by anodic oxidation

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H01L21/31687

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31687by anodic oxidation

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Patents Grantslast 30 patents

Information Patent Grant
Integrated circuit with capacitor and method for the production the...
- Patent number 8,367,514
- Issue date Feb 5, 2013
- Infineon Technologies AG
- Thomas Goebel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including transistors with silicided impurity...
- Patent number 8,198,683
- Issue date Jun 12, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including transistors with silicided impurity...
- Patent number 7,847,355
- Issue date Dec 7, 2010
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microstructure and method of manufacturing the same
- Patent number 7,699,971
- Issue date Apr 20, 2010
- FUJIFILM Corporation
- Yusuke Hatanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit with capacitor and method for the production the...
- Patent number 7,692,266
- Issue date Apr 6, 2010
- Infineon Technologies AG
- Thomas Goebel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating porous aluminum oxide mold having sub-micron...
- Patent number 7,588,953
- Issue date Sep 15, 2009
- National Central University
- Yeeu-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,569,856
- Issue date Aug 4, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having pixel electrode and peripheral circuit
- Patent number 7,525,158
- Issue date Apr 28, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of thin-film transistor, thin-film transistor...
- Patent number 7,393,727
- Issue date Jul 1, 2008
- Konica Minolta Holdings, Inc.
- Katsura Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for through-plating field effect transistors with a self-ass...
- Patent number 7,390,703
- Issue date Jun 24, 2008
- Infineon Technologies, AG
- Hagen Klauk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,381,599
- Issue date Jun 3, 2008
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of thin-film transistor, thin-film transistor...
- Patent number 7,368,331
- Issue date May 6, 2008
- Konica Minolta Holdings, Inc.
- Katsura Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices having improved capacitance
- Patent number 7,205,599
- Issue date Apr 17, 2007
- Micron Technology, Inc.
- Karl M. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and configuration for reinforcement of a dielectric layer at...
- Patent number 7,176,514
- Issue date Feb 13, 2007
- Infineon Technologies AG
- Thomas Hecht
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices having improved capacitance and methods of their fabrication
- Patent number 7,126,205
- Issue date Oct 24, 2006
- Micron Technology, Inc.
- Karl M. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dummy wafer
- Patent number 7,060,622
- Issue date Jun 13, 2006
- Oki Electric Industry Co., Ltd.
- Yuichiro Miyamori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Production of metal insulator metal (MIM) structures using anodizin...
- Patent number 6,992,368
- Issue date Jan 31, 2006
- International Business Machines Corporation
- Richard P. Volant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 6,867,431
- Issue date Mar 15, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices having improved capacitance and methods of their fabrication
- Patent number 6,838,353
- Issue date Jan 4, 2005
- Micron Technology, Inc.
- Karl M. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of electronic component fabrication and an electronic component
- Patent number 6,818,486
- Issue date Nov 16, 2004
- The University of Liverpool
- William Eccleston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for electrochemical oxidation
- Patent number 6,815,315
- Issue date Nov 9, 2004
- Matsushita Electric Works, Ltd.
- Yoshifumi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature sidewall oxidation of W/WN/poly-gatestack
- Patent number 6,716,734
- Issue date Apr 6, 2004
- Infineon Technologies AG
- Mihel Seitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices having improved capacitance and methods of their fabrication
- Patent number 6,660,610
- Issue date Dec 9, 2003
- Micron Technology, Inc.
- Karl M. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production of metal insulator metal (MIM) structures using anodizin...
- Patent number 6,613,641
- Issue date Sep 2, 2003
- International Business Machines Corporation
- Richard P. Volant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit structures having low k porous aluminum oxide di...
- Patent number 6,506,678
- Issue date Jan 14, 2003
- LSI Logic Corporation
- Valeriy Sukharev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tantalum anodization for in-laid copper metallization capacitor
- Patent number 6,433,379
- Issue date Aug 13, 2002
- Advanced Micro Devices, Inc.
- Sergey Lopatin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature oxidation of conductive layers for semiconductor fa...
- Patent number 6,387,771
- Issue date May 14, 2002
- Infineon Technologies AG
- Oliver Genz
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Forming electrolyte for forming metal oxide coating film
- Patent number 6,368,485
- Issue date Apr 9, 2002
- Mitsubishi Chemical Corporation
- Makoto Ue
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for fabricating a thin-film transistor
- Patent number 6,329,226
- Issue date Dec 11, 2001
- Agere Systems Guardian Corp.
- Christopher D. W. Jones
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing thin film transistor
- Patent number 6,326,246
- Issue date Dec 4, 2001
- Semiconductor Energy Laboratory Co., Ltd.
- Mutsuo Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20110068339
- Publication date Mar 24, 2011
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT WITH CAPACITOR AND METHOD FOR THE PRODUCTION THE...
- Publication number 20100129977
- Publication date May 27, 2010
- Infineon Technologies AG
- Thomas Goebel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS COMPATIBLE INTEGRATED HIGH DENSITY CAPACITOR STRUCTURE AND PRO...
- Publication number 20100079929
- Publication date Apr 1, 2010
- Peter Smeys
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICALLY MONITORING AN ALOX FABRICATION PROCESS
- Publication number 20100078329
- Publication date Apr 1, 2010
- Uri Mirsky
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Manufacturing method of thin-film transistor, thin-film transistor...
- Publication number 20100019319
- Publication date Jan 28, 2010
- Katsura Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20090289254
- Publication date Nov 26, 2009
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of thin-film transistor, thin film transistor...
- Publication number 20080197349
- Publication date Aug 21, 2008
- Katsura Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSTRUCTURE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20080152941
- Publication date Jun 26, 2008
- FUJIFILM CORPORATION
- Yusuke Hatanaka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method of fabricating porous AIO2 mold having sub-micro structure
- Publication number 20080143015
- Publication date Jun 19, 2008
- National Central University
- Yeeu-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing nanostructure
- Publication number 20070235342
- Publication date Oct 11, 2007
- Canon Kabushiki Kaisha
- Yasuhiro Matsuo
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Manufacturing method of thin-film transistor, thin-film transistor...
- Publication number 20070161163
- Publication date Jul 12, 2007
- Katsura Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Anodization process and layers produced therefrom
- Publication number 20060254921
- Publication date Nov 16, 2006
- Xerox Corporation.
- William G. Herbert
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Integrated circuit with capacitor and method for the production the...
- Publication number 20060214265
- Publication date Sep 28, 2006
- Thomas Goebel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR DEVICES HAVING IMPROVED CAPACITANCE
- Publication number 20060216532
- Publication date Sep 28, 2006
- Micron Technology, Inc.
- Karl M. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR DEVICES HAVING IMPROVED CAPACITANCE
- Publication number 20060196024
- Publication date Sep 7, 2006
- Micron Technology, Inc.
- Karl M. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for through-plating field effect transistors with a self-ass...
- Publication number 20050186700
- Publication date Aug 25, 2005
- Hagen Klauk
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for forming metal oxide layer by nitric acid oxidation
- Publication number 20050181619
- Publication date Aug 18, 2005
- National Taiwan University
- Jenn-Gwo Hwu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20050153489
- Publication date Jul 14, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20050142705
- Publication date Jun 30, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Devices having improved capacitance and methods of their fabrication
- Publication number 20050037592
- Publication date Feb 17, 2005
- Micron Technology, Inc.
- Karl M. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20040256621
- Publication date Dec 23, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Toshimitsu Konuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for electrochemical oxidation
- Publication number 20040180516
- Publication date Sep 16, 2004
- Yoshifumi Watabe
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Manufacturing method of thin-film transistor, thin-film transistor...
- Publication number 20040129978
- Publication date Jul 8, 2004
- Katsura Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming dummy wafer
- Publication number 20040063324
- Publication date Apr 1, 2004
- Yuichiro Miyamori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and configuration for reinforcement of a dielectric layer at...
- Publication number 20030224584
- Publication date Dec 4, 2003
- Thomas Hecht
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Production of metal insulator metal (MIM) structures using anodizin...
- Publication number 20030203586
- Publication date Oct 30, 2003
- Richard P. Volant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of electronic component fabrication and an electronic component
- Publication number 20030170937
- Publication date Sep 11, 2003
- William Eccleston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20030100152
- Publication date May 29, 2003
- TOSHIMITSU KONUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE SIDEWALL OXIDATION OF W/WN/POLY-GATESTACK
- Publication number 20030064576
- Publication date Apr 3, 2003
- Infineon Technologies North America Corp.
- Mihel Seitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES HAVING IMPROVED CAPACITANCE AND METHODS OF THEIR FABRICATION
- Publication number 20020038879
- Publication date Apr 4, 2002
- KARL M. ROBINSON
- H01 - BASIC ELECTRIC ELEMENTS

by anodic oxidation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Integrated circuit with capacitor and method for the production the...

Semiconductor device including transistors with silicided impurity...

Semiconductor device including transistors with silicided impurity...

Microstructure and method of manufacturing the same

Integrated circuit with capacitor and method for the production the...

Method of fabricating porous aluminum oxide mold having sub-micron...

Semiconductor device and method for manufacturing the same

Semiconductor device having pixel electrode and peripheral circuit

Manufacturing method of thin-film transistor, thin-film transistor...

Method for through-plating field effect transistors with a self-ass...

Semiconductor device and method for manufacturing the same

Manufacturing method of thin-film transistor, thin-film transistor...

Devices having improved capacitance

Method and configuration for reinforcement of a dielectric layer at...

Devices having improved capacitance and methods of their fabrication

Method of forming dummy wafer

Production of metal insulator metal (MIM) structures using anodizin...

Semiconductor device and method for manufacturing the same

Devices having improved capacitance and methods of their fabrication

Method of electronic component fabrication and an electronic component

Method for electrochemical oxidation

Low temperature sidewall oxidation of W/WN/poly-gatestack

Devices having improved capacitance and methods of their fabrication

Production of metal insulator metal (MIM) structures using anodizin...

Integrated circuit structures having low k porous aluminum oxide di...

Tantalum anodization for in-laid copper metallization capacitor

Low temperature oxidation of conductive layers for semiconductor fa...

Forming electrolyte for forming metal oxide coating film

Method for fabricating a thin-film transistor

Method for manufacturing thin film transistor

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

INTEGRATED CIRCUIT WITH CAPACITOR AND METHOD FOR THE PRODUCTION THE...

CMOS COMPATIBLE INTEGRATED HIGH DENSITY CAPACITOR STRUCTURE AND PRO...

OPTICALLY MONITORING AN ALOX FABRICATION PROCESS

Manufacturing method of thin-film transistor, thin-film transistor...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Manufacturing method of thin-film transistor, thin film transistor...

MICROSTRUCTURE AND METHOD OF MANUFACTURING THE SAME

Method of fabricating porous AIO2 mold having sub-micro structure

Method for manufacturing nanostructure

Manufacturing method of thin-film transistor, thin-film transistor...

Anodization process and layers produced therefrom

Integrated circuit with capacitor and method for the production the...

METHODS AND APPARATUS FOR DEVICES HAVING IMPROVED CAPACITANCE

METHODS AND APPARATUS FOR DEVICES HAVING IMPROVED CAPACITANCE

Method for through-plating field effect transistors with a self-ass...

Method for forming metal oxide layer by nitric acid oxidation

Semiconductor device and method for manufacturing the same

Semiconductor device and method for manufacturing the same

Devices having improved capacitance and methods of their fabrication

Semiconductor device and method for manufacturing the same

Method for electrochemical oxidation

Manufacturing method of thin-film transistor, thin-film transistor...

Method of forming dummy wafer

Method and configuration for reinforcement of a dielectric layer at...

Production of metal insulator metal (MIM) structures using anodizin...

Method of electronic component fabrication and an electronic component

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

LOW TEMPERATURE SIDEWALL OXIDATION OF W/WN/POLY-GATESTACK

DEVICES HAVING IMPROVED CAPACITANCE AND METHODS OF THEIR FABRICATION