characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Industry

CPC
G03F7/2008

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2008characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Industries

Patents Grantslast 30 patents

Information Patent Grant
Imaging optical system, exposure apparatus, and article manufacturi...
- Patent number 11,966,043
- Issue date Apr 23, 2024
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source device including discharge lamp, irradiation device an...
- Patent number 11,913,985
- Issue date Feb 27, 2024
- Phoenix Electric Co., Ltd.
- Tomihiko Ikeda
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for controlling droplet in extreme ultraviolet...
- Patent number 11,914,302
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuous digital light processing additive manufacturing of implants
- Patent number 11,865,785
- Issue date Jan 9, 2024
- H. David Dean
- G02 - OPTICS
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,852,964
- Issue date Dec 26, 2023
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Width adjustment of EUV radiation beam
- Patent number 11,796,917
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser radiation system and method for manufacturing electronic device
- Patent number 11,768,362
- Issue date Sep 26, 2023
- Gigaphoton Inc.
- Akiyoshi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography method, extreme ultraviolet mask an...
- Patent number 11,740,549
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal plate for producing vapor deposition masks, inspection method...
- Patent number 11,733,607
- Issue date Aug 22, 2023
- Dai Nippon Printing Co., Ltd.
- Chikao Ikenaga
- C21 - METALLURGY OF IRON
Information Patent Grant
Light source device, illuminating apparatus, exposing apparatus, an...
- Patent number 11,698,589
- Issue date Jul 11, 2023
- Canon Kabushiki Kaisha
- Noboru Osaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control apparatus and control method, exposure apparatus and exposu...
- Patent number 11,537,051
- Issue date Dec 27, 2022
- Nikon Corporation
- Satoshi Yashiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast fabrication of polymer out-of-plane optical coupler by gray-sc...
- Patent number 11,531,270
- Issue date Dec 20, 2022
- Arizona Board of Regents on behalf of the University of Arizona
- Yuzuru Takashima
- G02 - OPTICS
Information Patent Grant
Pattern drawing device
- Patent number 11,409,199
- Issue date Aug 9, 2022
- Nikon Corporation
- Masaki Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for correcting an inhomogeneous intensity distrib...
- Patent number 11,364,677
- Issue date Jun 21, 2022
- Schultheiss GmbH
- Andreas Schultheiss
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,320,731
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source apparatus, illumination apparatus, exposure apparatus,...
- Patent number 11,320,741
- Issue date May 3, 2022
- Canon Kabushiki Kaisha
- Noboru Osaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for controlling droplet in extreme ultraviolet...
- Patent number 11,237,483
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal plate for manufacturing deposition mask and manufacturing met...
- Patent number 11,237,481
- Issue date Feb 1, 2022
- Dai Nippon Printing Co., Ltd.
- Hiroki Oka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods that utilize angled photolithography for manufa...
- Patent number 11,131,929
- Issue date Sep 28, 2021
- Waymo LLC
- James Dunphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with flat 1D-patterned mask for use in EUV-expo...
- Patent number 11,054,745
- Issue date Jul 6, 2021
- Nikon Corporation
- Daniel Gene Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,048,159
- Issue date Jun 29, 2021
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition...
- Patent number 11,022,880
- Issue date Jun 1, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for exposing wafer
- Patent number 11,016,390
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Anti-reflection optical substrates and methods of manufacture
- Patent number 11,009,794
- Issue date May 18, 2021
- ASML Holding N.V.
- Parag Vinayak Kelkar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Extreme ultraviolet exposure apparatus and method, and method of ma...
- Patent number 10,969,691
- Issue date Apr 6, 2021
- Samsung Electronics Co., Ltd.
- Seung-yoon Lee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Reserving spatial light modulator sections to address field non-uni...
- Patent number 10,921,714
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imager for lithographic reproduction
- Patent number 10,908,504
- Issue date Feb 2, 2021
- Optical Associates, Inc.
- David Kessler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light irradiating device
- Patent number 10,877,376
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Ryo Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask and method
- Patent number 10,859,902
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source device
- Patent number 10,845,010
- Issue date Nov 24, 2020
- Ushio Denki Kabushiki Kaisha
- Takeo Matsushima
- F21 - LIGHTING

Patents Applicationslast 30 patents

Information Patent Application
CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS
- Publication number 20240100777
- Publication date Mar 28, 2024
- H. David DEAN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
WIDTH ADJUSTMENT OF EUV RADIATION BEAM
- Publication number 20230367221
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20230367230
- Publication date Nov 16, 2023
- Nikon Corporation
- Koichi MURAKAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, ILLUMINATION OPTICAL UNIT, PROJECTION E...
- Publication number 20230205090
- Publication date Jun 29, 2023
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, OPTICAL ARRANGEMENT, AND METHOD FOR MANUFACTURING...
- Publication number 20230185080
- Publication date Jun 15, 2023
- Carl Zeiss SMT GMBH
- Marwene Nefzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20230120789
- Publication date Apr 20, 2023
- PlayNitride Display Co., Ltd.
- Po-Wei Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gradient Structures Interfacing Microfluidics and Nanofluidics, Met...
- Publication number 20230110246
- Publication date Apr 13, 2023
- Princeton University
- Han Cao
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION
- Publication number 20230084088
- Publication date Mar 16, 2023
- DUKE UNIVERSITY
- Xin Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAM GUIDE AND POSITIONING DEVICE FOR POSITIONING A SCRAPER MIRROR,...
- Publication number 20230047967
- Publication date Feb 16, 2023
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- William Bettridge
- G02 - OPTICS
Information Patent Application
MASK CHARACTERIZATION METHODS AND APPARATUSES
- Publication number 20220357660
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WIDTH ADJUSTMENT OF EUV RADIATION BEAM
- Publication number 20220357662
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY METHOD, EXTREME ULTRAVIOLET MASK AN...
- Publication number 20220326597
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET...
- Publication number 20220155690
- Publication date May 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL PLATE FOR MANUFACTURING DEPOSITION MASK AND MANUFACTURING MET...
- Publication number 20220121115
- Publication date Apr 21, 2022
- DAI NIPPON PRINTING CO., LTD.
- Hiroki OKA
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Application
DIFFRACTIVE BACKLIGHT FABRICATION METHOD
- Publication number 20220050377
- Publication date Feb 17, 2022
- LEIA INC.
- Thomas Hoekman
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...
- Publication number 20220011571
- Publication date Jan 13, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATION SYSTEM AND DRAWING DEVICE
- Publication number 20220004109
- Publication date Jan 6, 2022
- Inspec Inc.
- Masashi SUGAWARA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Systems and Methods that Utilize Angled Photolithography for Manufa...
- Publication number 20210397094
- Publication date Dec 23, 2021
- WAYMO LLC
- James Dunphy
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET...
- Publication number 20210389680
- Publication date Dec 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM WITH VARIABLE FOCAL DISTANCE AND OPTICAL ASSEMBLY CO...
- Publication number 20210364933
- Publication date Nov 25, 2021
- THALES
- Luca PEVERINI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLA...
- Publication number 20210294202
- Publication date Sep 23, 2021
- HOYA CORPORATION
- Tsutomu SHOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nonlinear Scattering Lithography
- Publication number 20210240083
- Publication date Aug 5, 2021
- Vathys, Inc.
- Tapabrata GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL PLATE FOR PRODUCING VAPOR DEPOSITION MASKS, PRODUCTION METHOD...
- Publication number 20210157232
- Publication date May 27, 2021
- DAI NIPPON PRINTING CO., LTD.
- Chikao IKENAGA
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Application
LIGHT SOURCE DEVICE, ILLUMINATING APPARATUS, EXPOSING APPARATUS, AN...
- Publication number 20210096466
- Publication date Apr 1, 2021
- Canon Kabushiki Kaisha
- Noboru Osaka
- F21 - LIGHTING
Information Patent Application
LIGHT SOURCE DEVICE INCLUDING DISCHARGE LAMP, IRRADIATION DEVICE AN...
- Publication number 20210003627
- Publication date Jan 7, 2021
- PHOENIX ELECTRIC CO., LTD.
- Tomihiko IKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXPOSING WAFER
- Publication number 20200409268
- Publication date Dec 31, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- G02 - OPTICS
Information Patent Application
PATTERN DRAWING DEVICE
- Publication number 20200341379
- Publication date Oct 29, 2020
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
RESERVING SPATIAL LIGHT MODULATOR SECTIONS TO ADDRESS FIELD NON-UNI...
- Publication number 20200301288
- Publication date Sep 24, 2020
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST FABRICATION OF POLYMER OUT-OF-PLANE OPTICAL COUPLER BY GRAY-SC...
- Publication number 20200292943
- Publication date Sep 17, 2020
- Arizona Board of Regents on behalf of The University of Arizona
- Yuzuru TAKASHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL APPARATUS AND CONTROL METHOD, EXPOSURE APPARATUS AND EXPOSU...
- Publication number 20200257205
- Publication date Aug 13, 2020
- Nikon Corporation
- Satoshi YASHIKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Imaging optical system, exposure apparatus, and article manufacturi...

Light source device including discharge lamp, irradiation device an...

Method and apparatus for controlling droplet in extreme ultraviolet...

Continuous digital light processing additive manufacturing of implants

Method for manufacturing reflective mask blank, reflective mask bla...

Width adjustment of EUV radiation beam

Laser radiation system and method for manufacturing electronic device

Extreme ultraviolet lithography method, extreme ultraviolet mask an...

Metal plate for producing vapor deposition masks, inspection method...

Light source device, illuminating apparatus, exposing apparatus, an...

Control apparatus and control method, exposure apparatus and exposu...

Fast fabrication of polymer out-of-plane optical coupler by gray-sc...

Pattern drawing device

Method and device for correcting an inhomogeneous intensity distrib...

Membrane for EUV lithography

Light source apparatus, illumination apparatus, exposure apparatus,...

Method and apparatus for controlling droplet in extreme ultraviolet...

Metal plate for manufacturing deposition mask and manufacturing met...

Systems and methods that utilize angled photolithography for manufa...

Illumination system with flat 1D-patterned mask for use in EUV-expo...

Method for manufacturing reflective mask blank, reflective mask bla...

Chemically amplified positive-type photosensitive resin composition...

Method for exposing wafer

Anti-reflection optical substrates and methods of manufacture

Extreme ultraviolet exposure apparatus and method, and method of ma...

Reserving spatial light modulator sections to address field non-uni...

Imager for lithographic reproduction

Light irradiating device

Lithography mask and method

Light source device

Patents Applicationslast 30 patents

CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS

WIDTH ADJUSTMENT OF EUV RADIATION BEAM

EXPOSURE APPARATUS

REFLECTIVE OPTICAL ELEMENT, ILLUMINATION OPTICAL UNIT, PROJECTION E...

OPTICAL ELEMENT, OPTICAL ARRANGEMENT, AND METHOD FOR MANUFACTURING...

EXPOSURE APPARATUS

Gradient Structures Interfacing Microfluidics and Nanofluidics, Met...

METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION

BEAM GUIDE AND POSITIONING DEVICE FOR POSITIONING A SCRAPER MIRROR,...

MASK CHARACTERIZATION METHODS AND APPARATUSES

WIDTH ADJUSTMENT OF EUV RADIATION BEAM

EXTREME ULTRAVIOLET LITHOGRAPHY METHOD, EXTREME ULTRAVIOLET MASK AN...

METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET...

METAL PLATE FOR MANUFACTURING DEPOSITION MASK AND MANUFACTURING MET...

DIFFRACTIVE BACKLIGHT FABRICATION METHOD

IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...

CALIBRATION SYSTEM AND DRAWING DEVICE

Systems and Methods that Utilize Angled Photolithography for Manufa...

METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET...

OPTICAL SYSTEM WITH VARIABLE FOCAL DISTANCE AND OPTICAL ASSEMBLY CO...

METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLA...

Nonlinear Scattering Lithography

METAL PLATE FOR PRODUCING VAPOR DEPOSITION MASKS, PRODUCTION METHOD...

LIGHT SOURCE DEVICE, ILLUMINATING APPARATUS, EXPOSING APPARATUS, AN...

LIGHT SOURCE DEVICE INCLUDING DISCHARGE LAMP, IRRADIATION DEVICE AN...

METHOD FOR EXPOSING WAFER

PATTERN DRAWING DEVICE

RESERVING SPATIAL LIGHT MODULATOR SECTIONS TO ADDRESS FIELD NON-UNI...

FAST FABRICATION OF POLYMER OUT-OF-PLANE OPTICAL COUPLER BY GRAY-SC...

CONTROL APPARATUS AND CONTROL METHOD, EXPOSURE APPARATUS AND EXPOSU...