characterised by the means for protecting vessels or internal parts

Industry

CPC
H01J37/32477

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32477characterised by the means for protecting vessels or internal parts

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming layer
- Patent number 12,362,160
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsin-Liang Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ focus ring coating
- Patent number 12,354,842
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber process kit with protective coating
- Patent number 12,354,843
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Jian Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kits and related methods for processing chambers to facilit...
- Patent number 12,354,855
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Member for use in plasma processing device, and plasma processing d...
- Patent number 12,322,576
- Issue date Jun 3, 2025
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Texturizing a surface without bead blasting
- Patent number 12,318,868
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Gang Peng
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Film forming apparatus
- Patent number 12,315,701
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of performing maintenance on substrate processing apparatus
- Patent number 12,315,709
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Core insertion type spiral tube and making method for the same
- Patent number 12,308,213
- Issue date May 20, 2025
- Hyun Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 12,308,214
- Issue date May 20, 2025
- Tes Co., Ltd.
- Bong-Soo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, heating unit and substrate treating apparatus includi...
- Patent number 12,300,531
- Issue date May 13, 2025
- Semes Co., Ltd.
- Chung Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for use in plasma processing device, and plasma processing d...
- Patent number 12,283,466
- Issue date Apr 22, 2025
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate supporting plate, thin film deposition apparatus includin...
- Patent number 12,270,118
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Yong Min Yoo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber component and method of forming a surface texture
- Patent number 12,269,095
- Issue date Apr 8, 2025
- Cleanpart Group GmbH
- Olivier Marchand
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Multilayer coatings of component parts for a work piece processing...
- Patent number 12,266,509
- Issue date Apr 1, 2025
- Lam Researh Corporation
- Paul Konkola
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method of plasma resistant oxyfluoride coating layer
- Patent number 12,237,153
- Issue date Feb 25, 2025
- KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY
- Sung min Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kits and related methods for processing chambers to facilit...
- Patent number 12,221,696
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Zone-controlled rare-earth oxide ALD and CVD coatings
- Patent number 12,209,307
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam sputtering with ion assisted deposition for coatings on ch...
- Patent number 12,195,839
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning chamber of substrate processing apparatus
- Patent number 12,198,901
- Issue date Jan 14, 2025
- Jusung Engineering Co., Ltd.
- Yong Hyun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for physical vapor deposition and method for forming a layer
- Patent number 12,191,127
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsin-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,176,185
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Min Sung Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma apparatus and methods for processing feed material utilizing...
- Patent number 12,094,688
- Issue date Sep 17, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS
- Publication number 20250239476
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION TOOL WITH DIELECTRIC COATED CHAMBER SIDEWALLS TO IMPROVE...
- Publication number 20250232959
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250218846
- Publication date Jul 3, 2025
- HITACHI HIGH-TECH CORPORATION
- Tomoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250218735
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Si Young JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...
- Publication number 20250207287
- Publication date Jun 26, 2025
- ASM IP HOLDING B.V.
- Yong Min Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Conformal Coating on Textured Surface of Processing Chamber Co...
- Publication number 20250201527
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Cheng-Hsuan CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20250201528
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS
- Publication number 20250163578
- Publication date May 22, 2025
- Applied Materials, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composite Structures for Semiconductor Process Chambers
- Publication number 20250149305
- Publication date May 8, 2025
- Tianshu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...
- Publication number 20250149299
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF
- Publication number 20250112028
- Publication date Apr 3, 2025
- JUSUNG ENGINEERING CO., LTD.
- Sang Kyo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source and Plasma Processing Apparatus
- Publication number 20250104977
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALLOY COMPOSITION FOR CORROSION RESISTANCE
- Publication number 20250092491
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Chien-Min Liao
- B22 - CASTING POWDER METALLURGY
Information Patent Application
LINER STRUCTURE
- Publication number 20250079129
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Junho LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-RESISTANT LAMINATE, MANUFACTURING METHOD THEREFOR, AND PLASM...
- Publication number 20250006468
- Publication date Jan 2, 2025
- KYOCERA CORPORATION
- Motohiro UMEHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GLASS BLOCK, METHOD FOR PRODUCING SAME, AND PLASMA-RESISTANT MEMBER
- Publication number 20240425407
- Publication date Dec 26, 2024
- AGC Inc.
- Shuhei OGAWA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
- Publication number 20240404834
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240331982
- Publication date Oct 3, 2024
- TOTO LTD.
- Yasutaka NITTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240321555
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Jongyun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...
- Publication number 20240304430
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...
- Publication number 20240290583
- Publication date Aug 29, 2024
- AMOSENSE CO.,LTD
- Ji Hyung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...
- Publication number 20240284650
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Gayatri Natu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Semiconductor Process Chamber
- Publication number 20240266149
- Publication date Aug 8, 2024
- TOKYO ELECTRON LIMITED
- Qi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPRAY-COATED ELECTROSTATIC CHUCK DESIGN
- Publication number 20240258076
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Tuck Foong KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESTORING METHOD OF CONSUMED COMPONENT
- Publication number 20240254620
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
IN-SITU FOCUS RING COATING
- Publication number 20240249921
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER
- Publication number 20240242947
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- David GUNTHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...
- Publication number 20240212990
- Publication date Jun 27, 2024
- CoorsTek KK
- Manami Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS

characterised by the means for protecting vessels or internal parts

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for forming layer

High aspect ratio etch with infinite selectivity

In-situ focus ring coating

Process chamber process kit with protective coating

Process kits and related methods for processing chambers to facilit...

Member for use in plasma processing device, and plasma processing d...

Texturizing a surface without bead blasting

Film forming apparatus

Method of performing maintenance on substrate processing apparatus

Core insertion type spiral tube and making method for the same

Method of processing substrate

Support unit, heating unit and substrate treating apparatus includi...

Member for use in plasma processing device, and plasma processing d...

Substrate supporting plate, thin film deposition apparatus includin...

Process chamber component and method of forming a surface texture

Multilayer coatings of component parts for a work piece processing...

Method and apparatus for revitalizing plasma processing tools

Forming method of plasma resistant oxyfluoride coating layer

Process kits and related methods for processing chambers to facilit...

Zone-controlled rare-earth oxide ALD and CVD coatings

Ion beam sputtering with ion assisted deposition for coatings on ch...

Method for cleaning chamber of substrate processing apparatus

Apparatus for physical vapor deposition and method for forming a layer

Apparatus and method for processing substrate using plasma

Substrate processing apparatus and interlock method thereof

Spatial control of plasma processing environments

Control of plasma sheath with bias supplies

High conductance inner shield for process chamber

Metal oxide preclean chamber with improved selectivity and flow con...

Plasma apparatus and methods for processing feed material utilizing...

Patents Applicationslast 30 patents

ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS

DEPOSITION TOOL WITH DIELECTRIC COATED CHAMBER SIDEWALLS TO IMPROVE...

PLASMA PROCESSING APPARATUS

GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...

SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...

High Conformal Coating on Textured Surface of Processing Chamber Co...

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS

Composite Structures for Semiconductor Process Chambers

PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...

SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF

Plasma Source and Plasma Processing Apparatus

ALLOY COMPOSITION FOR CORROSION RESISTANCE

LINER STRUCTURE

PLASMA-RESISTANT LAMINATE, MANUFACTURING METHOD THEREFOR, AND PLASM...

GLASS BLOCK, METHOD FOR PRODUCING SAME, AND PLASMA-RESISTANT MEMBER

METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY

SEMICONDUCTOR MANUFACTURING APPARATUS

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AN...

ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...

Methods for Semiconductor Process Chamber

SPRAY-COATED ELECTROSTATIC CHUCK DESIGN

RESTORING METHOD OF CONSUMED COMPONENT

IN-SITU FOCUS RING COATING

PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER

CERAMIC SINTERED BODY FOR SEMICONDUCTOR PRODUCTION EQUIPMENT AND MA...