Arrangements for generation of plasma specially adapted for examination or treatment of objects

Industry

CPC
H01J37/32009

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects

Industries

Patents Grantslast 30 patents

Information Patent Grant
Apparatus with switches to produce a waveform
- Patent number 11,978,611
- Issue date May 7, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Light emitting sealed body, light emitting unit, and light source d...
- Patent number 11,972,931
- Issue date Apr 30, 2024
- Hamamatsu Photonics K.K.
- Akio Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing thin film and method of manufacturing semicond...
- Patent number 11,967,503
- Issue date Apr 23, 2024
- Wonik IPS Co., Ltd.
- Su In Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control circuit, pulsed power supply system, and semiconductor proc...
- Patent number 11,955,313
- Issue date Apr 9, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Gang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to reduce material surface roughness
- Patent number 11,939,674
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with real time force and film stress control
- Patent number 11,915,913
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Wendell Glenn Boyd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-step process for flowable gap-fill film
- Patent number 11,901,222
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Maximillian Clemons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for the surface treatment of substrates
- Patent number 11,901,172
- Issue date Feb 13, 2024
- EV Group E. Thallner GmbH
- Nasser Razek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Simplified voltage-boosting snubber network
- Patent number 11,888,311
- Issue date Jan 30, 2024
- Advanced Energy Industries, Inc.
- Faleh Alskran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprinted substrates
- Patent number 11,878,299
- Issue date Jan 23, 2024
- Illumina, Inc.
- Hui Han
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
System and method for performing spin dry etching
- Patent number 11,854,861
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,830,751
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source and method for removing materials from substrates uti...
- Patent number 11,810,756
- Issue date Nov 7, 2023
- AP Solutions Inc.
- Peter Joseph Yancey
- B08 - CLEANING
Information Patent Grant
Hollow cathode, an apparatus including a hollow cathode for manufac...
- Patent number 11,798,788
- Issue date Oct 24, 2023
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 11,789,356
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for avoiding electrical breakdown from RF t...
- Patent number 11,784,027
- Issue date Oct 10, 2023
- Lam Research Corporation
- Hyungjoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of detecting radicals using mass spectrometry
- Patent number 11,784,031
- Issue date Oct 10, 2023
- Inficon, Inc.
- Norbert Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power feeding mechanism and method for controlling temperature of a...
- Patent number 11,756,807
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch monitoring and performing
- Patent number 11,749,570
- Issue date Sep 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-De Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,742,183
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Ryuji Hisatomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 11,739,428
- Issue date Aug 29, 2023
- ASM IP Holding B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-functional protective coating
- Patent number 11,742,186
- Issue date Aug 29, 2023
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 11,739,427
- Issue date Aug 29, 2023
- ASM IP Holding B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method, device and system for the treatment of biological cryogenic...
- Patent number 11,735,404
- Issue date Aug 22, 2023
- FEI Company
- Alex De Marco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electric pressure systems for control of plasma properties and unif...
- Patent number 11,728,135
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Discharge chambers and ionization devices, methods and systems usin...
- Patent number 11,705,319
- Issue date Jul 18, 2023
- PerkinElmer Scientific Canada ULC
- Mehrnaz Sarrafzadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chuck pressure control system
- Patent number 11,694,919
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- Dongming Iu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing device
- Patent number 11,682,542
- Issue date Jun 20, 2023
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with real time force and film stress control
- Patent number 11,676,802
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Wendell Glenn Boyd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of atomic layer etching of oxide
- Patent number 11,658,037
- Issue date May 23, 2023
- Tokyo Electron Limited
- Sonam D. Sherpa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SIMPLIFIED VOLTAGE-BOOSTING SNUBBER NETWORK
- Publication number 20240154404
- Publication date May 9, 2024
- Advanced Energy Industries, Inc.
- Faleh Alskran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP PROCESS FOR FLOWABLE GAP-FILL FILM
- Publication number 20240128121
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Maximillian CLEMONS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING...
- Publication number 20240112918
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Noboru SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND SEMICONDUCT...
- Publication number 20240096593
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Toshiyuki SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...
- Publication number 20240071721
- Publication date Feb 29, 2024
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS COMPONENT FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20240055266
- Publication date Feb 15, 2024
- KOREA INSTITUTE OF MATERIALS SCIENCE
- Young Jo PARK
- B22 - CASTING POWDER METALLURGY
Information Patent Application
PLASMA SOURCE AND METHOD FOR REMOVING MATERIALS FROM SUBSTRATES UTI...
- Publication number 20240055224
- Publication date Feb 15, 2024
- Atmospheric Plasma Solutions, Inc.
- Peter Joseph Yancey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS TO CONTROL ION ENERGY
- Publication number 20240055225
- Publication date Feb 15, 2024
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH MONITORING AND PERFORMING
- Publication number 20240030073
- Publication date Jan 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-De HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMAL ATOMIC LAYER ETCHING PROCESSES
- Publication number 20240026548
- Publication date Jan 25, 2024
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...
- Publication number 20230420218
- Publication date Dec 28, 2023
- LAM RESEARCH CORPORATION
- Hyungjoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS
- Publication number 20230395399
- Publication date Dec 7, 2023
- SEMES CO., LTD.
- Ki Yung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS WITH SWITCHES TO PRODUCE A WAVEFORM
- Publication number 20230377840
- Publication date Nov 23, 2023
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ATOMIC LAYER ETCHING PROCESSES
- Publication number 20230374671
- Publication date Nov 23, 2023
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
APPARATUS TO PRODUCE A WAVEFORM
- Publication number 20230377839
- Publication date Nov 23, 2023
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING EUV PHOTO MASKS
- Publication number 20230367193
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO CONTROL A WAVEFORM
- Publication number 20230369016
- Publication date Nov 16, 2023
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION TOOL AND METHOD FOR FILLING DEEP TRENCHES
- Publication number 20230360970
- Publication date Nov 9, 2023
- Intel Corporation
- Elijah V. KARPOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA DICING A SEMI-CONDUCTOR WAFER
- Publication number 20230343647
- Publication date Oct 26, 2023
- Plasma-Therm LLC
- Russell Westerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Chamber And Process Kits For Advanced Packaging
- Publication number 20230307211
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Aravind Miyar Kamath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING
- Publication number 20230268187
- Publication date Aug 24, 2023
- ASM IP HOLDING B.V.
- Charles Dezelah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH REAL TIME FORCE AND FILM STRESS CONTROL
- Publication number 20230253188
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Wendell Glenn BOYD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER ETCHING PROCESSES
- Publication number 20230253182
- Publication date Aug 10, 2023
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DETECTING RADICALS USING MASS SPECTROMETRY
- Publication number 20230215711
- Publication date Jul 6, 2023
- Inficon, Inc.
- Norbert Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO REDUCE MATERIAL SURFACE ROUGHNESS
- Publication number 20230203652
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20230207309
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Viljami PORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION ENABLED BY VAPOR PHASE INHIBITOR
- Publication number 20230197418
- Publication date Jun 22, 2023
- International Business Machines Corporation
- Rudy J. Wojtecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSING ASSEMBLY AND POWER SUPPLY ARRANGEMENT
- Publication number 20230170184
- Publication date Jun 1, 2023
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD USING PERFLUOROISOPROPYL VINYL ETHER
- Publication number 20230162972
- Publication date May 25, 2023
- AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
- Chang-Koo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, TEMPERATURE CONTROL METHOD, AND TEMPER...
- Publication number 20230087979
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Shinsuke OKA
- H01 - BASIC ELECTRIC ELEMENTS

Arrangements for generation of plasma specially adapted for examination or treatment of objects

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus with switches to produce a waveform

Light emitting sealed body, light emitting unit, and light source d...

Method of depositing thin film and method of manufacturing semicond...

Control circuit, pulsed power supply system, and semiconductor proc...

Methods to reduce material surface roughness

Substrate support with real time force and film stress control

Multi-step process for flowable gap-fill film

Method and device for the surface treatment of substrates

Simplified voltage-boosting snubber network

Imprinted substrates

System and method for performing spin dry etching

Plasma processing apparatus and plasma processing method

Plasma source and method for removing materials from substrates uti...

Hollow cathode, an apparatus including a hollow cathode for manufac...

Method of manufacturing EUV photo masks

Apparatuses and methods for avoiding electrical breakdown from RF t...

Method of detecting radicals using mass spectrometry

Power feeding mechanism and method for controlling temperature of a...

Etch monitoring and performing

Plasma processing apparatus and control method

Thermal atomic layer etching processes

Multi-functional protective coating

Thermal atomic layer etching processes

Method, device and system for the treatment of biological cryogenic...

Electric pressure systems for control of plasma properties and unif...

Discharge chambers and ionization devices, methods and systems usin...

Vacuum chuck pressure control system

Plasma processing device

Substrate support with real time force and film stress control

Method of atomic layer etching of oxide

Patents Applicationslast 30 patents

SIMPLIFIED VOLTAGE-BOOSTING SNUBBER NETWORK

MULTI-STEP PROCESS FOR FLOWABLE GAP-FILL FILM

PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING...

PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND SEMICONDUCT...

SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...

PLASMA ETCHING APPARATUS COMPONENT FOR MANUFACTURING SEMICONDUCTOR...

PLASMA SOURCE AND METHOD FOR REMOVING MATERIALS FROM SUBSTRATES UTI...

APPARATUS TO CONTROL ION ENERGY

ETCH MONITORING AND PERFORMING

THERMAL ATOMIC LAYER ETCHING PROCESSES

APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS

APPARATUS WITH SWITCHES TO PRODUCE A WAVEFORM

THERMAL ATOMIC LAYER ETCHING PROCESSES

APPARATUS TO PRODUCE A WAVEFORM

METHOD OF MANUFACTURING EUV PHOTO MASKS

APPARATUS TO CONTROL A WAVEFORM

DEPOSITION TOOL AND METHOD FOR FILLING DEEP TRENCHES

METHOD AND APPARATUS FOR PLASMA DICING A SEMI-CONDUCTOR WAFER

Process Chamber And Process Kits For Advanced Packaging

ATOMIC LAYER ETCHING

SUBSTRATE SUPPORT WITH REAL TIME FORCE AND FILM STRESS CONTROL

ATOMIC LAYER ETCHING PROCESSES

METHOD OF DETECTING RADICALS USING MASS SPECTROMETRY

METHODS TO REDUCE MATERIAL SURFACE ROUGHNESS

METHOD AND APPARATUS FOR FILLING A GAP

SELECTIVE DEPOSITION ENABLED BY VAPOR PHASE INHIBITOR

PULSING ASSEMBLY AND POWER SUPPLY ARRANGEMENT

PLASMA ETCHING METHOD USING PERFLUOROISOPROPYL VINYL ETHER

PLASMA PROCESSING APPARATUS, TEMPERATURE CONTROL METHOD, AND TEMPER...