by drawing, writing

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CPC
G03F1/0015

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

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G03F1/0015by drawing, writing

Industries

Patents Grantslast 30 patents

Information Patent Grant
Conductive bi-layer e-beam resist with amorphous carbon
- Patent number 6,913,868
- Issue date Jul 5, 2005
- Applied Materials, Inc.
- Christopher D. Bencher
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Conductive bi-layer e-beam resist with amorphous carbon
- Publication number 20040142281
- Publication date Jul 22, 2004
- APPLIED MATERIALS, INC.
- Christopher D. Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY