by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns

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CPC
G03F1/10

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/10by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns

Industries

Patents Grantslast 30 patents

Information Patent Grant
Conductive alignment layer, manufacture method of the conductive al...
- Patent number 10,048,540
- Issue date Aug 14, 2018
- BOE Technology Group Co., Ltd.
- Wenbo Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ablatable direct write imaging medium
- Patent number 6,828,067
- Issue date Dec 7, 2004
- Precision Coatings, Inc.
- Norman Sweet
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
MASK FRAME ASSEMBLY FOR THIN FILM DEPOSITION
- Publication number 20110168087
- Publication date Jul 14, 2011
- Choong-Ho Lee
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Ablatable direct write imaging medium
- Publication number 20020164495
- Publication date Nov 7, 2002
- Norman Sweet
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC