characterised by structural details

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G03F7/09

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/09characterised by structural details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing microstructure including cured products of...
- Patent number 12,326,662
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Yohei Hamade
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coated underlayer for overcoated photoresist
- Patent number 12,313,971
- Issue date May 27, 2025
- DuPont Electronic Materials International, LLC
- Anton Chavez
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photopolymerizable relief precursor having adjustable surface prope...
- Patent number 12,313,970
- Issue date May 27, 2025
- XSYS Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Insulating layer for multilayer printed circuit board, multilayer p...
- Patent number 12,313,973
- Issue date May 27, 2025
- LG Chem, Ltd.
- Jeong Wook Mun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Metallic photoresist patterning and defect improvement
- Patent number 12,306,536
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of replicating a microstructure pattern
- Patent number 12,287,573
- Issue date Apr 29, 2025
- Viavi Solutions Inc.
- Riberet Almeida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electronic device and method for manufacturing target substrate
- Patent number 12,287,577
- Issue date Apr 29, 2025
- Innolux Corporation
- Chien-Hsing Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating a device using a multilayer stack
- Patent number 12,288,687
- Issue date Apr 29, 2025
- Google LLC
- Anthony Edward Megrant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside deposition tuning of stress to control wafer bow in semico...
- Patent number 12,276,922
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer photo etching mask including organic and inorganic mate...
- Patent number 12,272,553
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,265,332
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing lithography defects and pattern transfer
- Patent number 12,265,326
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Angélique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,259,654
- Issue date Mar 25, 2025
- Sumitomo Electric Industries, Ltd.
- Tadashi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of flexographic printing plate and printing me...
- Patent number 12,259,655
- Issue date Mar 25, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus of multi-modal illumination and display for im...
- Patent number 12,260,833
- Issue date Mar 25, 2025
- PixelDisplay, Inc.
- David Wyatt
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 12,242,193
- Issue date Mar 4, 2025
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Eui-Hyun Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing cured film and use of the same
- Patent number 12,242,195
- Issue date Mar 4, 2025
- Merck Patent GmbH
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,237,213
- Issue date Feb 25, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Libin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic photopolymer printing plate precursor with improved da...
- Patent number 12,226,997
- Issue date Feb 18, 2025
- ECO3 BV
- Katleen Himschoot
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hard-mask forming composition, method for manufacturing electronic...
- Patent number 12,221,556
- Issue date Feb 11, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Primers with improved reflective and thermally insulative propertie...
- Patent number 12,210,282
- Issue date Jan 28, 2025
- POLAROID IP B.V.
- Rong-Chang Liang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photoresist and method
- Patent number 12,197,128
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PROCESSING A SUBSTRATE AND METHOD OF FABRICATING BIT LINE...
- Publication number 20250185235
- Publication date Jun 5, 2025
- NANYA TECHNOLOGY CORPORATION
- CHIH-YING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...
- Publication number 20250172873
- Publication date May 29, 2025
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...
- Publication number 20250172876
- Publication date May 29, 2025
- Merck Patent GmbH
- Hiroshi Yanagita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250129203
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION, RESIST PATTERN FORMAT...
- Publication number 20250130498
- Publication date Apr 24, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER
- Publication number 20250116936
- Publication date Apr 10, 2025
- NISSAN CHEMICAL CORPORATION
- Takahiro KISHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250115736
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND AND COLORED RESIN COMPOSITION
- Publication number 20250109155
- Publication date Apr 3, 2025
- Sumitomo Chemical Company, Limited
- Takuma AOKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR DESIGN LITHOGRAPHIC SEAM IMPLEMENTATION METHODOLOGY F...
- Publication number 20250112167
- Publication date Apr 3, 2025
- Intel Corporation
- Kimberly Pierce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
- Publication number 20250102917
- Publication date Mar 27, 2025
- Merck Patent GmbH
- Takashi SEKITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photoresist and Method
- Publication number 20250102916
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250093774
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250093779
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Hsin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...
- Publication number 20250093778
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING COMPOSITION FOR PHOTOLITHOGRAPHY
- Publication number 20250095988
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Ting Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250085634
- Publication date Mar 13, 2025
- NISSAN CHEMICAL CORPORATION
- Masahisa ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
- Publication number 20250083182
- Publication date Mar 13, 2025
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEVELOPABLE RESIST OVERLAYER COMPOSITION AS WELL AS METHOD FOR MANU...
- Publication number 20250085635
- Publication date Mar 13, 2025
- Merck Patent GmbH
- Hiroshi Yanagita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIN LAMINATE AND APPLICATION THEREOF
- Publication number 20250076763
- Publication date Mar 6, 2025
- Chang Chun Plastics Co., Ltd.
- Zih-I CHUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...
- Publication number 20250076769
- Publication date Mar 6, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki AKIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER
- Publication number 20250068065
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250068075
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250060670
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...
- Publication number 20250060675
- Publication date Feb 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- KYU-SOON PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053091
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Ahra CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20250044684
- Publication date Feb 6, 2025
- FABRIC8LABS, INC.
- Edward White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for coating top anti-reflective coating
- Publication number 20250044693
- Publication date Feb 6, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Dian Han Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

characterised by structural details

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for manufacturing microstructure including cured products of...

Wet-dry bilayer resist dual tone exposure

Coated underlayer for overcoated photoresist

Photopolymerizable relief precursor having adjustable surface prope...

Insulating layer for multilayer printed circuit board, multilayer p...

Metallic photoresist patterning and defect improvement

Treatment liquid and pattern forming method

Method of replicating a microstructure pattern

Electronic device and method for manufacturing target substrate

Fabricating a device using a multilayer stack

Backside deposition tuning of stress to control wafer bow in semico...

Multi-layer photo etching mask including organic and inorganic mate...

Method of manufacturing a semiconductor device

Method for reducing lithography defects and pattern transfer

Method for manufacturing semiconductor device

Manufacturing method of flexographic printing plate and printing me...

Method and apparatus of multi-modal illumination and display for im...

Selective patterning with wet-dry bilayer resist

Coating compositions for use with an overcoated photoresist

Resist underlayer film-forming composition comprising epoxy adduct...

Method for manufacturing cured film and use of the same

Organometallic solution based high resolution patterning compositions

Method for manufacturing semiconductor device

Lithographic photopolymer printing plate precursor with improved da...

Coating composition for forming resist underlayer film for EUV lith...

Photoresist underlayer and method of manufacturing a semiconductor...

Hard-mask forming composition, method for manufacturing electronic...

Material for forming organic film, method for forming organic film,...

Primers with improved reflective and thermally insulative propertie...

Photoresist and method

Patents Applicationslast 30 patents

METHOD OF PROCESSING A SUBSTRATE AND METHOD OF FABRICATING BIT LINE...

PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...

DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

RESIST UNDERLAYER FILM FORMATION COMPOSITION, RESIST PATTERN FORMAT...

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER

Composition For Forming Metal-Containing Film And Patterning Process

COMPOUND AND COLORED RESIN COMPOSITION

SEMICONDUCTOR DESIGN LITHOGRAPHIC SEAM IMPLEMENTATION METHODOLOGY F...

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

Photoresist and Method

RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...

COATING COMPOSITION FOR PHOTOLITHOGRAPHY

RESIST UNDERLAYER FILM-FORMING COMPOSITION

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION

DEVELOPABLE RESIST OVERLAYER COMPOSITION AS WELL AS METHOD FOR MANU...

PHOTOSENSITIVE RESIN LAMINATE AND APPLICATION THEREOF

MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...

ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Method For Forming Resist Underlayer Film And Patterning Process

PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

SYSTEMS AND METHODS FOR MANUFACTURING ELECTRONIC DEVICES

Method for coating top anti-reflective coating