characterised by the process involved to create the mask

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H01L21/3086

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3086characterised by the process involved to create the mask

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure and forming method thereof
- Patent number 12,165,874
- Issue date Dec 10, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jingwen Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor having airgap and method for manufactur...
- Patent number 12,165,925
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sai-Hooi Yeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device with damascene structur...
- Patent number 12,159,790
- Issue date Dec 3, 2024
- NANYA TECHNOLOGY CORPORATION
- Wei-Chen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin-based field effect transistors
- Patent number 12,154,903
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Matthias Passlack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures and manufacturing methods thereof
- Patent number 12,148,613
- Issue date Nov 19, 2024
- ENKRIS SEMICONDUCTOR, INC.
- Kai Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method
- Patent number 12,140,863
- Issue date Nov 12, 2024
- United Microelectronics Corp.
- Su-Yun Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,142,495
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Toshiki Kanaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including a gate-all-around field effect trans...
- Patent number 12,142,529
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Ming Yu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Contact over active gate structures for advanced integrated circuit...
- Patent number 12,142,667
- Issue date Nov 12, 2024
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a vertical fin field effect transistor with reduced...
- Patent number 12,136,573
- Issue date Nov 5, 2024
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming FinFET super well
- Patent number 12,136,551
- Issue date Nov 5, 2024
- Shanghai Huali Integrated Circuit Corporation
- Yong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure cutting process and structures formed thereby
- Patent number 12,132,050
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 12,133,376
- Issue date Oct 29, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Fan Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced etching technologies for straight, tall and uniform fins a...
- Patent number 12,131,912
- Issue date Oct 29, 2024
- Intel Corporation
- Muralidhar S. Ambati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-gate transistors with backside power rail and reduced gate-dr...
- Patent number 12,125,852
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Huan-Chieh Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of antireflective surfaces
- Patent number 12,122,668
- Issue date Oct 22, 2024
- Brookhaven Science Associates, LLC
- Charles T. Black
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor device structure and method for forming the same prel...
- Patent number 12,125,912
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Lin-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage devices
- Patent number 12,119,265
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming semiconductor structure
- Patent number 12,120,869
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mengna Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Staircase patterning for 3D NAND devices
- Patent number 12,101,929
- Issue date Sep 24, 2024
- International Business Machines Corporation
- Effendi Leobandung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning a substrate using a sidewall spacer etch mask
- Patent number 12,099,299
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing semiconductor devices
- Patent number 12,100,596
- Issue date Sep 24, 2024
- Samsung Electronics Co., Ltd.
- Hyunki Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for forming patterned structures including silico...
- Patent number 12,100,597
- Issue date Sep 24, 2024
- ASM IP Holding B.V.
- Eiichiro Shiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, semiconductor structure and method for fabric...
- Patent number 12,094,718
- Issue date Sep 17, 2024
- NANYA TECHNOLOGY CORPORATION
- Huan-Yung Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,094,956
- Issue date Sep 17, 2024
- United Microelectronics Corp.
- Chin-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fin field-effect transistor devices and methods of forming the same
- Patent number 12,087,639
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using a same mask for direct print and self-aligned double patterni...
- Patent number 12,080,559
- Issue date Sep 3, 2024
- International Business Machines Corporation
- Stuart Sieg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buried metal for FinFET device and method
- Patent number 12,080,588
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Lei-Chun Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 12,074,031
- Issue date Aug 27, 2024
- Samsung Electronics Co., Ltd.
- Chong Kwang Chang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING VERTICAL POWER TRANSISTORS AND VERTICAL POWER...
- Publication number 20240404836
- Publication date Dec 5, 2024
- ROBERT BOSCH GmbH
- Jens Baringhaus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ISOLATION PROCESS CONTROL AND STRUCTURES THEREOF
- Publication number 20240404871
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- Wei Che Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240395909
- Publication date Nov 28, 2024
- UNITED MICROELECTRONICS CORP.
- Chin-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin-Based Field Effect Transistors
- Publication number 20240395818
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matthias PASSLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK
- Publication number 20240395542
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240395624
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Ming YU
- B82 - NANO-TECHNOLOGY
Information Patent Application
FINFET DEVICE AND METHOD OF FORMING SAME
- Publication number 20240387237
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bo-Cyuan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE DEVICE
- Publication number 20240387284
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Device and Method of Forming Same
- Publication number 20240387292
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE POWER RAIL AND METHODS OF FORMING THE SAME
- Publication number 20240387534
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Huan-Chieh Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20240379852
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lin-Yu HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING LOW-STRESS SILICON NITRIDE LAYER THROUGH HYDROGEN TREATMENT
- Publication number 20240379346
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Che Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Structure Cutting Process and Structures Formed Thereby
- Publication number 20240371869
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20240363431
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Buried Metal for FinFET Device and Method
- Publication number 20240363393
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lei-Chun Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR METAL PATTERNING
- Publication number 20240363347
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chen LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES FOR REDUCING LINE-END SPACING
- Publication number 20240355633
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Yen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20240355632
- Publication date Oct 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yasuyuki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE SUBSTRATE FOR FABRICATION OF BETA GALLIUM OXIDE DEVICES
- Publication number 20240347339
- Publication date Oct 17, 2024
- Syrnatec, Inc.
- Yash Suresh Mirchandani
- B24 - GRINDING POLISHING
Information Patent Application
GATE CUT AND FIN TRIM ISOLATION FOR ADVANCED INTEGRATED CIRCUIT STR...
- Publication number 20240332399
- Publication date Oct 3, 2024
- Intel Corporation
- Tahir GHANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240332059
- Publication date Oct 3, 2024
- Samsung Electronics Co., Ltd.
- Youngin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Assemblies and Methods of Forming Integrated Assemblies
- Publication number 20240315018
- Publication date Sep 19, 2024
- Micron Technology, Inc.
- Justin B. Dorhout
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING PHOTONIC DEVICES
- Publication number 20240302591
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Tao-Cheng LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...
- Publication number 20240302744
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240302747
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20240304453
- Publication date Sep 12, 2024
- Ulvac, Inc.
- Taichi SUZUKI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD OF PRODUCING AN ETCHING MASK, METHOD OF ETCHING A STRUCTURE...
- Publication number 20240304446
- Publication date Sep 12, 2024
- JENOPTIK OPTICAL SYSTEMS GMBH
- Meik PANITZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240295823
- Publication date Sep 5, 2024
- Innolux Corporation
- Chun-Yuan Chuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
- Publication number 20240297047
- Publication date Sep 5, 2024
- WINBOND ELECTRONICS CORP.
- Kun-Che Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-ASPECT RATIO METALLIZED STRUCTURES
- Publication number 20240297048
- Publication date Sep 5, 2024
- GE Precision Healthcare LLC
- Shubhodeep Goswami
- B81 - MICRO-STRUCTURAL TECHNOLOGY

characterised by the process involved to create the mask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor structure and forming method thereof

Fin field effect transistor having airgap and method for manufactur...

Method for fabricating semiconductor device with damascene structur...

Fin-based field effect transistors

Semiconductor structures and manufacturing methods thereof

Imprint method

Etching method and etching apparatus

Semiconductor device including a gate-all-around field effect trans...

Contact over active gate structures for advanced integrated circuit...

Fabrication of a vertical fin field effect transistor with reduced...

Method for forming FinFET super well

Semiconductor structure cutting process and structures formed thereby

Method for manufacturing semiconductor structure

Advanced etching technologies for straight, tall and uniform fins a...

Multi-gate transistors with backside power rail and reduced gate-dr...

Formation of antireflective surfaces

Semiconductor device structure and method for forming the same prel...

High voltage devices

Semiconductor structure and method for forming semiconductor structure

Staircase patterning for 3D NAND devices

Method of patterning a substrate using a sidewall spacer etch mask

Methods of manufacturing semiconductor devices

Method and system for forming patterned structures including silico...

Semiconductor device, semiconductor structure and method for fabric...

Semiconductor device and method for fabricating the same

Composition for forming silicon-containing resist underlayer film a...

Fin field-effect transistor devices and methods of forming the same

Using a same mask for direct print and self-aligned double patterni...

Buried metal for FinFET device and method

Method of fabricating semiconductor device

Patents Applicationslast 30 patents

METHOD FOR PRODUCING VERTICAL POWER TRANSISTORS AND VERTICAL POWER...

METHODS FOR ISOLATION PROCESS CONTROL AND STRUCTURES THEREOF

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

Fin-Based Field Effect Transistors

HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

FINFET DEVICE AND METHOD OF FORMING SAME

HIGH VOLTAGE DEVICE

FinFET Device and Method of Forming Same

BACKSIDE POWER RAIL AND METHODS OF FORMING THE SAME

SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME

FORMING LOW-STRESS SILICON NITRIDE LAYER THROUGH HYDROGEN TREATMENT

Semiconductor Structure Cutting Process and Structures Formed Thereby

FIN FIELD-EFFECT TRANSISTOR DEVICES AND METHODS OF FORMING THE SAME

Buried Metal for FinFET Device and Method

METHOD FOR METAL PATTERNING

PROCESSES FOR REDUCING LINE-END SPACING

Composition For Forming Organic Film, Method For Forming Organic Fi...

COMPOSITE SUBSTRATE FOR FABRICATION OF BETA GALLIUM OXIDE DEVICES

GATE CUT AND FIN TRIM ISOLATION FOR ADVANCED INTEGRATED CIRCUIT STR...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

Integrated Assemblies and Methods of Forming Integrated Assemblies

METHODS OF FORMING PHOTONIC DEVICES

COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...

NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION

ETCHING METHOD

METHOD OF PRODUCING AN ETCHING MASK, METHOD OF ETCHING A STRUCTURE...

METHOD FOR MANUFACTURING ELECTRONIC DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE

HIGH-ASPECT RATIO METALLIZED STRUCTURES