by photographic processes for production of originals simulating relief

Industry

CPC
G03F1/02

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/02by photographic processes for production of originals simulating relief

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure
- Patent number 10,163,787
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hui Yu Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Manufacturing method of color resist layer
- Patent number 9,897,848
- Issue date Feb 20, 2018
- Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Lixuan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor structure having a plurality of conductive paths
- Patent number 9,698,099
- Issue date Jul 4, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui Yu Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor structure and method of generating masks for making i...
- Patent number 9,053,255
- Issue date Jun 9, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui Yu Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for enhanced optical proximity correction
- Patent number 8,589,830
- Issue date Nov 19, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Cheng Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern-dependent proximity matching/tuning including light manipul...
- Patent number 8,560,978
- Issue date Oct 15, 2013
- ASML Netherlands B.V.
- Hanying Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
1807822
- Patent number 1,807,822
- Issue date Jun 2, 1931
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MANUFACTURING METHOD OF COLOR RESIST LAYER
- Publication number 20170371200
- Publication date Dec 28, 2017
- Shenzhen China Star Optoelectronics Technology Co. LTD.
- Lixuan Chen
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF GENERATING MASKS FOR MAKING I...
- Publication number 20140103545
- Publication date Apr 17, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui Yu LEE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN-DEPENDENT PROXIMITY MATCHING/TUNING INCLUDING LIGHT MANIPUL...
- Publication number 20140033145
- Publication date Jan 30, 2014
- Hanying FENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR ENHANCED OPTICAL PROXIMITY CORRECTION
- Publication number 20130239071
- Publication date Sep 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Cheng Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern-Dependent Proximity Matching/Tuning Including Light Manipul...
- Publication number 20120117521
- Publication date May 10, 2012
- ASML NETHERLANDS B.V.
- Hanying Feng
- G06 - COMPUTING CALCULATING COUNTING

by photographic processes for production of originals simulating relief

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor structure

Manufacturing method of color resist layer

Semiconductor structure having a plurality of conductive paths

Semiconductor structure and method of generating masks for making i...

Method and apparatus for enhanced optical proximity correction

Pattern-dependent proximity matching/tuning including light manipul...

1807822

Patents Applicationslast 30 patents

MANUFACTURING METHOD OF COLOR RESIST LAYER

SEMICONDUCTOR STRUCTURE AND METHOD OF GENERATING MASKS FOR MAKING I...

PATTERN-DEPENDENT PROXIMITY MATCHING/TUNING INCLUDING LIGHT MANIPUL...

METHOD AND APPARATUS FOR ENHANCED OPTICAL PROXIMITY CORRECTION

Pattern-Dependent Proximity Matching/Tuning Including Light Manipul...