Arrangements for directing or deflecting the discharge along a desired path

Industry

CPC
H01J37/147

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/147Arrangements for directing or deflecting the discharge along a desired path

Industries

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam device
- Patent number 11,967,482
- Issue date Apr 23, 2024
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for angled etching using multielectrode ex...
- Patent number 11,967,489
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometry based three dimensional reconstruction of a semiconductor...
- Patent number 11,953,316
- Issue date Apr 9, 2024
- Applied Materials Israel Ltd.
- Rafael Bistritzer
- G01 - MEASURING TESTING
Information Patent Grant
Transmission charged particle microscope with an electron energy lo...
- Patent number 11,955,310
- Issue date Apr 9, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for adjusting beam condition of charged par...
- Patent number 11,948,772
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed charged-particle beam system
- Patent number 11,942,302
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Arno Jan Bleeker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sampling assembly and testing instrument
- Patent number 11,933,668
- Issue date Mar 19, 2024
- Rohde & Schwarz GmbH & Co. KG
- Bernhard Sterzbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,923,167
- Issue date Mar 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam application apparatus
- Patent number 11,915,903
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conduction inspection method for multipole aberration corrector, an...
- Patent number 11,915,902
- Issue date Feb 27, 2024
- NuFlare Technology, Inc.
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,658
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,657
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-voltage electron beam control of conductive state at a complex-...
- Patent number 11,894,162
- Issue date Feb 6, 2024
- University of Pittsburgh—Of the Commonwealth System, of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion milling device
- Patent number 11,894,213
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Infrastructure-scale additive manufacturing using mobile electron a...
- Patent number 11,878,462
- Issue date Jan 23, 2024
- Fermi Research Alliance, LLC
- Aaron Sauers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number RE49784
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Weiming Ren
Information Patent Grant
Charged particle beam writing device and charged particle beam writ...
- Patent number 11,854,764
- Issue date Dec 26, 2023
- NuFlare Technology, Inc.
- Junpei Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for event modulated electron microscopy
- Patent number 11,848,173
- Issue date Dec 19, 2023
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Bryan Walter Reed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens system for fast scanning large FOV
- Patent number 11,837,431
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waveform generating device, waveform generating method, and charged...
- Patent number 11,837,436
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Michihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,837,430
- Issue date Dec 5, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring relative rotational angle and scanning transmis...
- Patent number 11,837,433
- Issue date Dec 5, 2023
- Jeol Ltd.
- Akiho Nakamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-BEAM PARTICLE BEAM SYSTEM
- Publication number 20240136146
- Publication date Apr 25, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...
- Publication number 20240136150
- Publication date Apr 25, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240128043
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...
- Publication number 20240128045
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN AND ELECTRON BEAM APPLICATION APPARATUS
- Publication number 20240120168
- Publication date Apr 11, 2024
- Hitachi High-Tech Corporation
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE ANALYSIS SYSTEM
- Publication number 20240112881
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jonghyeok PARK
- G01 - MEASURING TESTING
Information Patent Application
HIGH FRAMERATE AND HIGH DYNAMIC RANGE ELECTRON MICROSCOPY
- Publication number 20240105418
- Publication date Mar 28, 2024
- Integrated Dynamic Electron Solutions, Inc.
- Ruth BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS IN...
- Publication number 20240105421
- Publication date Mar 28, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-BEAM CHARGED PARTICLE SOURCE WITH ALIGHMENT MEANS
- Publication number 20240096585
- Publication date Mar 21, 2024
- Technische Universiteit Delft
- Pieter KRUIT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM
- Publication number 20240096587
- Publication date Mar 21, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEM
- Publication number 20240096592
- Publication date Mar 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC MULTIPOLE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND MET...
- Publication number 20240087837
- Publication date Mar 14, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...
- Publication number 20240087844
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...
- Publication number 20240079207
- Publication date Mar 7, 2024
- Carl Zeiss MultiSEM GmbH
- Michael Behnke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS
- Publication number 20240071715
- Publication date Feb 29, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Sissi Lachmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION DEVICE AND INSPECTION METHOD
- Publication number 20240055223
- Publication date Feb 15, 2024
- KIOXIA Corporation
- Chihiro IDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240055218
- Publication date Feb 15, 2024
- NuFlare Technology, Inc.
- Yasuo SENGOKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20240055217
- Publication date Feb 15, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON OPTICAL COLUMN AND METHOD FOR DIRECTING A BEAM OF PRIMARY...
- Publication number 20240055219
- Publication date Feb 15, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Simple Spherical Aberration Corrector for SEM
- Publication number 20240047170
- Publication date Feb 8, 2024
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Energy Filter Assembly for Ion Implantation System with at least on...
- Publication number 20240047168
- Publication date Feb 8, 2024
- mi2-factory GmbH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle optics components and their fabrication
- Publication number 20240047171
- Publication date Feb 8, 2024
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BE...
- Publication number 20240038481
- Publication date Feb 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM, METHOD OF OPERATING A CHARGED PARTICL...
- Publication number 20240038482
- Publication date Feb 1, 2024
- Carl Zeiss SMT GMBH
- Eugen Foca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL SOURCE INJECTOR WITH SWITCHABLE ANALYZING MAGNET
- Publication number 20240029998
- Publication date Jan 25, 2024
- Axcelis Technologies, Inc.
- Wilhelm Platow
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...
- Publication number 20240029993
- Publication date Jan 25, 2024
- FEI Company
- Maarten BISCHOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF
- Publication number 20240021404
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING

Arrangements for directing or deflecting the discharge along a desired path

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam device

Apparatus and techniques for angled etching using multielectrode ex...

Replaceable module for a charged particle apparatus

Charged particle beam writing apparatus, charged particle beam writ...

Apparatus using charged particle beams

Geometry based three dimensional reconstruction of a semiconductor...

Transmission charged particle microscope with an electron energy lo...

Methods and apparatuses for adjusting beam condition of charged par...

Systems and methods for real time stereo imaging using multiple ele...

Pulsed charged-particle beam system

Sampling assembly and testing instrument

Semiconductor wafer

Ion implanter and ion implantation method

Electron beam application apparatus

Conduction inspection method for multipole aberration corrector, an...

Scanning electron microscope device and electron beam inspection ap...

Scanning electron microscope device and electron beam inspection ap...

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Low-voltage electron beam control of conductive state at a complex-...

Ion milling device

Apparatus of plural charged-particle beams

Infrastructure-scale additive manufacturing using mobile electron a...

Apparatus of plural charged-particle beams

Charged particle beam writing device and charged particle beam writ...

Methods and systems for event modulated electron microscopy

Objective lens system for fast scanning large FOV

Waveform generating device, waveform generating method, and charged...

Blanking aperture array unit

Energy filter element for ion implantation systems for the use in t...

Method of measuring relative rotational angle and scanning transmis...

Patents Applicationslast 30 patents

MULTI-BEAM PARTICLE BEAM SYSTEM

METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

CHARGED PARTICLE APPARATUS AND METHOD

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...

ELECTRON GUN AND ELECTRON BEAM APPLICATION APPARATUS

SUBSTRATE ANALYSIS SYSTEM

HIGH FRAMERATE AND HIGH DYNAMIC RANGE ELECTRON MICROSCOPY

ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS IN...

MULTI-BEAM CHARGED PARTICLE SOURCE WITH ALIGHMENT MEANS

DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM

OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEM

MAGNETIC MULTIPOLE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND MET...

CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...

MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS

INSPECTION DEVICE AND INSPECTION METHOD

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

ELECTRON OPTICAL COLUMN AND METHOD FOR DIRECTING A BEAM OF PRIMARY...

Simple Spherical Aberration Corrector for SEM

Energy Filter Assembly for Ion Implantation System with at least on...

Charged particle optics components and their fabrication

IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BE...

CHARGED PARTICLE BEAM SYSTEM, METHOD OF OPERATING A CHARGED PARTICL...

DUAL SOURCE INJECTOR WITH SWITCHABLE ANALYZING MAGNET

METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...

CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...