characterised by the treatment performed before or after the formation of the layer

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H01L21/02296

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02296characterised by the treatment performed before or after the formation of the layer

Industries

Patents Grantslast 30 patents

Information Patent Grant
Mechanism for FinFET well doping
- Patent number 11,742,237
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing semiconductor devices
- Patent number 11,682,555
- Issue date Jun 20, 2023
- Samsung Electronics Co., Ltd.
- Ji-woon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparing method of monomolecular nano-thin film
- Patent number 11,534,795
- Issue date Dec 27, 2022
- Research & Business Foundation Sungkyunkwan University
- Byungkwon Lim
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Forming III nitride alloys
- Patent number 11,264,238
- Issue date Mar 1, 2022
- King Abdullah University of Science and Technology
- Xiaohang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for FinFET well doping
- Patent number 11,075,108
- Issue date Jul 27, 2021
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing semiconductor devices
- Patent number 10,991,574
- Issue date Apr 27, 2021
- Samsung Electronics Co., Ltd.
- Ji-woon Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method for light emitting device, light emitting devi...
- Patent number 10,943,781
- Issue date Mar 9, 2021
- Najing Technology Corporation Limited
- Changgua Zhen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching back method
- Patent number 10,777,420
- Issue date Sep 15, 2020
- United Microelectronics Corp.
- Kuan-Ying Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminate film and electrode substrate film, and method of manufactu...
- Patent number 10,752,985
- Issue date Aug 25, 2020
- Sumitomo Metal Mining Co., Ltd.
- Hideharu Okami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical fin type bipolar junction transistor (BJT) device with a s...
- Patent number 10,658,495
- Issue date May 19, 2020
- International Business Machines Corporation
- Injo Ok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple barrier layer encapsulation stack
- Patent number 10,580,638
- Issue date Mar 3, 2020
- Sage Electrochromics, Inc.
- Avanti M. Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabrication of a semiconductor element comprising a highl...
- Patent number 10,510,531
- Issue date Dec 17, 2019
- Soitec
- Oleg Kononchuk
- C30 - CRYSTAL GROWTH
Information Patent Grant
Reducing EUV-induced material property changes
- Patent number 10,510,538
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ying Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and structures for forming a tight pitch structure
- Patent number 10,424,482
- Issue date Sep 24, 2019
- International Business Machines Corporation
- Peng Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing substrate
- Patent number 10,392,297
- Issue date Aug 27, 2019
- Shenzhen China Star Optoelectronics Technology Co. Ltd.
- Zijian Li
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 10,312,146
- Issue date Jun 4, 2019
- United Microelectronics Corp.
- Ching-Ling Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for FinFET well doping
- Patent number 10,297,492
- Issue date May 21, 2019
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer dielectric structures with graded composition for nano-s...
- Patent number 10,211,047
- Issue date Feb 19, 2019
- International Business Machines Corporation
- Son V. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective gas phase film deposition on a substrate by mod...
- Patent number 10,062,564
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Kandabara N. Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multilayer dielectric structures with graded composition for nano-s...
- Patent number 9,934,963
- Issue date Apr 3, 2018
- International Business Machines Corporation
- Son V. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Segmented graphene growth on surfaces of a patterned substrate laye...
- Patent number 9,688,540
- Issue date Jun 27, 2017
- Solan, LLC
- Mark Alan Davis
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method of manufacturing device substrate and display device manufac...
- Patent number 9,500,890
- Issue date Nov 22, 2016
- Samsung Display Co., Ltd.
- TaeHwan Kim
- G02 - OPTICS
Information Patent Grant
Nitridation on HDP oxide before high-k deposition to prevent oxygen...
- Patent number 9,472,408
- Issue date Oct 18, 2016
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for selective deposition
- Patent number 9,385,219
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Ellie Y. Yieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling the melt front of thin film applications
- Patent number 9,205,631
- Issue date Dec 8, 2015
- GLOBALFOUNDRIES Inc.
- Stephen W. Bedell
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods of manufacturing semiconductor devices including capped met...
- Patent number 9,171,755
- Issue date Oct 27, 2015
- Samsung Electronics Co., Ltd.
- Euibok Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20230260783
- Publication date Aug 17, 2023
- Samsung Electronics Co., Ltd.
- Ji-woon Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20210225636
- Publication date Jul 22, 2021
- Samsung Electronics Co., Ltd.
- Ji-woon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING III NITRIDE ALLOYS
- Publication number 20200402791
- Publication date Dec 24, 2020
- King Abdullah University of Science and Technology
- Xiaohang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREPARING METHOD OF MONOMOLECULAR NANO-THIN FILM
- Publication number 20200122190
- Publication date Apr 23, 2020
- Research & Business Foundation Sungkyunkwan University
- Byungkwon LIM
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20200111660
- Publication date Apr 9, 2020
- Samsung Electronics Co., Ltd.
- Ji-woon Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mechanism for FinFET Well Doping
- Publication number 20190273014
- Publication date Sep 5, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reducing EUV-Induced Material Property Changes
- Publication number 20180151350
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Ying Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME
- Publication number 20150115398
- Publication date Apr 30, 2015
- Samsung Electronics Co., Ltd.
- Euibok LEE
- H01 - BASIC ELECTRIC ELEMENTS

characterised by the treatment performed before or after the formation of the layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mechanism for FinFET well doping

Methods of manufacturing semiconductor devices

Preparing method of monomolecular nano-thin film

Forming III nitride alloys

Mechanism for FinFET well doping

Methods of manufacturing semiconductor devices

Manufacturing method for light emitting device, light emitting devi...

Etching back method

Laminate film and electrode substrate film, and method of manufactu...

Vertical fin type bipolar junction transistor (BJT) device with a s...

Multiple barrier layer encapsulation stack

Method of fabrication of a semiconductor element comprising a highl...

Reducing EUV-induced material property changes

Methods and structures for forming a tight pitch structure

Method for manufacturing substrate

Method for fabricating semiconductor device

Mechanism for FinFET well doping

Multilayer dielectric structures with graded composition for nano-s...

Method of selective gas phase film deposition on a substrate by mod...

Multilayer dielectric structures with graded composition for nano-s...

Segmented graphene growth on surfaces of a patterned substrate laye...

Method of manufacturing device substrate and display device manufac...

Nitridation on HDP oxide before high-k deposition to prevent oxygen...

Method and apparatus for selective deposition

Controlling the melt front of thin film applications

Methods of manufacturing semiconductor devices including capped met...

Patents Applicationslast 30 patents

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES

FORMING III NITRIDE ALLOYS

PREPARING METHOD OF MONOMOLECULAR NANO-THIN FILM

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES

Mechanism for FinFET Well Doping

Reducing EUV-Induced Material Property Changes

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME