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H01L21/28194

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/28194by deposition

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming doped metal oxide films on a substrate by cyclic...
- Patent number 12,354,872
- Issue date Jul 8, 2025
- ASM IP Holding B.V.
- Tom Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having isolation structure formed of low-k die...
- Patent number 12,336,235
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Hua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal caps for gate structures
- Patent number 12,336,244
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Hang Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and semiconductor device manufacturing method
- Patent number RE50457
- Issue date Jun 10, 2025
- Sony Group Corporation
- Yasushi Tateshita
Information Patent Grant
Conformal and smooth titanium nitride layers and methods of forming...
- Patent number 12,308,226
- Issue date May 20, 2025
- Eugenus, Inc.
- Sung-Hoon Jung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium nitride adhesion layer
- Patent number 12,302,605
- Issue date May 13, 2025
- ZINITE CORPORATION
- Kenneth C. Cadien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-k feature formation processes and structures formed thereby
- Patent number 12,255,241
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to improve device performance
- Patent number 12,249,511
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses including Finfets having different gate oxide configura...
- Patent number 12,199,094
- Issue date Jan 14, 2025
- Micron Technology, Inc.
- Hyuck Soo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,191,144
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yi Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor having conformal and non-conformal gate...
- Patent number 12,170,321
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuei-Lun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a semiconductor device structure and related se...
- Patent number 12,166,099
- Issue date Dec 10, 2024
- ASM IP Holding B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device including ferroelectri...
- Patent number 12,148,829
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wilman Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming ion sensors
- Patent number 12,140,557
- Issue date Nov 12, 2024
- Life Technologies Corporation
- Phil Waggoner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method forming the same
- Patent number 12,131,973
- Issue date Oct 29, 2024
- Vanguard International Semiconductor Corporation
- Hsiu-Mei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate spacer structures and methods for forming the same
- Patent number 12,119,390
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NMOS and PMOS transistor gates with hafnium oxide layers and lantha...
- Patent number 12,107,015
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with nanofog oxide adhered to inert or weak...
- Patent number 12,080,549
- Issue date Sep 3, 2024
- The Regents of the University of California
- Iljo Kwak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming 2-D material semiconductor device with improved...
- Patent number 12,080,557
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Yen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance semiconductor oxide material channel regions for NMOS
- Patent number 12,068,319
- Issue date Aug 20, 2024
- Intel Corporation
- Gilbert Dewey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device structure with gate
- Patent number 12,051,594
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuei-Lun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PMOS high-k metal gates
- Patent number 12,051,734
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode formation
- Patent number 12,046,658
- Issue date Jul 23, 2024
- Micron Technology, Inc.
- An-Jen B. Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,033,850
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yi Chou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate stacks for semiconductor devices of different conductivity types
- Patent number 12,015,030
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-dielectric gate stack for crystalline thin film transistors
- Patent number 12,009,433
- Issue date Jun 11, 2024
- Intel Corporation
- Van H. Le
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D semiconductor device and structure with metal layers
- Patent number 11,990,462
- Issue date May 21, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursor solution for thin film deposition and thin film forming m...
- Patent number 11,972,941
- Issue date Apr 30, 2024
- SK TRICHEM
- Chang Sung Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device including buried gate structure and method for...
- Patent number 11,943,912
- Issue date Mar 26, 2024
- SK Hynix Inc.
- Dong-Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,929,403
- Issue date Mar 12, 2024
- Kabushiki Kaisha Toshiba
- Masaharu Shimabayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HAFNIUM NITRIDE ADHESION LAYER
- Publication number 20250220963
- Publication date Jul 3, 2025
- Zinite Corporation
- Kenneth C. CADIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-K FEATURE FORMATION PROCESSES AND STRUCTURES FORMED THEREBY
- Publication number 20250169102
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250107129
- Publication date Mar 27, 2025
- Kabushiki Kaisha Toshiba
- Masaharu SHIMABAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL AND CARBON CONTAINING LAYERS, INCLUDING METHODS AND SYSTEMS F...
- Publication number 20250105012
- Publication date Mar 27, 2025
- ASM IP HOLDING B.V.
- Charles Dezelah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING GATE OXIDE LAYER FOR HIGH-VOLTAGE TRANSISTOR
- Publication number 20250089324
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Jhu-Min Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250087482
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yi CHOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...
- Publication number 20250081588
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MEMORY STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20250063715
- Publication date Feb 20, 2025
- WINBOND ELECTRONICS CORP.
- Ji-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Spacer Structures And Methods For Forming The Same
- Publication number 20250040218
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250022766
- Publication date Jan 16, 2025
- Vanguard International Semiconductor Corporation
- Hsiu-Mei YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240379848
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wilman TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH GATE AND METHOD FOR FORMING THE...
- Publication number 20240371643
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Lun LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NMOS and PMOS Transistor Gates with Hafnium Oxide Layers and Lantha...
- Publication number 20240363442
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HAFNIUM NITRIDE ADHESION LAYER
- Publication number 20240355895
- Publication date Oct 24, 2024
- Zinite Corporation
- Kenneth C. CADIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240170341
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AREA-SELECTIVE REMOVAL AND SELECTIVE METAL CAP
- Publication number 20240097005
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Hang Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D SEMICONDUCTOR DEVICE AND STRUCTURE WITH METAL LAYERS
- Publication number 20240079401
- Publication date Mar 7, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240055260
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATION STRUCTURES IN MULTI-GATE FIELD-EFFECT TRANSISTORS
- Publication number 20240047518
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Yeh CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
2-D MATERIAL SEMICONDUCTOR DEVICE
- Publication number 20240030034
- Publication date Jan 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Yen LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURE FORMED OF LOW-K DIE...
- Publication number 20240030281
- Publication date Jan 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Hua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF FORMING SAME
- Publication number 20240021693
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuei-Lun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FORMING THE SAME
- Publication number 20230420328
- Publication date Dec 28, 2023
- Vanguard International Semiconductor Corporation
- Hsiu-Mei YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMOOTH TITANIUM NITRIDE LAYERS AND METHODS OF FORMING THE SAME
- Publication number 20230395369
- Publication date Dec 7, 2023
- EUGENUS, INC.
- Sung-Hoon Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...
- Publication number 20230352556
- Publication date Nov 2, 2023
- ASM IP HOLDING B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDE INSULATOR FILM, ELECTRONIC DEVICE AND METHOD FOR PRODUCING EL...
- Publication number 20230326624
- Publication date Oct 12, 2023
- Panasonic Intellectual Property Management Co., Ltd.
- Takashi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-k Feature Formation Processes and Structures Formed Thereby
- Publication number 20230275136
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING DOPED METAL OXIDE FILMS ON A SUBSTRATE BY CYCLIC...
- Publication number 20230260784
- Publication date Aug 17, 2023
- ASM IP HOLDING B.V.
- Tom Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL AND SMOOTH TITANIUM NITRIDE LAYERS AND METHODS OF FORMING...
- Publication number 20230215725
- Publication date Jul 6, 2023
- EUGENUS, INC.
- Sung-Hoon Jung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL STRONTIUM TITANATE ON SILICON
- Publication number 20230197443
- Publication date Jun 22, 2023
- Psiquantum, Corp.
- Yong Liang
- H01 - BASIC ELECTRIC ELEMENTS

by deposition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for forming doped metal oxide films on a substrate by cyclic...

Semiconductor device having isolation structure formed of low-k die...

Metal caps for gate structures

Semiconductor device and semiconductor device manufacturing method

Conformal and smooth titanium nitride layers and methods of forming...

Hafnium nitride adhesion layer

Low-k feature formation processes and structures formed thereby

Treatments to improve device performance

Apparatuses including Finfets having different gate oxide configura...

Semiconductor device and manufacturing method thereof

Fin field effect transistor having conformal and non-conformal gate...

Methods for forming a semiconductor device structure and related se...

Method of manufacturing semiconductor device including ferroelectri...

Method of forming ion sensors

Semiconductor device and method forming the same

Gate spacer structures and methods for forming the same

NMOS and PMOS transistor gates with hafnium oxide layers and lantha...

Semiconductor structure with nanofog oxide adhered to inert or weak...

Method for forming 2-D material semiconductor device with improved...

High performance semiconductor oxide material channel regions for NMOS

Method for forming semiconductor device structure with gate

PMOS high-k metal gates

Electrode formation

Semiconductor device and manufacturing method thereof

Gate stacks for semiconductor devices of different conductivity types

Multi-dielectric gate stack for crystalline thin film transistors

3D semiconductor device and structure with metal layers

Precursor solution for thin film deposition and thin film forming m...

Semiconductor device including buried gate structure and method for...

Method of manufacturing semiconductor device

Patents Applicationslast 30 patents

HAFNIUM NITRIDE ADHESION LAYER

LOW-K FEATURE FORMATION PROCESSES AND STRUCTURES FORMED THEREBY

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METAL AND CARBON CONTAINING LAYERS, INCLUDING METHODS AND SYSTEMS F...

METHODS FOR FORMING GATE OXIDE LAYER FOR HIGH-VOLTAGE TRANSISTOR

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...

SEMICONDUCTOR MEMORY STRUCTURE AND METHOD FOR FORMING THE SAME

Gate Spacer Structures And Methods For Forming The Same

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE STRUCTURE WITH GATE AND METHOD FOR FORMING THE...

NMOS and PMOS Transistor Gates with Hafnium Oxide Layers and Lantha...

HAFNIUM NITRIDE ADHESION LAYER

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

AREA-SELECTIVE REMOVAL AND SELECTIVE METAL CAP

3D SEMICONDUCTOR DEVICE AND STRUCTURE WITH METAL LAYERS

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

ISOLATION STRUCTURES IN MULTI-GATE FIELD-EFFECT TRANSISTORS

2-D MATERIAL SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURE FORMED OF LOW-K DIE...

GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF FORMING SAME

SEMICONDUCTOR DEVICE AND METHOD FORMING THE SAME

SMOOTH TITANIUM NITRIDE LAYERS AND METHODS OF FORMING THE SAME

METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...

OXIDE INSULATOR FILM, ELECTRONIC DEVICE AND METHOD FOR PRODUCING EL...

Low-k Feature Formation Processes and Structures Formed Thereby

METHOD FOR FORMING DOPED METAL OXIDE FILMS ON A SUBSTRATE BY CYCLIC...

CONFORMAL AND SMOOTH TITANIUM NITRIDE LAYERS AND METHODS OF FORMING...

EPITAXIAL STRONTIUM TITANATE ON SILICON