Auxiliary patterns or specific arrangements of the phase-shifting elements to avoid phase-conflicts

Industry

CPC
G03F1/0069

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/0069Auxiliary patterns or specific arrangements of the phase-shifting elements to avoid phase-conflicts

Industries

Patents Grantslast 30 patents

Information Patent Grant
Mask blank and phase shift mask using same
- Patent number 10,444,619
- Issue date Oct 15, 2019
- Samsung Electronics Co., Ltd.
- Hye Kyoung Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 9,418,195
- Issue date Aug 16, 2016
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Mask layout formation
- Patent number 8,875,063
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 8,843,859
- Issue date Sep 23, 2014
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Generation method, storage medium, and information processing appar...
- Patent number 8,756,536
- Issue date Jun 17, 2014
- Canon Kabushiki Kaisha
- Tadashi Arai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for directed self-assembly process/proximity correction
- Patent number 8,667,428
- Issue date Mar 4, 2014
- GLOBALFOUNDRIES, INC.
- Azat Latypov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for creating a photolithography mask
- Patent number 8,656,320
- Issue date Feb 18, 2014
- STMicroelectronics (Crolles 2) SAS
- Christian Gardin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining manufacturability of lithographic mask based on manufac...
- Patent number 8,539,390
- Issue date Sep 17, 2013
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK AND PHASE SHIFT MASK USING SAME
- Publication number 20180033612
- Publication date Feb 1, 2018
- Samsung Electronics Co., Ltd.
- Hye Kyoung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CREATING A PHOTOLITHOGRAPHY MASK
- Publication number 20140019920
- Publication date Jan 16, 2014
- Christian GARDIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GENERATION METHOD, STORAGE MEDIUM, AND INFORMATION PROCESSING APPAR...
- Publication number 20130246982
- Publication date Sep 19, 2013
- Canon Kabushiki Kaisha
- Tadashi Arai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20130036390
- Publication date Feb 7, 2013
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Application
Determining manufacturability of lithographic mask based on manufac...
- Publication number 20120196210
- Publication date Aug 2, 2012
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK LAYOUT FORMATION
- Publication number 20120089953
- Publication date Apr 12, 2012
- INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20110047519
- Publication date Feb 24, 2011
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING

Auxiliary patterns or specific arrangements of the phase-shifting elements to avoid phase-conflicts

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask blank and phase shift mask using same

Layout content analysis for source mask optimization acceleration

Mask layout formation

Layout content analysis for source mask optimization acceleration

Generation method, storage medium, and information processing appar...

Methods for directed self-assembly process/proximity correction

Method for creating a photolithography mask

Determining manufacturability of lithographic mask based on manufac...

Patents Applicationslast 30 patents

MASK BLANK AND PHASE SHIFT MASK USING SAME

METHOD FOR CREATING A PHOTOLITHOGRAPHY MASK

GENERATION METHOD, STORAGE MEDIUM, AND INFORMATION PROCESSING APPAR...

Layout Content Analysis for Source Mask Optimization Acceleration

Determining manufacturability of lithographic mask based on manufac...

MASK LAYOUT FORMATION

Layout Content Analysis for Source Mask Optimization Acceleration