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CPC
H01J37/3417

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3417Arrangements

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System, method and support for coating eyeglass lenses
- Patent number 12,261,031
- Issue date Mar 25, 2025
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus, deposition target structure, and method
- Patent number 12,237,159
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Housing, mobile terminal, and sputter coating apparatus
- Patent number 12,228,759
- Issue date Feb 18, 2025
- Huawei Technologies Co., Ltd.
- Peiling Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and sputtering apparatus including the same
- Patent number 12,221,686
- Issue date Feb 11, 2025
- Samsung Display Co., Ltd.
- Hyuneok Shin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target, method of bonding target material and backing pl...
- Patent number 12,217,948
- Issue date Feb 4, 2025
- Sumitomo Chemical Company, Limited
- Masahiro Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 12,217,949
- Issue date Feb 4, 2025
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron plasma sputtering arrangement
- Patent number 12,170,194
- Issue date Dec 17, 2024
- Danmarks Tekniske Universitet
- Eugen Stamate
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 12,163,215
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Koji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etch uniformity improvement for single turn internal coil PVD chamber
- Patent number 12,136,544
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Anthony Chih-Tung Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inverted cylindrical magnetron (ICM) system and methods of use
- Patent number 12,106,924
- Issue date Oct 1, 2024
- Vactronix Scientific, LLC.
- Tianzong Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target, method of bonding target material and backing pl...
- Patent number 12,051,577
- Issue date Jul 30, 2024
- Sumitomo Chemical Company, Limited
- Masahiro Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter target magnet
- Patent number 12,020,917
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Jie He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 12,014,911
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Shota Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for coupling RF power into LINACs and bellows coating by mag...
- Patent number 12,009,192
- Issue date Jun 11, 2024
- Starfire Industries LLC
- Thomas J. Houlahan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tilted PVD source with rotating pedestal
- Patent number 11,948,784
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Harish Penmethsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering system with a plurality of cathode assemblies
- Patent number 11,932,932
- Issue date Mar 19, 2024
- Alluxa, Inc.
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for homogeneously coating 3D substrates
- Patent number 11,913,108
- Issue date Feb 27, 2024
- FHR Anlagenbau GmbH
- Sven Häberlein
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam deposition target life enhancement
- Patent number 11,901,167
- Issue date Feb 13, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device, method and use for the coating of lenses
- Patent number 11,842,889
- Issue date Dec 12, 2023
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High efficiency rotatable sputter target
- Patent number 11,830,712
- Issue date Nov 28, 2023
- SCI ENGINEERED MATERIALS, INC.
- Ian Ravary
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 11,821,068
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus, deposition target structure, and method
- Patent number 11,823,878
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering a layer on a substrate using a high-energy density plasm...
- Patent number 11,823,859
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus
- Patent number 11,821,067
- Issue date Nov 21, 2023
- Canon Anelva Corporation
- Masahiro Atsumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and film forming method
- Patent number 11,742,190
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Partial spray refurbishment of sputtering targets
- Patent number 11,739,416
- Issue date Aug 29, 2023
- H.C. Starck Solutions Euclid, LLC
- Steven A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method for manufacturing the same
- Patent number 11,735,403
- Issue date Aug 22, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and method for fabricating semiconductor devic...
- Patent number 11,725,271
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Ki Woong Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus including gas distribution system
- Patent number 11,674,213
- Issue date Jun 13, 2023
- Cardinal CG Company
- Klaus Hartig
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming apparatus, film-forming system, and film-forming method
- Patent number 11,664,207
- Issue date May 30, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20250059640
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Koji MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION
- Publication number 20250029819
- Publication date Jan 23, 2025
- SAMSUNG DISPLAY CO., LTD.
- You Jong LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING KIT SHIELD
- Publication number 20240352574
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sundarapandian Ramaling Vijayalaskshmi REDDY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION DEVICE
- Publication number 20240274420
- Publication date Aug 15, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SHIMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACT...
- Publication number 20240186064
- Publication date Jun 6, 2024
- Evatec AG
- Claudiu Valentin FALUB
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS
- Publication number 20240136156
- Publication date Apr 25, 2024
- Evatec AG
- Stephan VOSER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET AND SPUTTERING APPARATUS INCLUDING THE SAME
- Publication number 20240084441
- Publication date Mar 14, 2024
- SAMSUNG DISPLAY CO., LTD.
- HYUNEOK SHIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS
- Publication number 20240052477
- Publication date Feb 15, 2024
- Canon ANELVA Corporation
- Masahiro ATSUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014005
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD
- Publication number 20240014019
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM DEPOSITION TARGET LIFE ENHANCEMENT
- Publication number 20230335383
- Publication date Oct 19, 2023
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR SPUTTERING AND DEPOSITING METAL ON SURFACE OF...
- Publication number 20230317429
- Publication date Oct 5, 2023
- Bin ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PL...
- Publication number 20230274921
- Publication date Aug 31, 2023
- Sumitomo Chemical Company, Limited
- Masahiro FUJITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...
- Publication number 20230257866
- Publication date Aug 17, 2023
- Carl Zeiss SMT GMBH
- Anastasia GONCHAR
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING TH...
- Publication number 20230257869
- Publication date Aug 17, 2023
- QORVO BIOTECHNOLOGIES, LLC
- Derya Deniz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS AND CVD MASK COATING METHOD USING THE SAME
- Publication number 20230220533
- Publication date Jul 13, 2023
- SAMSUNG DISPLAY CO., LTD.
- SUNGMIN HUR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTIVE SPUTTER DEPOSITION OF DIELECTRIC FILMS
- Publication number 20230203636
- Publication date Jun 29, 2023
- VIAVI SOLUTIONS INC.
- Georg J. OCKENFUSS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS
- Publication number 20230175113
- Publication date Jun 8, 2023
- Samsung Electronics Co., Ltd.
- Jaesuk KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROCHROMIC DEVICES
- Publication number 20230144179
- Publication date May 11, 2023
- VIEW, INC.
- Zhongchun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCH UNIFORMITY IMPROVEMENT FOR SINGLE TURN INTERNAL COIL PVD CHAMBER
- Publication number 20230141298
- Publication date May 11, 2023
- Anthony Chih-Tung CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering System with a Plurality of Cathode Assemblies
- Publication number 20230133160
- Publication date May 4, 2023
- Alluxa, Inc.
- Michael A. Scobey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION
- Publication number 20230085216
- Publication date Mar 16, 2023
- SAMSUNG DISPLAY CO., LTD.
- You Jong LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD
- Publication number 20230069264
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERING
- Publication number 20230052340
- Publication date Feb 16, 2023
- INTELLIVATION LLC
- Michael G. Simmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRT
- Publication number 20220415631
- Publication date Dec 29, 2022
- MATERION CORPORATION
- Matthew FISHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING CRYSTALLINE MATERIAL FROM DIFFERENT MATERIALS
- Publication number 20220407043
- Publication date Dec 22, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER DEPOSITION
- Publication number 20220399195
- Publication date Dec 15, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A MAGNETRON PLASMA SPUTTERING ARRANGEMENT
- Publication number 20220351952
- Publication date Nov 3, 2022
- Danmarks Tekniske Universitet
- Eugen STAMATE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PL...
- Publication number 20220310371
- Publication date Sep 29, 2022
- Sumitomo Chemical Company, Limited
- Masahiro FUJITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SPUTTER DEPOSITION
- Publication number 20220277940
- Publication date Sep 1, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Arrangements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System, method and support for coating eyeglass lenses

Deposition apparatus, deposition target structure, and method

Housing, mobile terminal, and sputter coating apparatus

Sputtering target and sputtering apparatus including the same

Sputtering target, method of bonding target material and backing pl...

Magnetically enhanced high density plasma-chemical vapor deposition...

Magnetron plasma sputtering arrangement

Film forming apparatus and film forming method

Etch uniformity improvement for single turn internal coil PVD chamber

Inverted cylindrical magnetron (ICM) system and methods of use

Sputtering target, method of bonding target material and backing pl...

Sputter target magnet

Sputtering apparatus

System for coupling RF power into LINACs and bellows coating by mag...

Tilted PVD source with rotating pedestal

Sputtering system with a plurality of cathode assemblies

Method and device for homogeneously coating 3D substrates

Ion beam deposition target life enhancement

Device, method and use for the coating of lenses

High efficiency rotatable sputter target

Magnetically enhanced high density plasma-chemical vapor deposition...

Deposition apparatus, deposition target structure, and method

Sputtering a layer on a substrate using a high-energy density plasm...

Deposition apparatus

Sputtering apparatus and film forming method

Partial spray refurbishment of sputtering targets

Sputtering target and method for manufacturing the same

Sputtering apparatus and method for fabricating semiconductor devic...

Sputtering apparatus including gas distribution system

Film-forming apparatus, film-forming system, and film-forming method

Patents Applicationslast 30 patents

FILM FORMING APPARATUS AND FILM FORMING METHOD

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

PROCESSING KIT SHIELD

FILM FORMATION METHOD AND FILM FORMATION DEVICE

SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACT...

SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS

SPUTTERING TARGET AND SPUTTERING APPARATUS INCLUDING THE SAME

DEPOSITION APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD

ION BEAM DEPOSITION TARGET LIFE ENHANCEMENT

DEVICE AND METHOD FOR SPUTTERING AND DEPOSITING METAL ON SURFACE OF...

SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PL...

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...

SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING TH...

SPUTTERING APPARATUS AND CVD MASK COATING METHOD USING THE SAME

REACTIVE SPUTTER DEPOSITION OF DIELECTRIC FILMS

PHYSICAL VAPOR DEPOSITION APPARATUS

ELECTROCHROMIC DEVICES

ETCH UNIFORMITY IMPROVEMENT FOR SINGLE TURN INTERNAL COIL PVD CHAMBER

Sputtering System with a Plurality of Cathode Assemblies

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD

MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERING

MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRT

METHOD OF MANUFACTURING CRYSTALLINE MATERIAL FROM DIFFERENT MATERIALS

SPUTTER DEPOSITION

A MAGNETRON PLASMA SPUTTERING ARRANGEMENT

SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PL...

METHOD AND APPARATUS FOR SPUTTER DEPOSITION