Calibration

Industry

CPC
G03F9/7019

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7019Calibration

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Height measurement method and height measurement system
- Patent number 12,253,807
- Issue date Mar 18, 2025
- ASML Netherlands B.V.
- Andrey Valerievich Rogachevskiy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self-referencing integrated alignment sensor
- Patent number 12,216,414
- Issue date Feb 4, 2025
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Offset alignment method and micro-lithographic printing device
- Patent number 12,147,168
- Issue date Nov 19, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of obtaining array of plurality of regions on substrate, exp...
- Patent number 12,130,562
- Issue date Oct 29, 2024
- Canon Kabushiki Kaisha
- Atsushi Shigenobu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method
- Patent number 12,124,178
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hao-Yu Lan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection method, detection apparatus, lithography apparatus, and a...
- Patent number 12,061,079
- Issue date Aug 13, 2024
- Canon Kabushiki Kaisha
- Masaharu Kajitani
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining a center of a radiation spot, sensor and sta...
- Patent number 11,982,948
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Mihaita Popinciuc
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus
- Patent number 11,914,308
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable diffraction grating
- Patent number 11,703,771
- Issue date Jul 18, 2023
- ASML Holding N.V.
- Ali Alsaqqa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,675,277
- Issue date Jun 13, 2023
- KLA Corporation
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method
- Patent number 11,675,280
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hao-Yu Lan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and article manufacturing method
- Patent number 11,673,313
- Issue date Jun 13, 2023
- Canon Kabushiki Kaisha
- Kenji Yaegashi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithographic apparatus
- Patent number 11,609,503
- Issue date Mar 21, 2023
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position detection apparatus, position detection method, lithograph...
- Patent number 11,249,401
- Issue date Feb 15, 2022
- Canon Kabushiki Kaisha
- Genki Murayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,231,654
- Issue date Jan 25, 2022
- GLOBALFOUNDRIES U.S. Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a height profile, a measurement system and a...
- Patent number 11,137,695
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Arend Johannes Donkerbroek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system and method
- Patent number 11,106,146
- Issue date Aug 31, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hao-Yu Lan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 11,003,099
- Issue date May 11, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus, article manufacturing method, subst...
- Patent number 10,996,574
- Issue date May 4, 2021
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 10,976,675
- Issue date Apr 13, 2021
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, lithographic projection apparatus and devic...
- Patent number 10,955,761
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration method for a lithographic apparatus
- Patent number 10,884,345
- Issue date Jan 5, 2021
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology robustness based on through-wavelength similarity
- Patent number 10,871,716
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for controlling lithographic apparatus, lithographic appara...
- Patent number 10,845,719
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Rene Marinus Gerardus Johan Queens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 10,747,120
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Carolus Johannes Catharina Schoormans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for detection of and compensation for malfuncti...
- Patent number 10,739,675
- Issue date Aug 11, 2020
- Canon Kabushiki Kaisha
- Matthew C. Traub
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 10,705,435
- Issue date Jul 7, 2020
- GLOBALFOUNDRIES Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performance monitoring of design-based alignment
- Patent number 10,698,325
- Issue date Jun 30, 2020
- KLA-Tencor Corporation
- Bjorn Brauer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240241454
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20240184221
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Samee Ur REHMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20240036484
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Timothy Dugan DAVIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20230418168
- Publication date Dec 28, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20230393487
- Publication date Dec 7, 2023
- ASML NETHERLANDS B.V.
- Gijs TEN HAAF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OFFSET ALIGNMENT METHOD AND MICRO-LITHOGRAPHIC PRINTING DEVICE
- Publication number 20230341788
- Publication date Oct 26, 2023
- Mycronic AB
- Anders SVENSSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATION METHOD, DETECTION SYSTEM, EXPOSURE APPARATUS, ARTICLE M...
- Publication number 20230341786
- Publication date Oct 26, 2023
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETECTION METHOD, DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND A...
- Publication number 20230273016
- Publication date Aug 31, 2023
- Canon Kabushiki Kaisha
- MASAHARU KAJITANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20230266678
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR
- Publication number 20230266681
- Publication date Aug 24, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD
- Publication number 20230266682
- Publication date Aug 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hao-Yu LAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEIGHT MEASUREMENT METHOD AND HEIGHT MEASUREMENT SYSTEM
- Publication number 20230244153
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Andrey Valerievich ROGACHEVSKIY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
VARIABLE DIFFRACTION GRATING
- Publication number 20220390861
- Publication date Dec 8, 2022
- ASML Holding N.V.
- Ali ALSAQQA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...
- Publication number 20220350268
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G01 - MEASURING TESTING
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20220334502
- Publication date Oct 20, 2022
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A CENTER OF A RADIATION SPOT, SENSOR AND STA...
- Publication number 20220308468
- Publication date Sep 29, 2022
- ASML NETHERLANDS B.V.
- Mihaita POPINCIUC
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...
- Publication number 20220269187
- Publication date Aug 25, 2022
- Canon Kabushiki Kaisha
- Atsushi Shigenobu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD
- Publication number 20210389685
- Publication date Dec 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hao-Yu LAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20210223703
- Publication date Jul 22, 2021
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MASK AND SUBSTRATE ALIGNMENT
- Publication number 20200371448
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Greg FREEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ARTICLE MANUFACTURING METHOD, SUBST...
- Publication number 20200333718
- Publication date Oct 22, 2020
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD
- Publication number 20200310259
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hao-Yu LAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20200241429
- Publication date Jul 30, 2020
- GLOBALFOUNDRIES INC.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration Method for a Lithographic Apparatus
- Publication number 20200218170
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20200159126
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD
- Publication number 20200133143
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hao-Yu LAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVIC...
- Publication number 20200050120
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Design of a Metrology Target
- Publication number 20200033741
- Publication date Jan 30, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD AND APPARATUS
- Publication number 20200004163
- Publication date Jan 2, 2020
- ASML NETHERLANDS B.V.
- Carolus Johannes Catharina SCHOORMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Calibration

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Height measurement method and height measurement system

Self-referencing integrated alignment sensor

Offset alignment method and micro-lithographic printing device

Method of obtaining array of plurality of regions on substrate, exp...

Lithography system and method

Detection method, detection apparatus, lithography apparatus, and a...

Method for determining a center of a radiation spot, sensor and sta...

Lithographic apparatus

Variable diffraction grating

Self-referencing and self-calibrating interference pattern overlay...

Lithography system and method

Imprint apparatus and article manufacturing method

Lithographic apparatus

Position detection apparatus, position detection method, lithograph...

Self-referencing and self-calibrating interference pattern overlay...

Method of determining a height profile, a measurement system and a...

Lithography system and method

Lithographic method

Method and apparatus for design of a metrology target

Substrate processing apparatus, article manufacturing method, subst...

Lithographic apparatus

Lithographic method

Lithographic apparatus, lithographic projection apparatus and devic...

Calibration method for a lithographic apparatus

Metrology robustness based on through-wavelength similarity

Methods for controlling lithographic apparatus, lithographic appara...

Lithographic method and apparatus

Systems and methods for detection of and compensation for malfuncti...

Self-referencing and self-calibrating interference pattern overlay...

Performance monitoring of design-based alignment

Patents Applicationslast 30 patents

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

METHOD OF METROLOGY AND ASSOCIATED APPARATUSES

METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

OFFSET ALIGNMENT METHOD AND MICRO-LITHOGRAPHIC PRINTING DEVICE

CALIBRATION METHOD, DETECTION SYSTEM, EXPOSURE APPARATUS, ARTICLE M...

DETECTION METHOD, DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND A...

LITHOGRAPHIC APPARATUS

SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR

LITHOGRAPHY SYSTEM AND METHOD

HEIGHT MEASUREMENT METHOD AND HEIGHT MEASUREMENT SYSTEM

VARIABLE DIFFRACTION GRATING

METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

METHOD FOR DETERMINING A CENTER OF A RADIATION SPOT, SENSOR AND STA...

METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...

LITHOGRAPHY SYSTEM AND METHOD

LITHOGRAPHIC APPARATUS

METHOD FOR MASK AND SUBSTRATE ALIGNMENT

SUBSTRATE PROCESSING APPARATUS, ARTICLE MANUFACTURING METHOD, SUBST...

LITHOGRAPHY SYSTEM AND METHOD

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

Calibration Method for a Lithographic Apparatus

LITHOGRAPHIC APPARATUS

LITHOGRAPHY METHOD

LITHOGRAPHIC METHOD

LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVIC...

Method and Apparatus for Design of a Metrology Target

LITHOGRAPHIC METHOD AND APPARATUS