Catadioptric systems

Industry

CPC
G03F7/70225

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70225Catadioptric systems

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection lens and method for producing same
- Patent number 11,360,293
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Martin Rocktaeschel
- G02 - OPTICS
Information Patent Grant
Magnification compensation and/or beam steering in optical systems
- Patent number 11,209,635
- Issue date Dec 28, 2021
- SUSS MICROTEC PHOTONIC SYSTEMS INC.
- Yanrong Yuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical distortion reduction in projection systems
- Patent number 11,175,487
- Issue date Nov 16, 2021
- SUSS MICROTEC PHOTONIC SYSTEMS INC.
- Paul Ferrari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical lithography system for patterning semiconductor devices and...
- Patent number 11,143,965
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prism rotation adjustment mechanism, stepper exposure system, and s...
- Patent number 11,106,005
- Issue date Aug 31, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Tongke Su
- G02 - OPTICS
Information Patent Grant
Appliance for the moiré measurement of an optical test object
- Patent number 10,996,566
- Issue date May 4, 2021
- Carl Zeiss SMT GmbH
- Michael Samaniego
- G02 - OPTICS
Information Patent Grant
Imager for lithographic reproduction
- Patent number 10,908,504
- Issue date Feb 2, 2021
- Optical Associates, Inc.
- David Kessler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma source with lamp house correction
- Patent number 10,823,943
- Issue date Nov 3, 2020
- KLA Corporation
- Shiyu Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,578,976
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and article manufact...
- Patent number 10,578,846
- Issue date Mar 3, 2020
- Canon Kabushiki Kaisha
- Michio Kono
- G02 - OPTICS
Information Patent Grant
Magnification compensation and/or beam steering in optical systems
- Patent number 10,539,770
- Issue date Jan 21, 2020
- SUSS MICROTEC PHOTONIC SYSTEMS INC.
- Yanrong Yuan
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,495,980
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,495,981
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric imaging systems for digital scanner
- Patent number 10,488,638
- Issue date Nov 26, 2019
- Nikon Corporation
- David M. Williamson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element and optical arrangement therewith
- Patent number 10,474,036
- Issue date Nov 12, 2019
- Carl Zeiss SMT GmbH
- Hans-Jochen Paul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Mirror and related EUV systems and methods
- Patent number 10,274,649
- Issue date Apr 30, 2019
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, and device manufacturing method
- Patent number 10,191,388
- Issue date Jan 29, 2019
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 10,156,792
- Issue date Dec 18, 2018
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,146,137
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective comprising deflection mirrors and...
- Patent number 10,120,176
- Issue date Nov 6, 2018
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Grant
Chromatically corrected objective with specifically structured and...
- Patent number 10,101,668
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric illumination system for metrology
- Patent number 10,048,591
- Issue date Aug 14, 2018
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective
- Patent number 10,042,146
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 10,007,188
- Issue date Jun 26, 2018
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,933,705
- Issue date Apr 3, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,904,174
- Issue date Feb 27, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conjugate common optical path lithography lens
- Patent number 9,891,533
- Issue date Feb 13, 2018
- National Applied Research Laboratories
- Jiun-Woei Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,891,539
- Issue date Feb 13, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...
- Publication number 20250216794
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...
- Publication number 20250216796
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250174452
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ILLUMINATION SYSTEM, PROJECTION ILLUMINATION FACILITY AND PROJECTIO...
- Publication number 20250068081
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM A...
- Publication number 20250068083
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Susanne Beder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS
- Publication number 20250044712
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Thomas IRTENKAUF
- G02 - OPTICS
Information Patent Application
EXPOSURE SYSTEM, METHOD OF FORMING ALIGNMENT FILM, METHOD OF MANUFA...
- Publication number 20240319542
- Publication date Sep 26, 2024
- FUJIFILM CORPORATION
- Masao MORI
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20240012334
- Publication date Jan 11, 2024
- Carl Zeiss SMT GMBH
- Markus Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM WITH AN APERTURE STOP
- Publication number 20230123115
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Lithography System for Patterning Semiconductor Devices and...
- Publication number 20200348601
- Publication date Nov 5, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- G02 - OPTICS
Information Patent Application
OPTICAL DISTORTION REDUCTION IN PROJECTION SYSTEMS
- Publication number 20200225454
- Publication date Jul 16, 2020
- SUSS MicroTec Photonic Systems Inc.
- Paul Ferrari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS
- Publication number 20200150409
- Publication date May 14, 2020
- SUSS MicroTec Photonic Systems Inc.
- Yanrong Yuan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma Source with Lamp House Correction
- Publication number 20200041774
- Publication date Feb 6, 2020
- KLA-Tencor Corporation
- Shiyu Zhang
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION LENS AND METHOD FOR PRODUCING SAME
- Publication number 20190302434
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Martin Rocktaeschel
- G02 - OPTICS
Information Patent Application
APPLIANCE FOR THE MOIRÉ MEASUREMENT OF AN OPTICAL TEST OBJECT
- Publication number 20190187564
- Publication date Jun 20, 2019
- Carl Zeiss SMT GMBH
- Michael SAMANIEGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20190101832
- Publication date Apr 4, 2019
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...
- Publication number 20190056576
- Publication date Feb 21, 2019
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20180373006
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...
- Publication number 20180373155
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Norbert Wabra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFAC...
- Publication number 20180341093
- Publication date Nov 29, 2018
- Canon Kabushiki Kaisha
- Michio KONO
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
- Publication number 20180299788
- Publication date Oct 18, 2018
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20180299785
- Publication date Oct 18, 2018
- Nikon Corporation
- Yasuhiro OMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARACTERIZING THE EMISSION PROPERTIES OF SAMPLES
- Publication number 20180172600
- Publication date Jun 21, 2018
- Roche Diagnostics Operations, Inc.
- Joachim Wietzorrek
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...
- Publication number 20180095259
- Publication date Apr 5, 2018
- Carl Zeiss SMT GMBH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20180095258
- Publication date Apr 5, 2018
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20180052398
- Publication date Feb 22, 2018
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180039185
- Publication date Feb 8, 2018
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES
- Publication number 20180031815
- Publication date Feb 1, 2018
- Carl Zeiss SMT GMBH
- David Shafer
- G02 - OPTICS
Information Patent Application
Catadioptric Projection Objective With Intermediate Images
- Publication number 20170363963
- Publication date Dec 21, 2017
- Carl Zeiss SMT GMBH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC IMAGING SYSTEMS FOR DIGITAL SCANNER
- Publication number 20170307863
- Publication date Oct 26, 2017
- Nikon Corporation
- David M. Williamson
- G02 - OPTICS

Catadioptric systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical system with an aperture stop

Catadioptric projection lens and method for producing same

Magnification compensation and/or beam steering in optical systems

Optical distortion reduction in projection systems

Optical lithography system for patterning semiconductor devices and...

Prism rotation adjustment mechanism, stepper exposure system, and s...

Appliance for the moiré measurement of an optical test object

Imager for lithographic reproduction

Plasma source with lamp house correction

Catadioptric projection objective including a reflective optical co...

Projection optical system, exposure apparatus, and article manufact...

Magnification compensation and/or beam steering in optical systems

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Catadioptric imaging systems for digital scanner

Optical element and optical arrangement therewith

Microlithography projection objective

Mirror and related EUV systems and methods

Exposure apparatus, and device manufacturing method

Projection optical system, exposure apparatus, and exposure method

Catadioptric projection objective including a reflective optical co...

Catadioptric projection objective comprising deflection mirrors and...

Chromatically corrected objective with specifically structured and...

Catadioptric illumination system for metrology

Catadioptric projection objective

Exposure apparatus and device manufacturing method

Reduction projection optical system, exposure apparatus, and exposu...

Reduction projection optical system, exposure apparatus, and exposu...

Conjugate common optical path lithography lens

Projection optical system, exposure apparatus, and exposure method

Patents Applicationslast 30 patents

MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...

Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

ILLUMINATION SYSTEM, PROJECTION ILLUMINATION FACILITY AND PROJECTIO...

CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM A...

OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS

EXPOSURE SYSTEM, METHOD OF FORMING ALIGNMENT FILM, METHOD OF MANUFA...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

OPTICAL SYSTEM WITH AN APERTURE STOP

Optical Lithography System for Patterning Semiconductor Devices and...

OPTICAL DISTORTION REDUCTION IN PROJECTION SYSTEMS

MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS

Plasma Source with Lamp House Correction

CATADIOPTRIC PROJECTION LENS AND METHOD FOR PRODUCING SAME

APPLIANCE FOR THE MOIRÉ MEASUREMENT OF AN OPTICAL TEST OBJECT

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...

CATADIOPTRIC PROJECTION OBJECTIVE

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFAC...

EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

CHARACTERIZING THE EMISSION PROPERTIES OF SAMPLES

CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...

CATADIOPTRIC PROJECTION OBJECTIVE

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES

Catadioptric Projection Objective With Intermediate Images

CATADIOPTRIC IMAGING SYSTEMS FOR DIGITAL SCANNER