Avoiding deleterious effects due to interactions between particles and tube elements

Industry

CPC
H01J2237/0213

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0213Avoiding deleterious effects due to interactions between particles and tube elements

Industries

Patents Grantslast 30 patents

Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,804,356
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source
- Patent number 11,735,391
- Issue date Aug 22, 2023
- IMS Nanofabrication GmbH
- Stefan Gerhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Sensor for electron detection
- Patent number 11,355,309
- Issue date Jun 7, 2022
- Applied Materials Israel Ltd.
- Itay Assulin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing device
- Patent number 11,295,934
- Issue date Apr 5, 2022
- Toto Ltd.
- Yasutaka Nitta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,289,304
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen generator for an ion implanter
- Patent number 11,276,543
- Issue date Mar 15, 2022
- Axcelis Technologies, Inc.
- Neil K Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for depositing metal films with plasma treatment
- Patent number 11,133,155
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Daping Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged-particle beam apparatus, charged-particle beam writing appa...
- Patent number 10,998,162
- Issue date May 4, 2021
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen generator for an ion implanter
- Patent number 10,847,339
- Issue date Nov 24, 2020
- Axcelis Technologies, Inc.
- Neil K Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low emission cladding and ion implanter
- Patent number 10,811,214
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- Julian G. Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,600,612
- Issue date Mar 24, 2020
- Hitachi High-Tech Science Corporation
- Toshiyuki Iwahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electrode Plate
- Patent number 10,580,621
- Issue date Mar 3, 2020
- THINKON NEW TECHNOLOGY JAPAN CORPORATION
- Atsushi Ikari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device, manufacturing method, and exposure apparatus
- Patent number 10,573,491
- Issue date Feb 25, 2020
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for depositing metal films with plasma treatment
- Patent number 10,453,657
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Daping Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source repeller shield comprising a labyrinth seal
- Patent number 10,361,069
- Issue date Jul 23, 2019
- Axcelis Technologies, Inc.
- Neil K. Colvin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron scanning microscope and image generation method
- Patent number 10,157,724
- Issue date Dec 18, 2018
- Hitachi High-Technologies Corporation
- Shinsuke Kawanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable mass resolving aperture
- Patent number 10,083,815
- Issue date Sep 25, 2018
- Glenn Lane Family Limited Liability Limited Partnership
- Glenn E. Lane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron scanning microscope and image generation method
- Patent number 9,875,877
- Issue date Jan 23, 2018
- Hitachi High-Technologies Corporation
- Shinsuke Kawanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Textured silicon liners in substrate processing systems
- Patent number 9,799,492
- Issue date Oct 24, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Specimen preparation device
- Patent number 9,773,638
- Issue date Sep 26, 2017
- Jeol Ltd.
- Yusuke Sakuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for producing an electron beam
- Patent number 9,773,635
- Issue date Sep 26, 2017
- LILAS GMBH
- Vitalij Lissotschenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced trace metals contamination ion source for an ion implantati...
- Patent number 9,543,110
- Issue date Jan 10, 2017
- Axcelis Technologies, Inc.
- Neil Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Textured silicon liners in substrate processing systems
- Patent number 9,437,397
- Issue date Sep 6, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable mass resolving aperture
- Patent number 9,401,260
- Issue date Jul 26, 2016
- Glenn Lane Family Limited Liability Limited Partnership
- Glenn E. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and filter member
- Patent number 9,373,480
- Issue date Jun 21, 2016
- Hitachi High-Technologies Corporation
- Shinsuke Kawanishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...
- Publication number 20240274410
- Publication date Aug 15, 2024
- Hansol IONES Co., Ltd.
- Dae Gun Kim
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20240186099
- Publication date Jun 6, 2024
- NHV CORPORATION
- Tomonori SHIRAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
- Publication number 20240120180
- Publication date Apr 11, 2024
- LAM RESEARCH CORPORATION
- Yuanping SONG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20220223366
- Publication date Jul 14, 2022
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SENSOR FOR ELECTRON DETECTION
- Publication number 20210319976
- Publication date Oct 14, 2021
- APPLIED MATERIALS ISRAEL LTD.
- Itay Assulin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN GENERATOR FOR AN ION IMPLANTER
- Publication number 20210090841
- Publication date Mar 25, 2021
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW EMISSION CLADDING AND ION IMPLANTER
- Publication number 20200234910
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Julian G. Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AN APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20200203114
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ELECTRODE PLATE
- Publication number 20190172682
- Publication date Jun 6, 2019
- THINKON NEW TECHNOLOGY JAPAN CORPORATION
- Atsushi Ikari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Mass Resolving Aperture
- Publication number 20190172679
- Publication date Jun 6, 2019
- Glenn Lane Family Limited Liability Limited Partnership
- Glenn E. LANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20190027343
- Publication date Jan 24, 2019
- TOTO LTD.
- Yasutaka Nitta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON SCANNING MICROSCOPE AND IMAGE GENERATION METHOD
- Publication number 20180122617
- Publication date May 3, 2018
- Hitachi High-Technologies Corporation
- Shinsuke KAWANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO DEPOSIT ALUMINUM OXY-FLUORIDE LAYER FOR FAST RECOVERY OF...
- Publication number 20180061617
- Publication date Mar 1, 2018
- Applied Materials, Inc.
- Jianqi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR DEPOSITING METAL FILMS WITH PLASMA TREATMENT
- Publication number 20180012732
- Publication date Jan 11, 2018
- DAPING YAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE REPELLER SHIELD
- Publication number 20170287579
- Publication date Oct 5, 2017
- Axcelis Technologies, Inc.
- Neil K. Colvin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Textured Silicon Liners In Substrate Processing Systems
- Publication number 20160343545
- Publication date Nov 24, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON SCANNING MICROSCOPE AND IMAGE GENERATION METHOD
- Publication number 20160343538
- Publication date Nov 24, 2016
- Hitachi High-Technologies Corporation
- Shinsuke KAWANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SOURCE WITH TEXTURED INTERIOR SURFACES
- Publication number 20150357151
- Publication date Dec 10, 2015
- Axcelis Technologies, Inc.
- Neil Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND MECHANISM FOR EROSION DETECTION OF DEFINING APERTURES
- Publication number 20150221472
- Publication date Aug 6, 2015
- Varian Semiconductor Equipment Associates, Inc.
- David Timberlake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROVIDING UNIFORM DISTRIBUTION OF PLASMA DENSITY IN A PL...
- Publication number 20150214013
- Publication date Jul 30, 2015
- Yuri Glukhoy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED TRACE METALS CONTAMINATION ION SOURCE FOR AN ION IMPLANTATI...
- Publication number 20150179393
- Publication date Jun 25, 2015
- Axcelis Technologies, Inc.
- Neil Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATION STRUCTURE AND INSULATION METHOD
- Publication number 20140353518
- Publication date Dec 4, 2014
- SEN Corporation
- Masateru Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE MASS RESOLVING APERTURE
- Publication number 20140261173
- Publication date Sep 18, 2014
- GLENN E. LANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20140197336
- Publication date Jul 17, 2014
- Hitachi High-Technologies Corporation
- Shun-ichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140065549
- Publication date Mar 6, 2014
- Canon Kabushiki Kaisha
- Takahiro Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHO...
- Publication number 20140065835
- Publication date Mar 6, 2014
- LAM RESEARCH CORPORATION
- Bobby Kadkhodayan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Avoiding deleterious effects due to interactions between particles and tube elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vacuum chamber arrangement for charged particle beam generator

Apparatus using multiple beams of charged particles

Charged-particle source

Vacuum chamber arrangement for charged particle beam generator

Sensor for electron detection

Aberration correction in charged particle system

Member for semiconductor manufacturing device

Apparatus using multiple beams of charged particles

Hydrogen generator for an ion implanter

Apparatus for depositing metal films with plasma treatment

Vacuum chamber arrangement for charged particle beam generator

Charged-particle beam apparatus, charged-particle beam writing appa...

Hydrogen generator for an ion implanter

Low emission cladding and ion implanter

Charged particle beam apparatus

Vacuum chamber arrangement for charged particle beam generator

Electrode Plate

Device, manufacturing method, and exposure apparatus

Apparatus for depositing metal films with plasma treatment

Ion source repeller shield comprising a labyrinth seal

Electron scanning microscope and image generation method

Adjustable mass resolving aperture

Electron scanning microscope and image generation method

Textured silicon liners in substrate processing systems

Specimen preparation device

Device for producing an electron beam

Reduced trace metals contamination ion source for an ion implantati...

Textured silicon liners in substrate processing systems

Adjustable mass resolving aperture

Charged particle beam device and filter member

Patents Applicationslast 30 patents

PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...

ELECTRON BEAM IRRADIATION DEVICE

POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

SENSOR FOR ELECTRON DETECTION

HYDROGEN GENERATOR FOR AN ION IMPLANTER

LOW EMISSION CLADDING AND ION IMPLANTER

AN APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

ELECTRODE PLATE

Adjustable Mass Resolving Aperture

MEMBER FOR SEMICONDUCTOR MANUFACTURING DEVICE

ELECTRON SCANNING MICROSCOPE AND IMAGE GENERATION METHOD

METHOD TO DEPOSIT ALUMINUM OXY-FLUORIDE LAYER FOR FAST RECOVERY OF...

APPARATUS FOR DEPOSITING METAL FILMS WITH PLASMA TREATMENT

ION SOURCE REPELLER SHIELD

Textured Silicon Liners In Substrate Processing Systems

ELECTRON SCANNING MICROSCOPE AND IMAGE GENERATION METHOD

ION IMPLANTATION SOURCE WITH TEXTURED INTERIOR SURFACES

METHOD AND MECHANISM FOR EROSION DETECTION OF DEFINING APERTURES

METHOD FOR PROVIDING UNIFORM DISTRIBUTION OF PLASMA DENSITY IN A PL...

REDUCED TRACE METALS CONTAMINATION ION SOURCE FOR AN ION IMPLANTATI...

INSULATION STRUCTURE AND INSULATION METHOD

ADJUSTABLE MASS RESOLVING APERTURE

ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHO...