characterised by the metal

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H01L21/02175

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02175characterised by the metal

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods for forming a semiconductor device structure and related se...
- Patent number 12,166,099
- Issue date Dec 10, 2024
- ASM IP Holding B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of oxide thin films
- Patent number 12,154,785
- Issue date Nov 26, 2024
- ASM IP Holding B.V.
- Suvi P. Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective processing with etch residue-based inhibitors
- Patent number 12,131,909
- Issue date Oct 29, 2024
- Lam Research Corporation
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to create air gaps
- Patent number 12,112,980
- Issue date Oct 8, 2024
- Lam Research Corporation
- Patrick A. Van Cleemput
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device including ferroelectric layer
- Patent number 12,094,971
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Yunseong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structures with metal oxide layers to inhi...
- Patent number 12,080,639
- Issue date Sep 3, 2024
- Intel Corporation
- Rami Hourani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance semiconductor oxide material channel regions for NMOS
- Patent number 12,068,319
- Issue date Aug 20, 2024
- Intel Corporation
- Gilbert Dewey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer level sequencing flow cell fabrication
- Patent number 12,057,309
- Issue date Aug 6, 2024
- MGI Tech Co., Ltd.
- Shifeng Li
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 12,051,589
- Issue date Jul 30, 2024
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Soft ashing process for forming protective layer on conductive cap...
- Patent number 12,033,860
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Guan-Xuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of metal films
- Patent number 11,970,776
- Issue date Apr 30, 2024
- Lam Research Corporation
- Joshua Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling threshold voltages through blocking layers
- Patent number 11,961,732
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursor supply unit, substrate processing system, and method of f...
- Patent number 11,959,170
- Issue date Apr 16, 2024
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of metal films with tungsten liner
- Patent number 11,948,836
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective dry etching gallium oxide
- Patent number 11,942,330
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 11,901,403
- Issue date Feb 13, 2024
- SK Hynix Inc.
- Jun Hyuk Seo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Gate-all-around integrated circuit structures fabricated using alte...
- Patent number 11,894,368
- Issue date Feb 6, 2024
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molybdenum thin films by oxidation-reduction
- Patent number 11,891,690
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition tool and method for depositing metal oxide films on orga...
- Patent number 11,887,846
- Issue date Jan 30, 2024
- Lam Research Corporation
- Akhil Singhal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contact isolation in semiconductor devices
- Patent number 11,862,452
- Issue date Jan 2, 2024
- Imec VZW
- Boon Teik Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride semiconductor device
- Patent number 11,862,686
- Issue date Jan 2, 2024
- Fuji Electric Co., Ltd.
- Shinya Takashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a metal silicide contact to a silicon substrate
- Patent number 11,854,881
- Issue date Dec 26, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Biao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing semiconductor memory
- Patent number 11,854,797
- Issue date Dec 26, 2023
- Changxin Memory Technologies, Inc.
- Haodong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,830,937
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric capacitor, a ferroelectric memory cell, an array of f...
- Patent number 11,825,662
- Issue date Nov 21, 2023
- Micron Technology, Inc.
- Clement Jacob
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective processing with etch residue-based inhibitors
- Patent number 11,823,909
- Issue date Nov 21, 2023
- Lam Research Corporation
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of selective atomic layer deposition
- Patent number 11,821,085
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten compound, raw material for thin film formation and method...
- Patent number 11,807,652
- Issue date Nov 7, 2023
- Adeka Corporation
- Akio Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 11,784,053
- Issue date Oct 10, 2023
- Sumitomo Electric Device Innovations, Inc.
- Yukinori Nose
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EPITAXIAL STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20240347340
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Jui CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING ASSISTED TUNGSTEN-CONTAINING FILM DEPOSITION
- Publication number 20240332003
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Qinghua Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP...
- Publication number 20240321582
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guan-Xuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240304439
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...
- Publication number 20240297209
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Susumu YAMAUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF METAL OXIDE
- Publication number 20240282572
- Publication date Aug 22, 2024
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF METAL FILMS
- Publication number 20240271281
- Publication date Aug 15, 2024
- LAM RESEARCH CORPORATION
- Joshua COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEFORMATION COMPENSATION METHOD FOR GROWING THICK GALIUM NITRIDE ON...
- Publication number 20240263348
- Publication date Aug 8, 2024
- ROBERT BOSCH GmbH
- Bo CHENG
- C30 - CRYSTAL GROWTH
Information Patent Application
LAMINATED STRUCTURE, SEMICONDUCTOR DEVICE, AND METHOD OF FORMING CR...
- Publication number 20240250185
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takenori WATABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL NITRIDE FERROELECTRONICS
- Publication number 20240242963
- Publication date Jul 18, 2024
- The Regents of the University of Michigan
- Zetian Mi
- C30 - CRYSTAL GROWTH
Information Patent Application
CONTROLLING THRESHOLD VOLTAGES THROUGH BLOCKING LAYERS
- Publication number 20240222108
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHENE DEVICE AND METHOD OF FABRICATION OF A GRAPHENE DEVICE
- Publication number 20240213353
- Publication date Jun 27, 2024
- Graphenea Semiconductor S.L.U.
- Elías Torres Alonso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213031
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Atsuki HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHENE DEVICE AND METHOD OF FABRICATING A GRAPHENE DEVICE
- Publication number 20240213351
- Publication date Jun 27, 2024
- Graphenea Semiconductor S.L.U.
- Elías Torres Alonso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-FUNCTION ETCHING SACRIFICIAL LAYERS TO PROTECT THREE-DIMENSIO...
- Publication number 20240162079
- Publication date May 16, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Miao-Syuan Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER STACKING WAFER BONDING STRUCTURE AND METHOD OF MANUFACTU...
- Publication number 20240162035
- Publication date May 16, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Shou-Zen Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ETCHING OF RUTHENIUM
- Publication number 20240153781
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Hisashi Higuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240145527
- Publication date May 2, 2024
- SK HYNIX INC.
- Jun Hyuk SEO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CRYSTALLOGRAPHIC- AND OXYNITRIDE-BASED SURFACE
- Publication number 20240141519
- Publication date May 2, 2024
- The Regents of the University of Michigan
- Francesca Maria Toma
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES FABRICATED USING ALTE...
- Publication number 20240120335
- Publication date Apr 11, 2024
- Intel Corporation
- Sudipto NASKAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF SELECTIVE ATOMIC LAYER DEPOSITION
- Publication number 20240052487
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
- Publication number 20240038539
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20240030031
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR ELECTRONIC DEVICES INCLUDING SIDEWALL BARRIER LAYERS...
- Publication number 20230411484
- Publication date Dec 21, 2023
- Corning Incorporated
- Hoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20230387270
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chi YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING REGION-SELECTIVE THIN FILM USING SELECTIVATING A...
- Publication number 20230366080
- Publication date Nov 16, 2023
- EGTM CO., LTD.
- Jae Min KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR MANUFACTURING TRANSISTORS
- Publication number 20230369042
- Publication date Nov 16, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Po-Hsun Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION METHOD TO FORM AIR GAPS
- Publication number 20230360964
- Publication date Nov 9, 2023
- ASM IP HOLDING B.V.
- Chiyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE FLOWABLE VANADIUM OXIDE GAP FILL
- Publication number 20230357924
- Publication date Nov 9, 2023
- ASM IP HOLDING B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...
- Publication number 20230352556
- Publication date Nov 2, 2023
- ASM IP HOLDING B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

characterised by the metal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods for forming a semiconductor device structure and related se...

Deposition of oxide thin films

Selective processing with etch residue-based inhibitors

Method to create air gaps

Electronic device including ferroelectric layer

Tin oxide films in semiconductor device manufacturing

Contact over active gate structures with metal oxide layers to inhi...

High performance semiconductor oxide material channel regions for NMOS

Wafer level sequencing flow cell fabrication

Tin oxide thin film spacers in semiconductor device manufacturing

Soft ashing process for forming protective layer on conductive cap...

Atomic layer deposition of metal films

Controlling threshold voltages through blocking layers

Precursor supply unit, substrate processing system, and method of f...

Deposition of metal films with tungsten liner

Methods for selective dry etching gallium oxide

Semiconductor device and method for fabricating the same

Gate-all-around integrated circuit structures fabricated using alte...

Molybdenum thin films by oxidation-reduction

Deposition tool and method for depositing metal oxide films on orga...

Contact isolation in semiconductor devices

Nitride semiconductor device

Method of making a metal silicide contact to a silicon substrate

Methods for manufacturing semiconductor memory

Method of manufacturing a semiconductor device and a semiconductor...

Ferroelectric capacitor, a ferroelectric memory cell, an array of f...

Selective processing with etch residue-based inhibitors

Methods of selective atomic layer deposition

Tungsten compound, raw material for thin film formation and method...

Semiconductor device manufacturing method

Patents Applicationslast 30 patents

EPITAXIAL STRUCTURE AND METHOD OF FORMING THE SAME

RF PULSING ASSISTED TUNGSTEN-CONTAINING FILM DEPOSITION

SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...

SELECTIVE DEPOSITION OF METAL OXIDE

DEPOSITION OF METAL FILMS

DEFORMATION COMPENSATION METHOD FOR GROWING THICK GALIUM NITRIDE ON...

LAMINATED STRUCTURE, SEMICONDUCTOR DEVICE, AND METHOD OF FORMING CR...

EPITAXIAL NITRIDE FERROELECTRONICS

CONTROLLING THRESHOLD VOLTAGES THROUGH BLOCKING LAYERS

GRAPHENE DEVICE AND METHOD OF FABRICATION OF A GRAPHENE DEVICE

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

GRAPHENE DEVICE AND METHOD OF FABRICATING A GRAPHENE DEVICE

MULTI-FUNCTION ETCHING SACRIFICIAL LAYERS TO PROTECT THREE-DIMENSIO...

MULTILAYER STACKING WAFER BONDING STRUCTURE AND METHOD OF MANUFACTU...

THERMAL ETCHING OF RUTHENIUM

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

CRYSTALLOGRAPHIC- AND OXYNITRIDE-BASED SURFACE

GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES FABRICATED USING ALTE...

METHODS OF SELECTIVE ATOMIC LAYER DEPOSITION

SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

SEMICONDUCTOR ELECTRONIC DEVICES INCLUDING SIDEWALL BARRIER LAYERS...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

METHOD FOR FORMING REGION-SELECTIVE THIN FILM USING SELECTIVATING A...

METHODS FOR MANUFACTURING TRANSISTORS

SELECTIVE DEPOSITION METHOD TO FORM AIR GAPS

LOW TEMPERATURE FLOWABLE VANADIUM OXIDE GAP FILL

METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SE...