characterised by structural details

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G03F7/09

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/09characterised by structural details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-layer photo etching mask including organic and inorganic mate...
- Patent number 12,272,553
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,265,332
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing lithography defects and pattern transfer
- Patent number 12,265,326
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Angélique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,259,654
- Issue date Mar 25, 2025
- Sumitomo Electric Industries, Ltd.
- Tadashi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of flexographic printing plate and printing me...
- Patent number 12,259,655
- Issue date Mar 25, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus of multi-modal illumination and display for im...
- Patent number 12,260,833
- Issue date Mar 25, 2025
- PixelDisplay, Inc.
- David Wyatt
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 12,242,193
- Issue date Mar 4, 2025
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Eui-Hyun Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing cured film and use of the same
- Patent number 12,242,195
- Issue date Mar 4, 2025
- Merck Patent GmbH
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,237,213
- Issue date Feb 25, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Libin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic photopolymer printing plate precursor with improved da...
- Patent number 12,226,997
- Issue date Feb 18, 2025
- ECO3 BV
- Katleen Himschoot
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hard-mask forming composition, method for manufacturing electronic...
- Patent number 12,221,556
- Issue date Feb 11, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Primers with improved reflective and thermally insulative propertie...
- Patent number 12,210,282
- Issue date Jan 28, 2025
- POLAROID IP B.V.
- Rong-Chang Liang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photoresist and method
- Patent number 12,197,128
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Superstrate and a method of using the same
- Patent number 12,195,382
- Issue date Jan 14, 2025
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,189,293
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for photolithography
- Patent number 12,191,147
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Ting Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planarization method and photocurable composition
- Patent number 12,179,231
- Issue date Dec 31, 2024
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250115736
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER
- Publication number 20250116936
- Publication date Apr 10, 2025
- NISSAN CHEMICAL CORPORATION
- Takahiro KISHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND AND COLORED RESIN COMPOSITION
- Publication number 20250109155
- Publication date Apr 3, 2025
- Sumitomo Chemical Company, Limited
- Takuma AOKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR DESIGN LITHOGRAPHIC SEAM IMPLEMENTATION METHODOLOGY F...
- Publication number 20250112167
- Publication date Apr 3, 2025
- Intel Corporation
- Kimberly Pierce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
- Publication number 20250102917
- Publication date Mar 27, 2025
- Merck Patent GmbH
- Takashi SEKITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photoresist and Method
- Publication number 20250102916
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250093774
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250093779
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Hsin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...
- Publication number 20250093778
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING COMPOSITION FOR PHOTOLITHOGRAPHY
- Publication number 20250095988
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Ting Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250085634
- Publication date Mar 13, 2025
- NISSAN CHEMICAL CORPORATION
- Masahisa ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
- Publication number 20250083182
- Publication date Mar 13, 2025
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEVELOPABLE RESIST OVERLAYER COMPOSITION AS WELL AS METHOD FOR MANU...
- Publication number 20250085635
- Publication date Mar 13, 2025
- Merck Patent GmbH
- Hiroshi Yanagita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIN LAMINATE AND APPLICATION THEREOF
- Publication number 20250076763
- Publication date Mar 6, 2025
- Chang Chun Plastics Co., Ltd.
- Zih-I CHUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...
- Publication number 20250076769
- Publication date Mar 6, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki AKIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER
- Publication number 20250068065
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250068075
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250060670
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...
- Publication number 20250060675
- Publication date Feb 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- KYU-SOON PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053091
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Ahra CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20250044684
- Publication date Feb 6, 2025
- FABRIC8LABS, INC.
- Edward White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for coating top anti-reflective coating
- Publication number 20250044693
- Publication date Feb 6, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Dian Han Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...
- Publication number 20250044695
- Publication date Feb 6, 2025
- Merck Patent GmbH
- Tomotsugu YANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...
- Publication number 20250044699
- Publication date Feb 6, 2025
- Riken
- Harumi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF MANUFACTURING MULTI-LAYERED PHOTORESIST FILMS AND INTEGR...
- Publication number 20250044694
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Sungkun Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250036029
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Resist Underlayer Film, Patterning Process,...
- Publication number 20250028246
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Kenta ISHIWATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

characterised by structural details

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-layer photo etching mask including organic and inorganic mate...

Method of manufacturing a semiconductor device

Method for reducing lithography defects and pattern transfer

Method for manufacturing semiconductor device

Manufacturing method of flexographic printing plate and printing me...

Method and apparatus of multi-modal illumination and display for im...

Selective patterning with wet-dry bilayer resist

Coating compositions for use with an overcoated photoresist

Resist underlayer film-forming composition comprising epoxy adduct...

Method for manufacturing cured film and use of the same

Organometallic solution based high resolution patterning compositions

Method for manufacturing semiconductor device

Lithographic photopolymer printing plate precursor with improved da...

Coating composition for forming resist underlayer film for EUV lith...

Photoresist underlayer and method of manufacturing a semiconductor...

Hard-mask forming composition, method for manufacturing electronic...

Material for forming organic film, method for forming organic film,...

Primers with improved reflective and thermally insulative propertie...

Photoresist and method

Superstrate and a method of using the same

Method of manufacturing a semiconductor device

Coating composition for photolithography

Organometallic solution based high resolution patterning compositions

Planarization method and photocurable composition

Method of manufacturing a semiconductor device

Chemical amplification methods and techniques for developable botto...

Tuning threshold voltage through meta stable plasma treatment

Resist underlayer film material, patterning process, and method for...

Photocurable composition and method for producing semiconductor device

Composition for resist underlayer, and pattern forming method using...

Patents Applicationslast 30 patents

Composition For Forming Metal-Containing Film And Patterning Process

PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER

COMPOUND AND COLORED RESIN COMPOSITION

SEMICONDUCTOR DESIGN LITHOGRAPHIC SEAM IMPLEMENTATION METHODOLOGY F...

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

Photoresist and Method

RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...

COATING COMPOSITION FOR PHOTOLITHOGRAPHY

RESIST UNDERLAYER FILM-FORMING COMPOSITION

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION

DEVELOPABLE RESIST OVERLAYER COMPOSITION AS WELL AS METHOD FOR MANU...

PHOTOSENSITIVE RESIN LAMINATE AND APPLICATION THEREOF

MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...

ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Method For Forming Resist Underlayer Film And Patterning Process

PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

SYSTEMS AND METHODS FOR MANUFACTURING ELECTRONIC DEVICES

Method for coating top anti-reflective coating

METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...

FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...

METHODS OF MANUFACTURING MULTI-LAYERED PHOTORESIST FILMS AND INTEGR...

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

Method For Forming Resist Underlayer Film And Patterning Process

Composition For Forming Resist Underlayer Film, Patterning Process,...