Changing particle velocity

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CPC
H01J2237/047

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/047Changing particle velocity

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam irradiation apparatus and maintenance method for elec...
- Patent number 12,033,828
- Issue date Jul 9, 2024
- NHV CORPORATION
- Masahiro Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear accelerator coil including multiple fluid channels
- Patent number 11,985,756
- Issue date May 14, 2024
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam irradiation apparatus and maintenance method for elec...
- Patent number 11,984,293
- Issue date May 14, 2024
- NHV CORPORATION
- Masahiro Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,923,167
- Issue date Mar 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a particle beam microscope
- Patent number 11,915,907
- Issue date Feb 27, 2024
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus suitable for a particle beam apparatus
- Patent number 11,908,656
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Han Willem Hendrik Severt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput multi-electron beam system
- Patent number 11,869,743
- Issue date Jan 9, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,837,430
- Issue date Dec 5, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,823,861
- Issue date Nov 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF quadrupole particle accelerator
- Patent number 11,818,830
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and power supply device
- Patent number 11,810,752
- Issue date Nov 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed ground single antenna ion source
- Patent number 11,810,763
- Issue date Nov 7, 2023
- Schlumberger Technology Corporation
- Benjamin Levitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,791,124
- Issue date Oct 17, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus
- Patent number 11,784,022
- Issue date Oct 10, 2023
- HITACHI HIGH-TECH CORPORATION
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,784,023
- Issue date Oct 10, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell detector for charged particles
- Patent number 11,784,024
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Joe Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method, and gas cluster generat...
- Patent number 11,772,138
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Resonator, linear accelerator, and ion implanter having adjustable...
- Patent number 11,728,133
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Keith E. Kowal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and analysis method
- Patent number 11,710,615
- Issue date Jul 25, 2023
- Jeol Ltd.
- Kenichi Tsutsumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and electrostatic quadrupole lens device
- Patent number 11,710,618
- Issue date Jul 25, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Haruka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonator coil having an asymmetrical profile
- Patent number 11,710,617
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus and composite beam apparatus
- Patent number 11,682,536
- Issue date Jun 20, 2023
- Hitachi High-Tech Science Corporation
- Koji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling electrostatic clamping of multipl...
- Patent number 11,670,532
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Scott E. Peitzsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of electron beam comprising pinnacle limiting plate and m...
- Patent number 11,664,186
- Issue date May 30, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,569,058
- Issue date Jan 31, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,562,882
- Issue date Jan 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
- Publication number 20240395495
- Publication date Nov 28, 2024
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VOLTAGE CONTROL FOR ETCHING SYSTEMS
- Publication number 20240387139
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240379318
- Publication date Nov 14, 2024
- HITACHI HIGH-TECH CORPORATION
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...
- Publication number 20240312758
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Zheng FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...
- Publication number 20240290571
- Publication date Aug 29, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Apparatus
- Publication number 20240258062
- Publication date Aug 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure for Particle Acceleration And Charged Particle Beam Appar...
- Publication number 20240242918
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- RYO SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...
- Publication number 20240234085
- Publication date Jul 11, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...
- Publication number 20240212967
- Publication date Jun 27, 2024
- PHOTO ELECTRON SOUL INC.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE LAYER RESONATOR COIL FOR LINEAR ACCELERATOR
- Publication number 20240170251
- Publication date May 23, 2024
- Applied Materials, Inc.
- William Herron Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...
- Publication number 20240136150
- Publication date Apr 25, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING PLASMA AND METHOD OF PROCESSING PLASMA AND...
- Publication number 20240128055
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Hyunbae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM FORMING APPARATUS AND METHOD
- Publication number 20240112897
- Publication date Apr 4, 2024
- SEMES CO., LTD.
- Sun Il KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
- Publication number 20240096586
- Publication date Mar 21, 2024
- KLA Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-BEAM IRRADIATION APPARATUS AND MAINTENANCE METHOD FOR ELEC...
- Publication number 20240087836
- Publication date Mar 14, 2024
- NHV CORPORATION
- Masahiro NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20240087835
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20240055217
- Publication date Feb 15, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...
- Publication number 20240036456
- Publication date Feb 1, 2024
- Carl Zeiss SMT GMBH
- Gilles Tabbone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOOD COLUMN AND CHARGED PARTICLE APPARATUS
- Publication number 20240006147
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386801
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM IRRADIATION APPARATUS
- Publication number 20230317403
- Publication date Oct 5, 2023
- Sumitomo Heavy Industries, Ltd.
- Takuya FUKUURA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Energy Filter, and Energy Analyzer and Charged Particle Beam Device...
- Publication number 20230298845
- Publication date Sep 21, 2023
- Hitachi High-Tech Corporation
- Kazuhiro HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM IRRADIATION SYSTEM, CONTROL METHOD FOR PARTICLE BEAM...
- Publication number 20230253175
- Publication date Aug 10, 2023
- Hitachi, Ltd
- Kenta TAKAHASHI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230230795
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Controlling Electrostatic Clamping of Multipl...
- Publication number 20230178405
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Scott E. Peitzsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONATOR, LINEAR ACCELERATOR, AND ION IMPLANTER HAVING ADJUSTABLE...
- Publication number 20230134262
- Publication date May 4, 2023
- Applied Materials, Inc.
- Keith E. Kowal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20230139482
- Publication date May 4, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINEAR ACCELERATOR COIL INCLUDING MULTIPLE FLUID CHANNELS
- Publication number 20230119010
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS

Changing particle velocity

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and system of image-forming multi-electron beams

Device and method for implanting particles into a substrate

Energy filter element for ion implantation systems for the use in t...

Electron-beam irradiation apparatus and maintenance method for elec...

Linear accelerator coil including multiple fluid channels

Electron-beam irradiation apparatus and maintenance method for elec...

Ion implanter and ion implantation method

Method for operating a particle beam microscope

Stage apparatus suitable for a particle beam apparatus

High throughput multi-electron beam system

Energy filter element for ion implantation systems for the use in t...

Charged particle beam device

RF quadrupole particle accelerator

Charged particle beam device and power supply device

Distributed ground single antenna ion source

Charged particle beam apparatus

Electron beam apparatus

Charged particle beam apparatus

Multi-cell detector for charged particles

Processing apparatus and processing method, and gas cluster generat...

Resonator, linear accelerator, and ion implanter having adjustable...

Charged particle beam device and analysis method

Ion implanter and electrostatic quadrupole lens device

Resonator coil having an asymmetrical profile

Particle beam apparatus and composite beam apparatus

System and method for controlling electrostatic clamping of multipl...

Apparatus of electron beam comprising pinnacle limiting plate and m...

Ion implanter and ion implantation method

Scanning electron microscope

In-situ plasma cleaning of process chamber components

Patents Applicationslast 30 patents

COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS

VOLTAGE CONTROL FOR ETCHING SYSTEMS

CHARGED PARTICLE BEAM DEVICE

SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...

CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...

Ion Milling Apparatus

Structure for Particle Acceleration And Charged Particle Beam Appar...

CHARGED PARTICLE APPARATUS AND METHOD

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...

ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...

THREE LAYER RESONATOR COIL FOR LINEAR ACCELERATOR

METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...

APPARATUS FOR PROCESSING PLASMA AND METHOD OF PROCESSING PLASMA AND...

THIN FILM FORMING APPARATUS AND METHOD

METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS

ELECTRON-BEAM IRRADIATION APPARATUS AND MAINTENANCE METHOD FOR ELEC...

CHARGED PARTICLE DEVICE AND METHOD

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...

FLOOD COLUMN AND CHARGED PARTICLE APPARATUS

PLASMA PROCESSING APPARATUS

PARTICLE BEAM IRRADIATION APPARATUS

Energy Filter, and Energy Analyzer and Charged Particle Beam Device...

PARTICLE BEAM IRRADIATION SYSTEM, CONTROL METHOD FOR PARTICLE BEAM...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

System and Method for Controlling Electrostatic Clamping of Multipl...

RESONATOR, LINEAR ACCELERATOR, AND ION IMPLANTER HAVING ADJUSTABLE...

ION IMPLANTER AND ION IMPLANTATION METHOD

LINEAR ACCELERATOR COIL INCLUDING MULTIPLE FLUID CHANNELS