characterised by the non-macromolecular additives

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0085characterised by the non-macromolecular additives

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive composition
- Patent number 11,953,831
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Shoichi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Three-dimensional crosslinker composition and method of manufacturi...
- Patent number 11,860,536
- Issue date Jan 2, 2024
- UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- BongSoo Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Click-chemistry compatible structures, click-chemistry functionaliz...
- Patent number 10,732,502
- Issue date Aug 4, 2020
- Lawrence Livermore National Security, LLC
- Patrick Campbell
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Grant
Photoresists and methods for use thereof
- Patent number 9,665,001
- Issue date May 30, 2017
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition and uses thereof
- Patent number 9,190,521
- Issue date Nov 17, 2015
- Chi Mei Corporation
- Kai-Min Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoinduced alkyne-azide click reactions
- Patent number 9,176,380
- Issue date Nov 3, 2015
- The Regents of the University of Colorado, a Body Corporate
- Christopher Bowman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and method of manufacturing display device...
- Patent number 8,927,189
- Issue date Jan 6, 2015
- Samsung Display Co., Ltd.
- Gwui-Hyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Benzocyclobutene based polymer formulations and methods for process...
- Patent number 8,143,324
- Issue date Mar 27, 2012
- Dow Global Technologies LLC
- Ying Hung So
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Inkjet-imageable lithographic printing members and methods of prepa...
- Patent number 7,608,388
- Issue date Oct 27, 2009
- Presstek, Inc.
- Albert S. Deutsch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and fabrication method thereof
- Patent number 6,395,447
- Issue date May 28, 2002
- Nippon Telegraph and Telephone Corporation
- Tetsuyoshi Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,270,939
- Issue date Aug 7, 2001
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 6,245,478
- Issue date Jun 12, 2001
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,228,554
- Issue date May 8, 2001
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and fabrication method thereof
- Patent number 6,177,231
- Issue date Jan 23, 2001
- Nippon Telegraph and Telephone Corporation
- Tetsuyoshi Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition utilizing monooxymonocarboxyl...
- Patent number 6,020,104
- Issue date Feb 1, 2000
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition utilizing monooxymonocarboxyl...
- Patent number 5,925,492
- Issue date Jul 20, 1999
- JSR Corporation
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of pattern formation utilizing radiation-sensitive resin com...
- Patent number 5,494,784
- Issue date Feb 27, 1996
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition containing 1,2 quinonediazide compo...
- Patent number 5,405,720
- Issue date Apr 11, 1995
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition containing 1,2-quinonediazide compo...
- Patent number 5,238,774
- Issue date Aug 24, 1993
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
1,2-quinonediazide containing radiation-sensitive resin composition...
- Patent number 5,215,857
- Issue date Jun 1, 1993
- Japan Synthetic Rubber Co., Ltd.
- Yoshihiro Hosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically oriented photoresist pattern forming method using organic...
- Patent number 4,996,123
- Issue date Feb 26, 1991
- Matsushita Electric Industrial Co., Ltd.
- Noboru Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition
- Patent number 4,792,516
- Issue date Dec 20, 1988
- Hitachi Chemical Company
- Minoru Toriumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negatively operating photoresist composition, with radiation-absorb...
- Patent number 4,762,767
- Issue date Aug 9, 1988
- Merck Patent Gesellschaft mit beschrankter Haftung
- Gunther Haas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming thermally stable negative images on surfaces ut...
- Patent number 4,631,249
- Issue date Dec 23, 1986
- Rohm & Haas Company
- Palaiyur S. Kalyanaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative photoresist compositions with polyglutarimide polymer
- Patent number 4,569,897
- Issue date Feb 11, 1986
- Rohm & Haas Company
- Palaiyur S. Kalyanaraman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Water soluble photoresist composition with bisazide, diazo, polymer...
- Patent number 4,491,629
- Issue date Jan 1, 1985
- Tokyo Shibaura Denki Kabushiki Kaisha
- Norio Koike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition and process for ultra-fine pattern formation
- Patent number 4,401,745
- Issue date Aug 30, 1983
- Tokyo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive compositions
- Patent number 4,356,247
- Issue date Oct 26, 1982
- Fuji Photo Film Co., Ltd.
- Yoshimasa Aotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 4,352,878
- Issue date Oct 5, 1982
- Hitachi, Ltd.
- Kiyoshi Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist cyclized rubber and bisazide compositions containing a...
- Patent number 4,287,289
- Issue date Sep 1, 1981
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Takayuki Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
THREE-DIMENSIONAL CROSSLINKER COMPOSITION AND METHOD OF MANUFACTURI...
- Publication number 20210397087
- Publication date Dec 23, 2021
- Ulsan National Institute of Science and Technology
- BongSoo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20200393759
- Publication date Dec 17, 2020
- FUJIFILM CORPORATION
- Shoichi NAKAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVIN...
- Publication number 20150378256
- Publication date Dec 31, 2015
- CHI MEI CORPORATION
- MING-JU WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE...
- Publication number 20140242515
- Publication date Aug 28, 2014
- SAMSUNG DISPLAY CO., LTD.
- Gwui-Hyun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoinduced Alkyne-Azide Click Reactions
- Publication number 20130323642
- Publication date Dec 5, 2013
- The Regents of the University of Colorado, a Body Corporate
- Christopher Bowman
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF
- Publication number 20130306970
- Publication date Nov 21, 2013
- CHI MEI CORPORATION
- KAI-MIN CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INKJET-IMAGEABLE LITHOGRAPHIC PRINTING MEMBERS AND METHODS OF PREPA...
- Publication number 20120060710
- Publication date Mar 15, 2012
- Albert S. Deutsch
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PHOTORESISTS AND METHODS FOR USE THEREOF
- Publication number 20110254133
- Publication date Oct 20, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Gerhard POHLERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Benzocyclobutene based polymer formulations and methods for process...
- Publication number 20090275673
- Publication date Nov 5, 2009
- Ying Hung So
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
INKJET-IMAGEABLE LITHOGRAPHIC PRINTING MEMBERS AND METHODS OF PREPA...
- Publication number 20090123872
- Publication date May 14, 2009
- Albert S. Deutsch
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Inkjet-imageable lithographic printing members and methods of prepa...
- Publication number 20060166141
- Publication date Jul 27, 2006
- Presstek, Inc.
- Albert S. Deutsch
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Inkjet-imageable lithographic printing members and methods of prepa...
- Publication number 20060160016
- Publication date Jul 20, 2006
- Presstek, Inc.
- Albert S. Deutsch
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Inkjet-imageable lithographic printing members and methods of prepa...
- Publication number 20060156939
- Publication date Jul 20, 2006
- Presstek, Inc.
- Albert S. Deutsch
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Inkjet-imageable lithographic printing members and methods of prepa...
- Publication number 20060150847
- Publication date Jul 13, 2006
- Presstek, Inc.
- Albert S. Deutsch
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

characterised by the non-macromolecular additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photosensitive composition

Three-dimensional crosslinker composition and method of manufacturi...

Click-chemistry compatible structures, click-chemistry functionaliz...

Photoresists and methods for use thereof

Positive photosensitive resin composition and uses thereof

Photoinduced alkyne-azide click reactions

Photoresist composition and method of manufacturing display device...

Benzocyclobutene based polymer formulations and methods for process...

Inkjet-imageable lithographic printing members and methods of prepa...

Resist material and fabrication method thereof

Radiation-sensitive resin composition

Resist composition

Radiation-sensitive resin composition

Resist material and fabrication method thereof

Radiation-sensitive resin composition utilizing monooxymonocarboxyl...

Radiation-sensitive resin composition utilizing monooxymonocarboxyl...

Method of pattern formation utilizing radiation-sensitive resin com...

Radiation-sensitive composition containing 1,2 quinonediazide compo...

Radiation-sensitive composition containing 1,2-quinonediazide compo...

1,2-quinonediazide containing radiation-sensitive resin composition...

Optically oriented photoresist pattern forming method using organic...

Photosensitive composition

Negatively operating photoresist composition, with radiation-absorb...

Process for forming thermally stable negative images on surfaces ut...

Negative photoresist compositions with polyglutarimide polymer

Water soluble photoresist composition with bisazide, diazo, polymer...

Composition and process for ultra-fine pattern formation

Light-sensitive compositions

Photoresist composition

Photoresist cyclized rubber and bisazide compositions containing a...

Patents Applicationslast 30 patents

THREE-DIMENSIONAL CROSSLINKER COMPOSITION AND METHOD OF MANUFACTURI...

PHOTOSENSITIVE COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVIN...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE...

Photoinduced Alkyne-Azide Click Reactions

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF

INKJET-IMAGEABLE LITHOGRAPHIC PRINTING MEMBERS AND METHODS OF PREPA...

PHOTORESISTS AND METHODS FOR USE THEREOF

Benzocyclobutene based polymer formulations and methods for process...

INKJET-IMAGEABLE LITHOGRAPHIC PRINTING MEMBERS AND METHODS OF PREPA...

Inkjet-imageable lithographic printing members and methods of prepa...

Inkjet-imageable lithographic printing members and methods of prepa...

Inkjet-imageable lithographic printing members and methods of prepa...

Inkjet-imageable lithographic printing members and methods of prepa...