by charged particle beam [CPB]

Industry

CPC
G03F1/78

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/78by charged particle beam [CPB]

Industries

Patents Grantslast 30 patents

Information Patent Grant
Filler particles for polymers
- Patent number 12,139,569
- Issue date Nov 12, 2024
- Texas Instruments Incorporated
- Nazila Dadvand
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method, apparatus and computer program for analyzing and/or process...
- Patent number 12,105,415
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Oliver Jäckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 12,019,973
- Issue date Jun 25, 2024
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,133
- Issue date Jun 4, 2024
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,953,824
- Issue date Apr 9, 2024
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of mask data synthesis and mask making
- Patent number 11,947,254
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu-Ting Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frame member for electron beam lithography device and electron beam...
- Patent number 11,934,096
- Issue date Mar 19, 2024
- Kyocera Corporation
- Shigenobu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dummy insertion for improving throughput of electron beam lithography
- Patent number 11,899,367
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,783,110
- Issue date Oct 10, 2023
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 11,704,463
- Issue date Jul 18, 2023
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,693,306
- Issue date Jul 4, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,687,006
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dummy insertion for improving throughput of electron beam lithography
- Patent number 11,526,081
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Secondary electron generating composition
- Patent number 11,487,199
- Issue date Nov 1, 2022
- The University of Manchester
- Scott Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor apparatus and method of operating the same
- Patent number 11,467,488
- Issue date Oct 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, negative resist composition, and resist pattern forming...
- Patent number 11,429,023
- Issue date Aug 30, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photomask including fiducial mark and method of making semiconducto...
- Patent number 11,422,466
- Issue date Aug 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of mask data synthesis and mask making
- Patent number 11,415,890
- Issue date Aug 16, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Ting Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,327,405
- Issue date May 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing photomask, method for producing semiconductor...
- Patent number 11,275,305
- Issue date Mar 15, 2022
- Kioxia Corporation
- Yukio Oppata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Filler particles for polymers
- Patent number 11,254,775
- Issue date Feb 22, 2022
- Texas Instruments Incorporated
- Nazila Dadvand
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Portion of layer removal at substrate edge
- Patent number 11,054,746
- Issue date Jul 6, 2021
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dummy insertion for improving throughput of electron beam lithography
- Patent number 11,054,748
- Issue date Jul 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark, method of patterning the photoma...
- Patent number 11,042,084
- Issue date Jun 22, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating reticle
- Patent number 11,003,091
- Issue date May 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 10,997,345
- Issue date May 4, 2021
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENTS PATTERNING
- Publication number 20240353751
- Publication date Oct 24, 2024
- TEL Manufacturing and Engineering of America, Inc.
- Angelique Raley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING DEVICE AND DRAWING METHOD
- Publication number 20240312761
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Yoshinori KAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240289532
- Publication date Aug 29, 2024
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240280890
- Publication date Aug 22, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240210815
- Publication date Jun 27, 2024
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING INTEGRATED CIRCUIT
- Publication number 20240201579
- Publication date Jun 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240045320
- Publication date Feb 8, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20230288813
- Publication date Sep 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230289510
- Publication date Sep 14, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230288796
- Publication date Sep 14, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dummy Insertion for Improving Throughput of Electron Beam Lithography
- Publication number 20230273524
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SECONDARY ELECTRON GENERATING COMPOSITION
- Publication number 20230266665
- Publication date Aug 24, 2023
- The University of Manchester
- Scott LEWIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230213852
- Publication date Jul 6, 2023
- SEMES CO., LTD.
- Ji Hoon Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...
- Publication number 20230185188
- Publication date Jun 15, 2023
- KIOXIA Corporation
- Yoshinori KAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OBTAINING AN EXPOSURE DATA AND METHOD FOR MANUFACTURING...
- Publication number 20230152682
- Publication date May 18, 2023
- Samsung Electronics Co., Ltd.
- Soeun Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR SETTING A SIDE WALL ANGLE OF A PATTERN ELE...
- Publication number 20230109566
- Publication date Apr 6, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PAR...
- Publication number 20230095091
- Publication date Mar 30, 2023
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK PROCESS CORRECTION METHODS AND METHODS OF FABRICATING LITHOGRA...
- Publication number 20230074316
- Publication date Mar 9, 2023
- Samsung Electronics Co., Ltd.
- Soeun Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFERENCE LITHOGRAPHY USING REFLECTIVE BASE SURFACES
- Publication number 20230042586
- Publication date Feb 9, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230035090
- Publication date Feb 2, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...
- Publication number 20230034170
- Publication date Feb 2, 2023
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20220382145
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MASK DATA SYNTHESIS AND MASK MAKING
- Publication number 20220373878
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...
- Publication number 20220301816
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Yoshinori KAGAWA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20220260926
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILLER PARTICLES FOR POLYMERS
- Publication number 20220169773
- Publication date Jun 2, 2022
- TEXAS INSTRUMENTS INCORPORATED
- Nazila DADVAND
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ENHANCED GRATING ALIGNED PATTERNING FOR EUV DIRECT PRINT PROCESSES
- Publication number 20220172857
- Publication date Jun 2, 2022
- Intel Corporation
- Seyedhamed M BARGHI
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Dummy Insertion for Improving Throughput of Electron Beam Lithography
- Publication number 20210405534
- Publication date Dec 30, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING RETICLE
- Publication number 20210263425
- Publication date Aug 26, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Yi CHUNG
- H01 - BASIC ELECTRIC ELEMENTS

by charged particle beam [CPB]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Filler particles for polymers

Method, apparatus and computer program for analyzing and/or process...

Method of manufacturing photo masks

Method for reticle enhancement technology of a design pattern to be...

Reflective mask blank, reflective mask, method of manufacturing ref...

Method for reticle enhancement technology of a design pattern to be...

Method of mask data synthesis and mask making

Method of fabricating reticle

Frame member for electron beam lithography device and electron beam...

Dummy insertion for improving throughput of electron beam lithography

Photomask including fiducial mark and method of making a semiconduc...

Method for reticle enhancement technology of a design pattern to be...

Method of etch model calibration using optical scatterometry

Method for reticle enhancement technology of a design pattern to be...

Method of manufacturing photo masks

Dummy insertion for improving throughput of electron beam lithography

Secondary electron generating composition

Semiconductor apparatus and method of operating the same

Onium salt, negative resist composition, and resist pattern forming...

Photomask including fiducial mark and method of making semiconducto...

Method of mask data synthesis and mask making

Method of manufacturing photo masks

Method for producing photomask, method for producing semiconductor...

Filler particles for polymers

Bias correction for lithography

Portion of layer removal at substrate edge

Dummy insertion for improving throughput of electron beam lithography

Photomask including fiducial mark, method of patterning the photoma...

Method of fabricating reticle

Method of etch model calibration using optical scatterometry

Patents Applicationslast 30 patents

OPTICAL ELEMENTS PATTERNING

METHOD OF MANUFACTURING PHOTO MASKS

DRAWING DEVICE AND DRAWING METHOD

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

METHOD OF MANUFACTURING INTEGRATED CIRCUIT

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

METHOD OF MANUFACTURING PHOTO MASKS

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

Dummy Insertion for Improving Throughput of Electron Beam Lithography

SECONDARY ELECTRON GENERATING COMPOSITION

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...

METHOD FOR OBTAINING AN EXPOSURE DATA AND METHOD FOR MANUFACTURING...

METHOD AND APPARATUS FOR SETTING A SIDE WALL ANGLE OF A PATTERN ELE...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PAR...

MASK PROCESS CORRECTION METHODS AND METHODS OF FABRICATING LITHOGRA...

INTERFERENCE LITHOGRAPHY USING REFLECTIVE BASE SURFACES

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE...

SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME

METHOD OF MASK DATA SYNTHESIS AND MASK MAKING

DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...

METHOD OF MANUFACTURING PHOTO MASKS

FILLER PARTICLES FOR POLYMERS

ENHANCED GRATING ALIGNED PATTERNING FOR EUV DIRECT PRINT PROCESSES

Dummy Insertion for Improving Throughput of Electron Beam Lithography

METHOD OF FABRICATING RETICLE