Calibration of components of the microlithographic apparatus

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G03F7/70516

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/70516Calibration of components of the microlithographic apparatus

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Patents Grantslast 30 patents

Information Patent Grant
Method for calibration of an optical measurement system and optical...
- Patent number 12,270,647
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for determining initial contact control values fo...
- Patent number 12,235,587
- Issue date Feb 25, 2025
- Canon Kabushiki Kaisha
- Daniel Ironside
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation source testing
- Patent number 12,169,363
- Issue date Dec 17, 2024
- Cymer, LLC
- Russell Allen Burdt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask correction method, mask correction device for double patternin...
- Patent number 12,147,155
- Issue date Nov 19, 2024
- United Microelectronics Corp.
- Min-Cheng Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for photolithographic imaging
- Patent number 12,117,730
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for correcting lithography systems
- Patent number 12,099,308
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Qin Zhong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for generating a control scheme and device manufacturing method
- Patent number 12,085,913
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Marc Hauptmann
- G05 - CONTROLLING REGULATING
Information Patent Grant
Light source calibration method and system employed in source mask...
- Patent number 12,050,407
- Issue date Jul 30, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and lithographic apparatuses
- Patent number 12,025,925
- Issue date Jul 2, 2024
- ASML Netherlands B.V.
- Filippo Alpeggiani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection using semiconductor detector
- Patent number 12,009,177
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Chin King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Image based learning correction for mitigating thermal ghosting in...
- Patent number 11,900,588
- Issue date Feb 13, 2024
- Xerox Corporation
- Joseph C. Sheflin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,880,142
- Issue date Jan 23, 2024
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acoustic particle deflection in lithography tool
- Patent number 11,822,259
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control device, lithography apparatus, measurement apparatus, proce...
- Patent number 11,809,089
- Issue date Nov 7, 2023
- Canon Kabushiki Kaisha
- Tosiya Asano
- G05 - CONTROLLING REGULATING
Information Patent Grant
Calibration method for a lithographic system
- Patent number 11,774,861
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Cornelis Melchior Brouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active reticle carrier for in situ stage correction
- Patent number 11,774,866
- Issue date Oct 3, 2023
- KLA Corporation
- Avner Safrani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for overlay measurement based on soft X-ray Sca...
- Patent number 11,698,251
- Issue date Jul 11, 2023
- KLA Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint apparatus and article manufacturing method
- Patent number 11,673,313
- Issue date Jun 13, 2023
- Canon Kabushiki Kaisha
- Kenji Yaegashi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method and apparatus for characterizing a microlithographic mask
- Patent number 11,619,882
- Issue date Apr 4, 2023
- Carl Zeiss SMT GmbH
- Ulrich Matejka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining the initial contact point for partial fields...
- Patent number 11,614,693
- Issue date Mar 28, 2023
- Canon Kabushiki Kaisha
- Xiaoming Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,604,419
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,604,420
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electronic system, accelerometer, calibration method, lithographic...
- Patent number 11,561,479
- Issue date Jan 24, 2023
- ASML Netherlands B.V.
- Hans Butler
- G01 - MEASURING TESTING
Information Patent Grant
Method of calibrating a plurality of metrology apparatuses, method...
- Patent number 11,556,060
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Seyed Iman Mossavat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,531,279
- Issue date Dec 20, 2022
- Onto Innovation Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two-dimensional position encoder
- Patent number 11,467,506
- Issue date Oct 11, 2022
- NIKON CORPORATION
- Zhiqiang Liu
- G01 - MEASURING TESTING
Information Patent Grant
Control device for generating a control deviation via machine learning
- Patent number 11,460,781
- Issue date Oct 4, 2022
- Canon Kabushiki Kaisha
- Tosiya Asano
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for the qualification of a mask for microlithography
- Patent number 11,460,785
- Issue date Oct 4, 2022
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250028250
- Publication date Jan 23, 2025
- Carl Zeiss SMT GMBH
- Florian Baumer
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM
- Publication number 20250028252
- Publication date Jan 23, 2025
- XSYS PREPRESS N.V.
- Frederik DEFOUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS
- Publication number 20250021017
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Raaja Ganapathy SUBRAMANIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20240429672
- Publication date Dec 26, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...
- Publication number 20240419085
- Publication date Dec 19, 2024
- KIOXIA Corporation
- Yoshio MIZUTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...
- Publication number 20240345488
- Publication date Oct 17, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Determining Initial Contact Control Values fo...
- Publication number 20240329542
- Publication date Oct 3, 2024
- Canon Kabushiki Kaisha
- Daniel IRONSIDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE
- Publication number 20240319614
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROMAGNETIC MOTOR SYSTEM, POSTION CONTROL SYSTEM, STAGE APPARAT...
- Publication number 20240313684
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY IMPROVEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240310719
- Publication date Sep 19, 2024
- Samsung Electronics Co., Ltd.
- Jonghyun HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE
- Publication number 20240302750
- Publication date Sep 12, 2024
- SAMSUNG DISPLAY CO., LTD.
- CHOULWON MIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20240295827
- Publication date Sep 5, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION USING SEMICONDUCTOR DETECTOR
- Publication number 20240290575
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND MECHANISMS FOR MODIFYING MACHINE-LEARNING MODELS FOR NE...
- Publication number 20240288779
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Waheb Bishara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...
- Publication number 20240280913
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION...
- Publication number 20240219827
- Publication date Jul 4, 2024
- Canon Kabushiki Kaisha
- Craig William Cone
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM
- Publication number 20240184217
- Publication date Jun 6, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL
- Publication number 20240184215
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Jin LIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE CALIBRATION METHOD AND SYSTEM EMPLOYED IN SOURCE MASK...
- Publication number 20240085801
- Publication date Mar 14, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION CORRECTION APPARATUS
- Publication number 20240069443
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- Donghyeong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MAN...
- Publication number 20240027898
- Publication date Jan 25, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Acoustic Particle Deflection In Lithography Tool
- Publication number 20230384696
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...
- Publication number 20230341784
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Tijmen Pieter COLLIGNON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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ACOUSTIC PARTICLE DEFLECTION IN LITHOGRAPHY TOOL
- Publication number 20230333491
- Publication date Oct 19, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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TOOL DRIFT COMPENSATION WITH MACHINE LEARNING
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- Publication date Sep 21, 2023
- Applied Materials, Inc.
- YenShuo LIN
- G06 - COMPUTING CALCULATING COUNTING
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SUB-NANOSCALE HIGH-PRECISION LITHOGRAPHY WRITING FIELD STITCHING ME...
- Publication number 20230296990
- Publication date Sep 21, 2023
- Parcan Nanotech Co., Ltd.
- Xiangqian ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PREDICTIVE CALIBRATION SCHEDULING APPARATUS AND METHOD
- Publication number 20230266168
- Publication date Aug 24, 2023
- CYMER, LLC
- Mohammad Taghi Mohebbi
- H01 - BASIC ELECTRIC ELEMENTS

Calibration of components of the microlithographic apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for calibration of an optical measurement system and optical...

Method and system for determining initial contact control values fo...

Stage apparatus and electron beam lithography system

Radiation source testing

Mask correction method, mask correction device for double patternin...

Method and apparatus for photolithographic imaging

Methods and apparatus for correcting lithography systems

Method for generating a control scheme and device manufacturing method

Light source calibration method and system employed in source mask...

Metrology method and lithographic apparatuses

Detection using semiconductor detector

Measurement apparatus and a method for determining a substrate grid

Image based learning correction for mitigating thermal ghosting in...

Self-calibrating overlay metrology

Acoustic particle deflection in lithography tool

Control device, lithography apparatus, measurement apparatus, proce...

Calibration method for a lithographic system

Active reticle carrier for in situ stage correction

Methods and systems for overlay measurement based on soft X-ray Sca...

Imprint apparatus and article manufacturing method

Method and apparatus for characterizing a microlithographic mask

Method of determining the initial contact point for partial fields...

Method of determining information about a patterning process, metho...

Self-calibrating overlay metrology

Electronic system, accelerometer, calibration method, lithographic...

Method of calibrating a plurality of metrology apparatuses, method...

System and method for optimizing a lithography exposure process

Two-dimensional position encoder

Control device for generating a control deviation via machine learning

Method for the qualification of a mask for microlithography

Patents Applicationslast 30 patents

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS

LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...

HIGH RESOLUTION PHOTOLITHOGRAPHY

OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...

Method and System for Determining Initial Contact Control Values fo...

METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE

ELECTROMAGNETIC MOTOR SYSTEM, POSTION CONTROL SYSTEM, STAGE APPARAT...

OVERLAY IMPROVEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCT...

CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

DETECTION USING SEMICONDUCTOR DETECTOR

METHODS AND MECHANISMS FOR MODIFYING MACHINE-LEARNING MODELS FOR NE...

SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...

METHOD FOR DETERMINING A POSITION OF A MIRROR

GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION...

METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM

METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL

LIGHT SOURCE CALIBRATION METHOD AND SYSTEM EMPLOYED IN SOURCE MASK...

ILLUMINATION CORRECTION APPARATUS

EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MAN...

Acoustic Particle Deflection In Lithography Tool

METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...

ACOUSTIC PARTICLE DEFLECTION IN LITHOGRAPHY TOOL

TOOL DRIFT COMPENSATION WITH MACHINE LEARNING

SUB-NANOSCALE HIGH-PRECISION LITHOGRAPHY WRITING FIELD STITCHING ME...

PREDICTIVE CALIBRATION SCHEDULING APPARATUS AND METHOD