Auxiliary patterns; Corrected patterns

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CPC
G03F1/144

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/144Auxiliary patterns; Corrected patterns

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Stretchable layout design for EUV defect mitigation
- Patent number 10,877,370
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsing-Lin Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask pattern correction system, and semiconductor device manufactur...
- Patent number 10,852,648
- Issue date Dec 1, 2020
- TOSHIBA MEMORY CORPORATION
- Kazuyuki Hino
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 10,839,131
- Issue date Nov 17, 2020
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask, related display device, and related exposure method for manuf...
- Patent number 10,809,627
- Issue date Oct 20, 2020
- Samsung Display Co., Ltd.
- Inwoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming layout definition of semiconductor device
- Patent number 10,795,255
- Issue date Oct 6, 2020
- United Microelectronics Corp.
- Wei-Lun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanisms for forming patterns using multiple lithography processes
- Patent number 10,770,303
- Issue date Sep 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and masks for line end formation for back end of line (BEOL...
- Patent number 10,770,291
- Issue date Sep 8, 2020
- Intel Corporation
- Richard E. Schenker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-based optical proximity correction
- Patent number 10,691,869
- Issue date Jun 23, 2020
- Mentor Graphics Corporation
- Ahmed Abouelseoud
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction (OPC) method and method of manufacturi...
- Patent number 10,684,544
- Issue date Jun 16, 2020
- Samsung Electronics Co., Ltd.
- Da-woon Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,634,990
- Issue date Apr 28, 2020
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preventing corner violations in fill region of layout using exclusi...
- Patent number 10,628,551
- Issue date Apr 21, 2020
- GLOBALFOUNDRIES Inc.
- Gazi M. Huda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple-mask multiple-exposure lithography and masks
- Patent number 10,620,530
- Issue date Apr 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 10,592,633
- Issue date Mar 17, 2020
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Shifting of patterns to reduce line waviness
- Patent number 10,591,815
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay-correction method and a control system using the same
- Patent number 10,566,252
- Issue date Feb 18, 2020
- Samsung Electronics Co., Ltd.
- Seungyoon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Statistical overlay error prediction for feed forward and feedback...
- Patent number 10,545,412
- Issue date Jan 28, 2020
- KLA-Tencor Corporation
- Wei Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for determining an OPC model
- Patent number 10,539,865
- Issue date Jan 21, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Layout optimization of a main pattern and a cut pattern
- Patent number 10,528,693
- Issue date Jan 7, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical mask validation
- Patent number 10,429,743
- Issue date Oct 1, 2019
- International Business Machines Corporation
- Daniel Corliss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,394,118
- Issue date Aug 27, 2019
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based generation of dummy features
- Patent number 10,345,694
- Issue date Jul 9, 2019
- BLOBALFOUNDRIES INC.
- Ayman Hamouda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sub-resolution assist features in semiconductor pattern writing
- Patent number 10,317,790
- Issue date Jun 11, 2019
- D2S, Inc.
- Leo Pang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for lithography process-window-maximizing optical...
- Patent number 10,310,371
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for manufacturing an array substrate, array substrate and di...
- Patent number 10,304,876
- Issue date May 28, 2019
- BOE Technology Group Co., Ltd.
- Yiping Dong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanisms for forming patterns using multiple lithography processes
- Patent number 10,276,363
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Categorized stitching guidance for triple-patterning technology
- Patent number 10,261,412
- Issue date Apr 16, 2019
- Synopsys, Inc.
- Soo Han Choi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanner based optical proximity correction system and method of use
- Patent number 10,234,756
- Issue date Mar 19, 2019
- Nikon Corporation
- Jacek Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 10,198,549
- Issue date Feb 5, 2019
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and system for model-based generic matching and tuning
- Patent number 10,169,522
- Issue date Jan 1, 2019
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Distributed LC resonant tanks clock tree synthesis
- Patent number 10,073,937
- Issue date Sep 11, 2018
- The Regents of the University of California
- Matthew Guthaus
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD USING A MULTI-OPC MODEL A...
- Publication number 20210116800
- Publication date Apr 22, 2021
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PERFORMING OPTICAL PROXIMITY CORRECTION AND METHOD OF MAN...
- Publication number 20210072636
- Publication date Mar 11, 2021
- Samsung Electronics Co., Ltd.
- Sanghun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS
- Publication number 20200387660
- Publication date Dec 10, 2020
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY MODEL CALIBRATION
- Publication number 20200278604
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Hsiang LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK WITH ELECTROSTATIC DISCHARGE PROTECTION
- Publication number 20200233298
- Publication date Jul 23, 2020
- Yangtze Memory Technologies Co., Ltd.
- Peng Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
- Publication number 20200218850
- Publication date Jul 9, 2020
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Optimization of a Main Pattern and a Cut Pattern
- Publication number 20200125784
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK PATTERN CORRECTION SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTUR...
- Publication number 20200117104
- Publication date Apr 16, 2020
- Toshiba Memory Corporation
- Kazuyuki HINO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHOD FOR FORMING THE SAME
- Publication number 20200089098
- Publication date Mar 19, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- HSUAN-WEN WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple-Mask Multiple-Exposure Lithography and Masks
- Publication number 20200050102
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHIFTING OF PATTERNS TO REDUCE LINE WAVINESS
- Publication number 20200004132
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...
- Publication number 20190369480
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Steven George HANSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE FOR OPTICAL VALIDATION
- Publication number 20190346773
- Publication date Nov 14, 2019
- International Business Machines Corporation
- Daniel Corliss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PREVENTING CORNER VIOLATIONS IN FILL REGION OF LAYOUT USING EXCLUSI...
- Publication number 20190340326
- Publication date Nov 7, 2019
- GLOBALFOUNDRIES INC.
- Gazi M. Huda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20190332006
- Publication date Oct 31, 2019
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern-Based Optical Proximity Correction
- Publication number 20190266311
- Publication date Aug 29, 2019
- Mentor Graphics Corporation
- Ahmed Abouelseoud
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MECHANISMS FOR FORMING PATTERNS USING MULTIPLE LITHOGRAPHY PROCESSES
- Publication number 20190259600
- Publication date Aug 22, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, RELATED DISPLAY DEVICE, AND RELATED EXPOSURE METHOD FOR MANUF...
- Publication number 20190219928
- Publication date Jul 18, 2019
- SAMSUNG DISPLAY CO., LTD.
- Inwoo KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20190187551
- Publication date Jun 20, 2019
- HOYA CORPORATION
- Hiroyuki IWASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURI...
- Publication number 20190187552
- Publication date Jun 20, 2019
- Samsung Electronics Co., Ltd.
- Da-woon CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY PLATE AND MASK CORRECTION METHOD
- Publication number 20190179226
- Publication date Jun 13, 2019
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL (Shangha i) CORPORATION
- Jiancheng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL MASK VALIDATION
- Publication number 20190163071
- Publication date May 30, 2019
- International Business Machines Corporation
- Daniel Corliss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20190163866
- Publication date May 30, 2019
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE
- Publication number 20190163050
- Publication date May 30, 2019
- Nikon Corporation
- Jacek TYMINSKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOLITHOGRAPHY PROCESS AND PHOTOLITHOGRAPHY APPARATUS
- Publication number 20190064655
- Publication date Feb 28, 2019
- Semiconductor Manufacturing International (Shanghai) Corporation
- Yao Jun DU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple-Mask Multiple-Exposure Lithography and Masks
- Publication number 20190033706
- Publication date Jan 31, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRETCHABLE LAYOUT DESIGN FOR EUV DEFECT MITIGATION
- Publication number 20190033707
- Publication date Jan 31, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Hsing-Lin YANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY-CORRECTION METHOD AND A CONTROL SYSTEM USING THE SAME
- Publication number 20180330999
- Publication date Nov 15, 2018
- Samsung Electronics Co., Ltd.
- Seungyoon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20180321582
- Publication date Nov 8, 2018
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRATING BASED PLUGS AND CUTS FOR FEATURE END FORMATION FOR BACK END...
- Publication number 20180315590
- Publication date Nov 1, 2018
- Intel Corporation
- Richard E. SCHENKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Auxiliary patterns; Corrected patterns

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stretchable layout design for EUV defect mitigation

Mask pattern correction system, and semiconductor device manufactur...

Three-dimensional mask model for photolithography simulation

Mask, related display device, and related exposure method for manuf...

Method of forming layout definition of semiconductor device

Mechanisms for forming patterns using multiple lithography processes

Methods and masks for line end formation for back end of line (BEOL...

Pattern-based optical proximity correction

Optical proximity correction (OPC) method and method of manufacturi...

Photomask and methods for manufacturing and correcting photomask

Preventing corner violations in fill region of layout using exclusi...

Multiple-mask multiple-exposure lithography and masks

Fast freeform source and mask co-optimization method

Shifting of patterns to reduce line waviness

Overlay-correction method and a control system using the same

Statistical overlay error prediction for feed forward and feedback...

Method and device for determining an OPC model

Layout optimization of a main pattern and a cut pattern

Optical mask validation

Photomask and methods for manufacturing and correcting photomask

Model-based generation of dummy features

Sub-resolution assist features in semiconductor pattern writing

Method and system for lithography process-window-maximizing optical...

Method for manufacturing an array substrate, array substrate and di...

Mechanisms for forming patterns using multiple lithography processes

Categorized stitching guidance for triple-patterning technology

Scanner based optical proximity correction system and method of use

Three-dimensional mask model for photolithography simulation

Methods and system for model-based generic matching and tuning

Distributed LC resonant tanks clock tree synthesis

Patents Applicationslast 30 patents

OPTICAL PROXIMITY CORRECTION (OPC) METHOD USING A MULTI-OPC MODEL A...

METHOD OF PERFORMING OPTICAL PROXIMITY CORRECTION AND METHOD OF MAN...

MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS

LITHOGRAPHY MODEL CALIBRATION

PHOTOMASK WITH ELECTROSTATIC DISCHARGE PROTECTION

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

Layout Optimization of a Main Pattern and a Cut Pattern

MASK PATTERN CORRECTION SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTUR...

PHOTOMASK AND METHOD FOR FORMING THE SAME

Multiple-Mask Multiple-Exposure Lithography and Masks

SHIFTING OF PATTERNS TO REDUCE LINE WAVINESS

OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...

SEMICONDUCTOR STRUCTURE FOR OPTICAL VALIDATION

PREVENTING CORNER VIOLATIONS IN FILL REGION OF LAYOUT USING EXCLUSI...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

Pattern-Based Optical Proximity Correction

MECHANISMS FOR FORMING PATTERNS USING MULTIPLE LITHOGRAPHY PROCESSES

MASK, RELATED DISPLAY DEVICE, AND RELATED EXPOSURE METHOD FOR MANUF...

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURI...

PHOTOLITHOGRAPHY PLATE AND MASK CORRECTION METHOD

OPTICAL MASK VALIDATION

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE

PHOTOLITHOGRAPHY PROCESS AND PHOTOLITHOGRAPHY APPARATUS

Multiple-Mask Multiple-Exposure Lithography and Masks

STRETCHABLE LAYOUT DESIGN FOR EUV DEFECT MITIGATION

OVERLAY-CORRECTION METHOD AND A CONTROL SYSTEM USING THE SAME

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

GRATING BASED PLUGS AND CUTS FOR FEATURE END FORMATION FOR BACK END...