by charged particle beam [CPB]

Industry

CPC
G03F1/86

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/86by charged particle beam [CPB]

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Devices and methods for examining and/or processing an element for...
- Patent number 12,135,540
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus and computer program for analyzing and/or process...
- Patent number 12,105,415
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Oliver Jäckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 12,072,621
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement targets design
- Patent number 11,914,290
- Issue date Feb 27, 2024
- KLA Corporation
- Hong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of metrology and associated apparatuses
- Patent number 11,733,614
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Thomas Jarik Huisman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 11,704,463
- Issue date Jul 18, 2023
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for determining a position of an element on a...
- Patent number 11,650,495
- Issue date May 16, 2023
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 11,614,684
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) mask inspection system, a load-lock chamb...
- Patent number 11,531,277
- Issue date Dec 20, 2022
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of contact structure
- Patent number 11,527,438
- Issue date Dec 13, 2022
- United Semiconductor (Xiamen) Co., Ltd.
- Xiongwu He
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing chemical fluid for manufacturing electronic...
- Patent number 11,429,018
- Issue date Aug 30, 2022
- FUJIFILM Corporation
- Tetsuya Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining a position of an element on a...
- Patent number 11,385,540
- Issue date Jul 12, 2022
- Carl Zeiss SMT GmbH
- Michael Budach
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining positions of a plurality of pi...
- Patent number 11,366,383
- Issue date Jun 21, 2022
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask
- Patent number 11,281,091
- Issue date Mar 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for repairing a photolithographic mask
- Patent number 11,256,168
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement method and apparatus
- Patent number 11,243,473
- Issue date Feb 8, 2022
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of detecting printing defects on photoresist patterns
- Patent number 11,187,976
- Issue date Nov 30, 2021
- SK hynix Inc.
- Jun Taek Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for switching between an EUV pellicle and an opti...
- Patent number 11,156,927
- Issue date Oct 26, 2021
- KLA Corporation
- Mohammad Mehdi Daneshpanah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of metrology and associated apparatuses
- Patent number 11,112,703
- Issue date Sep 7, 2021
- ASML Netherlands B.V.
- Thomas Jarik Huisman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 10,997,345
- Issue date May 4, 2021
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dispositioning defects detected on extreme ultraviolet photomasks
- Patent number 10,866,197
- Issue date Dec 15, 2020
- KLA Corp.
- Vikram Tolani
- G01 - MEASURING TESTING
Information Patent Grant
Methods of detecting printing defects on photoresist patterns
- Patent number 10,802,396
- Issue date Oct 13, 2020
- SK hynix Inc.
- Jun Taek Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of detecting a defect and apparatus for performing the same
- Patent number 10,782,254
- Issue date Sep 22, 2020
- Samsung Electronics Co., Ltd.
- Hyon-Seok Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-column spacing for photomask and reticle inspection and wafer...
- Patent number 10,777,377
- Issue date Sep 15, 2020
- KLA-Tencor Corporation
- Robert Haynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet (EUV) exposure apparatus and method of manufact...
- Patent number 10,754,254
- Issue date Aug 25, 2020
- Samsung Electronics Co., Ltd.
- Keunhee Bai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 10,572,697
- Issue date Feb 25, 2020
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern measurement apparatus and defect inspection apparatus
- Patent number 10,417,756
- Issue date Sep 17, 2019
- Hitachi High-Technologies Corporation
- Kei Sakai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reflective mask blank, method for manufacturing same, reflective ma...
- Patent number 10,347,485
- Issue date Jul 9, 2019
- Hoya Corporation
- Tsutomu Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
On-axis illumination and alignment for charge control during charge...
- Patent number 10,168,614
- Issue date Jan 1, 2019
- Applied Materials Israel Ltd.
- Alex Goldenshtein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection of a lithographic mask that is protected by a pellicle
- Patent number 10,156,785
- Issue date Dec 18, 2018
- Applied Materials Israel Ltd.
- Alon Litman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF
- Publication number 20240361684
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-WEI WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...
- Publication number 20240353748
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul YEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK
- Publication number 20230375917
- Publication date Nov 23, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xiuxuan ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF
- Publication number 20230213853
- Publication date Jul 6, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-WEI WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK
- Publication number 20230113702
- Publication date Apr 13, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SETTING A SIDE WALL ANGLE OF A PATTERN ELE...
- Publication number 20230109566
- Publication date Apr 6, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PROCESS CORRECTION METHODS AND METHODS OF FABRICATING LITHOGRA...
- Publication number 20230074316
- Publication date Mar 9, 2023
- Samsung Electronics Co., Ltd.
- Soeun Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT DETECTION
- Publication number 20230046682
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Fuming WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...
- Publication number 20230042743
- Publication date Feb 9, 2023
- Katholieke Universiteit Leuven
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A POSITION OF AN ELEMENT ON A...
- Publication number 20220334469
- Publication date Oct 20, 2022
- Carl Zeiss SMT GMBH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...
- Publication number 20220317563
- Publication date Oct 6, 2022
- FUJIFILM CORPORATION
- Tetsuya SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION APPARATUS
- Publication number 20220299456
- Publication date Sep 22, 2022
- NuFlare Technology, Inc.
- Riki OGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) MASK INSPECTION SYSTEM, A LOAD-LOCK CHAMB...
- Publication number 20220283519
- Publication date Sep 8, 2022
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF CONTACT STRUCTURE
- Publication number 20220139778
- Publication date May 5, 2022
- United Semiconductor (Xiamen) Co., Ltd.
- XIONGWU HE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20220107571
- Publication date Apr 7, 2022
- ASML NETHERLANDS B.V.
- Thomas Jarik Huisman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF
- Publication number 20220075262
- Publication date Mar 10, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-WEI WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY
- Publication number 20210216695
- Publication date Jul 15, 2021
- LAM RESEARCH CORPORATION
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY MEASUREMENT TARGETS DESIGN
- Publication number 20210026238
- Publication date Jan 28, 2021
- KLA Corporation
- Hong XIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DETECTING PRINTING DEFECTS ON PHOTORESIST PATTERNS
- Publication number 20200409256
- Publication date Dec 31, 2020
- SK HYNIX INC.
- Jun Taek PARK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20200249558
- Publication date Aug 6, 2020
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR REPAIRING A PHOTOLITHOGRAPHIC MASK
- Publication number 20200249564
- Publication date Aug 6, 2020
- Carl Zeiss SMT GMBH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A POSITION OF AN ELEMENT ON A...
- Publication number 20200233299
- Publication date Jul 23, 2020
- Carl Zeiss SMT GMBH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY
- Publication number 20200218844
- Publication date Jul 9, 2020
- LAM RESEARCH CORPORATION
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASUREMENT METHOD AND APPARATUS
- Publication number 20200159124
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING POSITIONS OF A PLURALITY OF PI...
- Publication number 20200124959
- Publication date Apr 23, 2020
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPOSITIONING DEFECTS DETECTED ON EXTREME ULTRAVIOLET PHOTOMASKS
- Publication number 20200096862
- Publication date Mar 26, 2020
- KLA Corporation
- Vikram Tolani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY
- Publication number 20190311083
- Publication date Oct 10, 2019
- LAM RESEARCH CORPORATION
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron-Beam Inspection Systems with optimized throughput
- Publication number 20190088442
- Publication date Mar 21, 2019
- DONGFANG JINGYUAN ELECTRON LIMITED
- Weimin Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, APERTURE ARRANGEMENT FOR A CHARGED PA...
- Publication number 20190066972
- Publication date Feb 28, 2019
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Jürgen Frosien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...
- Publication number 20190011827
- Publication date Jan 10, 2019
- FUJIFILM CORPORATION
- Tetsuya SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS

by charged particle beam [CPB]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Devices and methods for examining and/or processing an element for...

Method, apparatus and computer program for analyzing and/or process...

Photomask inspection method and apparatus thereof

Overlay measurement targets design

Method of metrology and associated apparatuses

Method of etch model calibration using optical scatterometry

Apparatus and method for determining a position of an element on a...

Photomask inspection method and apparatus thereof

Extreme ultraviolet (EUV) mask inspection system, a load-lock chamb...

Manufacturing method of contact structure

Method of manufacturing chemical fluid for manufacturing electronic...

Apparatus and method for determining a position of an element on a...

Method and apparatus for determining positions of a plurality of pi...

Photomask

Apparatus and method for repairing a photolithographic mask

Measurement method and apparatus

Methods of detecting printing defects on photoresist patterns

System and method for switching between an EUV pellicle and an opti...

Method of metrology and associated apparatuses

Method of etch model calibration using optical scatterometry

Dispositioning defects detected on extreme ultraviolet photomasks

Methods of detecting printing defects on photoresist patterns

Method of detecting a defect and apparatus for performing the same

Multi-column spacing for photomask and reticle inspection and wafer...

Extreme ultraviolet (EUV) exposure apparatus and method of manufact...

Method of etch model calibration using optical scatterometry

Pattern measurement apparatus and defect inspection apparatus

Reflective mask blank, method for manufacturing same, reflective ma...

On-axis illumination and alignment for charge control during charge...

Inspection of a lithographic mask that is protected by a pellicle

Patents Applicationslast 30 patents

PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...

METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK

PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK

METHOD AND APPARATUS FOR SETTING A SIDE WALL ANGLE OF A PATTERN ELE...

MASK PROCESS CORRECTION METHODS AND METHODS OF FABRICATING LITHOGRA...

MASK DEFECT DETECTION

PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...

APPARATUS AND METHOD FOR DETERMINING A POSITION OF AN ELEMENT ON A...

METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...

INSPECTION APPARATUS

EXTREME ULTRAVIOLET (EUV) MASK INSPECTION SYSTEM, A LOAD-LOCK CHAMB...

MANUFACTURING METHOD OF CONTACT STRUCTURE

METHOD OF METROLOGY AND ASSOCIATED APPARATUSES

PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY

OVERLAY MEASUREMENT TARGETS DESIGN

METHODS OF DETECTING PRINTING DEFECTS ON PHOTORESIST PATTERNS

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

APPARATUS AND METHOD FOR REPAIRING A PHOTOLITHOGRAPHIC MASK

APPARATUS AND METHOD FOR DETERMINING A POSITION OF AN ELEMENT ON A...

METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY

MEASUREMENT METHOD AND APPARATUS

METHOD AND APPARATUS FOR DETERMINING POSITIONS OF A PLURALITY OF PI...

DISPOSITIONING DEFECTS DETECTED ON EXTREME ULTRAVIOLET PHOTOMASKS

METHOD OF ETCH MODEL CALIBRATION USING OPTICAL SCATTEROMETRY

Electron-Beam Inspection Systems with optimized throughput

CHARGED PARTICLE BEAM DEVICE, APERTURE ARRANGEMENT FOR A CHARGED PA...

METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...