Beam diameter

Industry

CPC
H01J2237/24521

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24521Beam diameter

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photocathode designs and methods of generating an electron beam usi...
- Patent number 10,804,069
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- Katerina Ioakeimidi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam generation and measurement
- Patent number 10,748,737
- Issue date Aug 18, 2020
- KLA-Tencor Corporation
- Katerina Ioakeimidi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon electron emitter designs
- Patent number 10,607,806
- Issue date Mar 31, 2020
- KLA-Tencor Corporation
- Frances Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photocathode designs and methods of generating an electron beam usi...
- Patent number 10,535,493
- Issue date Jan 14, 2020
- KLA-Tencor Corporation
- Katerina Ioakeimidi
- G02 - OPTICS
Information Patent Grant
Device for spot size measurement at wafer level using a knife edge...
- Patent number 9,240,306
- Issue date Jan 19, 2016
- Mapper Lithography IP B.V.
- Jan Andries Meijer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Measuring apparatus, drawing apparatus, and article manufacturing m...
- Patent number 8,927,949
- Issue date Jan 6, 2015
- Canon Kabushiki Kaisha
- Shigeki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring ion implantation
- Patent number 8,581,217
- Issue date Nov 12, 2013
- Advanced Ion Beam Technology, Inc.
- Don Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-column electron beam exposure apparatus and multi-column elec...
- Patent number 8,222,619
- Issue date Jul 17, 2012
- Advantest Corp.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion source and ion implantation apparatus
- Patent number 7,755,062
- Issue date Jul 13, 2010
- Nissin Ion Equipment Co., Ltd.
- Takatoshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...
- Publication number 20240087838
- Publication date Mar 14, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20240014002
- Publication date Jan 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Takayasu IWATSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED ARCHITECTURE FOR HIGH-PERFORMANCE DETECTION DEVICE
- Publication number 20230170179
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Yongxin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20230162943
- Publication date May 25, 2023
- Hitachi High-Tech Corporation
- U OH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR ESTIMATING LIFETIME OF CATHODE IN ELECTRON BEAM LITHOGRA...
- Publication number 20160238636
- Publication date Aug 18, 2016
- NuFlare Technology, Inc.
- MASAYUKI ITO
- G01 - MEASURING TESTING
Information Patent Application
ION IMPLANTATION APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20130256566
- Publication date Oct 3, 2013
- SEN Corporation
- Hiroyuki KARIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING APPARATUS, DRAWING APPARATUS, AND ARTICLE MANUFACTURING M...
- Publication number 20130017476
- Publication date Jan 17, 2013
- Canon Kabushiki Kaisha
- Shigeki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MONITORING ION IMPLANTATION
- Publication number 20120085936
- Publication date Apr 12, 2012
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Don BERRIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-column electron beam exposure apparatus and multi-column elec...
- Publication number 20100019172
- Publication date Jan 28, 2010
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION SOURCE AND ION IMPLANTATION APPARATUS
- Publication number 20090212232
- Publication date Aug 27, 2009
- NISSIN ION EQUIPMENT CO., LTD.
- Takatoshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS

Beam diameter

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photocathode designs and methods of generating an electron beam usi...

Electron beam generation and measurement

Silicon electron emitter designs

Photocathode designs and methods of generating an electron beam usi...

Device for spot size measurement at wafer level using a knife edge...

Measuring apparatus, drawing apparatus, and article manufacturing m...

Method for monitoring ion implantation

Multi-column electron beam exposure apparatus and multi-column elec...

Ion source and ion implantation apparatus

Patents Applicationslast 30 patents

MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...

CHARGED PARTICLE BEAM APPARATUS

ENHANCED ARCHITECTURE FOR HIGH-PERFORMANCE DETECTION DEVICE

CHARGED PARTICLE BEAM DEVICE

METHOD FOR ESTIMATING LIFETIME OF CATHODE IN ELECTRON BEAM LITHOGRA...

ION IMPLANTATION APPARATUS AND CONTROL METHOD THEREOF

MEASURING APPARATUS, DRAWING APPARATUS, AND ARTICLE MANUFACTURING M...

METHOD FOR MONITORING ION IMPLANTATION

Multi-column electron beam exposure apparatus and multi-column elec...

ION SOURCE AND ION IMPLANTATION APPARATUS