Auxiliary processes relating to originals

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G03F1/0092

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/0092Auxiliary processes relating to originals

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and device for the simulation of a photolithographic process...
- Patent number 10,733,337
- Issue date Aug 4, 2020
- Carl Zeiss SMT GmbH
- Hans Michael Solowan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for characterizing a mask for microlithography
- Patent number 10,698,318
- Issue date Jun 30, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,634,990
- Issue date Apr 28, 2020
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a focus position of a lithography mask and m...
- Patent number 10,564,551
- Issue date Feb 18, 2020
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,394,118
- Issue date Aug 27, 2019
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,048,580
- Issue date Aug 14, 2018
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for cleaning organic materials
- Patent number 9,733,561
- Issue date Aug 15, 2017
- Samsung Display Co., Ltd.
- Tae-Jong Kim
- B08 - CLEANING
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 9,519,211
- Issue date Dec 13, 2016
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 9,418,195
- Issue date Aug 16, 2016
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Particle control near reticle and optics using showerhead
- Patent number 9,244,368
- Issue date Jan 26, 2016
- KLA-Tencor Corporation
- Gildardo R. Delgado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and method of manufacturing a reflective mask
- Patent number 9,229,315
- Issue date Jan 5, 2016
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Phase grating for mask inspection system
- Patent number 9,151,881
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Microscope and microscopy method for space-resolved measurement of...
- Patent number 9,134,626
- Issue date Sep 15, 2015
- Carl Zeiss SMS GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Method and apparatus for measuring line end shortening, substrate a...
- Patent number 8,982,329
- Issue date Mar 17, 2015
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 8,974,987
- Issue date Mar 10, 2015
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout content analysis for source mask optimization acceleration
- Patent number 8,843,859
- Issue date Sep 23, 2014
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Grant
Generation method, storage medium, and information processing appar...
- Patent number 8,756,536
- Issue date Jun 17, 2014
- Canon Kabushiki Kaisha
- Tadashi Arai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Slit width adjusting device and microscope laser processing apparatus
- Patent number 8,680,428
- Issue date Mar 25, 2014
- Mitutoyo Corporation
- Hidemitsu Asano
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods for directed self-assembly process/proximity correction
- Patent number 8,667,428
- Issue date Mar 4, 2014
- GLOBALFOUNDRIES, INC.
- Azat Latypov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for creating a photolithography mask
- Patent number 8,656,320
- Issue date Feb 18, 2014
- STMicroelectronics (Crolles 2) SAS
- Christian Gardin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for enhanced optical proximity correction
- Patent number 8,589,830
- Issue date Nov 19, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Cheng Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Test method for determining reticle transmission stability
- Patent number 8,582,078
- Issue date Nov 12, 2013
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Grant
Reflective mask blank and method of manufacturing a reflective mask
- Patent number 8,546,047
- Issue date Oct 1, 2013
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System for measuring a shape, method for measuring a shape, and com...
- Patent number 8,543,352
- Issue date Sep 24, 2013
- Dai Nippon Printing Co., Ltd.
- Yuki Aritsuka
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Scanning electron microscope system and method for measuring dimens...
- Patent number 8,481,936
- Issue date Jul 9, 2013
- Hitachi High-Technologies Corporation
- Chie Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of correcting optical parameters in photomasks
- Patent number 8,435,705
- Issue date May 7, 2013
- Samsung Electronics Co., Ltd.
- Haek-seung Han
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern measuring apparatus and pattern measuring method
- Patent number 8,431,895
- Issue date Apr 30, 2013
- Advantest Corp.
- Jun Matsumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern verification-test method, optical image intensity distribut...
- Patent number 8,407,629
- Issue date Mar 26, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for minimizing sample damage during the ablation of a first...
- Patent number 8,389,890
- Issue date Mar 5, 2013
- International Business Machines Corporation
- Richard Alan Haight
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Mask defect measurement method, mask quality determination and meth...
- Patent number 8,384,888
- Issue date Feb 26, 2013
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
RETICLE AND METHOD OF DETECTING INTACTNESS OF RETICLE STAGE USING T...
- Publication number 20200292932
- Publication date Sep 17, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Yu LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20190332006
- Publication date Oct 31, 2019
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REAL-TIME CORRECTION OF TEMPLATE DEFORMATION IN NANOIMPRINT LITHOGR...
- Publication number 20190033708
- Publication date Jan 31, 2019
- Canon Kabushiki Kaisha
- Anshuman Cherala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...
- Publication number 20190011827
- Publication date Jan 10, 2019
- FUJIFILM CORPORATION
- Tetsuya SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20180321582
- Publication date Nov 8, 2018
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element for the EUV Wavelength Range, Method for...
- Publication number 20140307308
- Publication date Oct 16, 2014
- Carl Zeiss SMT GMBH
- Markus WEISS
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A CRITICAL DIMENSION VARIATION...
- Publication number 20140236516
- Publication date Aug 21, 2014
- CARL ZEISS SMS LTD.
- Rainer Pforr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Phase Grating For Mask Inspection System
- Publication number 20140131586
- Publication date May 15, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G02 - OPTICS
Information Patent Application
PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD
- Publication number 20140085618
- Publication date Mar 27, 2014
- Gildardo R. Delgado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method And Apparatus For Surface Cleaning
- Publication number 20140053868
- Publication date Feb 27, 2014
- SEMATECH, INC.
- Abbas Rastegar
- B08 - CLEANING
Information Patent Application
METHOD FOR CREATING A PHOTOLITHOGRAPHY MASK
- Publication number 20140019920
- Publication date Jan 16, 2014
- Christian GARDIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK
- Publication number 20140011122
- Publication date Jan 9, 2014
- HOYA CORPORATION
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
GENERATION METHOD, STORAGE MEDIUM, AND INFORMATION PROCESSING APPAR...
- Publication number 20130246982
- Publication date Sep 19, 2013
- Canon Kabushiki Kaisha
- Tadashi Arai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR ENHANCED OPTICAL PROXIMITY CORRECTION
- Publication number 20130239071
- Publication date Sep 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Cheng Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus for Minimizing Sample Damage During the Ablation of Biolo...
- Publication number 20130211388
- Publication date Aug 15, 2013
- International Business Machines Corporation
- Richard Alan Haight
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method And Device for The Depollution Of A Pelliculated Reticle
- Publication number 20130152977
- Publication date Jun 20, 2013
- ADIXEN VACUUM PRODUCTS
- Arnaud Favre
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION
- Publication number 20130119251
- Publication date May 16, 2013
- Kabushiki Kaisha Toshiba
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20130036390
- Publication date Feb 7, 2013
- Mentor Graphics Corporation
- Juan Andres Torres Robles
- G01 - MEASURING TESTING
Information Patent Application
PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUT...
- Publication number 20120250011
- Publication date Oct 4, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING ELECTRON MICROSCOPE SYSTEM AND METHOD FOR MEASURING DIMENS...
- Publication number 20120112067
- Publication date May 10, 2012
- Chie Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20110294045
- Publication date Dec 1, 2011
- DAI NIPPON PRINTING CO., LTD.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Correcting Optical Parameters in Photomasks
- Publication number 20110244374
- Publication date Oct 6, 2011
- SAMSUNG ELECTRONICS CO., LTD.
- Haek-seung Han
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK
- Publication number 20110217633
- Publication date Sep 8, 2011
- HOYA CORPORATION
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY
- Publication number 20110205509
- Publication date Aug 25, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20110200920
- Publication date Aug 18, 2011
- ASAHI GLASS COMPANY, LIMITED
- Kazuyuki HAYASHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION I...
- Publication number 20110158543
- Publication date Jun 30, 2011
- Hitachi High-Technologies Corporation
- Hidetoshi Morokuma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and Apparatus for Measuring Line End Shortening, Substrate a...
- Publication number 20110109888
- Publication date May 12, 2011
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Application
Pattern measuring apparatus and pattern measuring method
- Publication number 20110049362
- Publication date Mar 3, 2011
- Jun Matsumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Layout Content Analysis for Source Mask Optimization Acceleration
- Publication number 20110047519
- Publication date Feb 24, 2011
- Juan Andres Torres Robles
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK DEFECT MEASUREMENT METHOD, MASK QUALITY DETERMINATION METHOD,...
- Publication number 20110043811
- Publication date Feb 24, 2011
- Takeshi Yamane
- G01 - MEASURING TESTING

Auxiliary processes relating to originals

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and device for the simulation of a photolithographic process...

Method and device for characterizing a mask for microlithography

Photomask and methods for manufacturing and correcting photomask

Method for determining a focus position of a lithography mask and m...

Photomask and methods for manufacturing and correcting photomask

Photomask and methods for manufacturing and correcting photomask

Method and apparatus for cleaning organic materials

Photomask and methods for manufacturing and correcting photomask

Layout content analysis for source mask optimization acceleration

Particle control near reticle and optics using showerhead

Reflective mask blank and method of manufacturing a reflective mask

Phase grating for mask inspection system

Microscope and microscopy method for space-resolved measurement of...

Method and apparatus for measuring line end shortening, substrate a...

Photomask and methods for manufacturing and correcting photomask

Layout content analysis for source mask optimization acceleration

Generation method, storage medium, and information processing appar...

Slit width adjusting device and microscope laser processing apparatus

Methods for directed self-assembly process/proximity correction

Method for creating a photolithography mask

Method and apparatus for enhanced optical proximity correction

Test method for determining reticle transmission stability

Reflective mask blank and method of manufacturing a reflective mask

System for measuring a shape, method for measuring a shape, and com...

Scanning electron microscope system and method for measuring dimens...

Methods of correcting optical parameters in photomasks

Pattern measuring apparatus and pattern measuring method

Pattern verification-test method, optical image intensity distribut...

Method for minimizing sample damage during the ablation of a first...

Mask defect measurement method, mask quality determination and meth...

Patents Applicationslast 30 patents

RETICLE AND METHOD OF DETECTING INTACTNESS OF RETICLE STAGE USING T...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

REAL-TIME CORRECTION OF TEMPLATE DEFORMATION IN NANOIMPRINT LITHOGR...

METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

Reflective Optical Element for the EUV Wavelength Range, Method for...

METHOD AND APPARATUS FOR DETERMINING A CRITICAL DIMENSION VARIATION...

Phase Grating For Mask Inspection System

PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD

Method And Apparatus For Surface Cleaning

METHOD FOR CREATING A PHOTOLITHOGRAPHY MASK

REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

GENERATION METHOD, STORAGE MEDIUM, AND INFORMATION PROCESSING APPAR...

METHOD AND APPARATUS FOR ENHANCED OPTICAL PROXIMITY CORRECTION

Apparatus for Minimizing Sample Damage During the Ablation of Biolo...

Method And Device for The Depollution Of A Pelliculated Reticle

METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION

Layout Content Analysis for Source Mask Optimization Acceleration

PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUT...

SCANNING ELECTRON MICROSCOPE SYSTEM AND METHOD FOR MEASURING DIMENS...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

Methods of Correcting Optical Parameters in Photomasks

REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION I...

Method and Apparatus for Measuring Line End Shortening, Substrate a...

Pattern measuring apparatus and pattern measuring method

Layout Content Analysis for Source Mask Optimization Acceleration

MASK DEFECT MEASUREMENT METHOD, MASK QUALITY DETERMINATION METHOD,...