characterised by the treatment performed before or after the formation of the layer

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    • Samsung Electronics Co., Ltd.
    • Ji-woon Park
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    METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES

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    • Publication date Jul 22, 2021
    • Samsung Electronics Co., Ltd.
    • Ji-woon Park
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    FORMING III NITRIDE ALLOYS

    • Publication number 20200402791
    • Publication date Dec 24, 2020
    • King Abdullah University of Science and Technology
    • Xiaohang LI
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    PREPARING METHOD OF MONOMOLECULAR NANO-THIN FILM

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    • Publication date Apr 23, 2020
    • Research & Business Foundation Sungkyunkwan University
    • Byungkwon LIM
    • B82 - NANO-TECHNOLOGY
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    METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES

    • Publication number 20200111660
    • Publication date Apr 9, 2020
    • Samsung Electronics Co., Ltd.
    • Ji-woon Park
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    Mechanism for FinFET Well Doping

    • Publication number 20190273014
    • Publication date Sep 5, 2019
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Chun Hsiung Tsai
    • H01 - BASIC ELECTRIC ELEMENTS
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    Reducing EUV-Induced Material Property Changes

    • Publication number 20180151350
    • Publication date May 31, 2018
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Chia-Ying Li
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  • Information Patent Application

    SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME

    • Publication number 20150115398
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    • Samsung Electronics Co., Ltd.
    • Euibok LEE
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