by charged particle beam [CPB]

Industry

CPC
G03F1/74

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/74by charged particle beam [CPB]

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photomask repairing method and system thereof
- Patent number 12,140,858
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Devices and methods for examining and/or processing an element for...
- Patent number 12,135,540
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 12,019,973
- Issue date Jun 25, 2024
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask defect repair apparatus and mask defect repair method
- Patent number 11,906,899
- Issue date Feb 20, 2024
- Hitachi High-Tech Science Corporation
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask repairing method and system thereof
- Patent number 11,815,802
- Issue date Nov 14, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,783,110
- Issue date Oct 10, 2023
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for determining positions of a plurality of pi...
- Patent number 11,366,383
- Issue date Jun 21, 2022
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for repairing a photolithographic mask
- Patent number 11,256,168
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ascertaining a repair shape for processing...
- Patent number 11,079,674
- Issue date Aug 3, 2021
- Carl Zeiss SMT GmbH
- Jens Oster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, method for manufacturing phase shift...
- Patent number 11,054,735
- Issue date Jul 6, 2021
- Hoya Corporation
- Takenori Kajiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blanks, phase shift mask, method for manufacturing phase shift...
- Patent number 11,016,382
- Issue date May 25, 2021
- Hoya Corporation
- Atsushi Kominato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for increasing accuracy of pattern positioning
- Patent number 10,996,573
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dispositioning defects detected on extreme ultraviolet photomasks
- Patent number 10,866,197
- Issue date Dec 15, 2020
- KLA Corp.
- Vikram Tolani
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for permanently repairing defects of absent mater...
- Patent number 10,732,501
- Issue date Aug 4, 2020
- Carl Zeiss SMT GmbH
- Jens Oster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, transfer mask, method of manufacturing transfer mask an...
- Patent number 10,481,485
- Issue date Nov 19, 2019
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for permanently repairing defects of absent mater...
- Patent number 10,372,032
- Issue date Aug 6, 2019
- Carl Zeiss SMT GmbH
- Jens Oster
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern formation method, control device, and semiconductor device...
- Patent number 10,241,394
- Issue date Mar 26, 2019
- TOSHIBA MEMORY CORPORATION
- Keiko Morishita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image mask film scheme and method
- Patent number 10,156,783
- Issue date Dec 18, 2018
- Taiwan Semiconductor Manufactuing Company, Ltd.
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing mask defects
- Patent number 10,073,338
- Issue date Sep 11, 2018
- Semiconductor Manufacturing International (Beijing) Corporation
- Kuaixia Ren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focused radiation beam induced deposition
- Patent number 10,061,193
- Issue date Aug 28, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsun-Chuan Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Focused radiation beam induced deposition
- Patent number 9,915,866
- Issue date Mar 13, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsun-Chuan Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam-induced etching
- Patent number 9,909,218
- Issue date Mar 6, 2018
- Ecole Polytechnique Federales de Lausanne
- Tristan Bret
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomasks, methods of fabricating the photomasks, and method of fa...
- Patent number 9,817,309
- Issue date Nov 14, 2017
- Samsung Electronics Co., Ltd.
- Jung-hwan Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for processing a substrate with a focused part...
- Patent number 9,721,754
- Issue date Aug 1, 2017
- Carl Zeiss SMT GmbH
- Tristan Bret
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank, transfer mask and method of manufacturing transfer mask
- Patent number 9,651,859
- Issue date May 16, 2017
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Durable metal film deposition for mask repair
- Patent number 9,625,808
- Issue date Apr 18, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Kai Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method of correcting error thereof, integrated circuit d...
- Patent number 9,588,413
- Issue date Mar 7, 2017
- Samsung Electronics Co., Ltd.
- Sang-hyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image mask film scheme and method
- Patent number 9,581,894
- Issue date Feb 28, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method of correcting error thereof, integrated circuit d...
- Patent number 9,465,286
- Issue date Oct 11, 2016
- Samsung Electronics Co., Ltd.
- Sang-hyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Endpoint detection for photolithography mask repair
- Patent number 9,312,101
- Issue date Apr 12, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS
- Publication number 20240411223
- Publication date Dec 12, 2024
- Carl Zeiss SMT GMBH
- Jens Oster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ML REFLECTIVITY MODIFICATION
- Publication number 20240402591
- Publication date Dec 5, 2024
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART RE...
- Publication number 20240379464
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Chien HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF
- Publication number 20240377721
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- HAO-MING CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT
- Publication number 20240310722
- Publication date Sep 19, 2024
- Carl Zeiss SMT GMBH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK
- Publication number 20240310721
- Publication date Sep 19, 2024
- Cart Zeiss SMT GmbH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240289532
- Publication date Aug 29, 2024
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTR...
- Publication number 20240118603
- Publication date Apr 11, 2024
- APPLIED MATERALS, INC.
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFE...
- Publication number 20240069434
- Publication date Feb 29, 2024
- Carl Zeiss SMT GMBH
- Christian Rensing
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REPAIR METHOD FOR PHOTOMASK DEFECTS
- Publication number 20240069433
- Publication date Feb 29, 2024
- Intel Corporation
- Juan Pablo OVIEDO ROBLES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
- Publication number 20240069428
- Publication date Feb 29, 2024
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING PHOTOMASK, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20230408912
- Publication date Dec 21, 2023
- Samsung Electronics Co., Ltd.
- Jongkeun OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK
- Publication number 20230375917
- Publication date Nov 23, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xiuxuan ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF
- Publication number 20230367198
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- HAO-MING CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
END POINT DETERMINATION BY MEANS OF CONTRAST GAS
- Publication number 20230341766
- Publication date Oct 26, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20230305386
- Publication date Sep 28, 2023
- Carl Zeiss SMT GMBH
- Christian Felix Hermanns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230289510
- Publication date Sep 14, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20230280647
- Publication date Sep 7, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A LITHOGRAPHIC MASK
- Publication number 20230152685
- Publication date May 18, 2023
- Carl Zeiss SMT GMBH
- Markus Bauer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK
- Publication number 20230113702
- Publication date Apr 13, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SETTING A SIDE WALL ANGLE OF A PATTERN ELE...
- Publication number 20230109566
- Publication date Apr 6, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...
- Publication number 20230081844
- Publication date Mar 16, 2023
- Carl Zeiss SMT GMBH
- Thorsten Hofmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230035090
- Publication date Feb 2, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, DEVICE AND COMPUTER PROGRAM FOR REPAIRING A MASK DEFECT
- Publication number 20220308443
- Publication date Sep 29, 2022
- Carl Zeiss SMT GMBH
- Johannes Schöneberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART RE...
- Publication number 20220285226
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Chien HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICES AND METHODS FOR VARIABLE ETCH DEPTHS
- Publication number 20220100078
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- M. Arif Zeeshan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Correction of Blur Variation in a Multi-Beam Writer
- Publication number 20210240074
- Publication date Aug 5, 2021
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT REPAIR APPARATUS AND MASK DEFECT REPAIR METHOD
- Publication number 20200310246
- Publication date Oct 1, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshitomo NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20200249558
- Publication date Aug 6, 2020
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR REPAIRING A PHOTOLITHOGRAPHIC MASK
- Publication number 20200249564
- Publication date Aug 6, 2020
- Carl Zeiss SMT GMBH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

by charged particle beam [CPB]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photomask repairing method and system thereof

Devices and methods for examining and/or processing an element for...

Method for reticle enhancement technology of a design pattern to be...

Mask defect repair apparatus and mask defect repair method

Photomask repairing method and system thereof

Method for reticle enhancement technology of a design pattern to be...

Method and apparatus for determining positions of a plurality of pi...

Apparatus and method for repairing a photolithographic mask

Method and apparatus for ascertaining a repair shape for processing...

Mask blank, phase shift mask, method for manufacturing phase shift...

Mask blanks, phase shift mask, method for manufacturing phase shift...

Method and system for increasing accuracy of pattern positioning

Dispositioning defects detected on extreme ultraviolet photomasks

Method and device for permanently repairing defects of absent mater...

Mask blank, transfer mask, method of manufacturing transfer mask an...

Method and device for permanently repairing defects of absent mater...

Pattern formation method, control device, and semiconductor device...

Image mask film scheme and method

Method for repairing mask defects

Focused radiation beam induced deposition

Focused radiation beam induced deposition

Beam-induced etching

Photomasks, methods of fabricating the photomasks, and method of fa...

Method and apparatus for processing a substrate with a focused part...

Mask blank, transfer mask and method of manufacturing transfer mask

Durable metal film deposition for mask repair

Photomask, method of correcting error thereof, integrated circuit d...

Image mask film scheme and method

Photomask, method of correcting error thereof, integrated circuit d...

Endpoint detection for photolithography mask repair

Patents Applicationslast 30 patents

METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS

ML REFLECTIVITY MODIFICATION

APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART RE...

PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF

METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT

METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTR...

METHOD AND APPARATUS FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFE...

REPAIR METHOD FOR PHOTOMASK DEFECTS

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...

METHOD OF MANUFACTURING PHOTOMASK, AND METHOD OF MANUFACTURING SEMI...

METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK

PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF

END POINT DETERMINATION BY MEANS OF CONTRAST GAS

METHOD AND APPARATUS FOR MASK REPAIR

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHOD AND APPARATUS FOR MASK REPAIR

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A LITHOGRAPHIC MASK

METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK

METHOD AND APPARATUS FOR SETTING A SIDE WALL ANGLE OF A PATTERN ELE...

METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHOD, DEVICE AND COMPUTER PROGRAM FOR REPAIRING A MASK DEFECT

APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART RE...

DEVICES AND METHODS FOR VARIABLE ETCH DEPTHS

Correction of Blur Variation in a Multi-Beam Writer

MASK DEFECT REPAIR APPARATUS AND MASK DEFECT REPAIR METHOD

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

APPARATUS AND METHOD FOR REPAIRING A PHOTOLITHOGRAPHIC MASK