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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/09characterised by structural details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Primers with improved reflective and thermally insulative propertie...
- Patent number 12,210,282
- Issue date Jan 28, 2025
- POLAROID IP B.V.
- Rong-Chang Liang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photoresist and method
- Patent number 12,197,128
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Superstrate and a method of using the same
- Patent number 12,195,382
- Issue date Jan 14, 2025
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,189,293
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for photolithography
- Patent number 12,191,147
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Ting Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planarization method and photocurable composition
- Patent number 12,179,231
- Issue date Dec 31, 2024
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating-type composition for forming organic film, patterning proce...
- Patent number 12,105,420
- Issue date Oct 1, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keisuke Niida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Forming variable depth structures with laser ablation
- Patent number 12,099,241
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Peter Kurunczi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Aromatic underlayer
- Patent number 12,099,300
- Issue date Sep 24, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of patterning a substrate using a sidewall spacer etch mask
- Patent number 12,099,299
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow cells
- Patent number 12,085,499
- Issue date Sep 10, 2024
- Illumina, Inc.
- Sahngki Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer substrate design parameters for electronic microfabrication
- Patent number 12,071,533
- Issue date Aug 27, 2024
- ARES MATERIALS INC.
- Radu Reit
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 12,072,629
- Issue date Aug 27, 2024
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Display device and method for manufacturing the same
- Patent number 12,075,650
- Issue date Aug 27, 2024
- Samsung Display Co., Ltd.
- Myoung-ha Jeon
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Underlayer of multilayer structure and methods of use thereof
- Patent number 12,074,027
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Amorphous boron nitride film and anti-reflection coating structure...
- Patent number 12,061,312
- Issue date Aug 13, 2024
- Samsung Electronics Co., Ltd.
- Taejin Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist structure, patterned deposition layer, semiconductor ch...
- Patent number 12,040,188
- Issue date Jul 16, 2024
- Tencent Technology (Shenzhen) Company Limited
- Wenlong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing multi-layered type microchannel device using p...
- Patent number 12,032,286
- Issue date Jul 9, 2024
- Asahi Kasei Kabushiki Kaisha
- Hidenori Nagai
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photosensitive film and method for forming permanent mask resist
- Patent number 12,032,292
- Issue date Jul 9, 2024
- Resonac Corporation
- Hideki Etori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive material and method of lithography
- Patent number 12,019,375
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,013,640
- Issue date Jun 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Quantum dot layer and manufacturing method thereof, quantum dot col...
- Patent number 12,012,539
- Issue date Jun 18, 2024
- BOE Technology Group Co., Ltd.
- Juanjuan You
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250036029
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Resist Underlayer Film, Patterning Process,...
- Publication number 20250028246
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Kenta ISHIWATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Pattern Forming Method
- Publication number 20250004378
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW CELLS
- Publication number 20240418630
- Publication date Dec 19, 2024
- Illumina, Inc.
- Sahngki Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE
- Publication number 20240402598
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAMATERIAL AND LAMINATE
- Publication number 20240402597
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material For Forming Organic Film, Patterning Process, And Organic...
- Publication number 20240402605
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240393690
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...
- Publication number 20240377740
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jooyoung Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE
- Publication number 20240379376
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF
- Publication number 20240371640
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jing-Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240369929
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material For Forming Organic Film, Substrate For Manufacturing Semi...
- Publication number 20240363335
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20240355632
- Publication date Oct 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yasuyuki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240345483
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Underlayer Film Material, Pattern Forming Method, And Method...
- Publication number 20240337944
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST
- Publication number 20240329535
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHIP PREPARATION METHOD AND SYSTEM, AND CHIP
- Publication number 20240334843
- Publication date Oct 3, 2024
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Jingjing HU
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20240327321
- Publication date Oct 3, 2024
- Samsung SDI Co., Ltd.
- Seil CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240321585
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240310732
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST
- Publication number 20240295817
- Publication date Sep 5, 2024
- SHANGHAI MICROSTART PHOTOELECTRIC TECHNOLOGY CO., LTD.
- Yijiao GAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240295816
- Publication date Sep 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER
- Publication number 20240294771
- Publication date Sep 5, 2024
- TAN KAH KEE INNOVATION LABORATORY
- Aiqiang Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

characterised by structural details

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Primers with improved reflective and thermally insulative propertie...

Photoresist and method

Superstrate and a method of using the same

Method of manufacturing a semiconductor device

Coating composition for photolithography

Organometallic solution based high resolution patterning compositions

Planarization method and photocurable composition

Method of manufacturing a semiconductor device

Chemical amplification methods and techniques for developable botto...

Tuning threshold voltage through meta stable plasma treatment

Resist underlayer film material, patterning process, and method for...

Photocurable composition and method for producing semiconductor device

Composition for resist underlayer, and pattern forming method using...

Film processing method

Coating-type composition for forming organic film, patterning proce...

Forming variable depth structures with laser ablation

Aromatic underlayer

Method of patterning a substrate using a sidewall spacer etch mask

Flow cells

Polymer substrate design parameters for electronic microfabrication

Resist underlayer film-forming composition containing novolac resin...

Display device and method for manufacturing the same

Underlayer of multilayer structure and methods of use thereof

Amorphous boron nitride film and anti-reflection coating structure...

Photoresist structure, patterned deposition layer, semiconductor ch...

Method for producing multi-layered type microchannel device using p...

Photosensitive film and method for forming permanent mask resist

Photosensitive material and method of lithography

Resist underlayer film material, patterning process, and method for...

Quantum dot layer and manufacturing method thereof, quantum dot col...

Patents Applicationslast 30 patents

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

Method For Forming Resist Underlayer Film And Patterning Process

Composition For Forming Resist Underlayer Film, Patterning Process,...

Pattern Forming Method

FLOW CELLS

BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE

METAMATERIAL AND LAMINATE

Material For Forming Organic Film, Patterning Process, And Organic...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF

COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Material For Forming Organic Film, Substrate For Manufacturing Semi...

Composition For Forming Organic Film, Method For Forming Organic Fi...

Method For Forming Resist Underlayer Film And Patterning Process

Resist Underlayer Film Material, Pattern Forming Method, And Method...

DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST

CHIP PREPARATION METHOD AND SYSTEM, AND CHIP

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

Optical Device and Method of Manufacture

Composition For Forming Silicon-Containing Resist Underlayer Film A...

Compound For Forming Metal-Containing Film, Composition For Forming...

Method For Forming Resist Underlayer Film And Patterning Process

PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST

Compound For Forming Metal-Containing Film, Composition For Forming...

ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER