characterised by the means for protecting vessels or internal parts

Industry

CPC
H01J37/32477

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32477characterised by the means for protecting vessels or internal parts

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,176,185
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Min Sung Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma apparatus and methods for processing feed material utilizing...
- Patent number 12,094,688
- Issue date Sep 17, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system including coil with RF powered faraday...
- Patent number 12,087,557
- Issue date Sep 10, 2024
- Lam Research Corporation
- Shen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Permanent secondary erosion containment for electrostatic chuck bonds
- Patent number 12,074,049
- Issue date Aug 27, 2024
- Lam Research Corporation
- Eric A. Pape
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liner assemblies for substrate processing systems
- Patent number 12,071,686
- Issue date Aug 27, 2024
- GlobalWafers Co., Ltd.
- Arash Abedijaberi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Member for plasma processing device and plasma processing device pr...
- Patent number 12,065,727
- Issue date Aug 20, 2024
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 12,051,568
- Issue date Jul 30, 2024
- Toto Ltd.
- Yasutaka Nitta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma resistant process chamber lid
- Patent number 12,049,696
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Laminate
- Patent number 12,031,213
- Issue date Jul 9, 2024
- Resonac Corporation
- Akira Furuya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of driving relay member
- Patent number 12,027,346
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of cleaning process chamber components
- Patent number 12,014,902
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Jong Yun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a semiconductor structure and for conditioning...
- Patent number 12,009,249
- Issue date Jun 11, 2024
- GlobalWafers Co., Ltd.
- Gang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Real-time detection of particulate matter during deposition chamber...
- Patent number 12,002,665
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin conformal coatings for electrostatic dissipation in semic...
- Patent number 12,004,337
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Gayatri Natu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition device apparatus
- Patent number 11,984,299
- Issue date May 14, 2024
- Samsung Display Co., Ltd.
- Youngsik Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of component and substrate processing system
- Patent number 11,981,993
- Issue date May 14, 2024
- Tokyo Electron Limited
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus
- Patent number 11,978,614
- Issue date May 7, 2024
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting plate, thin film deposition apparatus includin...
- Patent number 11,965,262
- Issue date Apr 23, 2024
- ASM IP Holding B.V.
- Yong Min Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit having tall deposition ring for PVD chamber
- Patent number 11,961,723
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- David Gunther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making a semiconductor manufacturing apparatus member
- Patent number 11,939,678
- Issue date Mar 26, 2024
- Toto Ltd.
- Yasutaka Nitta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for preparing void-free coatings for plasma treatment compo...
- Patent number 11,875,973
- Issue date Jan 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Tsung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component and apparatus of manufacturing semiconductor
- Patent number 11,873,553
- Issue date Jan 16, 2024
- Shibaura Institute of Technology
- Atsushi Yumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,862,434
- Issue date Jan 2, 2024
- PSK INC.
- Young Jae Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Corrosion-resistant member
- Patent number 11,859,288
- Issue date Jan 2, 2024
- Resonac Corporation
- So Miyaishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GLASS BLOCK, METHOD FOR PRODUCING SAME, AND PLASMA-RESISTANT MEMBER
- Publication number 20240425407
- Publication date Dec 26, 2024
- AGC Inc.
- Shuhei OGAWA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
- Publication number 20240404834
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240331982
- Publication date Oct 3, 2024
- TOTO LTD.
- Yasutaka NITTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240321555
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Jongyun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...
- Publication number 20240304430
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...
- Publication number 20240290583
- Publication date Aug 29, 2024
- AMOSENSE CO.,LTD
- Ji Hyung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...
- Publication number 20240284650
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Gayatri Natu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Semiconductor Process Chamber
- Publication number 20240266149
- Publication date Aug 8, 2024
- TOKYO ELECTRON LIMITED
- Qi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPRAY-COATED ELECTROSTATIC CHUCK DESIGN
- Publication number 20240258076
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Tuck Foong KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESTORING METHOD OF CONSUMED COMPONENT
- Publication number 20240254620
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
IN-SITU FOCUS RING COATING
- Publication number 20240249921
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER
- Publication number 20240242947
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- David GUNTHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...
- Publication number 20240212990
- Publication date Jun 27, 2024
- CoorsTek KK
- Manami Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTU...
- Publication number 20240213006
- Publication date Jun 27, 2024
- SEMES CO., LTD.
- Sun Il KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD
- Publication number 20240194500
- Publication date Jun 13, 2024
- SEMES CO., LTD.
- Seonggil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT
- Publication number 20240177974
- Publication date May 30, 2024
- FERROTEC MATERIAL TECHNOLOGIES CORPORATION
- Wataru YAMAGISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...
- Publication number 20240158942
- Publication date May 16, 2024
- ASM IP HOLDING B.V.
- Yong Min Yoo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONSUMABLE MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...
- Publication number 20240128057
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
- Publication number 20240120180
- Publication date Apr 11, 2024
- LAM RESEARCH CORPORATION
- Yuanping SONG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
IN-SITU CARBON LINER FOR HIGH ASPECT RATIO FEATURES
- Publication number 20240096641
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Hailong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD USING TH...
- Publication number 20240087856
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Jiwon Son
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING...
- Publication number 20240071725
- Publication date Feb 29, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240055230
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Jong Yun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240047258
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Tomoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL SPRAY MATERIAL, THERMAL SPRAY COATING, METHOD FOR FORMING T...
- Publication number 20240043982
- Publication date Feb 8, 2024
- TOCALO CO., LTD.
- Yasuhiro Shiojiri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOCK ABSORBING PLATE AND SUBSTRATE PROCESSING APPARATUS INCLUDING...
- Publication number 20240021414
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- Suhwan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20240021415
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Yasuhiko KOJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESS APPARATUS AND SUBSTRATE PROCESS METHOD USING THE...
- Publication number 20240021413
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- JAEHYUN PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC COMPONENT WITH CHANNELS
- Publication number 20230411124
- Publication date Dec 21, 2023
- LAM RESEARCH CORPORATION
- John Michael KERNS
- H01 - BASIC ELECTRIC ELEMENTS

characterised by the means for protecting vessels or internal parts

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for processing substrate using plasma

Substrate processing apparatus and interlock method thereof

Spatial control of plasma processing environments

Control of plasma sheath with bias supplies

High conductance inner shield for process chamber

Metal oxide preclean chamber with improved selectivity and flow con...

Plasma apparatus and methods for processing feed material utilizing...

Substrate processing system including coil with RF powered faraday...

Permanent secondary erosion containment for electrostatic chuck bonds

Liner assemblies for substrate processing systems

Member for plasma processing device and plasma processing device pr...

Semiconductor manufacturing apparatus

Plasma resistant process chamber lid

Laminate

Substrate processing apparatus and method of driving relay member

System and method of cleaning process chamber components

Sensors and system for in-situ edge ring erosion monitor

Methods for etching a semiconductor structure and for conditioning...

Real-time detection of particulate matter during deposition chamber...

Ultrathin conformal coatings for electrostatic dissipation in semic...

Deposition device apparatus

Forming method of component and substrate processing system

Substrate processing apparatus

Substrate supporting plate, thin film deposition apparatus includin...

Process kit having tall deposition ring for PVD chamber

Method of making a semiconductor manufacturing apparatus member

Methods for preparing void-free coatings for plasma treatment compo...

Component and apparatus of manufacturing semiconductor

Substrate processing apparatus

Corrosion-resistant member

Patents Applicationslast 30 patents

GLASS BLOCK, METHOD FOR PRODUCING SAME, AND PLASMA-RESISTANT MEMBER

METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY

SEMICONDUCTOR MANUFACTURING APPARATUS

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...

ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...

Methods for Semiconductor Process Chamber

SPRAY-COATED ELECTROSTATIC CHUCK DESIGN

RESTORING METHOD OF CONSUMED COMPONENT

IN-SITU FOCUS RING COATING

PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER

CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...

CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTU...

SUBSTRATE PROCESSING APPARATUS AND METHOD

WAFER SUPPORT

SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...

CONSUMABLE MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...

POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS

IN-SITU CARBON LINER FOR HIGH ASPECT RATIO FEATURES

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD USING TH...

PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING...

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

PLASMA PROCESSING APPARATUS

THERMAL SPRAY MATERIAL, THERMAL SPRAY COATING, METHOD FOR FORMING T...

SHOCK ABSORBING PLATE AND SUBSTRATE PROCESSING APPARATUS INCLUDING...

FILM FORMING APPARATUS

SUBSTRATE PROCESS APPARATUS AND SUBSTRATE PROCESS METHOD USING THE...

CERAMIC COMPONENT WITH CHANNELS