Attenuating PSM [att-PSM]

Industry

CPC
G03F1/32

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/32Attenuating PSM [att-PSM]

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 12,153,338
- Issue date Nov 26, 2024
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 12,111,566
- Issue date Oct 8, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,105,413
- Issue date Oct 1, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift reticle for use in photolithography
- Patent number 12,078,921
- Issue date Sep 3, 2024
- Entegris, Inc.
- Tse-An Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for producing photomask, and photomask
- Patent number 11,971,653
- Issue date Apr 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
- Patent number 11,953,822
- Issue date Apr 9, 2024
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift blankmask and photomask for EUV lithography
- Patent number 11,940,725
- Issue date Mar 26, 2024
- S&S TECH CO., LTD.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,914,284
- Issue date Feb 27, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask plate, display panel and display device
- Patent number 11,910,695
- Issue date Feb 20, 2024
- Chengdu Boe Optoelectronics Technology Co., Ltd.
- Wenhui Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing phase shift photo masks
- Patent number 11,906,898
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask
- Patent number 11,899,357
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, mask blank for EUV litho...
- Patent number 11,822,229
- Issue date Nov 21, 2023
- AGC Inc.
- Daijiro Akagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 11,815,806
- Issue date Nov 14, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,815,807
- Issue date Nov 14, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making semiconductor device and semiconductor device
- Patent number 11,763,061
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,720,014
- Issue date Aug 8, 2023
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of accelerated hazing of mask assembly
- Patent number 11,703,752
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift-type photomask blank, method of manufacturing...
- Patent number 11,644,743
- Issue date May 9, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, manufacturing method thereof, and phase shi...
- Patent number 11,644,742
- Issue date May 9, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 11,630,388
- Issue date Apr 18, 2023
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photopolymerizable resin composition, display device using same, an...
- Patent number 11,599,024
- Issue date Mar 7, 2023
- Samsung Display Co., Ltd.
- Hoon Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,550,215
- Issue date Jan 10, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 11,531,264
- Issue date Dec 20, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device
- Patent number 11,443,093
- Issue date Sep 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 11,435,662
- Issue date Sep 6, 2022
- Hoya Corporation
- Ryo Ohkubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Array substrate and manufacturing method thereof
- Patent number 11,430,819
- Issue date Aug 30, 2022
- TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Weina Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shift mask blank, method for producing phase shift mask, and...
- Patent number 11,422,456
- Issue date Aug 23, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 11,415,875
- Issue date Aug 16, 2022
- Hoya Corporation
- Hitoshi Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, manufacturing method of photomask and photomask
- Patent number 11,402,744
- Issue date Aug 2, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and electronic component manufacturing method
- Patent number 11,385,537
- Issue date Jul 12, 2022
- Beijing Boe Display Technology Co., Ltd.
- Xiaoxiang Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK
- Publication number 20240427229
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Katsuyoshi KODERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240393675
- Publication date Nov 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND PHASE SHIFT MASK
- Publication number 20240361683
- Publication date Oct 31, 2024
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240345468
- Publication date Oct 17, 2024
- SK enpulse Co., Ltd.
- Hyung-joo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240329516
- Publication date Oct 3, 2024
- S&S TECH Co., Ltd.
- Min-Kwang PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...
- Publication number 20240248390
- Publication date Jul 25, 2024
- SK enpulse Co., Ltd.
- Tae Wan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...
- Publication number 20240248389
- Publication date Jul 25, 2024
- SK enpulse Co., Ltd.
- Tae Wan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20240210814
- Publication date Jun 27, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20240184194
- Publication date Jun 6, 2024
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS
- Publication number 20240184195
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh TIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240176224
- Publication date May 30, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING...
- Publication number 20240152045
- Publication date May 9, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Kazuaki MATSUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY MASK
- Publication number 20240134268
- Publication date Apr 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY
- Publication number 20240094623
- Publication date Mar 21, 2024
- META PLATFORMS, INC.
- Cheng Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240069431
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Che HSIEH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240061324
- Publication date Feb 22, 2024
- SK enpulse Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20240053672
- Publication date Feb 15, 2024
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHO...
- Publication number 20240045319
- Publication date Feb 8, 2024
- AGC Inc.
- Daijiro AKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240036458
- Publication date Feb 1, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
- Publication number 20240036457
- Publication date Feb 1, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MAKING A HARD DISK DRIVE WRITE POLE USING A TRI-TONE ATTE...
- Publication number 20240027892
- Publication date Jan 25, 2024
- Western Digital Technologies, Inc.
- Xianzhong Zeng
- G11 - INFORMATION STORAGE
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230418150
- Publication date Dec 28, 2023
- SK enpulse Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20230393457
- Publication date Dec 7, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230367200
- Publication date Nov 16, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20230350285
- Publication date Nov 2, 2023
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20230324785
- Publication date Oct 12, 2023
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20230314929
- Publication date Oct 5, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20230259015
- Publication date Aug 17, 2023
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20230194973
- Publication date Jun 22, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLA...
- Publication number 20230185185
- Publication date Jun 15, 2023
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Attenuating PSM [att-PSM]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask blank, method for manufacturing transfer mask, and method for...

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, reflective mask, method of manufacturing ref...

Phase-shift reticle for use in photolithography

Photomask blank, method for producing photomask, and photomask

Reflective mask blank for EUV lithography, reflective mask for EUV...

Phase shift blankmask and photomask for EUV lithography

Reflective mask blank, reflective mask, method of manufacturing ref...

Mask plate, display panel and display device

Method of manufacturing phase shift photo masks

Lithography mask

Reflective mask blank for EUV lithography, mask blank for EUV litho...

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, reflective mask, method of manufacturing ref...

Method of making semiconductor device and semiconductor device

Mask blank, phase shift mask, and method of manufacturing semicondu...

Method of accelerated hazing of mask assembly

Halftone phase shift-type photomask blank, method of manufacturing...

Phase shift mask blank, manufacturing method thereof, and phase shi...

Mask blank, method for manufacturing phase shift mask, and method f...

Photopolymerizable resin composition, display device using same, an...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask and manufacturing method the...

Semiconductor device

Mask blank, method for manufacturing transfer mask, and method for...

Array substrate and manufacturing method thereof

Phase shift mask blank, method for producing phase shift mask, and...

Mask blank, phase shift mask, and method for manufacturing semicond...

Photomask blank, manufacturing method of photomask and photomask

Phase shift mask and electronic component manufacturing method

Patents Applicationslast 30 patents

MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

MASK BLANK AND PHASE SHIFT MASK

BLANK MASK AND PHOTOMASK USING THE SAME

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...

APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING...

LITHOGRAPHY MASK

ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY

METHOD OF MANUFACTURING PHOTO MASKS

BLANK MASK AND PHOTOMASK USING THE SAME

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHO...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...

METHOD OF MAKING A HARD DISK DRIVE WRITE POLE USING A TRI-TONE ATTE...

BLANK MASK AND PHOTOMASK USING THE SAME

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

BLANK MASK AND PHOTOMASK USING THE SAME

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLA...