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H01L21/31138

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/31138by dry-etching

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for forming semiconductor memory structure
- Patent number 12,148,627
- Issue date Nov 19, 2024
- Winbond Electronics Corp.
- Hsin-Hung Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming recesses in source/drain regions and devices fo...
- Patent number 12,132,089
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing blocking layers on metal surfaces
- Patent number 12,131,900
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to form contacts with multiple depth by enhanced CESL
- Patent number 12,131,946
- Issue date Oct 29, 2024
- SiEn (QingDao) Integrated Circuits Co., Ltd
- Min-Hwa Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating method of etching device
- Patent number 12,131,892
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Feng-Ju Tsai
- B08 - CLEANING
Information Patent Grant
Method for manufacturing display substrate, display substrate and d...
- Patent number 12,113,076
- Issue date Oct 8, 2024
- HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.
- Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 12,112,954
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method, and dry etching agent and storage container the...
- Patent number 12,100,600
- Issue date Sep 24, 2024
- Central Glass Company, Limited
- Hiroyuki Oomori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Atomic layer etch and ion beam etch patterning
- Patent number 12,080,562
- Issue date Sep 3, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of detecting photoresist scum, method of forming semiconduct...
- Patent number 12,080,609
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing a substrate
- Patent number 12,074,009
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Yuki Iijima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,062,522
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Keiji Kitagaito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,051,595
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
By-site-compensated etch back for local planarization/topography ad...
- Patent number 12,046,477
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming nanostructures using self-assembled nucleic acid...
- Patent number RE50029
- Issue date Jul 2, 2024
- Micron Technology, Inc.
- Scott E. Sills
Information Patent Grant
Apparatus for processing a substrate
- Patent number 12,020,904
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Yuki Iijima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method
- Patent number 12,020,942
- Issue date Jun 25, 2024
- ULVAC, Inc.
- Taichi Suzuki
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Integrated circuit structure and fabrication thereof
- Patent number 12,020,987
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Hsien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing resist layer, method of forming a pattern and m...
- Patent number 12,013,645
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Christine Y Ouyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric layer, interconnection structure using the same, and man...
- Patent number 12,014,919
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Chen Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 12,009,228
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming source/drain contacts
- Patent number 12,009,363
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 12,002,718
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacture method of array substrate, array substrate, and display...
- Patent number 11,961,852
- Issue date Apr 16, 2024
- HKC CORPORATION LIMITED
- En-Tsung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 11,955,336
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,948,778
- Issue date Apr 2, 2024
- Kokusai Electric Corporation
- Hidehiro Yanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Combined RF generator and RF solid-state matching network
- Patent number 11,948,775
- Issue date Apr 2, 2024
- ASM AMERICA, INC.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PASSIVATION LAYERS WITH ROUNDED CORNERS
- Publication number 20240387244
- Publication date Nov 21, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Mingni CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...
- Publication number 20240387185
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND STRUCTURE FOR SOURCE/DRAIN CONTACTS
- Publication number 20240379775
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Huan Jao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCT...
- Publication number 20240363450
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240363330
- Publication date Oct 31, 2024
- NANYA TECHNOLOGY CORPORATION
- Szu Yu HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SOURCE/DRAIN CONTACTS
- Publication number 20240332298
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POROUS STRUCTURE WITH MICROCHANNELS
- Publication number 20240332124
- Publication date Oct 3, 2024
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Sujan Dewanjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20240304453
- Publication date Sep 12, 2024
- Ulvac, Inc.
- Taichi SUZUKI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...
- Publication number 20240297038
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Chen HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Process
- Publication number 20240297041
- Publication date Sep 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...
- Publication number 20240288776
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Christine Y. Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD
- Publication number 20240282641
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AIR GAP AND METHOD FOR MANUFACTURING TH...
- Publication number 20240266212
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Hao LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition of Passivating Layer During Spacer Etching
- Publication number 20240258108
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258129
- Publication date Aug 1, 2024
- Lam Reseach Corporation
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258130
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258131
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240249941
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD
- Publication number 20240250036
- Publication date Jul 25, 2024
- TAIWAN SEMICODUCTOR MANUFACTURING CO., LTD.
- Shih-Hao Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240242972
- Publication date Jul 18, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFYING PATTERNED FEATURES USING A DIRECTIONAL ETCH
- Publication number 20240234161
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Tassie Andersen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LITHOGRAPHY AND NANOENGINEERING
- Publication number 20240222073
- Publication date Jul 4, 2024
- Intel Corporation
- Shida Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240212989
- Publication date Jun 27, 2024
- Kokusai Electric Corporation
- Hidehiro YANAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT
- Publication number 20240213038
- Publication date Jun 27, 2024
- Nichia Corporation.
- Hirofumi KAWAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER
- Publication number 20240177970
- Publication date May 30, 2024
- ASM IP HOLDING B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Metal Oxide Film, Patterning Process, And M...
- Publication number 20240153771
- Publication date May 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFYING PATTERNED FEATURES USING A DIRECTIONAL ETCH
- Publication number 20240136197
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Tassie Andersen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240120207
- Publication date Apr 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lung-Kai Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE SELECTIVE ETCHING TECHNOLOGY FOR THICK SOI DEVICES
- Publication number 20240112914
- Publication date Apr 4, 2024
- University of Electronic Science and Technology of China
- Bo ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SELF-ASSEMBLED MONOLAYER FOR SELECTIVE ETCHING PROCESS
- Publication number 20240105462
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Hsiu CHEN
- H01 - BASIC ELECTRIC ELEMENTS

by dry-etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for forming semiconductor memory structure

Symmetric plasma source to generate pie-shaped treatment

Methods for forming recesses in source/drain regions and devices fo...

Methods for depositing blocking layers on metal surfaces

Method to form contacts with multiple depth by enhanced CESL

Operating method of etching device

Method for manufacturing display substrate, display substrate and d...

Etching method, substrate processing apparatus, and substrate proce...

Dry etching method, and dry etching agent and storage container the...

Tin oxide films in semiconductor device manufacturing

Composition for forming silicon-containing resist underlayer film a...

Atomic layer etch and ion beam etch patterning

Method of detecting photoresist scum, method of forming semiconduct...

Apparatus for processing a substrate

Plasma etching method and plasma etching apparatus

Plasma processing method and plasma processing apparatus

By-site-compensated etch back for local planarization/topography ad...

Methods of forming nanostructures using self-assembled nucleic acid...

Apparatus for processing a substrate

Etching method

Integrated circuit structure and fabrication thereof

Method for removing resist layer, method of forming a pattern and m...

Dielectric layer, interconnection structure using the same, and man...

Low temperature chuck for plasma processing systems

Method for forming source/drain contacts

Fin field-effect transistor device and method

Manufacture method of array substrate, array substrate, and display...

Method of manufacturing a semiconductor device

Substrate processing apparatus, method of manufacturing semiconduct...

Combined RF generator and RF solid-state matching network

Patents Applicationslast 30 patents

PASSIVATION LAYERS WITH ROUNDED CORNERS

BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...

PROCESS AND STRUCTURE FOR SOURCE/DRAIN CONTACTS

METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCT...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD FOR FORMING SOURCE/DRAIN CONTACTS

POROUS STRUCTURE WITH MICROCHANNELS

ETCHING METHOD

DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...

Patterning Process

METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...

FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD

SEMICONDUCTOR DEVICE HAVING AIR GAP AND METHOD FOR MANUFACTURING TH...

Selective Deposition of Passivating Layer During Spacer Etching

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR PACKAGE AND METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

MODIFYING PATTERNED FEATURES USING A DIRECTIONAL ETCH

ION BEAM LITHOGRAPHY AND NANOENGINEERING

SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...

METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT

SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER

Composition For Forming Metal Oxide Film, Patterning Process, And M...

MODIFYING PATTERNED FEATURES USING A DIRECTIONAL ETCH

SEMICONDUCTOR PACKAGES AND METHODS OF MANUFACTURING THEREOF

VARIABLE SELECTIVE ETCHING TECHNOLOGY FOR THICK SOI DEVICES

FORMATION OF SELF-ASSEMBLED MONOLAYER FOR SELECTIVE ETCHING PROCESS