Auxiliary processes

Industry

CPC
G03F1/82

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/82Auxiliary processes

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photolithography method
- Patent number 12,181,794
- Issue date Dec 31, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating and servicing a photomask
- Patent number 12,169,357
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Fu Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatuses for disposing of excess material of a photol...
- Patent number 12,164,226
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- B08 - CLEANING
Information Patent Grant
Pellicle frame, pellicle, and method for peeling pellicle
- Patent number 12,164,222
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame, pellicle, and method for peeling pellicle
- Patent number 12,158,696
- Issue date Dec 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method, method for forming semiconductor structure and sys...
- Patent number 12,153,341
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wu-Hung Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Network type pellicle membrane and method for forming the same
- Patent number 12,153,339
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate treatment device
- Patent number 12,138,671
- Issue date Nov 12, 2024
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus
- Patent number 12,117,736
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transition cells for advanced technology processes
- Patent number 12,106,031
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Hsu Chuang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for cleaning an EUV mask
- Patent number 12,099,310
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Hui Li
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photomask cleaning tool
- Patent number 12,085,848
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pin Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removing assembly and method of cleaning mask for lithography
- Patent number 12,085,866
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Baking chamber with shroud for mask clean
- Patent number 12,085,849
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Banqiu Wu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Cleaning system, exposure machine, and cleaning method
- Patent number 12,072,640
- Issue date Aug 27, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Lulu Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame, pellicle, and method for peeling pellicle
- Patent number 12,050,400
- Issue date Jul 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 12,038,684
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame, pellicle, and method for peeling pellicle
- Patent number 12,038,686
- Issue date Jul 16, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle cleaning apparatus and pellicle cleaning method using the...
- Patent number 12,032,281
- Issue date Jul 9, 2024
- Samsung Electronics Co., Ltd.
- Byunghoon Lee
- B08 - CLEANING
Information Patent Grant
Cleaning system, exposure machine, and cleaning method
- Patent number 12,032,304
- Issue date Jul 9, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Lulu Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Removal of contaminants from EUV masks
- Patent number 12,019,368
- Issue date Jun 25, 2024
- DUPONT ELECTRONICS, INC.
- Pen-Nan Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask cleaning
- Patent number 12,013,633
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Jerry Cullins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle having vent hole
- Patent number 12,013,632
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High throughput and high position accurate method for particle insp...
- Patent number 12,013,646
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Jui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component for use in a lithographic apparatus, method of protecting...
- Patent number 12,001,149
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Debris removal from high aspect structures
- Patent number 11,964,310
- Issue date Apr 23, 2024
- Bruker Nano, Inc.
- Tod Evan Robinson
- B08 - CLEANING
Information Patent Grant
Pellicle removal tool
- Patent number 11,948,824
- Issue date Apr 2, 2024
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single-volume baking chamber for mask clean
- Patent number 11,921,422
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for removing a particle from a photolithograph...
- Patent number 11,899,359
- Issue date Feb 13, 2024
- Carl Zeiss SMT GmbH
- Christof Baur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatuses for disposing of excess material of a photol...
- Patent number 11,874,598
- Issue date Jan 16, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REMOVING METHOD, REMOVAL APPARATUS, IMPRINT APPARATUS, REPLICA MANU...
- Publication number 20240393678
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- Keiko ABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR CLEANING PELLICLE FRAME AND MEMBRANE
- Publication number 20240393679
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kun-Lung Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK CLEANING TOOL
- Publication number 20240393680
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pin Cheng CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...
- Publication number 20240385512
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- WU-HUNG KO
- B08 - CLEANING
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK
- Publication number 20240377766
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Hui LI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TRANSITION CELLS FOR ADVANCED TECHNOLOGY PROCESSES
- Publication number 20240370634
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Hsu CHUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL APPARATUS AND METHOD OF PREVENTING CONTAMINATION OF OPTICAL...
- Publication number 20240361590
- Publication date Oct 31, 2024
- Lasertec Corporation
- Ko GONDAIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND METHOD OF FABRICATING THE SAME
- Publication number 20240345467
- Publication date Oct 17, 2024
- SK enpulse Co., Ltd.
- Tae Wan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20240329517
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...
- Publication number 20240321580
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Dong Jin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20240295826
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES
- Publication number 20240269717
- Publication date Aug 15, 2024
- Bruker Nano, Inc.
- Tod Evan Robinson
- B08 - CLEANING
Information Patent Application
PHOTOLITHOGRAPHY METHOD
- Publication number 20240264523
- Publication date Aug 8, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...
- Publication number 20240248389
- Publication date Jul 25, 2024
- SK enpulse Co., Ltd.
- Tae Wan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE REMOVAL TOOL
- Publication number 20240242996
- Publication date Jul 18, 2024
- PHOTRONICS, INC.
- Hilario Ar-Miguel Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask handling assembly for atmospheric pressure plasma chamber
- Publication number 20240201580
- Publication date Jun 20, 2024
- Nolan Layne ZIMMERMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF
- Publication number 20240192600
- Publication date Jun 13, 2024
- Darwin Precisions Corporation
- Cheng-Wei Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle Frame, Pellicle, Photomask with Pellicle, Exposure Method,...
- Publication number 20240184205
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Akinori Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY PATTERNING METHOD
- Publication number 20240176245
- Publication date May 30, 2024
- Korea Advanced Institute of Science and Technology
- Jungchul SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE CLEANING APPARATUS
- Publication number 20240142871
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20240118607
- Publication date Apr 11, 2024
- SEMES CO.,LTD
- Hyun YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR PHOTOMASK CLEANING AND FLIPPING
- Publication number 20240118608
- Publication date Apr 11, 2024
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR
- Publication number 20240085781
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR REMOVING A PARTICLE FROM A PHOTOLITHOGRAPH...
- Publication number 20240077800
- Publication date Mar 7, 2024
- Carl Zeiss SMT GMBH
- Christof Baur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPONENT FOR USE IN A LITHOGRAPHIC APPARATUS, METHOD OF PROTECTING...
- Publication number 20240027925
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PHOTOMASK PROCESSING
- Publication number 20240027894
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Banqiu WU
- B08 - CLEANING
Information Patent Application
TRAINING METHOD AND APPARATUS FOR LITHOGRAPHIC MASK GENERATION MODE...
- Publication number 20240019777
- Publication date Jan 18, 2024
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Xingyu MA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE
- Publication number 20240012323
- Publication date Jan 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE
- Publication number 20240004287
- Publication date Jan 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Auxiliary processes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photolithography method

Method of fabricating and servicing a photomask

Method and apparatuses for disposing of excess material of a photol...

Pellicle frame, pellicle, and method for peeling pellicle

Pellicle frame, pellicle, and method for peeling pellicle

Cleaning method, method for forming semiconductor structure and sys...

Network type pellicle membrane and method for forming the same

Substrate treatment device

Lithographic apparatus

Transition cells for advanced technology processes

System and method for cleaning an EUV mask

Photomask cleaning tool

Particle removing assembly and method of cleaning mask for lithography

Baking chamber with shroud for mask clean

Cleaning system, exposure machine, and cleaning method

Pellicle frame, pellicle, and method for peeling pellicle

Reflective mask and fabricating method thereof

Pellicle frame, pellicle, and method for peeling pellicle

Pellicle cleaning apparatus and pellicle cleaning method using the...

Cleaning system, exposure machine, and cleaning method

Removal of contaminants from EUV masks

Photomask cleaning

Pellicle having vent hole

High throughput and high position accurate method for particle insp...

Component for use in a lithographic apparatus, method of protecting...

Debris removal from high aspect structures

Pellicle removal tool

Single-volume baking chamber for mask clean

Method and apparatus for removing a particle from a photolithograph...

Method and apparatuses for disposing of excess material of a photol...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

REMOVING METHOD, REMOVAL APPARATUS, IMPRINT APPARATUS, REPLICA MANU...

DEVICE AND METHOD FOR CLEANING PELLICLE FRAME AND MEMBRANE

PHOTOMASK CLEANING TOOL

CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...

SYSTEM AND METHOD FOR CLEANING AN EUV MASK

TRANSITION CELLS FOR ADVANCED TECHNOLOGY PROCESSES

OPTICAL APPARATUS AND METHOD OF PREVENTING CONTAMINATION OF OPTICAL...

BLANK MASK AND METHOD OF FABRICATING THE SAME

PELLICLE HAVING VENT HOLE

PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES

PHOTOLITHOGRAPHY METHOD

APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...

PELLICLE REMOVAL TOOL

Photomask handling assembly for atmospheric pressure plasma chamber

MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF

Pellicle Frame, Pellicle, Photomask with Pellicle, Exposure Method,...

PHOTOLITHOGRAPHY PATTERNING METHOD

MEMBRANE CLEANING APPARATUS

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

DEVICE AND METHOD FOR PHOTOMASK CLEANING AND FLIPPING

CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR

METHOD AND APPARATUS FOR REMOVING A PARTICLE FROM A PHOTOLITHOGRAPH...

COMPONENT FOR USE IN A LITHOGRAPHIC APPARATUS, METHOD OF PROTECTING...

METHODS AND APPARATUS FOR PHOTOMASK PROCESSING

TRAINING METHOD AND APPARATUS FOR LITHOGRAPHIC MASK GENERATION MODE...

PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE

PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE