
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM MICROSCOPE
- Publication number 20240304412
- Publication date Sep 12, 2024
- CARL ZEISS MICROSCOPY GMBH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM MICROSCOPE
- Publication number 20240304410
- Publication date Sep 12, 2024
- CARL ZEISS MICROSCOPY GMBH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS JET DEFLECTION IN PRESSURIZED SYSTEMS
- Publication number 20240295213
- Publication date Sep 5, 2024
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNING A DISTORTED IMAGE
- Publication number 20240297013
- Publication date Sep 5, 2024
- ASML NETHERLANDS B.V.
- Jasper Frans Mathijs VAN RENS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE
- Publication number 20240297012
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Atsuko Shintani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...
- Publication number 20240290571
- Publication date Aug 29, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...
- Publication number 20240281952
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING

Arrangements for directing or deflecting the discharge along a desired path

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ribbon beam angle adjustment in an ion implantation system

System and method for scanning a sample using multi-beam inspection...

Stroboscopic illumination synchronized electron detection and imaging

Electron gun and electron beam application apparatus

Automated ion-beam alignment for dual-beam instrument

Beam pattern device having beam absorber structure

Particle beam gun control systems and methods

Multi-beam inspection apparatus

Charged particle beam apparatus with multiple detectors and methods...

Dual speed acquisition for drift corrected, fast, low dose, adaptiv...

Apparatus and method for generating particle wave carrying electric...

Multi-source charged particle illumination apparatus

Particle beam system and the use thereof for flexibly setting the c...

Dual source injector with switchable analyzing magnet

Modulation of rolling k vectors of angled gratings

Apparatus of plural charged-particle beams

Energy filter element for ion implantation systems for the use in t...

Arbitrary electron dose waveforms for electron microscopy

Apparatus for multiple charged-particle beams

Beam deflection device, aberration corrector, monochromator, and ch...

Method for operating a multiple particle beam system while altering...

Charged particle beam device and inspection method

Gas jet deflection in pressurized systems

Multi-charged-particle-beam writing method, multi-charged-particle-...

Method of manufacturing semiconductor device and ion beam irradiati...

In-die metrology methods and systems for process control

Pattern data processing for programmable direct-write apparatus

Beam adjustment method and three-dimensional powder bed fusion addi...

Charged particle beam writing apparatus

Particle beam apparatus, defect repair method, lithographic exposur...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE

LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...

ION IMPLANTER AND ION IMPLANTATION METHOD

FIVE-DIMENSIONAL ELECTRON MICROSCOPE AND ANALYSIS METHOD THEREFOR

COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS

CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF

MULTIPLE ELECTRON BEAM OPTICS

MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...

METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...

Heated Plasma Flood Gun Sweeper

BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM APPARATUS

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

METHODS AND SYSTEMS FOR EVENT MODULATED ELECTRON MICROSCOPY

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS

CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

SEMICONDUCTOR DEVICE

CHARGED-PARTICLE OPTICAL DEVICE

PARTICLE BEAM MICROSCOPE

Device and Method for Calibrating a Charged-Particle Beam

ELECTRON BEAM MICROSCOPE

GAS JET DEFLECTION IN PRESSURIZED SYSTEMS

ALIGNING A DISTORTED IMAGE

CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE

CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...