characterised by antistatic means

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CPC
G03F7/093

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/093characterised by antistatic means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Electroconductive film and method for manufacturing electroconducti...
- Patent number 11,450,445
- Issue date Sep 20, 2022
- Tokyo University of Science Foundation
- Koji Arimitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning material film stack with metal-containing top coat for e...
- Patent number 11,177,130
- Issue date Nov 16, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water-soluble diacetylene, photolithography composition comprising...
- Patent number 11,131,925
- Issue date Sep 28, 2021
- Industry-University Cooperation Foundation Hanyang University
- Jongman Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Electroconductive film and method for manufacturing electroconducti...
- Patent number 10,720,259
- Issue date Jul 21, 2020
- Tokyo University of Science Foundation
- Koji Arimitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the production of a layered body and layered bodies obt...
- Patent number 10,671,192
- Issue date Jun 2, 2020
- Heraeus Deutschland GmbH & Co. KG
- Udo Guntermann
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Conductive composition, antistatic film, laminate and production th...
- Patent number 10,488,757
- Issue date Nov 26, 2019
- Mitsubishi Chemical Corporation
- Akira Yamazaki
- B32 - LAYERED PRODUCTS
Information Patent Grant
Composition for forming resist underlayer film with reduced outgassing
- Patent number 10,437,150
- Issue date Oct 8, 2019
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlying absorbing or conducting layer for Ebeam direct write (EB...
- Patent number 10,338,474
- Issue date Jul 2, 2019
- Intel Corporation
- Shakul Tandon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive polymer composition, coated article, and patterning process
- Patent number 10,295,906
- Issue date May 21, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Nagasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, positive resist composition, laminate, and resist...
- Patent number 9,944,738
- Issue date Apr 17, 2018
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, resist pattern forming process, and method for mak...
- Patent number 9,904,169
- Issue date Feb 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive polymer composition, coated article, and patterning process
- Patent number 9,897,917
- Issue date Feb 20, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Nagasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laminated structure
- Patent number 9,817,313
- Issue date Nov 14, 2017
- Eternal Materials Co., Ltd.
- Shin Yi Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive polymer composition, coated article, patterning process,...
- Patent number 9,817,314
- Issue date Nov 14, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Nagasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive polymer composition, coated article, patterning process...
- Patent number 9,778,570
- Issue date Oct 3, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Nagasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically transitioned metal-insulator surface
- Patent number 9,639,001
- Issue date May 2, 2017
- Raytheon Company
- Michael H. Robson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive polymer composition, coated article having antistatic fi...
- Patent number 9,558,862
- Issue date Jan 31, 2017
- Shin-Etsu Polymer Co., Ltd.
- Toshiya Sawai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming antistatic film and oligomer compound
- Patent number 9,394,231
- Issue date Jul 19, 2016
- Nissan Chemical Industries, Ltd.
- Tokio Nishita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Antistatic treatment agent, and antistatic film, coated article and...
- Patent number 9,023,247
- Issue date May 5, 2015
- Showa Denko K.K.
- Takashi Ohkubo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antistatic agent, antistatic film and articles coated with antistat...
- Patent number 8,821,761
- Issue date Sep 2, 2014
- Showa Denko K.K.
- Ayako Nishioka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
High-resolution photolithographic method for forming nanostructures...
- Patent number 8,715,915
- Issue date May 6, 2014
- STMicroelectronics S.R.L.
- Davide Giuseppe Patti
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming conductive antireflection film, method for for...
- Patent number 8,557,144
- Issue date Oct 15, 2013
- Fujitsu Limited
- Junichi Kon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for electroconductive pattern formation
- Patent number 8,546,066
- Issue date Oct 1, 2013
- Mitsubishi Paper Mills Limited
- Munetoshi Irisawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-layer body, method for forming resist pattern, method for man...
- Patent number 8,313,892
- Issue date Nov 20, 2012
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving sensitivity of resist
- Patent number 8,178,281
- Issue date May 15, 2012
- Showa Denko K.K.
- Hirofumi Ohki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithography patterning method
- Patent number 8,101,530
- Issue date Jan 24, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsiung Huang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electronic device and manufacturing method therefor
- Patent number 8,018,146
- Issue date Sep 13, 2011
- Fujikura Ltd.
- Kiwako Ohmori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method for electronic device
- Patent number 8,007,335
- Issue date Aug 30, 2011
- Fujikura Ltd.
- Kiwako Ohmori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive lithographic polymer and method of making devices using...
- Patent number 7,700,246
- Issue date Apr 20, 2010
- Intel Corporation
- Rebecca Shia
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Composition for forming a conjugated polymer pattern and process of...
- Patent number 7,507,520
- Issue date Mar 24, 2009
- Samsung Electronics Co., Ltd.
- Sang Kyun Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CONDUCTIVE POLYMER COMPOSITION, COATED PRODUCT, AND PATTERNING PROCESS
- Publication number 20230168584
- Publication date Jun 1, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, LAMINATE, TO...
- Publication number 20220206390
- Publication date Jun 30, 2022
- FUJIFILM CORPORATION
- Kunihiko KODAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE TRANSFER FILM, MANUFACTURING METHOD OF ANTISTATIC PA...
- Publication number 20220137513
- Publication date May 5, 2022
- FUJIFILM CORPORATION
- Tatsuya SHIMOYAMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONDUCTIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND CONDU...
- Publication number 20210261765
- Publication date Aug 26, 2021
- MITSUBISHI CHEMICAL CORPORATION
- Saki Nakano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTI...
- Publication number 20200303086
- Publication date Sep 24, 2020
- TOKYO UNIVERSITY OF SCIENCE FOUNDATION
- Koji ARIMITSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS
- Publication number 20190180888
- Publication date Jun 13, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Underlying Absorbing or Conducting Layer for Ebeam Direct Write (EB...
- Publication number 20170338105
- Publication date Nov 23, 2017
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION TH...
- Publication number 20170261854
- Publication date Sep 14, 2017
- MITSUBISHI CHEMICAL CORPORATION
- Akira YAMAZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS
- Publication number 20170090286
- Publication date Mar 30, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST...
- Publication number 20170037167
- Publication date Feb 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Daisuke DOMON
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS
- Publication number 20170010534
- Publication date Jan 12, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...
- Publication number 20160299431
- Publication date Oct 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAMINATED STRUCTURE
- Publication number 20160291471
- Publication date Oct 6, 2016
- ETERNAL MATERIALS CO., LTD.
- Shin Yi LI
- B32 - LAYERED PRODUCTS
Information Patent Application
CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, PATTERNING PROCESS...
- Publication number 20160223909
- Publication date Aug 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONDUCTIVE COMPOSITION, CONDUCTOR, METHOD FOR FORMING CONDUCTOR, AN...
- Publication number 20160223910
- Publication date Aug 4, 2016
- MITSUBISHI RAYON CO., LTD.
- Hiroya FUKUDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, PATTERNING PROCESS,...
- Publication number 20160091792
- Publication date Mar 31, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for the Production of a Layered Body and Layered Bodies Obt...
- Publication number 20140313433
- Publication date Oct 23, 2014
- HERAEUS PRECIOUS METALS GMBH & CO. KG
- Udo Guntermann
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Process For The Production Of A Layered Body And Layered Bodies Wit...
- Publication number 20140242350
- Publication date Aug 28, 2014
- HERAEUS PRECIOUS METALS GMBH & CO. KG
- Udo Guntermann
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HIGH-RESOLUTION PHOTOLITHOGRAPHIC METHOD FOR FORMING NANOSTRUCTURES...
- Publication number 20110287363
- Publication date Nov 24, 2011
- STMicroelectronics S.r.l.
- Davide Giuseppe Patti
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING
- Publication number 20110230058
- Publication date Sep 22, 2011
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR PRODUCING SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER...
- Publication number 20110209906
- Publication date Sep 1, 2011
- Takashi Ihara
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR FORMING CONDUCTIVE POLYMER PATTERN
- Publication number 20110165389
- Publication date Jul 7, 2011
- TOAGOSEI CO., LTD.
- Hiromu Taguchi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR IMPROVING SENSITIVITY OF RESIST
- Publication number 20110143283
- Publication date Jun 16, 2011
- Showa Denko K.K.
- Hirofumi Ohki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND...
- Publication number 20110097671
- Publication date Apr 28, 2011
- SHOWA DENKO K.K.
- Takashi Ohkubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LITHOGRAPHY PATTERNING METHOD
- Publication number 20110076843
- Publication date Mar 31, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsiung Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ELECTROCONDUCTIVE PATTERN FORMATION
- Publication number 20100330504
- Publication date Dec 30, 2010
- Munetoshi Irisawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MATERIAL FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FOR...
- Publication number 20100009296
- Publication date Jan 14, 2010
- Fujitsu Limited
- Junichi Kon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREFOR
- Publication number 20090317563
- Publication date Dec 24, 2009
- FUJIKURA LTD.
- Kiwako OHMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND...
- Publication number 20090123771
- Publication date May 14, 2009
- SHOWA DENKO K.K.
- Takashi Ohkubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Enhancing photoresist performance using electric fields
- Publication number 20080220380
- Publication date Sep 11, 2008
- Robert Bristol
- B82 - NANO-TECHNOLOGY

characterised by antistatic means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electroconductive film and method for manufacturing electroconducti...

Patterning material film stack with metal-containing top coat for e...

Water-soluble diacetylene, photolithography composition comprising...

Electroconductive film and method for manufacturing electroconducti...

Process for the production of a layered body and layered bodies obt...

Conductive composition, antistatic film, laminate and production th...

Composition for forming resist underlayer film with reduced outgassing

Underlying absorbing or conducting layer for Ebeam direct write (EB...

Conductive polymer composition, coated article, and patterning process

Polymer compound, positive resist composition, laminate, and resist...

Photomask blank, resist pattern forming process, and method for mak...

Conductive polymer composition, coated article, and patterning process

Laminated structure

Conductive polymer composition, coated article, patterning process,...

Conductive polymer composition, coated article, patterning process...

Optically transitioned metal-insulator surface

Conductive polymer composition, coated article having antistatic fi...

Composition for forming antistatic film and oligomer compound

Antistatic treatment agent, and antistatic film, coated article and...

Antistatic agent, antistatic film and articles coated with antistat...

High-resolution photolithographic method for forming nanostructures...

Material for forming conductive antireflection film, method for for...

Method for electroconductive pattern formation

Multi-layer body, method for forming resist pattern, method for man...

Method for improving sensitivity of resist

Lithography patterning method

Electronic device and manufacturing method therefor

Manufacturing method for electronic device

Conductive lithographic polymer and method of making devices using...

Composition for forming a conjugated polymer pattern and process of...

Patents Applicationslast 30 patents

CONDUCTIVE POLYMER COMPOSITION, COATED PRODUCT, AND PATTERNING PROCESS

PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, LAMINATE, TO...

PHOTOSENSITIVE TRANSFER FILM, MANUFACTURING METHOD OF ANTISTATIC PA...

CONDUCTIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND CONDU...

ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTI...

CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS

Underlying Absorbing or Conducting Layer for Ebeam Direct Write (EB...

CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION TH...

CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST...

CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS

PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...

LAMINATED STRUCTURE

CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, PATTERNING PROCESS...

CONDUCTIVE COMPOSITION, CONDUCTOR, METHOD FOR FORMING CONDUCTOR, AN...

CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, PATTERNING PROCESS,...

Process for the Production of a Layered Body and Layered Bodies Obt...

Process For The Production Of A Layered Body And Layered Bodies Wit...

HIGH-RESOLUTION PHOTOLITHOGRAPHIC METHOD FOR FORMING NANOSTRUCTURES...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING

PROCESS FOR PRODUCING SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER...

METHOD FOR FORMING CONDUCTIVE POLYMER PATTERN

METHOD FOR IMPROVING SENSITIVITY OF RESIST

ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND...

LITHOGRAPHY PATTERNING METHOD

METHOD FOR ELECTROCONDUCTIVE PATTERN FORMATION

MATERIAL FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FOR...

ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREFOR

ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND...

Enhancing photoresist performance using electric fields