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CPC
H01J2237/1504

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1504Associated circuits

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-leaf collimator
- Patent number 11,771,922
- Issue date Oct 3, 2023
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfang Liu
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Charged particle beam apparatus and control method
- Patent number 11,610,756
- Issue date Mar 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Kaori Bizen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-leaf collimator
- Patent number 11,497,936
- Issue date Nov 15, 2022
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfang Liu
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,476,086
- Issue date Oct 18, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning efficiency by individual beam steering of multi-beam appar...
- Patent number 11,031,209
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source device
- Patent number 11,004,649
- Issue date May 11, 2021
- Luxembourg Institute of Science and Technology (LIST)
- Olivier De Castro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam axial alignment device, charged particle beam...
- Patent number 10,903,038
- Issue date Jan 26, 2021
- Shimadzu Corporation
- Takehiro Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,784,081
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,685,809
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,636,618
- Issue date Apr 28, 2020
- Hitachi High-Technologies Corporation
- Kaori Bizen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,424,459
- Issue date Sep 24, 2019
- Hitachi High-Technologies Corporation
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Studying dynamic specimen behavior in a charged-particle microscope
- Patent number 10,340,113
- Issue date Jul 2, 2019
- FEI Company
- Erik René Kieft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, and charged particle beam...
- Patent number 10,283,314
- Issue date May 7, 2019
- NUFLARE TECHNOLOGY, INC.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for high power pulse generator
- Patent number 10,212,799
- Issue date Feb 19, 2019
- Stangenes Industries, Inc.
- Christopher Yeckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multicolumn charged particle beam exposure apparatus
- Patent number 10,083,813
- Issue date Sep 25, 2018
- Intel Corporation
- Masaki Kurokawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,734,981
- Issue date Aug 15, 2017
- NuFlare Technology, Inc.
- Saori Gomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam current density distribution adjustment device and ion implanter
- Patent number 9,734,982
- Issue date Aug 15, 2017
- Nissin Ion Equipment Co., Ltd.
- Sami K. Hahto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam device
- Patent number 9,679,740
- Issue date Jun 13, 2017
- Hitachi High-Technologies Corporation
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,478,391
- Issue date Oct 25, 2016
- NuFlare Technology, Inc.
- Hironobu Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and method using a scanning electron microscope
- Patent number 9,177,759
- Issue date Nov 3, 2015
- Hitachi High-Technologies Corporation
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generation of charged particle vortex waves
- Patent number 9,153,412
- Issue date Oct 6, 2015
- Universiteit Antwerpen
- Johan Verbeeck
- G01 - MEASURING TESTING
Information Patent Grant
Pattern modification schemes for improved FIB patterning
- Patent number 8,624,206
- Issue date Jan 7, 2014
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DA conversion device and electron beam exposure system using the same
- Patent number 8,618,970
- Issue date Dec 31, 2013
- Advantest Corp.
- Takamasa Sato
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Pattern modification schemes for improved FIB patterning
- Patent number 8,314,409
- Issue date Nov 20, 2012
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and method for diagnosing D...
- Patent number 8,290,743
- Issue date Oct 16, 2012
- Nuflare Technology, Inc.
- Seiichi Tsuchiya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Beamlet blanker arrangement
- Patent number 8,258,484
- Issue date Sep 4, 2012
- Mapper Lithography IP B.V.
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle optical system comprising an electrostatic deflector
- Patent number 8,110,813
- Issue date Feb 7, 2012
- Mapper Lithography IP B.V.
- Norman Hendrikus Rudolf Baars
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam writing apparatus and charged-particle beam w...
- Patent number 7,893,411
- Issue date Feb 22, 2011
- Nuflare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
AN APPARATUS USING ENHANCED DEFLECTORS TO MANIPULATE CHARGED PARTIC...
- Publication number 20230178328
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Yongxin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY UNIT
- Publication number 20220392731
- Publication date Dec 8, 2022
- NuFlare Technology, Inc.
- Shuji YOSHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD
- Publication number 20220115203
- Publication date Apr 14, 2022
- HITACHI HIGH-TECH CORPORATION
- Kaori BIZEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20210257184
- Publication date Aug 19, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20200266033
- Publication date Aug 20, 2020
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING EFFICIENCY BY INDIVIDUAL BEAM STEERING OF MULTI-BEAM APPAR...
- Publication number 20200211814
- Publication date Jul 2, 2020
- ASML NETHERLANDS B.V.
- Jan-Gerard Cornelis VAN DER TOORN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE DEVICE
- Publication number 20200066476
- Publication date Feb 27, 2020
- Luxembourg Institute of Science and Technology (LIST)
- Olivier De Castro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20190066969
- Publication date Feb 28, 2019
- Hitachi High-Technologies Corporation
- Kaori BIZEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus, and Charged Particle Beam...
- Publication number 20180122616
- Publication date May 3, 2018
- NUFLARE TECHNOLOGY, INC.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20170271121
- Publication date Sep 21, 2017
- Hitachi High-Technologies Corporation
- Wen LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20160329186
- Publication date Nov 10, 2016
- Hitachi High-Technologies Corporation
- Wen LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20160300687
- Publication date Oct 13, 2016
- NuFlare Technology, Inc.
- Saori GOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20150279611
- Publication date Oct 1, 2015
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM ADJUSTMENT ASSISTANCE DEVICE AND METHOD
- Publication number 20150124077
- Publication date May 7, 2015
- Hitachi High-Technologies Corporation
- Naohiko Fukaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERATION OF CHARGED PARTICLE VORTEX WAVES
- Publication number 20140346354
- Publication date Nov 27, 2014
- Johan Verbeeck
- G01 - MEASURING TESTING
Information Patent Application
DA CONVERSION DEVICE AND ELECTRON BEAM EXPOSURE SYSTEM USING THE SAME
- Publication number 20130270449
- Publication date Oct 17, 2013
- Hitachi Information & Communication Engineering, Ltd.
- Takamasa Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Modification Schemes for Improved FIB Patterning
- Publication number 20130092826
- Publication date Apr 18, 2013
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAMLET BLANKER ARRANGEMENT
- Publication number 20120091318
- Publication date Apr 19, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING
- Publication number 20110049382
- Publication date Mar 3, 2011
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle optical system comprising an electrostatic deflector
- Publication number 20100276606
- Publication date Nov 4, 2010
- MAPPER LITHOGRAPHY IP BV
- Norman Hendrikus Rudolf BAARS
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR DIAGNOSING D...
- Publication number 20100030522
- Publication date Feb 4, 2010
- NuFlare Technology, Inc.
- Seiichi TSUCHIYA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...
- Publication number 20090084990
- Publication date Apr 2, 2009
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM DRAWING APPARATUS
- Publication number 20080231192
- Publication date Sep 25, 2008
- Kabushiki Kaisha Toshiba
- Munehiro Ogasawara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged beam drawing apparatus
- Publication number 20070228297
- Publication date Oct 4, 2007
- Kabushiki Kaisha Toshiba
- Munehiro Ogasawara
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS
- Publication number 20070138413
- Publication date Jun 21, 2007
- NuFlare Technology, Inc.
- Takayuki ABE
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrostatic deflection system with impedance matching for high po...
- Publication number 20070075256
- Publication date Apr 5, 2007
- Benyamin Buller
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam apparatus, and inspection instrument and inspection p...
- Publication number 20070034797
- Publication date Feb 15, 2007
- Nikon Corporation
- Yoshiaki Kohama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus, and inspection instrument and inspection p...
- Publication number 20060022138
- Publication date Feb 2, 2006
- Nikon Corporation
- Yoshiaki Kohama
- G01 - MEASURING TESTING
Information Patent Application
Method and fine-control collimator for accurate collimation and pre...
- Publication number 20050082498
- Publication date Apr 21, 2005
- Nicholas R. White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electromagnetic regulator assembly for adjusting and controlling th...
- Publication number 20050017202
- Publication date Jan 27, 2005
- Nicholas R. White
- H01 - BASIC ELECTRIC ELEMENTS

Associated circuits

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple charged-particle beam apparatus with low crosstalk

Blanking aperture array unit

Multi-leaf collimator

Charged particle beam apparatus and control method

Multi-leaf collimator

Multi-beam writing method and multi-beam writing apparatus

Scanning efficiency by individual beam steering of multi-beam appar...

Ion source device

Charged particle beam axial alignment device, charged particle beam...

Charged particle beam lithography apparatus and charged particle be...

Charged particle beam lithography apparatus and charged particle be...

Charged particle beam apparatus

Charged particle beam device

Studying dynamic specimen behavior in a charged-particle microscope

Charged particle beam writing apparatus, and charged particle beam...

System and method for high power pulse generator

Multicolumn charged particle beam exposure apparatus

Charged particle beam writing apparatus and charged particle beam w...

Beam current density distribution adjustment device and ion implanter

Charged particle beam device

Charged particle beam writing apparatus and charged particle beam w...

Processing apparatus and method using a scanning electron microscope

Generation of charged particle vortex waves

Pattern modification schemes for improved FIB patterning

DA conversion device and electron beam exposure system using the same

Pattern modification schemes for improved FIB patterning

Charged particle beam writing apparatus and method for diagnosing D...

Beamlet blanker arrangement

Charged particle optical system comprising an electrostatic deflector

Charged-particle beam writing apparatus and charged-particle beam w...

Patents Applicationslast 30 patents

AN APPARATUS USING ENHANCED DEFLECTORS TO MANIPULATE CHARGED PARTIC...

BLANKING APERTURE ARRAY UNIT

CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

SCANNING EFFICIENCY BY INDIVIDUAL BEAM STEERING OF MULTI-BEAM APPAR...

ION SOURCE DEVICE

CHARGED PARTICLE BEAM APPARATUS

Charged Particle Beam Writing Apparatus, and Charged Particle Beam...

Charged Particle Beam Device

Charged Particle Beam Device

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM ADJUSTMENT ASSISTANCE DEVICE AND METHOD

GENERATION OF CHARGED PARTICLE VORTEX WAVES

DA CONVERSION DEVICE AND ELECTRON BEAM EXPOSURE SYSTEM USING THE SAME

Pattern Modification Schemes for Improved FIB Patterning

BEAMLET BLANKER ARRANGEMENT

PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING

Charged particle optical system comprising an electrostatic deflector

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR DIAGNOSING D...

CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...

ELECTRON BEAM DRAWING APPARATUS

Charged beam drawing apparatus

CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS

Electrostatic deflection system with impedance matching for high po...

Electron beam apparatus, and inspection instrument and inspection p...

Electron beam apparatus, and inspection instrument and inspection p...

Method and fine-control collimator for accurate collimation and pre...

Electromagnetic regulator assembly for adjusting and controlling th...