Beam current

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CPC
H01J2237/24535

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24535Beam current

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for event modulated electron microscopy
- Patent number 11,848,173
- Issue date Dec 19, 2023
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Bryan Walter Reed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device and milling processing method using same
- Patent number 11,742,178
- Issue date Aug 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Hitoshi Kamoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of mixing upstream and downstream current measurements for i...
- Patent number 11,646,175
- Issue date May 9, 2023
- Axcelis Technologies, Inc.
- James DeLuca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for reduction of particle contamination by bia...
- Patent number 11,600,464
- Issue date Mar 7, 2023
- Advanced Ion Beam Technology, Inc.
- Shao-Yu Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam profiling system and related methods
- Patent number 11,598,890
- Issue date Mar 7, 2023
- Battelle Energy Alliance, LLC
- Chase N. Taylor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,508,552
- Issue date Nov 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Hitoshi Kamoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for determining and correcting for expected dose variati...
- Patent number 11,264,205
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Eric Donald Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and beam profiler
- Patent number 11,205,560
- Issue date Dec 21, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for determining, using, and indicating ion be...
- Patent number 11,004,656
- Issue date May 11, 2021
- Gatan, Inc.
- John Andrew Hunt
- G01 - MEASURING TESTING
Information Patent Grant
Ion implantation apparatus and measurement device
- Patent number 10,825,654
- Issue date Nov 3, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Noriyasu Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and measurement device
- Patent number 10,790,117
- Issue date Sep 29, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoshiaki Inda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection sensitivity calculation method and deflection sensitivit...
- Patent number 10,707,048
- Issue date Jul 7, 2020
- Ebara Corporation
- Ryo Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 10,672,586
- Issue date Jun 2, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Sho Kawatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of controlling same
- Patent number 10,607,803
- Issue date Mar 31, 2020
- Jeol Ltd.
- Masaki Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam profiling speed enhancement for scanned beam implanters
- Patent number 10,483,086
- Issue date Nov 19, 2019
- Axcelis Technologies, Inc.
- Andy M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emission noise correction of a charged particle source
- Patent number 10,453,647
- Issue date Oct 22, 2019
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for beam mapping in ion beam system
- Patent number 10,431,421
- Issue date Oct 1, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ beam current monitoring and control in scanned ion implanta...
- Patent number 10,395,889
- Issue date Aug 27, 2019
- Axcelis Technologies, Inc.
- Alfred Mike Halling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of operating same
- Patent number 10,224,176
- Issue date Mar 5, 2019
- Jeol Ltd.
- Takashi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement of the electric current profile of particle clusters in...
- Patent number 10,192,715
- Issue date Jan 29, 2019
- Uwe Renner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 9,852,878
- Issue date Dec 26, 2017
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling implant process
- Patent number 9,738,968
- Issue date Aug 22, 2017
- Varian Semiconductor Equipment Associates, Inc.
- George M. Gammel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method to improve productivity of hybrid scan ion beam i...
- Patent number 9,711,329
- Issue date Jul 18, 2017
- Axelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High energy ion implanter, beam current adjuster, and beam current...
- Patent number 9,576,771
- Issue date Feb 21, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kouji Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam measuring device and method of measuring ion beam
- Patent number 9,564,292
- Issue date Feb 7, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Noriyasu Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter, ion implantation method, and beam measurement apparatus
- Patent number 9,502,210
- Issue date Nov 22, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of dose inhomogeneity using overlapping exposure spots
- Patent number 9,495,499
- Issue date Nov 15, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Current regulation method of multiple beams
- Patent number 9,455,123
- Issue date Sep 27, 2016
- NuFlare Technology, Inc.
- Kenichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of dose inhomogeneity using overlapping exposure spots
- Patent number 9,443,052
- Issue date Sep 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Non-invasive charged particle beam monitor
- Patent number 9,390,887
- Issue date Jul 12, 2016
- KLA-Tencor Corporation
- Thomas Plettner
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS FOR EVENT MODULATED ELECTRON MICROSCOPY
- Publication number 20240355581
- Publication date Oct 24, 2024
- Integrated Dynamic Electron Solutions, Inc.
- Bryan Walter REED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...
- Publication number 20240312758
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Zheng FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM
- Publication number 20240194444
- Publication date Jun 13, 2024
- INFINEON TECHNOLOGIES AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPLICATION DEVICE
- Publication number 20230335367
- Publication date Oct 19, 2023
- HITACHI HIGH-TECH CORPORATION
- Takashi OHSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20230260747
- Publication date Aug 17, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tetsuya Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM GENERATION
- Publication number 20230178326
- Publication date Jun 8, 2023
- MICROCHIP TECHNOLOGY INCORPORATED
- Hyunwook Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD, ION IMPLANTER, AND METHOD FOR MANUFACTURIN...
- Publication number 20230140499
- Publication date May 4, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL
- Publication number 20230016619
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tien-Shun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device and Milling Processing Method Using Same
- Publication number 20220293391
- Publication date Sep 15, 2022
- Hitachi High-Tech Corporation
- Hitoshi KAMOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20210183615
- Publication date Jun 17, 2021
- Hitachi High-Tech Corporation
- Hitoshi KAMOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR DETERMINING AND CORRECTING FOR EXPECTED DOSE VARIATI...
- Publication number 20210175048
- Publication date Jun 10, 2021
- Applied Materials, Inc.
- Eric Donald Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND BEAM PROFILER
- Publication number 20210134559
- Publication date May 6, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR REDUCTION OF PARTICLE CONTAMINATION BY BIA...
- Publication number 20210104378
- Publication date Apr 8, 2021
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Shao-Yu HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
- Publication number 20200027698
- Publication date Jan 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE
- Publication number 20190295818
- Publication date Sep 26, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoshiaki Inda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE
- Publication number 20190244785
- Publication date Aug 8, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Noriyasu Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20190244782
- Publication date Aug 8, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Sho Kawatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFLECTION SENSITIVITY CALCULATION METHOD AND DEFLECTION SENSITIVIT...
- Publication number 20190237293
- Publication date Aug 1, 2019
- EBARA CORPORATION
- Ryo TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope and Method of Controlling Same
- Publication number 20190139734
- Publication date May 9, 2019
- JEOL Ltd.
- Masaki Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU BEAM CURRENT MONITORING AND CONTROL IN SCANNED ION IMPLANTA...
- Publication number 20180068828
- Publication date Mar 8, 2018
- Axcelis Technologies, Inc.
- Alfred Mike Halling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT OF THE ELECTRIC CURRENT PROFILE OF PARTICLE CLUSTERS IN...
- Publication number 20160314932
- Publication date Oct 27, 2016
- Bruker Daltonik GmbH
- Uwe RENNER
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ESTIMATING LIFETIME OF CATHODE IN ELECTRON BEAM LITHOGRA...
- Publication number 20160238636
- Publication date Aug 18, 2016
- NuFlare Technology, Inc.
- MASAYUKI ITO
- G01 - MEASURING TESTING
Information Patent Application
Methods and Apparatus for Determining, Using, and Indicating Ion Be...
- Publication number 20160111249
- Publication date Apr 21, 2016
- GATAN, INC.
- John Andrew Hunt
- G01 - MEASURING TESTING
Information Patent Application
ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS
- Publication number 20160042915
- Publication date Feb 11, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY ION IMPLANTER, BEAM CURRENT ADJUSTER, AND BEAM CURRENT...
- Publication number 20150136996
- Publication date May 21, 2015
- SEN Corporation
- Kouji Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY
- Publication number 20140326179
- Publication date Nov 6, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CURRENT REGULATION METHOD OF MULTIPLE BEAMS
- Publication number 20140265827
- Publication date Sep 18, 2014
- NuFlare Technology, Inc.
- Kenichi SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140158903
- Publication date Jun 12, 2014
- Canon Kabushiki Kaisha
- Kentaro Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reducing Glitching In An Ion Implanter
- Publication number 20140099430
- Publication date Apr 10, 2014
- William T. Levay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTATION APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20130256566
- Publication date Oct 3, 2013
- SEN Corporation
- Hiroyuki KARIYA
- H01 - BASIC ELECTRIC ELEMENTS

Beam current

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and systems for event modulated electron microscopy

Ion milling device and milling processing method using same

Method of mixing upstream and downstream current measurements for i...

Apparatus and method for reduction of particle contamination by bia...

Ion beam profiling system and related methods

Ion milling device

Techniques for determining and correcting for expected dose variati...

Ion implanter and beam profiler

Methods and apparatus for determining, using, and indicating ion be...

Ion implantation apparatus and measurement device

Ion implantation apparatus and measurement device

Deflection sensitivity calculation method and deflection sensitivit...

Ion implantation apparatus and ion implantation method

Electron microscope and method of controlling same

Beam profiling speed enhancement for scanned beam implanters

Emission noise correction of a charged particle source

Apparatus and techniques for beam mapping in ion beam system

In situ beam current monitoring and control in scanned ion implanta...

Electron microscope and method of operating same

Measurement of the electric current profile of particle clusters in...

Surface processing apparatus

Apparatus and method for controlling implant process

System and method to improve productivity of hybrid scan ion beam i...

High energy ion implanter, beam current adjuster, and beam current...

Ion beam measuring device and method of measuring ion beam

Ion implanter, ion implantation method, and beam measurement apparatus

Compensation of dose inhomogeneity using overlapping exposure spots

Current regulation method of multiple beams

Compensation of dose inhomogeneity using overlapping exposure spots

Non-invasive charged particle beam monitor

Patents Applicationslast 30 patents

METHODS AND SYSTEMS FOR EVENT MODULATED ELECTRON MICROSCOPY

SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...

ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM

ELECTRON BEAM APPLICATION DEVICE

ION IMPLANTER AND ION IMPLANTATION METHOD

CHARGED PARTICLE BEAM GENERATION

ION IMPLANTATION METHOD, ION IMPLANTER, AND METHOD FOR MANUFACTURIN...

METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL

Ion Milling Device and Milling Processing Method Using Same

Ion Milling Device

TECHNIQUES FOR DETERMINING AND CORRECTING FOR EXPECTED DOSE VARIATI...

ION IMPLANTER AND BEAM PROFILER

APPARATUS AND METHOD FOR REDUCTION OF PARTICLE CONTAMINATION BY BIA...

APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM

ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE

ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

DEFLECTION SENSITIVITY CALCULATION METHOD AND DEFLECTION SENSITIVIT...

Electron Microscope and Method of Controlling Same

IN SITU BEAM CURRENT MONITORING AND CONTROL IN SCANNED ION IMPLANTA...

MEASUREMENT OF THE ELECTRIC CURRENT PROFILE OF PARTICLE CLUSTERS IN...

METHOD FOR ESTIMATING LIFETIME OF CATHODE IN ELECTRON BEAM LITHOGRA...

Methods and Apparatus for Determining, Using, and Indicating Ion Be...

ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS

HIGH ENERGY ION IMPLANTER, BEAM CURRENT ADJUSTER, AND BEAM CURRENT...

APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY

CURRENT REGULATION METHOD OF MULTIPLE BEAMS

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

Reducing Glitching In An Ion Implanter

ION IMPLANTATION APPARATUS AND CONTROL METHOD THEREOF