by chemical mechanical polishing [CMP]

Industry

CPC
H01L21/3212

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3212by chemical mechanical polishing [CMP]

Industries

Patents Grantslast 30 patents

Information Patent Grant
Polishing compositions and methods of using the same
- Patent number 12,319,843
- Issue date Jun 3, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Qingmin Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Liner structures
- Patent number 12,324,232
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Chieh Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry composition for chemical mechanical polishing
- Patent number 12,319,841
- Issue date Jun 3, 2025
- Samsung Electronics Co., Ltd.
- Inkwon Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Displacement measurements in semiconductor wafer processing
- Patent number 12,322,662
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Justin Wong
- B24 - GRINDING POLISHING
Information Patent Grant
Graphene barrier layer for reduced contact resistance
- Patent number 12,315,811
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shin-Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP slurry composition for polishing polycrystalline silicon and po...
- Patent number 12,305,079
- Issue date May 20, 2025
- KCTECH Co., Ltd.
- Jae Woo Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods for processing semiconductor wafers having a polycrystallin...
- Patent number 12,308,247
- Issue date May 20, 2025
- GlobalWafers Co., Ltd.
- Alexis Grabbe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric MFM capacitor array and methods of making the same
- Patent number 12,302,590
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device having a dummy section
- Patent number 12,300,543
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Osamu Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing method
- Patent number 12,300,508
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tung-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and structure for source/drain contacts
- Patent number 12,300,727
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Huan Jao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for CMP temperature control
- Patent number 12,296,427
- Issue date May 13, 2025
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry composition and method for polishing and integrated circuit
- Patent number 12,297,375
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ji Cui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing apparatus and method
- Patent number 12,296,428
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing solution, polishing apparatus, and polishing method
- Patent number 12,300,499
- Issue date May 13, 2025
- Kioxia Corporation
- Mikiya Sakashita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Sag nanowire growth with a planarization process
- Patent number 12,283,483
- Issue date Apr 22, 2025
- Microsoft Technology Licensing, LLC
- Geoffrey C. Gardner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition and method with high selectivity for silicon...
- Patent number 12,269,969
- Issue date Apr 8, 2025
- CMC MATERIALS LLC
- Benjamin Petro
- B24 - GRINDING POLISHING
Information Patent Grant
Low warpage high density trench capacitor
- Patent number 12,272,725
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jyun-Ying Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact resistance between via and conductive line
- Patent number 12,266,566
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition, polishing method, and method for manufacturi...
- Patent number 12,258,492
- Issue date Mar 25, 2025
- Fujimi Incorporated
- Jingzhi Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor device
- Patent number 12,261,228
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Chung Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry compositions for chemical mechanical planarization
- Patent number 12,261,055
- Issue date Mar 25, 2025
- TAIWAN SSEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Hsuan Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Local gate height tuning by CMP and dummy gate design
- Patent number 12,243,782
- Issue date Mar 4, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING C0., LTD.
- Ming-Chang Wen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical solution, etching method, and method for manufacturing sem...
- Patent number 12,243,751
- Issue date Mar 4, 2025
- Kioxia Corporation
- Hakuba Kitagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,237,398
- Issue date Feb 25, 2025
- United Microelectronics Corp.
- Chia-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP composition including anionic and cationic inhibitors
- Patent number 12,234,382
- Issue date Feb 25, 2025
- CMC MATERIALS LLC
- Hsin-Yen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dishing oxide CMP polishing compositions for shallow trench iso...
- Patent number 12,234,383
- Issue date Feb 25, 2025
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insulator-metal structure
- Patent number 12,230,566
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yuan-Yang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal heterojunction structure with capping metal layer
- Patent number 12,224,179
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Sheng Lin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor device and manufacturing method of the semiconductor...
- Patent number 12,218,247
- Issue date Feb 4, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...
- Publication number 20250183049
- Publication date Jun 5, 2025
- KIOXIA Corporation
- Hakuba KITAGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR ENABLING CHEMICAL MECHANICAL POLISHING AND BONDING OF A...
- Publication number 20250183037
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Maria Gorchichko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT STRUCTURES FOR THREE-DIMENSIONAL MEMORY
- Publication number 20250183177
- Publication date Jun 5, 2025
- Yangtze Memory Technologies Co., Ltd.
- Zhongwang SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stable Chemical Mechanical Planarization Polishing Compositions And...
- Publication number 20250171658
- Publication date May 29, 2025
- VERSUM MATERIALS US, LLC
- Maitland Graham
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20250169140
- Publication date May 22, 2025
- UNITED MICROELECTRONICS CORP.
- Chia-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal of an Etching Stop Layer for Improving Overlay Sh...
- Publication number 20250167002
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD OF MANUF...
- Publication number 20250145857
- Publication date May 8, 2025
- SK enpulse Co., Ltd.
- Deok Su HAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND MANUFACTURING M...
- Publication number 20250145860
- Publication date May 8, 2025
- SK enpulse Co., Ltd.
- Deok Su HAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD OF MANUF...
- Publication number 20250136842
- Publication date May 1, 2025
- SK enpulse Co., Ltd.
- Han Teo PARK
- B24 - GRINDING POLISHING
Information Patent Application
PLANARIZATION METHOD
- Publication number 20250132168
- Publication date Apr 24, 2025
- UNITED MICROELECTRONICS CORP.
- Yi-Ching Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-DAMAGE-RESISTANT INTERCONNECT STRUCTURE AND METHODS FOR MANU...
- Publication number 20250132258
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Jheng-Hong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEEP TRENCH INTERSECTIONS
- Publication number 20250133780
- Publication date Apr 24, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Binghua Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250129267
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Yoonseok KO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor Structure Cutting Process and Structures Formed Thereby
- Publication number 20250126883
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROELECTRONIC ASSEMBLY FROM PROCESSED SUBSTRATE
- Publication number 20250125196
- Publication date Apr 17, 2025
- ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
- Cyprian Emeka Uzoh
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SILICA PARTICLES, PRODUCTION METHOD THEREFOR, SILICA SOL, POLISHING...
- Publication number 20250122408
- Publication date Apr 17, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta SHIMADA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD OF BONDING MULTIPLE COPPER ELEMENTS AND METHOD OF BONDING MU...
- Publication number 20250125185
- Publication date Apr 17, 2025
- National Cheng Kung University
- Shih-kang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLI...
- Publication number 20250115785
- Publication date Apr 10, 2025
- Samsung Electronics Co., Ltd.
- Wonki HUR
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
- Publication number 20250118604
- Publication date Apr 10, 2025
- EBARA CORPORATION
- Akira FUKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURI...
- Publication number 20250109319
- Publication date Apr 3, 2025
- FUJIMI INCORPORATED
- Masashi ABE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING APPARATUS HAVING BEAM FOR SURFACE TREATMENT AND POLISHING...
- Publication number 20250112050
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Hao JHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250113538
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YI CHEN LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION, POST-CHEMI...
- Publication number 20250109353
- Publication date Apr 3, 2025
- Fujimi Incorporated
- Takahiro ITO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
DIRECT-BONDED LED ARRAYS AND DRIVER CIRCUITS
- Publication number 20250105234
- Publication date Mar 27, 2025
- ADEIA SEMICONDUCTOR TECHNOLOGIES LLC
- Min Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20250101263
- Publication date Mar 27, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP POLISHING SOLUTION, STORAGE SOLUTION, AND POLISHING METHOD
- Publication number 20250101260
- Publication date Mar 27, 2025
- Resonac Corporation
- Keisuke INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION AND METHOD FOR POLISHING SUBSTRATE USING THE...
- Publication number 20250084281
- Publication date Mar 13, 2025
- Fujimi Incorporated
- Shogo ONISHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TITANIUM OXIDE-BASED CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR...
- Publication number 20250075104
- Publication date Mar 6, 2025
- Entegris, Inc.
- Alex Villani-Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACOUSTIC MONITORING FOR PROCESS RELIABILITY DURING POLISHING
- Publication number 20250062163
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Nicholas A. Wiswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250054764
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- KE-JING YU
- H01 - BASIC ELECTRIC ELEMENTS

by chemical mechanical polishing [CMP]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polishing compositions and methods of using the same

Liner structures

Slurry composition for chemical mechanical polishing

Displacement measurements in semiconductor wafer processing

Graphene barrier layer for reduced contact resistance

CMP slurry composition for polishing polycrystalline silicon and po...

Methods for processing semiconductor wafers having a polycrystallin...

Ferroelectric MFM capacitor array and methods of making the same

Method for manufacturing a semiconductor device having a dummy section

Chemical mechanical polishing method

Process and structure for source/drain contacts

Apparatus and method for CMP temperature control

Slurry composition and method for polishing and integrated circuit

Chemical mechanical polishing apparatus and method

Polishing solution, polishing apparatus, and polishing method

Sag nanowire growth with a planarization process

Polishing composition and method with high selectivity for silicon...

Low warpage high density trench capacitor

Contact resistance between via and conductive line

Polishing composition, polishing method, and method for manufacturi...

Semiconductor device

Slurry compositions for chemical mechanical planarization

Local gate height tuning by CMP and dummy gate design

Chemical solution, etching method, and method for manufacturing sem...

Semiconductor device and method for fabricating the same

CMP composition including anionic and cationic inhibitors

Low dishing oxide CMP polishing compositions for shallow trench iso...

Metal-insulator-metal structure

Metal heterojunction structure with capping metal layer

Semiconductor device and manufacturing method of the semiconductor...

Patents Applicationslast 30 patents

CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...

METHODS FOR ENABLING CHEMICAL MECHANICAL POLISHING AND BONDING OF A...

CONTACT STRUCTURES FOR THREE-DIMENSIONAL MEMORY

Stable Chemical Mechanical Planarization Polishing Compositions And...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

Selective Removal of an Etching Stop Layer for Improving Overlay Sh...

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD OF MANUF...

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND MANUFACTURING M...

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD OF MANUF...

PLANARIZATION METHOD

PLASMA-DAMAGE-RESISTANT INTERCONNECT STRUCTURE AND METHODS FOR MANU...

DEEP TRENCH INTERSECTIONS

POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Semiconductor Structure Cutting Process and Structures Formed Thereby

MICROELECTRONIC ASSEMBLY FROM PROCESSED SUBSTRATE

SILICA PARTICLES, PRODUCTION METHOD THEREFOR, SILICA SOL, POLISHING...

METHOD OF BONDING MULTIPLE COPPER ELEMENTS AND METHOD OF BONDING MU...

SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLI...

SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD

POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURI...

POLISHING APPARATUS HAVING BEAM FOR SURFACE TREATMENT AND POLISHING...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION, POST-CHEMI...

DIRECT-BONDED LED ARRAYS AND DRIVER CIRCUITS

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

CMP POLISHING SOLUTION, STORAGE SOLUTION, AND POLISHING METHOD

POLISHING COMPOSITION AND METHOD FOR POLISHING SUBSTRATE USING THE...

TITANIUM OXIDE-BASED CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR...

ACOUSTIC MONITORING FOR PROCESS RELIABILITY DURING POLISHING

SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME