characterised by structural details

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G03F7/09

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/09characterised by structural details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Composition containing a heterocyclic compound having a dicyanostyr...
- Patent number 12,366,804
- Issue date Jul 22, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating pattern of cured product and methods for man...
- Patent number 12,362,176
- Issue date Jul 15, 2025
- Canon Kabushiki Kaisha
- Jun Kato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Metallic photoresist patterning and defect improvement
- Patent number 12,353,132
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure, method for manufacturing same and memory
- Patent number 12,354,971
- Issue date Jul 8, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shaowen Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming adhesive film, patterning process, and method...
- Patent number 12,351,742
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Mamoru Watabe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of replicating a microstructure pattern
- Patent number 12,353,128
- Issue date Jul 8, 2025
- Viavi Solutions Inc.
- Riberet Almeida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming underlayer film, resist pattern forming met...
- Patent number 12,346,026
- Issue date Jul 1, 2025
- FUJIFILM Corporation
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treatment device and treatment method
- Patent number 12,341,008
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Yohei Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photocurable resin composition containing self-crosslinkable polymer
- Patent number 12,339,586
- Issue date Jun 24, 2025
- NISSAN CHEMICAL CORPORATION
- Takahiro Kishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern fidelity enhancement
- Patent number 12,334,342
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Tien Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 12,332,565
- Issue date Jun 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for patterning a substrate using photolithography
- Patent number 12,334,391
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,334,386
- Issue date Jun 17, 2025
- Semes Co., Ltd.
- Kiwon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing microstructure including cured products of...
- Patent number 12,326,662
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Yohei Hamade
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coated underlayer for overcoated photoresist
- Patent number 12,313,971
- Issue date May 27, 2025
- DuPont Electronic Materials International, LLC
- Anton Chavez
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photopolymerizable relief precursor having adjustable surface prope...
- Patent number 12,313,970
- Issue date May 27, 2025
- XSYS Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Insulating layer for multilayer printed circuit board, multilayer p...
- Patent number 12,313,973
- Issue date May 27, 2025
- LG Chem, Ltd.
- Jeong Wook Mun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Metallic photoresist patterning and defect improvement
- Patent number 12,306,536
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of replicating a microstructure pattern
- Patent number 12,287,573
- Issue date Apr 29, 2025
- Viavi Solutions Inc.
- Riberet Almeida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electronic device and method for manufacturing target substrate
- Patent number 12,287,577
- Issue date Apr 29, 2025
- Innolux Corporation
- Chien-Hsing Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating a device using a multilayer stack
- Patent number 12,288,687
- Issue date Apr 29, 2025
- Google LLC
- Anthony Edward Megrant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside deposition tuning of stress to control wafer bow in semico...
- Patent number 12,276,922
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer photo etching mask including organic and inorganic mate...
- Patent number 12,272,553
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,265,332
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing lithography defects and pattern transfer
- Patent number 12,265,326
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Angélique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,259,654
- Issue date Mar 25, 2025
- Sumitomo Electric Industries, Ltd.
- Tadashi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of flexographic printing plate and printing me...
- Patent number 12,259,655
- Issue date Mar 25, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate
- Publication number 20250237947
- Publication date Jul 24, 2025
- HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD
- Li YUAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20250237953
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takashi SAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250237954
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231486
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20250232976
- Publication date Jul 17, 2025
- NANYA TECHNOLOGY CORPORATION
- WEI-CHUAN FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250231485
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Nobuhiro NAGAMACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST
- Publication number 20250231491
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226222
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250224676
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuki YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20250224679
- Publication date Jul 10, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Silicon-Containing Anti-Reflective Film And...
- Publication number 20250218768
- Publication date Jul 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRESS LAYER MODIFICATION USING ENERGETIC BEAM PROCESSING THROUGH P...
- Publication number 20250216786
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Morgan EVANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST TOPCOAT COMPOSITIONS, AND METHODS OF FORMING PATTERNS USING...
- Publication number 20250216785
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Kyoungjin HA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250218775
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208511
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208510
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY
- Publication number 20250208517
- Publication date Jun 26, 2025
- Brewer Science, Inc.
- Si Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208509
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING FLUORENE SKEL...
- Publication number 20250199407
- Publication date Jun 19, 2025
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250199408
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tse LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER PHOTO ETCHING MASK INCLUDING ORGANIC AND INORGANIC MATE...
- Publication number 20250201556
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE AND METHOD OF FABRICATING BIT LINE...
- Publication number 20250185235
- Publication date Jun 5, 2025
- NANYA TECHNOLOGY CORPORATION
- CHIH-YING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...
- Publication number 20250172873
- Publication date May 29, 2025
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...
- Publication number 20250172876
- Publication date May 29, 2025
- Merck Patent GmbH
- Hiroshi Yanagita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250129203
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION, RESIST PATTERN FORMAT...
- Publication number 20250130498
- Publication date Apr 24, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250115736
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

characterised by structural details

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Composition containing a heterocyclic compound having a dicyanostyr...

Resist underlayer film-forming composition

Method for fabricating pattern of cured product and methods for man...

Metallic photoresist patterning and defect improvement

Semiconductor structure, method for manufacturing same and memory

Material for forming adhesive film, patterning process, and method...

Method of replicating a microstructure pattern

Composition for forming underlayer film, resist pattern forming met...

Heat treatment device and treatment method

Photocurable resin composition containing self-crosslinkable polymer

Pattern fidelity enhancement

Thermosetting iodine- and silicon-containing material, composition...

Method for patterning a substrate using photolithography

Apparatus and method for treating substrate

Method for manufacturing microstructure including cured products of...

Wet-dry bilayer resist dual tone exposure

Coated underlayer for overcoated photoresist

Photopolymerizable relief precursor having adjustable surface prope...

Insulating layer for multilayer printed circuit board, multilayer p...

Metallic photoresist patterning and defect improvement

Treatment liquid and pattern forming method

Method of replicating a microstructure pattern

Electronic device and method for manufacturing target substrate

Fabricating a device using a multilayer stack

Backside deposition tuning of stress to control wafer bow in semico...

Multi-layer photo etching mask including organic and inorganic mate...

Method of manufacturing a semiconductor device

Method for reducing lithography defects and pattern transfer

Method for manufacturing semiconductor device

Manufacturing method of flexographic printing plate and printing me...

Patents Applicationslast 30 patents

Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate

SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...

Composition For Forming Metal-Containing Film And Patterning Process

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE

Compound For Forming Metal-Containing Film, Composition For Forming...

PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

RESIST PATTERN FORMATION METHOD

Composition For Forming Silicon-Containing Anti-Reflective Film And...

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

STRESS LAYER MODIFICATION USING ENERGETIC BEAM PROCESSING THROUGH P...

RESIST TOPCOAT COMPOSITIONS, AND METHODS OF FORMING PATTERNS USING...

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY

Compound For Forming Metal-Containing Film, Composition For Forming...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING FLUORENE SKEL...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

MULTI-LAYER PHOTO ETCHING MASK INCLUDING ORGANIC AND INORGANIC MATE...

METHOD OF PROCESSING A SUBSTRATE AND METHOD OF FABRICATING BIT LINE...

PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...

DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

RESIST UNDERLAYER FILM FORMATION COMPOSITION, RESIST PATTERN FORMAT...

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

Composition For Forming Metal-Containing Film And Patterning Process